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    • 54. 发明授权
    • Precision polishing apparatus for polishing a semiconductor substrate
    • 用于研磨半导体基板的精密抛光装置
    • US06358360B2
    • 2002-03-19
    • US09451444
    • 1999-11-30
    • Kazuo Takahashi
    • Kazuo Takahashi
    • C23F102
    • H01L21/3212H01L21/76807
    • A precision polishing method and a precision polishing apparatus are adapted to be used with a chemical etching technique of utilizing a chemical effect for polishing a metal film without producing any process-altered layer nor any scratches on the metal surface and without the risk of partly burying the polishing agent near the metal surface in order to flatten and smooth or remove the metal film. With a precision polishing method and a precision polishing apparatus according to the invention, the surface to be polished of a substrate 1 carrying thereon a metal film for forming a semiconductor device is pressed against a hard polishing pad 4, while an etching solution 7 is supplyed to the surface to be polished and that of the polishing pad 4 that are held in contact with each other and the surface to be polished and the polishing pad 4 are driven to move relative to each other. Then, the etching solution on the surface to be polished gives rise to a local temperature rise in projecting areas of the metal film found in the surface to be polished due to the generated frictional heat and the etching rate of the etching solution is raised in those areas to selectively etch the projecting areas of the metal film and flatten the surface. Thereafter, the metal film is uniformly etched and removed.
    • 精密抛光方法和精密抛光装置适用于化学蚀刻技术,其利用化学效应来抛光金属膜,而不产生任何过程改变的层,也不会在金属表面上产生任何划痕,并且没有部分掩埋的风险 抛光剂靠近金属表面,以平整和平滑或去除金属膜。 利用本发明的精密抛光方法和精密抛光装置,将载有用于形成半导体器件的金属膜的基板1的待抛光表面压在硬抛光垫4上,同时提供蚀刻溶液7 要抛光的表面和被保持接触的抛光垫4和抛光表面和抛光垫4被驱动相对于彼此移动。 然后,待研磨表面上的蚀刻溶液由于产生的摩擦热而导致在待抛光表面中发现的金属膜的投影面积中的局部温度升高,并且蚀刻溶液的蚀刻速率在那些 选择性地蚀刻金属膜的投影区域并使表面变平的区域。 此后,金属膜被均匀地蚀刻和去除。
    • 57. 发明授权
    • Apparatus for reproducing record information of multiple-layered optical
disc
    • 用于再现多层光盘记录信息的装置
    • US5903530A
    • 1999-05-11
    • US964219
    • 1997-11-04
    • Kiyoshi TateishiKazuo Takahashi
    • Kiyoshi TateishiKazuo Takahashi
    • G11B7/00G11B7/085G11B7/09
    • G11B7/08511G11B7/0945G11B2007/0013
    • An apparatus for reproducing record information of a multiple-layered optical disc is provided with: an optical pickup having a light source for emitting a reading light, an objective lens for condensing the emitted reading light onto one of the information record layers, a focus actuator for moving the objective lens in a focus direction, and a light-detection device for detecting the reflected reading light and outputting a light detection signal; a focus error generation device for generating a focus error signal; an acceleration/deceleration signal generator for generating and outputting to the focus actuator an acceleration signal to accelerate the objective lens in the focus direction and a deceleration signal to decelerate the objective lens in the focus direction; an inter-layer distance measurement device for measuring an interlayer distance between the information record layers of the multiple-layered optical disc; and a controller for measuring a time duration since the acceleration signal is generated until the focus error signal reaches a predetermined threshold level, and for controlling the acceleration/deceleration signal generator to set a magnitude of the deceleration signal on the basis of the measured inter-layer distance and the measured time duration.
    • 一种用于再现多层光盘的记录信息的设备设置有:具有用于发射读取光的光源的光学拾取器,用于将发射的读取光聚焦到信息记录层之一的物镜,聚焦致动器 用于在聚焦方向上移动物镜;以及光检测装置,用于检测反射的读取光并输出光检测信号; 聚焦误差产生装置,用于产生聚焦误差信号; 加速/减速信号发生器,用于产生并向焦点致动器输出在聚焦方向上加速物镜的加速度信号和减小信号以使物镜在聚焦方向上减速; 层间距离测量装置,用于测量多层光盘的信息记录层之间的层间距离; 以及控制器,用于测量从加速度信号产生直到聚焦误差信号达到预定阈值水平为止的持续时间,并且用于控制加速/减速信号发生器基于所测量的相互间隔来设置减速信号的大小, 层距离和测量的持续时间。