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    • 53. 发明申请
    • Method for forming device isolation film of semiconductor device
    • 半导体器件隔离膜形成方法
    • US20060003541A1
    • 2006-01-05
    • US10998806
    • 2004-11-30
    • Hyung ChoiBo Wi
    • Hyung ChoiBo Wi
    • H01L21/76
    • H01L21/76229H01L27/1052
    • A method for forming device isolation film of semiconductor device is provided, the method including sequentially forming a pad oxide layer and a pad nitride layer on a semiconductor substrate having a cell region and a peripheral circuit region, etching a predetermined region of the pad nitride layer, the pad oxide layer, and the semiconductor substrate to form a trench, forming an sidewall oxide film on a surface of the trench, etching a predetermined thickness of the sidewall oxide film in the cell region, forming a liner nitride film and a liner oxide film on the semiconductor substrate including the trench and the pad nitride layer, depositing a HDP oxide film to fill up the trench, performing a planarization process to expose the pad nitride layer, and removing the pad nitride layer.
    • 提供了一种用于形成半导体器件的器件隔离膜的方法,该方法包括在具有单元区域和外围电路区域的半导体衬底上依次形成衬垫氧化物层和衬垫氮化物层,蚀刻衬垫氮化物层的预定区域 ,衬垫氧化物层和半导体衬底以形成沟槽,在沟槽的表面上形成侧壁氧化膜,蚀刻电池区域中的侧壁氧化物膜的预定厚度,形成衬里氮化物膜和衬里氧化物 在包括沟槽和衬垫氮化物层的半导体衬底上形成膜,沉积HDP氧化物膜以填充沟槽,执行平坦化工艺以露出衬垫氮化物层,以及去除焊盘氮化物层。
    • 55. 发明授权
    • Micromirror actuator and manufacturing method thereof
    • 微镜致动器及其制造方法
    • US06931171B2
    • 2005-08-16
    • US10310134
    • 2002-12-05
    • Yong-seop YoonHyung Choi
    • Yong-seop YoonHyung Choi
    • B81B3/00B81C1/00G02B6/35G02B26/08G02B6/26
    • G02B6/357G02B6/3512G02B6/3546G02B6/3584G02B6/3586G02B26/0841
    • An actuator which can be actively driven so as to precisely control a driving angle of a micromirror, and a manufacturing method thereof are provided. The micromirror actuator includes a substrate, a trench, a micromirror, and a driving angle control unit. The trench is formed in a predetermined position of the substrate and has at least one electrode. The micromirror rotates by an electrostatic force generated through an interaction with the at least one electrode so as to reflect incident light in a predetermined direction. The driving angle control unit supports the micromirror so as to control the position of an actuation shaft of the micromirror. Accordingly, the micromirror can stand erect at an accurate right angle without an additional actuator for correcting the error in the driving angle of the micromirror so as to reduce insertion loss.
    • 提供一种能够被主动驱动以致精确地控制微反射镜的驱动角的致动器及其制造方法。 微反射镜致动器包括基板,沟槽,微镜和驱动角度控制单元。 沟槽形成在基板的预定位置,并具有至少一个电极。 微镜通过与至少一个电极的相互作用产生的静电力旋转,以便沿预定方向反射入射光。 驱动角度控制单元支撑微镜,以便控制微镜的致动轴的位置。 因此,微镜可以以精确的直角直立,而不需要额外的致动器来校正微镜的驱动角度的误差,从而减小插入损耗。
    • 57. 发明授权
    • Optical switch using micro-electromechanical system
    • 光开关采用微机电系统
    • US06819809B2
    • 2004-11-16
    • US10619503
    • 2003-07-16
    • Yong-seop YoonHyung Choi
    • Yong-seop YoonHyung Choi
    • G02F1295
    • G02B6/3584G02B6/3512G02B6/3546G02B6/357
    • Provided is a 2×2 optical switch includes a substrate, a first input fiber and a first output fiber, a second input fiber and a second output fiber, a rotating mirror, torsion bars, and an electrostatic force generating part. The first input fiber and a first output fiber are arranged at a predetermined distance from a central point in a first optical path passing through the central point over the substrate. The second input fiber and a second output fiber are arranged at a predetermined distance from the central point in a second optical path that passes through the central point and is orthogonal to the first optical path. The rotating mirror is positioned at around the central point and turns on a turning shaft. The torsion bars support the rotating mirror and the electrostatic force generating part supplies a drive force to the rotating mirror.
    • 提供了一种2x2光开关,其包括基板,第一输入光纤和第一输出光纤,第二输入光纤和第二输出光纤,旋转镜,扭杆和静电力产生部。 第一输入光纤和第一输出光纤被布置在距离通过基板上方的中心点的第一光路中的中心点预定的距离处。 第二输入光纤和第二输出光纤布置在通过中心点并且与第一光路正交的第二光路中的中心点预定距离处。 旋转镜位于中心点周围,并转动转轴。 扭杆支撑旋转镜,静电力产生部分向旋转镜提供驱动力。