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51. 发明申请

US20090029284A1 PATTERN COATING MATERIAL AND PATTERN FORMING METHOD 有权
标题翻译：图案涂料和图案形成方法
公开(公告)号：US20090029284A1
公开(公告)日：2009-01-29
申请号：US11993444
申请日：2006-06-16
申请人： Shogo Matsumaru , Toshiyuki Ogata , Kiyoshi Ishikawa , Hideo Hada , Shigenori Fujikawa , Toyoki Kunitake
发明人： Shogo Matsumaru , Toshiyuki Ogata , Kiyoshi Ishikawa , Hideo Hada , Shigenori Fujikawa , Toyoki Kunitake
IPC分类号： G03F7/075 , G03F7/20
CPC分类号： H01L21/0273 , G03F7/405
摘要： There are provided a coating material which improves an etching resistance of a pattern in an etching process using a pattern formed on a substrate as a mask.The material is a pattern coating material for an etching process using a pattern formed on a substrate as a mask, including a metal compound (W) which can produce a hydroxyl group on hydrolysis.
摘要翻译：提供一种涂覆材料，其使用在基板上形成的图案作为掩模，在蚀刻工艺中提高图案的耐蚀刻性。该材料是使用在基板上形成的图案作为掩模的蚀刻工艺的图案涂覆材料，其包括在水解时可产生羟基的金属化合物（W）。

52. 发明申请

US20080086724A1 Controller for machine tool 审中-公开
标题翻译：机床控制器
公开(公告)号：US20080086724A1
公开(公告)日：2008-04-10
申请号：US11902202
申请日：2007-09-19
申请人： Toshiyuki Ogata , Kaoru Hiraga
发明人： Toshiyuki Ogata , Kaoru Hiraga
IPC分类号： G06F9/44
CPC分类号： G05B19/4155 , G05B2219/35573 , G05B2219/36225
摘要： A processing program is constituted by a main program and sub-programs, and a plurality of processing programs are stored in a storage means. Only main programs are extracted from the storage means and displayed on a display device by a list. Extraction of only the main program is performed by determining whether a program to be detected has a specific code included in only the main program or whether the program to be detected has a specific code included in only a sub-program.
摘要翻译：处理程序由主程序和子程序构成，并且多个处理程序存储在存储装置中。仅从存储装置提取主程序并通过列表显示在显示装置上。仅通过确定要检测的程序是否具有仅包括在主程序中的特定代码，或者所检测的程序是否仅包括在子程序中的特定代码来执行仅主程序的提取。

53. 发明申请

US20080050564A1 Method of Forming a Nano-Structure and the Nano-Structure 失效
标题翻译：形成纳米结构和纳米结构的方法
公开(公告)号：US20080050564A1
公开(公告)日：2008-02-28
申请号：US11628793
申请日：2005-06-08
申请人： Shigenori Fujikawa , Toyoki Kunitake , Hideo Hada , Toshiyuki Ogata
发明人： Shigenori Fujikawa , Toyoki Kunitake , Hideo Hada , Toshiyuki Ogata
IPC分类号： B05D1/00
CPC分类号： G03F7/405 , H01L21/0272 , Y10T428/24802
摘要： A method of forming a nano-structure can form a fine pattern easily, and the nano-structure obtained by the method is provided. A method of forming a nano-structure comprising forming a thin film by a liquid phase adsorption on surface of a template formed on a substrate, and removing a portion of the thin film, and removing the template is used.
摘要翻译：形成纳米结构的方法可以容易地形成精细图案，并且提供通过该方法获得的纳米结构。使用形成纳米结构的方法，包括通过在形成在基板上的模板的表面上的液相吸附形成薄膜，以及去除薄膜的一部分，以及去除模板。

54. 发明申请

US20070172757A1 Polymer compound, photoresist composition including the polymer compound, and resist pattern formation method 有权
标题翻译：高分子化合物，包含高分子化合物的光致抗蚀剂组合物和抗蚀图案形成方法
公开(公告)号：US20070172757A1
公开(公告)日：2007-07-26
申请号：US10588866
申请日：2005-01-20
申请人： Toshiyuki Ogata , Syogo Matsumaru , Hideo Hada
发明人： Toshiyuki Ogata , Syogo Matsumaru , Hideo Hada
IPC分类号： G03C1/00
CPC分类号： G03F7/0046 , C08G61/08 , G03F7/0392 , G03F7/0395 , G03F7/0397
摘要： The present invention provide a polymer compound whereby the alkali solubility greatly changes before and after exposure in a chemically amplified positive resist, and a photoresist composition including the polymer compound and a resist pattern formation method which can form a fine pattern with high resolution. The photoresist composition and the resist pattern formation method use the polymer compound including at least one substituent group selected from an alcoholic hydroxyl group, a phenolic hydroxyl group, or a carboxyl group as an alkali soluble group (i), wherein the substituent group is protected by an acid dissociable, dissolution inhibiting group (ii) represented by a general formula (1): —CH2—O—R (1)(wherein R represents an organic group containing no more than 20 carbon atoms and at least one hydrophilic group).
摘要翻译：本发明提供了一种聚合物化合物，其中碱溶解度在化学放大的正性抗蚀剂中暴露之前和之后剧烈变化，以及包含高分子化合物的光致抗蚀剂组合物和能够以高分辨率形成精细图案的抗蚀剂图案形成方法。光致抗蚀剂组合物和抗蚀剂图案形成方法使用包含至少一个选自醇羟基，酚羟基或羧基的取代基的聚合物化合物作为碱溶性基团（i），其中取代基被保护通过由通式（1）表示的酸解离的溶解抑制基团（ⅱ）：<？in-line-formula description =“In-line Formulas”end =“lead”→> CH 2 （式中，R表示含有不超过20个碳原子的有机基团和至少一个亲水基团）。

55. 发明申请

US20070156278A1 Monitoring device for machining apparatus 审中-公开
标题翻译：加工设备监控装置
公开(公告)号：US20070156278A1
公开(公告)日：2007-07-05
申请号：US11646564
申请日：2006-12-28
申请人： Kaoru Hiraga , Toshiyuki Ogata
发明人： Kaoru Hiraga , Toshiyuki Ogata
IPC分类号： G06F19/00
CPC分类号： G05B19/406
摘要： A monitoring device capable of automatically plotting a machining path according to a machining program to be executed or being executed for a machining apparatus in which workpieces and machining programs are automatically changed and executed successively. When a machining program is selected from machining managing means, the selected machining program is stored to be renewed in machining program execution means. When machining program analysis means determines the renewal of the machining program in the machining program, the machining program analysis means analyzes the machining program stored in the machining program execution means, so that a machining path according to the machining program is plotted on a display device.
摘要翻译：一种监视装置，其能够根据要对所述加工装置执行或正在执行的加工程序自动绘制加工路径，所述加工装置在其中自动地改变和执行工件和加工程序。当从加工管理装置中选择加工程序时，所选择的加工程序被存储以在加工程序执行装置中更新。当加工程序分析装置确定加工程序中的加工程序的更新时，加工程序分析装置分析存储在加工程序执行装置中的加工程序，使得根据加工程序的加工路径被绘制在显示装置上。

56. 发明授权

US06683202B2 Fluorine-containing monomeric ester compound for base resin in photoresist composition 失效
标题翻译：用于光致抗蚀剂组合物中的基础树脂的含氟单体酯化合物
公开(公告)号：US06683202B2
公开(公告)日：2004-01-27
申请号：US10079506
申请日：2002-02-22
申请人： Toshiyuki Ogata , Kotaro Endo , Hiroshi Komano
发明人： Toshiyuki Ogata , Kotaro Endo , Hiroshi Komano
IPC分类号： C08F6900
CPC分类号： C07C69/653 , C07C2602/42 , C07C2603/74 , G03F7/0046 , G03F7/0397
摘要： The invention discloses a novel ester compound of an unsaturated carboxylic acid represented by the general formula in which R1 is preferably a hydrogen atom or methyl group, R2 is preferably a trifluoromethyl group, R3 is a non-aromatic polycyclic hydrocarbon group or, preferably, an adamantyl group and R4 is preferably a hydrogen atom or methyl group. This unsaturated ester compound is polymerizable to give a (co)polymeric resin which can be used as a base resinous ingredient in a photoresist composition for light exposure with ultraviolet light of a very short wavelength by virtue of the high transparency to the short-wavelength light. A synthetic method for the preparation of the novel ester compound is disclosed.
摘要翻译：本发明公开了一种由通式表示的不饱和羧酸的酯化合物，其中R 1优选为氢原子或甲基，R 2优选为三氟甲基，R 3为非芳族多环烃基或优选金刚烷基，R 4优选为氢原子或甲基。这种不饱和酯化合物是可聚合的，得到（共）聚合物树脂，其可以用作光致抗蚀剂组合物中的基础树脂成分，用于通过对短波长光的高透明度而具有非常短的波长的紫外光进行曝光。公开了一种制备新型酯化合物的合成方法。

57. 发明授权

US06638684B2 Photosensitive laminate, process for forming resist pattern using same and positive resist composition 失效
标题翻译：感光层压板，使用其形成抗蚀剂图案的方法和正性抗蚀剂组合物
公开(公告)号：US06638684B2
公开(公告)日：2003-10-28
申请号：US09799549
申请日：2001-03-07
申请人： Waki Okubo , Kazufumi Sato , Kazuyuki Nitta , Toshiyuki Ogata
发明人： Waki Okubo , Kazufumi Sato , Kazuyuki Nitta , Toshiyuki Ogata
IPC分类号： G03F7039
CPC分类号： G03F7/0045 , G03F7/0392 , G03F7/0395 , Y10S430/106 , Y10S430/111
摘要： A photosensitive laminate includes a substrate and a resist layer 500 to 5800 angstroms thick formed on the substrate. A composition for the resist layer includes (A) a compound which generates an acid upon irradiation with radioactive ray, (B) an alkali-soluble novolak resin, and (C) a compound having at least one acid-decomposable dissolution-inhibiting group, and the dissolution-inhibiting group is decomposable by action of an acid generated from the ingredient (A) to yield an organic carboxylic acid. This photosensitive laminate is sequentially subjected to selective exposure to KrF excimer laser light or to light having a short wavelength equal to or less than that of F2 laser, post-exposure baking, and developing with an alkali to yield a resist pattern.
摘要翻译：感光层压板包括基材和形成在基材上的500至5800埃的抗蚀剂层。抗蚀层的组合物包括（A）在放射线照射时产生酸的化合物，（B）碱溶性酚醛清漆树脂，（C）具有至少一个可酸分解溶解抑制基团的化合物，并且溶解抑制基团可以通过由成分（A）产生的酸的作用而分解，得到有机羧酸。依次对该感光性层叠体进行KrF准分子激光的选择性曝光或者等于或小于F2激光的短波长，曝光后烘烤和用碱显影以产生抗蚀剂图案的光。

58. 发明授权

US08920583B2 Steel pipe excellent in deformation characteristics and method of producing the same 有权
标题翻译：变形特性优良的钢管及其制造方法
公开(公告)号：US08920583B2
公开(公告)日：2014-12-30
申请号：US12452765
申请日：2008-07-22
申请人： Hitoshi Asahi , Tetsuo Ishitsuka , Motofumi Koyuba , Toshiyuki Ogata
发明人： Hitoshi Asahi , Tetsuo Ishitsuka , Motofumi Koyuba , Toshiyuki Ogata
IPC分类号： B32B1/08 , C22C38/58 , C22C38/42 , C22C38/54 , C22C38/04 , C21D9/08 , C21D8/10
CPC分类号： C22C38/04 , C21D8/105 , C21D9/08 , Y10T428/12292
摘要： The invention provides a steel pipe excellent in deformation characteristics, most notably a steel pipe for expandable-pipe oil well and a low-yield-ratio line pipe, and a method of producing the same without conducting water cooling requiring large-scale heat treatment equipment, namely a method of producing a steel pipe excellent in deformation characteristics whose microstructure is a two-phase structure including a martensite-austenite constituent at an area fraction of 2 to 10% and a soft phase, which method comprises: heating at Ac1+10° C. to Ac1+60° C. and thereafter cooling a precursor steel pipe which contains, in mass %, C: 0.04 to 0.10% and Mn: 1.00 to 2.50%, is limited to Si: 0.80% or less, P: 0.03% or less, S: 0.01% or less, Al: 0.10% or less and N: 0.01% or less, further contains one or more of Ni: 1.00% or less, Mo: 0.60% or less, Cr: 1.00% or less and Cu: 1.00% or less, where content of Mn and content of one or more of Cr, Ni, Mo and Cu satisfy Mn+Cr+Ni+2Mo+Cu≧2.00, and a balance of iron and unavoidable impurities.
摘要翻译：本发明提供一种变形特性优异的钢管，特别是可膨胀管油管用钢管和低屈服比管线管，以及不进行需要大型热处理设备的水冷却的制造方法即具有优异的变形特性的钢管的制造方法，其特征在于微结构为包含2〜10％面积分数的马氏体 - 奥氏体组分和软相的两相组织，该方法包括：在Ac1 + 10 ℃至Ac1 + 60℃，然后将质量％C：0.04〜0.10％，Mn：1.00〜2.50％的前体钢管冷却至Si：0.80％以下，P： 0.03％以下，S：0.01％以下，Al：0.10％以下，N：0.01％以下，还含有Ni：1.00％以下，Mo：0.60％以下，Cr：1.00％以下，Cu：1.00％以下，其中，Cr，Ni，Mo，Cu中的一种以上的Mn含量满足Mn + Cr + Ni + 2Mo +Cu≥2.00，和铁和不可避免的杂质的平衡。

59. 发明授权

US08741538B2 Polymer compound, photoresist composition containing such polymer compound, and method for forming resist pattern 有权
标题翻译：高分子化合物，含有该高分子化合物的光致抗蚀剂组合物，以及形成抗蚀剂图案
公开(公告)号：US08741538B2
公开(公告)日：2014-06-03
申请号：US12707462
申请日：2010-02-17
申请人： Toshiyuki Ogata , Syogo Matsumaru , Hideo Hada , Masaaki Yoshida
发明人： Toshiyuki Ogata , Syogo Matsumaru , Hideo Hada , Masaaki Yoshida
IPC分类号： G03F7/00 , G03F7/004
CPC分类号： C08F220/28 , C07C69/54 , C07C2601/14 , C08F222/1006 , C08F232/08 , G03F7/0046 , G03F7/0392 , G03F7/0397
摘要： A polymer compound that, within a chemically amplified positive resist system, exhibits a significant change in alkali solubility from a state prior to exposure to that following exposure, as well as a photoresist composition that includes such a polymer compound and a method for forming a resist pattern, which are capable of forming fine patterns with a high level of resolution. The polymer compound includes, as an alkali-soluble group (i), a substituent group in which a group selected from amongst alcoholic hydroxyl groups, carboxyl groups, and phenolic hydroxyl groups is protected with an acid dissociable, dissolution inhibiting group (ii) represented by a general formula (1) shown below: [Formula 1] —CH2—O-AO—CH2—]n (1) (wherein, A represents an organic group of 1 to 20 carbon atoms with a valency of at least n+1, and n represents an integer from 1 to 4).
摘要翻译：化学放大型正性抗蚀剂体系内的曝光后的状态下的碱溶解度显着变化的高分子化合物以及包含这种高分子化合物的光致抗蚀剂组合物和形成抗蚀剂的方法图案，能够以高分辨率形成精细图案。高分子化合物作为碱溶性基团（i）包括其中选自醇羟基，羧基和酚羟基的基团用酸解离的溶解抑制基团（ii）保护的取代基，通式（1）表示：[式1] -CH 2 -O-AO-CH 2 - ] n（1）（其中，A表示1〜20个碳原子的有机基团， 1，n表示1〜4的整数）。

60. 发明授权

US08304163B2 Compound, dissolution inhibitor, positive type resist composition, and method of forming resist pattern 失效
标题翻译：化合物，溶解抑制剂，正型抗蚀剂组合物和形成抗蚀剂图案的方法
公开(公告)号：US08304163B2
公开(公告)日：2012-11-06
申请号：US12980914
申请日：2010-12-29
申请人： Daiju Shiono , Taku Hirayama , Toshiyuki Ogata , Shogo Matsumaru , Hideo Hada
发明人： Daiju Shiono , Taku Hirayama , Toshiyuki Ogata , Shogo Matsumaru , Hideo Hada
IPC分类号： G03F7/004
CPC分类号： G03F7/0392 , C07J9/00 , G03F7/0045 , Y10S430/106
摘要： A positive type resist composition for forming a high resolution resist pattern and a method of forming a resist pattern are provided which use a low-molecular-weight material as a base component, and a compound and a dissolution inhibitor that are each suitable for the positive type resist composition. Here, the compound is a non-polymer having a molecular weight of 500 to 3000, and is decomposed under the action of an acid to produce two or more molecules of a decomposition product having a molecular weight of 200 or more; the dissolution inhibitor comprises the compound; the positive type resist composition comprises the compound and the acid generator component; and the method of forming a resist pattern uses the positive type resist composition.
摘要翻译：提供了用于形成高分辨抗蚀剂图案的正型抗蚀剂组合物和形成抗蚀剂图案的方法，其使用低分子量材料作为基础组分，并且化合物和溶解抑制剂各自适用于阳性型抗蚀剂组合物。这里，该化合物是分子量为500〜3000的非聚合物，在酸的作用下分解，生成分子量为200以上的分解产物的2个以上分子; 该溶解抑制剂包含该化合物; 正型抗蚀剂组合物包含化合物和酸产生剂组分; 并且形成抗蚀剂图案的方法使用正型抗蚀剂组合物。

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