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1. 发明申请

US20090029284A1 PATTERN COATING MATERIAL AND PATTERN FORMING METHOD 有权
标题翻译：图案涂料和图案形成方法
公开(公告)号：US20090029284A1
公开(公告)日：2009-01-29
申请号：US11993444
申请日：2006-06-16
申请人： Shogo Matsumaru , Toshiyuki Ogata , Kiyoshi Ishikawa , Hideo Hada , Shigenori Fujikawa , Toyoki Kunitake
发明人： Shogo Matsumaru , Toshiyuki Ogata , Kiyoshi Ishikawa , Hideo Hada , Shigenori Fujikawa , Toyoki Kunitake
IPC分类号： G03F7/075 , G03F7/20
CPC分类号： H01L21/0273 , G03F7/405
摘要： There are provided a coating material which improves an etching resistance of a pattern in an etching process using a pattern formed on a substrate as a mask.The material is a pattern coating material for an etching process using a pattern formed on a substrate as a mask, including a metal compound (W) which can produce a hydroxyl group on hydrolysis.
摘要翻译：提供一种涂覆材料，其使用在基板上形成的图案作为掩模，在蚀刻工艺中提高图案的耐蚀刻性。该材料是使用在基板上形成的图案作为掩模的蚀刻工艺的图案涂覆材料，其包括在水解时可产生羟基的金属化合物（W）。

2. 发明授权

US07932013B2 Pattern coating material and pattern forming method 有权
标题翻译：图案涂层材料和图案形成方法
公开(公告)号：US07932013B2
公开(公告)日：2011-04-26
申请号：US11993444
申请日：2006-06-16
申请人： Shogo Matsumaru , Toshiyuki Ogata , Kiyoshi Ishikawa , Hideo Hada , Shigenori Fujikawa , Toyoki Kunitake
发明人： Shogo Matsumaru , Toshiyuki Ogata , Kiyoshi Ishikawa , Hideo Hada , Shigenori Fujikawa , Toyoki Kunitake
IPC分类号： G03F7/004 , G03F7/30
CPC分类号： H01L21/0273 , G03F7/405
摘要： There are provided a coating material which improves an etching resistance of a pattern in an etching process using a pattern formed on a substrate as a mask.The material is a pattern coating material for an etching process using a pattern formed on a substrate as a mask, including a metal compound (W) which can produce a hydroxyl group on hydrolysis.
摘要翻译：提供一种涂覆材料，其使用在基板上形成的图案作为掩模，在蚀刻工艺中提高图案的耐蚀刻性。该材料是使用在基板上形成的图案作为掩模的蚀刻工艺的图案涂覆材料，其包括在水解时可产生羟基的金属化合物（W）。

3. 发明授权

US07993706B2 Method of forming a nano-structure and the nano-structure 失效
标题翻译：形成纳米结构和纳米结构的方法
公开(公告)号：US07993706B2
公开(公告)日：2011-08-09
申请号：US11628793
申请日：2005-06-08
申请人： Shigenori Fujikawa , Toyoki Kunitake , Hideo Hada , Toshiyuki Ogata
发明人： Shigenori Fujikawa , Toyoki Kunitake , Hideo Hada , Toshiyuki Ogata
IPC分类号： B82B3/00 , C01B33/12 , H01L21/027
CPC分类号： G03F7/405 , H01L21/0272 , Y10T428/24802
摘要： A method of forming a nano-structure can form a fine pattern easily, and the nano-structure obtained by the method is provided. A method of forming a nano-structure comprising forming a thin film by a liquid phase adsorption on surface of a template formed on a substrate, and removing a portion of the thin film, and removing the template is used.
摘要翻译：形成纳米结构的方法可以容易地形成精细图案，并且提供通过该方法获得的纳米结构。使用形成纳米结构的方法，包括通过在形成在基板上的模板的表面上的液相吸附形成薄膜，以及去除薄膜的一部分，以及去除模板。

4. 发明申请

US20090286936A1 COMPOSITION FOR FORMATION OF MOLD 审中-公开
标题翻译：组合物形成模具
公开(公告)号：US20090286936A1
公开(公告)日：2009-11-19
申请号：US11912388
申请日：2006-04-20
申请人： Toshiyuki Ogata , Hideo Hada , Shigenori Fujikawa , Toyoki Kunitake
发明人： Toshiyuki Ogata , Hideo Hada , Shigenori Fujikawa , Toyoki Kunitake
IPC分类号： C08F12/04
CPC分类号： B29C33/424 , B29C33/3842 , B82Y10/00 , B82Y40/00 , C08L25/18 , C08L2205/02 , G03F7/0002 , G03F7/0017 , H01L21/31 , C08L2666/04
摘要： Disclosed is a composition for formation of a mold, which is used in a method for producing a nanostructure by removing a portion of a thin film formed on the surface of a mold, and removing the mold, the composition including an organic compound, which has a hydrophilic group and has a molecular weight of 500 or more.
摘要翻译：公开了一种用于形成模具的组合物，其用于通过除去在模具表面上形成的薄膜的一部分来制造纳米结构，并且除去模具，该组合物包含有机化合物，该组合物具有亲水性基团，分子量为500以上。

5. 发明申请

US20080050564A1 Method of Forming a Nano-Structure and the Nano-Structure 失效
标题翻译：形成纳米结构和纳米结构的方法
公开(公告)号：US20080050564A1
公开(公告)日：2008-02-28
申请号：US11628793
申请日：2005-06-08
申请人： Shigenori Fujikawa , Toyoki Kunitake , Hideo Hada , Toshiyuki Ogata
发明人： Shigenori Fujikawa , Toyoki Kunitake , Hideo Hada , Toshiyuki Ogata
IPC分类号： B05D1/00
CPC分类号： G03F7/405 , H01L21/0272 , Y10T428/24802
摘要： A method of forming a nano-structure can form a fine pattern easily, and the nano-structure obtained by the method is provided. A method of forming a nano-structure comprising forming a thin film by a liquid phase adsorption on surface of a template formed on a substrate, and removing a portion of the thin film, and removing the template is used.
摘要翻译：形成纳米结构的方法可以容易地形成精细图案，并且提供通过该方法获得的纳米结构。使用形成纳米结构的方法，包括通过在形成在基板上的模板的表面上的液相吸附形成薄膜，以及去除薄膜的一部分，以及去除模板。

6. 发明申请

US20090134119A1 FILM-FORMING MATERIAL AND METHOD OF FORMING PATTERN 有权
标题翻译：成膜材料和形成图案的方法
公开(公告)号：US20090134119A1
公开(公告)日：2009-05-28
申请号：US11997300
申请日：2006-08-24
申请人： Shogo Matsumaru , Hideo Hada , Fujikawa Shigenori , Toyoki Kunitake
发明人： Shogo Matsumaru , Hideo Hada , Fujikawa Shigenori , Toyoki Kunitake
IPC分类号： C23F1/02
CPC分类号： H01L21/0273 , C09D183/04 , G03F7/0755 , G03F7/40 , H01L21/31138 , H01L21/31144
摘要： A film-forming material that is capable of forming, at a low temperature, a film having a high degree of etching resistance and a high etching selectivity ratio relative to an organic film, as well as a method of forming a pattern that uses the film-forming material. The film-forming material includes a metal compound (W) capable of generating a hydroxyl group upon hydrolysis, and a solvent (S) in which the metal compound is dissolved, wherein the solvent (S) includes a solvent (S1) with a boiling point of at least 155° C. that contains no functional groups that react with the metal compound (W). The method of forming a pattern includes the steps of: coating a pattern, which has been formed on top of an organic film of a laminate that includes a substrate and the organic film, using the above film-forming material, and then conducting etching of the organic film using the pattern as a mask.
摘要翻译：能够在低温下形成相对于有机膜具有高耐蚀刻性和高蚀刻选择比的膜的成膜材料以及形成使用该膜的图案的方法形成材料。成膜材料包括水解时能够产生羟基的金属化合物（W）和其中溶解有金属化合物的溶剂（S），其中溶剂（S）包括沸腾的溶剂（S1）至少155℃，不含与金属化合物（W）反应的官能团。形成图案的方法包括以下步骤：使用上述成膜材料涂覆已经形成在包括基材和有机膜的层压体的有机膜的顶部上的图案，然后进行蚀刻使用该图案作为掩模的有机膜。

7. 发明授权

US08101013B2 Film-forming material and method of forming pattern 有权
标题翻译：成膜材料及其形成方法
公开(公告)号：US08101013B2
公开(公告)日：2012-01-24
申请号：US11997300
申请日：2006-08-24
申请人： Shogo MatsuMaru , Hideo Hada , Shingenori Fujikawa , Toyoki Kunitake
发明人： Shogo MatsuMaru , Hideo Hada , Shingenori Fujikawa , Toyoki Kunitake
IPC分类号： C09D5/00 , C09K13/00
CPC分类号： H01L21/0273 , C09D183/04 , G03F7/0755 , G03F7/40 , H01L21/31138 , H01L21/31144
摘要： A film-forming material that is capable of forming, at a low temperature, a film having a high degree of etching resistance and a high etching selectivity ratio relative to an organic film, as well as a method of forming a pattern that uses the film-forming material. The film-forming material includes a metal compound (W) capable of generating a hydroxyl group upon hydrolysis, and a solvent (S) in which the metal compound is dissolved, wherein the solvent (S) includes a solvent (S1) with a boiling point of at least 155° C. that contains no functional groups that react with the metal compound (W). The method of forming a pattern includes the steps of: coating a pattern, which has been formed on top of an organic film of a laminate that includes a substrate and the organic film, using the above film-forming material, and then conducting etching of the organic film using the pattern as a mask.
摘要翻译：能够在低温下形成相对于有机膜具有高耐蚀刻性和高蚀刻选择比的膜的成膜材料以及形成使用该膜的图案的方法形成材料。成膜材料包括水解时能够产生羟基的金属化合物（W）和其中溶解有金属化合物的溶剂（S），其中溶剂（S）包括沸腾的溶剂（S1）至少155℃，不含与金属化合物（W）反应的官能团。形成图案的方法包括以下步骤：使用上述成膜材料涂覆已经形成在包括基材和有机膜的层压体的有机膜的顶部上的图案，然后进行蚀刻使用该图案作为掩模的有机膜。

8. 发明申请

US20090061170A1 ANISOTROPIC FILM AND METHOD OF MANUFACTURING ANISOTROPIC FILM 审中-公开
标题翻译： ANISOTROPIC膜和制造ANISOTROPIC膜的方法
公开(公告)号：US20090061170A1
公开(公告)日：2009-03-05
申请号：US12199569
申请日：2008-08-27
申请人： Shigenori Fujikawa , Wakana Kubo , Toyoki Kunitake , Hideo Hada , Sanae Furuya
发明人： Shigenori Fujikawa , Wakana Kubo , Toyoki Kunitake , Hideo Hada , Sanae Furuya
IPC分类号： B32B3/10 , B05D5/00 , B05D3/00 , B05D3/10 , H05H1/24
CPC分类号： H05K3/4038 , H01L23/4985 , H01L2924/0002 , H01R43/007 , H05K2201/10378 , H05K2203/0338 , Y10T428/24802 , H01L2924/00
摘要： An anisotropic film is disclosed in which a line-shaped nanostructure is disposed inside a resin film. Also disclosed is a method of producing an anisotropic film that includes: forming a metal nanostructure on a substrate, forming a resin film that embeds the metal nanostructure, and detaching the resin film from the substrate, wherein the step of forming the metal nanostructure on the substrate includes: at least, forming a coating film on the surface of a template provided on the substrate, the coating film including a metal layer formed by electroless plating; and removing a portion or all of the template while retaining a portion or all of the coating film, or removing a portion of the coating film. Also disclosed is an anisotropic film produced using the method of producing an anisotropic film.
摘要翻译：公开了在树脂膜内设置线状纳米结构的各向异性膜。还公开了一种制造各向异性膜的方法，其包括：在基板上形成金属纳米结构体，形成嵌入金属纳米结构体的树脂膜，以及从基板剥离树脂膜，其中，将形成金属纳米结构的工序基板包括：至少在设置在基板上的模板的表面上形成涂膜，所述涂膜包括通过无电镀形成的金属层; 并且在保留一部分或全部涂膜的同时除去部分或全部模板，或者去除涂膜的一部分。还公开了使用各向异性膜的制造方法制造的各向异性膜。

9. 发明申请

US20090087625A1 METHOD FOR MANUFACTURING STRUCTURE, AND STRUCTURE 失效
标题翻译：制造结构和结构的方法
公开(公告)号：US20090087625A1
公开(公告)日：2009-04-02
申请号：US12202972
申请日：2008-09-02
申请人： Shigenori Fujikawa , Toyoki Kunitake , Hiromi Takemoto , Mari Koizumi , Hideo Hada , Sanae Furuya
发明人： Shigenori Fujikawa , Toyoki Kunitake , Hiromi Takemoto , Mari Koizumi , Hideo Hada , Sanae Furuya
IPC分类号： B32B3/10 , B05D1/36
CPC分类号： B81C1/00111 , Y10S977/70 , Y10S977/84 , Y10S977/89 , Y10S977/892 , Y10T428/24802
摘要： A method of producing a structure, including: a composite film formation step that forms a composite film composed of a coating film and an organic film or inorganic film on top of a substrate by conducting Steps (1) to (3) below: (1) forming the coating film composed of a metal layer or a metal oxide layer on the surface of a template provided on top of the substrate, (2) forming the organic film or inorganic film on the surface of the coating film, and (3) removing a portion of the organic film or inorganic film and the coating film; a second coating film formation step that forms a second coating film composed of a metal layer or a metal oxide layer on the surface of the composite film; a coating step that, following formation of the second coating film, forms an organic coating film on the substrate that covers the surface of the substrate; a removal step that removes a portion of the second coating film, the side surfaces of which are at least partially supported by the organic coating film; and a structure formation step that forms a structure composed of a metal layer or metal oxide layer on the substrate by removing all residues left on the substrate except for the coating film and the second coating film.
摘要翻译：一种制造结构的方法，包括：通过进行下述步骤（1）至（3），在基板的顶部上形成由涂膜和有机膜或无机膜构成的复合膜的复合膜形成步骤：（1 ），在设置在基板顶部的模板表面上形成由金属层或金属氧化物层构成的涂膜，（2）在涂膜的表面形成有机膜或无机膜，（3）去除一部分有机膜或无机膜和涂膜; 第二涂膜形成步骤，在复合膜的表面上形成由金属层或金属氧化物层构成的第二涂膜; 涂覆步骤，在形成第二涂膜之后，在覆盖基材表面的基材上形成有机涂膜; 去除步骤，其去除第二涂膜的一部分，其侧表面至少部分地由有机涂膜支撑; 以及结构形成步骤，通过去除除了涂膜和第二涂膜之外的残留在基板上的残留物，在基板上形成由金属层或金属氧化物层构成的结构。

10. 发明授权

US08025923B2 Method for manufacturing a structure 失效
标题翻译：制造结构的方法
公开(公告)号：US08025923B2
公开(公告)日：2011-09-27
申请号：US12202972
申请日：2008-09-02
申请人： Shigenori Fujikawa , Toyoki Kunitake , Hiromi Takaemoto , Mari Koizumi , Hideo Hada , Sanae Furuya
发明人： Shigenori Fujikawa , Toyoki Kunitake , Hiromi Takaemoto , Mari Koizumi , Hideo Hada , Sanae Furuya
IPC分类号： B05D1/32
CPC分类号： B81C1/00111 , Y10S977/70 , Y10S977/84 , Y10S977/89 , Y10S977/892 , Y10T428/24802
摘要： A method of manufacturing a structure, including forming a composite film composed of a coating film and an organic or inorganic film on top of a substrate by forming the coating film on the surface of a template provided on top of the substrate; forming the organic or inorganic film on the surface of the coating film, and removing a portion of the organic or inorganic film and a portion of the coating film; forming a second coating film on the surface of the composite film; forming an organic coating film on the substrate that covers the second coating film; removing a portion of the second coating film; and forming a structure composed of a metal or metal oxide later on the substrate by removing all residues left on the substrate except for the coating film and the second coating film.
摘要翻译：一种结构的制造方法，其特征在于，在基板顶部的模板表面上形成涂膜，在基板顶部形成由涂膜和有机或无机膜构成的复合膜; 在涂膜表面上形成有机或无机膜，除去一部分有机或无机膜和一部分涂膜; 在复合膜的表面上形成第二涂膜; 在覆盖第二涂膜的基板上形成有机涂膜; 去除所述第二涂膜的一部分; 并且通过除去除了涂膜和第二涂膜之外残留在基板上的所有残留物，在基板上形成由金属或金属氧化物组成的结构。

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