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    • 57. 发明授权
    • Display driver, display device, and portable electronic apparatus
    • 显示驱动器,显示设备和便携式电子设备
    • US07271799B2
    • 2007-09-18
    • US10844567
    • 2004-05-13
    • Hiroshi IwataAkihide Shibata
    • Hiroshi IwataAkihide Shibata
    • G09G5/00
    • H01L29/66833G09G3/20H01L21/28282H01L29/792
    • A display driver includes a display driving part for receiving image data and outputting a drive signal to a display panel; a nonvolatile memory part for storing control information for controlling output of the display driving part; and a control part for controlling output of the display driving part on the basis of the control information, wherein the nonvolatile memory part has a nonvolatile memory cell, and the nonvolatile memory cell includes a gate electrode formed on a semiconductor layer via a gate insulating film, a channel region disposed under the gate electrode, diffusion regions disposed on both sides of the channel region and having a conductive type opposite to that of the channel region, and memory functional units formed on both sides of the gate electrode and having a function for retaining charges.
    • 显示驱动器包括用于接收图像数据并向显示面板输出驱动信号的显示驱动部分; 非易失性存储器部分,用于存储用于控制显示驱动部分的输出的控制信息; 以及控制部分,用于根据控制信息控制显示驱动部分的输出,其中非易失性存储器部分具有非易失性存储单元,并且非易失性存储单元包括通过栅极绝缘膜形成在半导体层上的栅电极 设置在所述栅电极下方的沟道区域,设置在所述沟道区域的两侧且具有与沟道区域相反的导电类型的扩散区域,以及形成在所述栅极电极两侧的存储功能单元, 保留费用。
    • 60. 发明授权
    • Semiconductor memory having two charge storage sections
    • 具有两个电荷存储部分的半导体存储器
    • US07095077B2
    • 2006-08-22
    • US10824394
    • 2004-04-15
    • Kotaro KataokaHiroshi IwataAkihide Shibata
    • Kotaro KataokaHiroshi IwataAkihide Shibata
    • H01L29/792
    • H01L29/66833H01L21/28282H01L29/7923
    • A semiconductor memory includes: a p-type semiconductor (p-type semiconductor film on a substrate, a p-type well region in a semiconductor substrate, or an insulator); a gate insulating film formed on the p-type semiconductor; a gate electrode formed on the gate insulating film; two charge storage sections formed on side walls of the gate electrode; a channel region provided below the gate electrode; and a first n-type diffusion layer region and a second n-type diffusion layer region provided to sides of the channel region, wherein: the charge storage sections are arranged to change an electric current flow between the first n-type diffusion layer region and the second n-type diffusion layer region under application of a voltage to the gate electrode according to the quantity of electric charges stored in the charge storage sections; and the first n-type diffusion layer region is set to a reference voltage, the other n-type diffusion layer region is set to a voltage greater than the reference voltage, and the gate electrode is set to a voltage greater than the reference voltage. Thus, the semiconductor memory obtained is capable of 2 bit operation and easy to miniaturize.
    • 半导体存储器包括:p型半导体(衬底上的p型半导体膜,半导体衬底中的p型阱区或绝缘体); 形成在p型半导体上的栅极绝缘膜; 形成在栅极绝缘膜上的栅电极; 形成在栅电极的侧壁上的两个电荷存储部分; 设置在栅电极下方的沟道区; 以及设置在沟道区域的侧面的第一n型扩散层区域和第二n型扩散层区域,其中:电荷存储部分被布置成改变第一n型扩散层区域和 根据存储在电荷存储部中的电荷量,向栅电极施加电压的第二n型扩散层区域; 并且将第一n型扩散层区域设定为基准电压,将另一n型扩散层区域设定为大于基准电压的电压,将栅极电极设定为大于基准电压的电压。 因此,所获得的半导体存储器能够进行2位操作并且容易小型化。