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51. 发明申请

US20130175447A1 Scanning Electron Microscope 有权
标题翻译：扫描电子显微镜
公开(公告)号：US20130175447A1
公开(公告)日：2013-07-11
申请号：US13812451
申请日：2011-08-26
申请人： Yasunari Sohda , Hiromasa Yamanashi , Muneyuki Fukuda , Takeyoshi Ohashi , Osamu Komuro
发明人： Yasunari Sohda , Hiromasa Yamanashi , Muneyuki Fukuda , Takeyoshi Ohashi , Osamu Komuro
IPC分类号： H01J37/28
CPC分类号： H01J37/28 , H01J37/153 , H01J2237/1506 , H01J2237/1532 , H01J2237/2826
摘要： Provided is a scanning electron microscope equipped with a high-speed and high-precision astigmatism measuring means to be used when both astigmatism generated by an electron-beam column and astigmatism generated from the surroundings of a measuring sample exist. This scanning electron microscope is characterized in controlling an astigmatism corrector (201) with high-speed and high-precision, to correct the astigmatism, by using both a method of obtaining the astigmatism from the qualities of two-dimensional images to be acquired upon changing the intensity of the astigmatism corrector (201), and a method of measuring the astigmatism from the change in the position displacement of an electron beam that occurs when the electron beam is tilted using a tilt deflector (202).
摘要翻译：本发明提供一种扫描电子显微镜，其配备有当由电子束柱产生的散光和从测量样品的周围产生的散光存在时使用的高速和高精度散光测量装置。该扫描电子显微镜的特征在于以高速和高精度控制像散校正器（201），以通过使用从改变后获得的二维图像的质量获得散光的方法来校正像散散光校正器（201）的强度，以及根据使用倾斜偏转器（202）使电子束倾斜时发生的电子束的位置偏移的变化来测量像散的方法。

52. 发明申请

US20120327213A1 Charged Particle Beam Microscope 有权
标题翻译：带电粒子束显微镜
公开(公告)号：US20120327213A1
公开(公告)日：2012-12-27
申请号：US13580875
申请日：2011-02-22
申请人： Nobuhiro Okai , Yasunari Sohda , Junichi Tanaka
发明人： Nobuhiro Okai , Yasunari Sohda , Junichi Tanaka
IPC分类号： H04N7/18
CPC分类号： G01B15/00 , G01B15/04 , H01J37/28 , H01J2237/2067 , H01J2237/221 , H01J2237/24578 , H01J2237/2817
摘要： Disclosed is a charged particle beam microscope which can obtain information about pattern materials and stereostructure without lowering throughput of pattern dimension measurement. To achieve this, the charged particle beam microscope acquires a plurality of frame images by scanning the field of view of the sample (S304, 305), adds the images together (S307), computes the dimensions of the pattern formed on the sample (308) and at the same time acquires pattern information (314) using components of a frame image, such as a single frame image or subframe image, as a separated image (309, 310).
摘要翻译：公开了一种带电粒子束显微镜，其可以获得关于图案材料和立体结构的信息，而不降低图案尺寸测量的生产率。为了实现这一点，带电粒子束显微镜通过扫描样本的视场来获取多个帧图像（S304,305），将图像相加在一起（S307），计算在样本（308）上形成的图案的尺寸），并且同时使用诸如单帧图像或子帧图像的帧图像的分量作为分离图像（309,310）获取图案信息（314）。

53. 发明授权

US07378668B2 Method and apparatus for applying charged particle beam 有权
标题翻译：用于施加带电粒子束的方法和装置
公开(公告)号：US07378668B2
公开(公告)日：2008-05-27
申请号：US11475014
申请日：2006-06-27
申请人： Sayaka Tanimoto , Yasunari Sohda , Yasuhiro Someda , Masaki Hosoda
发明人： Sayaka Tanimoto , Yasunari Sohda , Yasuhiro Someda , Masaki Hosoda
IPC分类号： H01J3/14 , G21K1/08
CPC分类号： H01J37/304 , B82Y10/00 , B82Y40/00 , H01J37/1471 , H01J37/3174 , H01J2237/0458 , H01J2237/1501 , H01J2237/31774 , H01J2237/31776
摘要： In a charged particle beam applying apparatus such as an electron beams lithography system, there is a technology that facilitates positional adjustment of a crossover and improves throughput of the apparatus. A front focal plane of a condenser lens is provided with a sharp end face (crossover regulation edge) for regulating the height of the crossover on a beam axis. By using the crossover regulation edge to measure the shape of an electron beam, the shape of the beam on the front focal plane of the condenser lens can be always checked even if the height of the crossover formed by an electron gun or the resistance of a source forming lens is changed.
摘要翻译：在诸如电子束光刻系统的带电粒子束施加装置中，存在促进交叉的位置调整并提高装置的生产量的技术。聚光透镜的前焦平面设置有用于调节光束轴上的交叉点的高度的尖端（交叉调节边缘）。通过使用交叉调节边缘来测量电子束的形状，即使电子枪形成的交叉点的高度或电子枪的电阻，也可以始终检查聚光透镜的前焦平面上的光束的形状源形成透镜改变。

54. 发明授权

US09261360B2 Charged particle beam microscope 有权
标题翻译：带电粒子束显微镜
公开(公告)号：US09261360B2
公开(公告)日：2016-02-16
申请号：US13580875
申请日：2011-02-22
申请人： Nobuhiro Okai , Yasunari Sohda , Junichi Tanaka
发明人： Nobuhiro Okai , Yasunari Sohda , Junichi Tanaka
IPC分类号： G01B15/00 , H01J37/285 , G01B15/04 , H01J37/28
CPC分类号： G01B15/00 , G01B15/04 , H01J37/28 , H01J2237/2067 , H01J2237/221 , H01J2237/24578 , H01J2237/2817
摘要： Disclosed is a charged particle beam microscope which can obtain information about pattern materials and stereostructure without lowering throughput of pattern dimension measurement. To achieve this, the charged particle beam microscope acquires a plurality of frame images by scanning the field of view of the sample (S304, 305), adds the images together (S307), computes the dimensions of the pattern formed on the sample (308) and at the same time acquires pattern information (314) using components of a frame image, such as a single frame image or subframe image, as a separated image (309, 310).
摘要翻译：公开了一种带电粒子束显微镜，其可以获得关于图案材料和立体结构的信息，而不降低图案尺寸测量的生产率。为了实现这一点，带电粒子束显微镜通过扫描样本的视场来获取多个帧图像（S304,305），将图像相加在一起（S307），计算在样本（308）上形成的图案的尺寸），并且同时使用诸如单帧图像或子帧图像的帧图像的分量作为分离图像（309,310）获取图案信息（314）。

55. 发明授权

US09230775B2 Charged particle instrument 有权
标题翻译：带电粒子仪器
公开(公告)号：US09230775B2
公开(公告)日：2016-01-05
申请号：US13451596
申请日：2012-04-20
申请人： Takeyoshi Ohashi , Yasunari Sohda , Makoto Ezumi , Muneyuki Fukuda , Noritsugu Takahashi
发明人： Takeyoshi Ohashi , Yasunari Sohda , Makoto Ezumi , Muneyuki Fukuda , Noritsugu Takahashi
IPC分类号： H01J37/00 , H01J37/28 , H01J37/26
CPC分类号： H01J37/28 , H01J37/265 , H01J2237/1532 , H01J2237/1536 , H01J2237/2811
摘要： A charged particle instrument including a controlling and operating unit for controlling a charged particle source, deflecting means, and focus changing means and making a data for an image by an electric signal detected by a detector, and a recording unit for preserving a correction coefficient registered at each image-acquisition, in which the controlling and operating unit acquires plural images while changing a focus, and controls an optical condition such that a landing angle of a charged particle beam becomes perpendicular when an image for measurement is acquired on the basis of a position shift amount of a mark in the image and a correction coefficient registered to the recording unit.
摘要翻译：一种带电粒子仪器，包括用于控制带电粒子源的控制和操作单元，偏转装置和聚焦改变装置，以及通过由检测器检测的电信号为图像提供数据;以及记录单元，用于保持记录的校正系数在每次图像获取期间，控制和操作单元在改变焦点的同时获取多个图像，并且控制光学条件，使得当基于以下步骤获得用于测量的图像时，带电粒子束的着陆角变为垂直图像中的标记的位置偏移量和登记到记录单元的校正系数。

56. 发明申请

US20130026361A1 PATTERN EVALUATION METHOD, DEVICE THEREFOR, AND ELECTRON BEAM DEVICE 有权
标题翻译：图案评估方法，其设备和电子束装置
公开(公告)号：US20130026361A1
公开(公告)日：2013-01-31
申请号：US13386540
申请日：2010-07-26
申请人： Yasunari Sohda , Takeyoshi Ohashi , Muneyuki Fukuda , Toru Yamanashi
发明人： Hiromasa Yamanashi , Yasunari Sohda , Takeyoshi Ohashi , Muneyuki Fukuda
IPC分类号： H01J37/26 , H01J37/20
CPC分类号： H01J37/28 , G06T7/74 , G06T2207/10061 , G06T2207/30148 , G06T2207/30204 , H01J37/1478 , H01J2237/24578 , H01J2237/2611 , H01J2237/2817
摘要： An amount of pattern position displacement between observation images acquired by irradiating from two different directions is changed depending on beam deflection for moving an image acquisition position. In a pattern evaluation method that measures astigmatic difference or focus position displacement having a small amount of dose at a high speed using parallax caused by the tilted beam, a correction value obtained in advance by measurement is reflected in an amount of pattern position displacement between observation images obtained by irradiating from at least two different directions and generated in accordance with the amount of beam deflection for moving an image acquisition position. A processing unit calculates an amount of correction of an amount of pattern position displacement depending on beam deflection of a beam deflecting unit for moving an image acquisition position on the sample at a high speed.
摘要翻译：通过从两个不同方向照射获取的观察图像之间的图案位置位移量根据用于移动图像获取位置的光束偏转而改变。在使用由倾斜光束引起的视差来高速度地测量具有少量剂量的散光差异或聚焦位置位移的图案评估方法中，通过测量预先获得的校正值反映在观察之间的图案位置位移量通过从至少两个不同方向照射而产生的并且根据用于移动图像获取位置的光束偏转量而产生的图像。处理单元计算取决于用于在高速下移动样本上的图像获取位置的光束偏转单元的光束偏转的图案位置位移量的校正量。

57. 发明申请

US20120217393A1 Electron Microscope 有权
标题翻译：电子显微镜
公开(公告)号：US20120217393A1
公开(公告)日：2012-08-30
申请号：US13505951
申请日：2010-11-01
申请人： Nobuhiro Okai , Yasunari Sohda
发明人： Nobuhiro Okai , Yasunari Sohda
IPC分类号： H01J37/26
CPC分类号： H01J37/04 , H01J37/026 , H01J37/14 , H01J37/145 , H01J37/153 , H01J37/28 , H01J2237/004 , H01J2237/0044 , H01J2237/121 , H01J2237/153
摘要： A scanning electron microscope suppresses a beam drift by reducing charging on a sample surface while suppressing resolution degradation upon observation of an insulator sample. An electron microscope includes an electron source and an objective lens that focuses an electron beam emitted from the electron source, which provides an image using a secondary signal generated from the sample irradiated with the electron beam. A magnetic body with a continuous structure and an inside diameter larger than an inside diameter of an upper pole piece that forms the objective lens is provided between the objective lens and the sample.
摘要翻译：扫描电子显微镜通过减少对样品表面的充电而抑制光束偏移，同时在观察绝缘体样品时抑制分辨率劣化。电子显微镜包括电子源和物镜，其聚焦从电子源发射的电子束，其使用从照射电子束的样品产生的二次信号来提供图像。在物镜和样品之间设置具有连续结构且内径大于形成物镜的上极片的内径的磁体。

58. 发明申请

US20110249110A1 SCANNING ELECTRON MICROSCOPE 有权
标题翻译：扫描电子显微镜
公开(公告)号：US20110249110A1
公开(公告)日：2011-10-13
申请号：US13139315
申请日：2009-11-24
申请人： Nobuhiro Okai , Yasunari Sohda
发明人： Nobuhiro Okai , Yasunari Sohda
IPC分类号： H04N7/18
CPC分类号： G01B15/00 , H01J37/222 , H01J37/28
摘要： Provided is a scanning electron microscope including: an image recording unit (112) which stores a plurality of acquired frame images; a correction analyzing handling unit (113) which calculates a drift amount between frame images and a drift amount between a plurality of field images constituting a frame image; and a data handling unit (111) which corrects positions of respective field images constituting the plurality of fields images according to the drift amount between the field images and superimposes the field images on one another so as to create a new frame image. This provides a scanning electron microscope which can obtain a clear frame image even if an image drift is caused during observation of a pattern on a semiconductor substrate or an insulating object.
摘要翻译：提供一种扫描电子显微镜，包括：图像记录单元，其存储多个获取的帧图像; 校正分析处理单元，其计算帧图像之间的漂移量和构成帧图像的多个场图像之间的漂移量; 以及数据处理单元（111），其根据场图像之间的漂移量校正构成多个场图像的各个场图像的位置，并将场图像彼此叠加，从而创建新的帧图像。这提供了即使在观察半导体衬底或绝缘物体上的图案时引起图像漂移，也可以获得清晰的帧图像的扫描电子显微镜。

59. 发明授权

US07745237B2 Pattern forming method and pattern forming system 有权
标题翻译：图案形成方法和图案形成系统
公开(公告)号：US07745237B2
公开(公告)日：2010-06-29
申请号：US11626402
申请日：2007-01-24
申请人： Souichi Katagiri , Yasunari Sohda , Masahiko Ogino
发明人： Souichi Katagiri , Yasunari Sohda , Masahiko Ogino
IPC分类号： H01L21/66 , H01L21/461 , G01R31/26
CPC分类号： G03F9/7049 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/703 , G03F9/7084 , G03F9/7088
摘要： Method of forming a pattern by a nanoimprint technique starts with preparing a mold with nanostructures on its surface. The mold is pressed against a substrate or plate coated with a resin film. The positions of alignment marks formed on the rear surface of the plate coated with the resin film are detected. Thus, a relative alignment between the mold and the plate coated with the resin film is performed.
摘要翻译：通过纳米压印技术形成图案的方法开始于在其表面上制备具有纳米结构的模具。将模具压在涂有树脂膜的基板或板上。检测在涂覆有树脂膜的板的后表面上形成的对准标记的位置。因此，执行模具和涂覆有树脂膜的板之间的相对对准。

60. 发明授权

US07655907B2 Charged particle beam apparatus and pattern measuring method 有权
标题翻译：带电粒子束装置和图案测量方法
公开(公告)号：US07655907B2
公开(公告)日：2010-02-02
申请号：US11704227
申请日：2007-02-09
申请人： Sayaka Tanimoto , Hiromasa Yamanashi , Muneyuki Fukuda , Yasunari Sohda
发明人： Sayaka Tanimoto , Hiromasa Yamanashi , Muneyuki Fukuda , Yasunari Sohda
IPC分类号： H01J37/26
CPC分类号： H01J37/265 , H01J37/28 , H01J2237/04735 , H01J2237/216 , H01J2237/2817
摘要： It is to provide a technology that can quickly process many measurement points on a substrate by a primary charged particle beam. In a control system, with respect to each measurement point (irradiation position of the primary charged particle beam) on a wafer, a calculator obtains a probability of a surface potential at a relevant measurement point that is obtained from a surface potential distribution function of the wafer and is stored in a data storage unit. Based on the probability, the calculator determines an amplitude of a set parameter (for example, retarding voltage) of charged particle optics at the relevant measurement point. Then the calculator checks the focus state of the primary charged particle beam by changing the set parameter in the range of the determined amplitude, and determines the set parameter to be used for measurement.
摘要翻译：它是提供一种能够通过初级带电粒子束快速处理衬底上许多测量点的技术。在控制系统中，对于晶片上的每个测量点（初级带电粒子束的照射位置），计算器获得从相对测量点的表面电位分布函数获得的相关测量点的表面电位的概率，并存储在数据存储单元中。基于概率，计算器确定相关测量点处的带电粒子光学器件的设定参数（例如延迟电压）的幅度。然后，计算器通过在确定的幅度的范围内改变设定参数来检查主要带电粒子束的聚焦状态，并确定要用于测量的设定参数。

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