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51. 发明授权

US08181302B2 Brush alignment control mechanism 有权
标题翻译：刷子对准控制机构
公开(公告)号：US08181302B2
公开(公告)日：2012-05-22
申请号：US12564254
申请日：2009-09-22
申请人： Hung Chih Chen , Hui Chen , Dan Zhang
发明人： Hung Chih Chen , Hui Chen , Dan Zhang
IPC分类号： A46B13/00
CPC分类号： A46B13/02 , A46B9/005 , A46B2200/3073 , A61C1/085
摘要： A method and apparatus for providing uniform pressure, friction and/or contact between a substrate and a cylindrical roller in a brush-type cleaning system is described. The apparatus includes an alignment member adapted to allow pivotal movement of the cylindrical roller based on the topography of a substrate and/or the outer surface of the cylindrical roller. The method includes positioning a substrate between two cylindrical rollers, moving each of the two cylindrical rollers to a position where at least a portion of an outer surface of each of the cylindrical rollers are in contact with the major surfaces of the substrate, and rotating one or both of the substrate and the two cylindrical rollers relative to each other while allowing a longitudinal axis of one or both of the two cylindrical rollers to pivot relative to a plane defined by one of the major surfaces of the substrate.
摘要翻译：描述了一种用于在刷式清洁系统中在衬底和圆柱形辊之间提供均匀的压力，摩擦和/或接触的方法和装置。该装置包括一个对准构件，该对准构件适于基于衬底的形状和/或圆柱形辊的外表面允许圆柱形辊的枢转运动。该方法包括将基板定位在两个圆柱形辊之间，将两个圆柱滚子中的每一个移动到每个圆柱滚子的外表面的至少一部分与基板的主表面接触的位置，并且旋转一个或两个圆柱形滚子中的两个相对于彼此同时允许两个圆柱滚子中的一个或两个的纵向轴线相对于由基板的主要表面之一限定的平面枢转。

52. 发明授权

US08101934B2 Methods and apparatus for detecting a substrate notch or flat 有权
标题翻译：用于检测基板切口或平面的方法和装置
公开(公告)号：US08101934B2
公开(公告)日：2012-01-24
申请号：US11683420
申请日：2007-03-07
申请人： Hui Chen , Haochuan Zhang , Noel A. Manto
发明人： Hui Chen , Haochuan Zhang , Noel A. Manto
IPC分类号： G01V8/00
CPC分类号： G01V8/12
摘要： In a first aspect, a first apparatus is provided. The first apparatus includes a through-beam sensor coupled to a scrubber and adapted to detect a notch or flat of a substrate in the scrubber during processing. The through-beam sensor has (1) an emitter facing a first major surface of a substrate in the scrubber and adapted to transmit a beam toward an edge of the first major surface; and (2) a receiver facing a second major surface of the substrate and adapted to receive the beam transmitted from the emitter when the edge of the substrate does not obstruct the beam. Numerous other aspects are provided.
摘要翻译：在第一方面中，提供了一种第一装置。第一装置包括耦合到洗涤器并适于在处理期间检测洗涤器中的基板的凹口或平面的通过光束传感器。通过光束传感器具有（1）发射器面向洗涤器中的基板的第一主表面并且适于将光束传送到第一主表面的边缘; 和（2）接触器，其面对衬底的第二主表面，并且适于在衬底的边缘不阻挡光束时接收从发射器发射的光束。提供了许多其他方面。

53. 发明授权

US08003522B2 Method for forming trenches with wide upper portion and narrow lower portion 有权
标题翻译：用于形成具有宽的上部和窄的下部的沟槽的方法
公开(公告)号：US08003522B2
公开(公告)日：2011-08-23
申请号：US12327425
申请日：2008-12-03
申请人： Hui Chen , Ihsiu Ho , Stacy W. Hall , Briant Harward , Hossein Paravi
发明人： Hui Chen , Ihsiu Ho , Stacy W. Hall , Briant Harward , Hossein Paravi
IPC分类号： H01L21/00
CPC分类号： H01L29/7813 , H01L21/3085 , H01L21/3086 , H01L29/41766 , H01L29/4236 , H01L29/66348 , H01L29/66727 , H01L29/66734 , H01L29/7397
摘要： A method for forming a semiconductor structure includes the following steps. A hard mask layer is formed over a semiconductor region. The hard mask layer has inner portions that are thinner than its outer portions, and the inner portions define an exposed surface area of the semiconductor region. A portion of the semiconductor region is removed through the exposed surface area of the semiconductor region. The thinner portions of the hard mask layer are removed to expose surface areas of the semiconductor region underlying the thinner portions. An additional portion of the semiconductor region is removed through all exposed surface areas of the semiconductor region thereby forming a trench having an upper portion that is wider than its lower portion.
摘要翻译：一种形成半导体结构的方法包括以下步骤。在半导体区域上形成硬掩模层。硬掩模层具有比其外部部分薄的内部部分，并且内部部分限定半导体区域的暴露的表面积。通过半导体区域的暴露的表面区域去除半导体区域的一部分。去除硬掩模层的较薄部分以暴露较薄部分下面的半导体区域的表面区域。通过半导体区域的所有暴露的表面区域去除半导体区域的附加部分，从而形成具有比下部更宽的上部的沟槽。

54. 发明申请

US20110134829A1 REPEAT CONTROL METHOD IN ENHANCED UPLINK ASYNCHRONOUS HYBRID AUTOMATIC REPEAT REQUEST 有权
标题翻译：增强异步混合自动重复请求中的重复控制方法
公开(公告)号：US20110134829A1
公开(公告)日：2011-06-09
申请号：US12377929
申请日：2007-08-15
申请人： Hui Chen , Yincheng Zhang , Zhifeng Ma
发明人： Hui Chen , Yincheng Zhang , Zhifeng Ma
IPC分类号： H04W40/00
CPC分类号： H04L1/1854 , H04L1/1812 , H04L1/1822 , H04L1/1848 , H04L1/1883
摘要： A repeat control method in the enhanced uplink asynchronous hybrid automatic repeat request (HARQ) includes the following steps: (1) the network side adding a parameter of retransmission timer in the HARQ Profile of each dedicated media access control (MAC-d) entity flow in the user equipment, and the user equipment configures the value of the retransmission timer of the enhanced media access control entity (MAC-e) protocol data unit (PDU) according to the parameter of the retransmission timer; (2) the user equipment uses the value of the retransmission timer and the maximum number of retransmissions to control the retransmission. The radio bearer QoS delay requirement and the cooperation work between the sender and the receiver are implemented.
摘要翻译：增强上行异步混合自动重传请求（HARQ）中的重复控制方法包括以下步骤：（1）网络侧在每个专用媒体访问控制（MAC-d）实体流的HARQ简档中添加重发定时器的参数在用户设备中，用户设备根据重传定时器的参数配置增强型媒体接入控制实体（MAC-e）协议数据单元（PDU）的重传定时器的值; （2）用户设备使用重传定时器的值和最大重发次数来控制重传。实现无线承载QoS延迟要求和发送方与接收方之间的协作工作。

55. 发明申请

US20100040322A1 INTEGRATED ELECTRO-OPTIC DEVICE AND METHOD OF MAKING 有权
标题翻译：集成电光器件及其制造方法
公开(公告)号：US20100040322A1
公开(公告)日：2010-02-18
申请号：US12246957
申请日：2008-10-07
申请人： Bing Li , Raluca Dinu , Eric Miller , Danliang Jin , Hui Chen , Christopher A. Wiklof
发明人： Bing Li , Raluca Dinu , Eric Miller , Danliang Jin , Hui Chen , Christopher A. Wiklof
IPC分类号： G02B6/12 , G02F1/035 , H01L21/02
CPC分类号： G02F1/065 , G02B6/1221
摘要： An electro-optic polymer semiconductor integrated circuit includes one or more doped regions configured to drive one or more electrodes, and the electrodes are configured to drive a juxtaposed electro-optic core. The assembly may include a planarization layer disposed at least partially coplanar with the electrodes. The circuit may include an integrated multiplexer, driver configured to receive a signal from the multiplexer, at least one high speed electrode configured to be driven by the driver and modulate light energy passed through a hyperpolarizable poled chromophore regions disposed near the high speed electrode. The circuit may include a calibration storage circuit. The circuit may include, during fabrication, structures to provide voltage to a buried electrode and a shield to prevent damage from the poling field.
摘要翻译：电光聚合物半导体集成电路包括被配置为驱动一个或多个电极的一个或多个掺杂区域，并且电极被配置为驱动并置的电光芯。组件可以包括至少部分地与电极共面设置的平坦化层。电路可以包括集成多路复用器，被配置为从多路复用器接收信号的驱动器，配置成由驱动器驱动的至少一个高速电极，并调制通过设置在高速电极附近的超极化极化发色团区域的光能。电路可以包括校准存储电路。该电路在制造期间可以包括向掩埋电极和屏蔽层提供电压以防止来自极化场的损伤的结构。

56. 发明申请

US20090302482A1 Structure and Method for Forming Hybrid Substrate 有权
标题翻译：用于形成混合基板的结构和方法
公开(公告)号：US20090302482A1
公开(公告)日：2009-12-10
申请号：US12332326
申请日：2008-12-10
申请人： Qi Wang , Joelle Sharp , Minhua Li , Hui Chen
发明人： Qi Wang , Joelle Sharp , Minhua Li , Hui Chen
IPC分类号： H01L25/16 , H01L21/78
CPC分类号： H01L29/045 , H01L21/02381 , H01L21/02433 , H01L21/02532 , H01L21/02609 , H01L21/0262 , H01L21/02639 , H01L21/02642 , H01L29/7802 , H01L29/7813 , H01L2924/0002 , H01L2924/00
摘要： A first and a second substrate are bonded together to thereby form a unitary hybrid substrate. Predefined portions of the first substrate are removed to form openings in the first substrate through which surface regions of the second substrate are exposed. A selective epitaxial growth process that is selective with respect to the crystalline orientations of the first and second substrates is carried out to thereby form epitaxial silicon from the exposed surfaces of the second substrate but not from exposed surfaces of the first substrate. The epitaxial silicon formed from the exposed surfaces of the second substrate has the same crystalline orientation as the second substrate.
摘要翻译：将第一基板和第二基板接合在一起形成单一的混合基板。去除第一衬底的预定部分以在第一衬底中形成开口，第二衬底的表面区域暴露在第一衬底中。执行相对于第一和第二衬底的晶体取向选择性的选择性外延生长工艺，从而从第二衬底的暴露表面形成外延硅，但不从第一衬底的暴露表面形成外延硅。由第二衬底的暴露表面形成的外延硅具有与第二衬底相同的晶体取向。

57. 发明申请

US20090032071A1 LID FOR A SEMICONDUCTOR DEVICE PROCESSING APPARATUS AND METHODS FOR USING THE SAME 审中-公开
标题翻译：用于半导体器件加工装置的夹具及其使用方法
公开(公告)号：US20090032071A1
公开(公告)日：2009-02-05
申请号：US12245742
申请日：2008-10-04
申请人： Joseph Yudovsky , Hui Chen , Gary Ettinger
发明人： Joseph Yudovsky , Hui Chen , Gary Ettinger
IPC分类号： H01L21/67
CPC分类号： H01L21/67126 , B08B3/02 , B08B3/12 , B08B13/00 , H01L21/67051
摘要： A lid for a semiconductor device processing apparatus is provided. The lid comprises a cover having an opening and a wall formed around the opening, the wall adapted to prevent fluid present on the lid from entering a body of the processing apparatus through the opening, and one or more cover edges including one or more edge walls; an outer door adapted to prevent fluid from entering the body of the processing apparatus through the opening of the cover, wherein the outer door interfaces with the wall formed around the opening and the one or more edge walls; and an inner door coupled to the outer door and adapted to prevent fluid from exiting the body of the processing apparatus through the opening of the cover. Numerous other aspects are provided.
摘要翻译：提供了一种用于半导体器件处理设备的盖子。所述盖包括具有开口和围绕所述开口形成的壁的盖，所述壁适于防止存在于所述盖上的流体通过所述开口进入所述处理设备的主体，以及一个或多个盖边缘，包括一个或多个边缘壁 ; 外门，其适于防止流体通过盖的打开进入加工设备的主体，其中外门与围绕开口和一个或多个边缘壁形成的壁相连; 以及联接到所述外门并适于防止流体通过所述盖的打开而离开所述处理设备的主体的内门。提供了许多其他方面。

58. 发明申请

US20080213542A1 LASER PROCESSING OF METAL NANOPARTICLE/POLYMER COMPOSITES 有权
标题翻译：金属纳米颗粒/聚合物复合材料的激光加工
公开(公告)号：US20080213542A1
公开(公告)日：2008-09-04
申请号：US11774796
申请日：2007-07-09
申请人： QUN HUO , Hui Chen
发明人： QUN HUO , Hui Chen
IPC分类号： B05D3/06 , B32B3/10
CPC分类号： B23K26/16 , B23K26/0006 , B23K26/354 , B23K26/55 , B23K2103/16 , B23K2103/42 , B23K2103/50 , Y10T428/24479 , Y10T428/24612 , Y10T428/24744
摘要： A method of forming articles having closed microchannels includes the steps of providing a substrate including a composite material, the composite having metal nanoparticles dispersed in a polymer matrix. The substrate is irradiated with a laser beam at an intensity and time sufficient to selectively remove the polymer below a surface of said substrate to form at least one microchannel, wherein the intensity and time is low enough to avoid removing the polymer above the microchannel, wherein an article having at least one closed microchannel is formed. A metal nanoparticle/polymer composite composition can have functionality that can undergo addition reactions to seal or join pieces of polymers or composites upon irradiation of the composition placed on one or more pieces.
摘要翻译：形成具有闭合微通道的制品的方法包括提供包括复合材料的基材的步骤，所述复合材料具有分散在聚合物基质中的金属纳米颗粒。以足够的强度和时间照射激光束的衬底，以便选择性地去除所述衬底的表面下方的聚合物以形成至少一个微通道，其中强度和时间足够低以避免去除微通道上方的聚合物，其中形成具有至少一个封闭微通道的制品。金属纳米颗粒/聚合物复合组合物可以具有在放置在一个或多个片上的组合物照射时可以经历加成反应以密封或连接聚合物片或复合材料片的官能团。

59. 发明申请

US20080210258A1 SCRUBBER BOX AND METHODS FOR USING THE SAME 有权
标题翻译： SCRUBBER BOX及其使用方法
公开(公告)号：US20080210258A1
公开(公告)日：2008-09-04
申请号：US12102846
申请日：2008-04-14
申请人： Joseph Yudovsky , Avi Tepman , Kenneth R. Reynolds , Younes Achkire , Dan A. Marohl , Steve G. Ghanayem , Alexander S. Polyak , Gary Ettinger , Haochuan Zhang , Hui Chen
发明人： Joseph Yudovsky , Avi Tepman , Kenneth R. Reynolds , Younes Achkire , Dan A. Marohl , Steve G. Ghanayem , Alexander S. Polyak , Gary Ettinger , Haochuan Zhang , Hui Chen
IPC分类号： B08B7/00 , A47L25/00
CPC分类号： H01L21/67046 , B08B1/04
摘要： A scrubber box is provided that includes a tank adapted to receive a substrate for cleaning, supports outside of the tank and adapted to couple to ends of scrubber brushes disposed within the tank, a motor mounted to each of the supports and adapted to rotate the scrubber brushes, a base to which the supports are pivotally mounted via spherical bearings adapted to permit toe-in of the scrubber brushes, a brush gap actuator adapted, via a crank and rocker mechanism, to substantially simultaneously pivot the supports toward or away from each other so as to permit the scrubber brushes to substantially simultaneously achieve or break contact with the substrate, and a toe-in actuator adapted to move two of the spherical bearings toward or away from each other so as to adjust a toe-in angle between the scrubber brushes.
摘要翻译：提供了一种洗涤器箱，其包括适于接收用于清洁的基底的罐，支撑在罐外部并且适于耦合到设置在罐内的洗涤器刷的端部;马达，其安装到每个支撑件上并适于旋转洗涤器电刷，支架通过适于允许洗涤器刷子进入的球面轴承可枢转地安装的基座，经由曲柄和摇臂机构适应的基本上同时地使支撑件朝向或远离彼此枢转的电刷间隙致动器以便允许洗涤器刷子基本上同时实现或断开与基板的接触，以及适于将两个球形轴承朝向或远离彼此移动的脚趾致动器，以便调节洗涤器之间的束缚角度刷子

60. 发明申请

US20080155852A1 MULTIPLE SUBSTRATE VAPOR DRYING SYSTEMS AND METHODS 审中-公开
标题翻译：多基底蒸汽干燥系统及方法
公开(公告)号：US20080155852A1
公开(公告)日：2008-07-03
申请号：US11967533
申请日：2007-12-31
申请人： DONALD J.K. OLGADO , Simon Yavelberg , Edwin Velaquez , Hui Chen , Sheshraj L. Tulshibagwale , Ho Seon Shin
发明人： DONALD J.K. OLGADO , Simon Yavelberg , Edwin Velaquez , Hui Chen , Sheshraj L. Tulshibagwale , Ho Seon Shin
IPC分类号： F26B25/08 , F26B3/04
CPC分类号： H01L21/67034 , H01L21/67028
摘要： Embodiments of the present invention generally relate to an apparatus and methods for rinsing and drying substrates that include multiple rinsing and drying modules. Methods for arranging drying modules to enable high-throughput rinsing and drying of multiple substrates are also provided. In one embodiment a system for drying semiconductor substrates is provided. The system comprises a housing, a first drying module positioned within the housing, and a second drying module positioned adjacent the first drying module within the housing, wherein the first and second drying modules are oriented approximately vertically within the housing.
摘要翻译：本发明的实施方案一般涉及用于冲洗和干燥包括多个漂洗和干燥模块的基材的设备和方法。还提供了用于布置干燥模块以实现多个基板的高通量冲洗和干燥的方法。在一个实施例中，提供了一种用于干燥半导体衬底的系统。所述系统包括壳体，位于所述壳体内的第一干燥模块和邻近所述壳体内的所述第一干燥模块定位的第二干燥模块，其中所述第一和第二干燥模块在所述壳体内大致垂直定向。

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