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51. 发明申请

US20130293888A1 Composite Polarizer With Adjustable Polarization Angles 有权
标题翻译：具有可调极化角度的复合偏振器
公开(公告)号：US20130293888A1
公开(公告)日：2013-11-07
申请号：US13883988
申请日：2012-02-14
申请人： Guoheng Zhao
发明人： Guoheng Zhao
IPC分类号： G02B27/28 , G01N21/21
CPC分类号： G02B27/286 , G01N21/21 , G01N21/8806 , G01N21/9501 , G01N2021/8848 , G02B5/3066 , G02B27/283
摘要： An adjustable, composite polarizer can include first and second plate polarizers and an adjusting apparatus. The adjusting apparatus can adjust a pitch angle and a roll angle for the first and second plate polarizers while maintaining a predetermined, minimal distance between those plates. In this configuration, the adjustable, composite polarizer can provide mirror symmetric polarization with respect to an incident plane while providing the flexibility of any polarization.
摘要翻译：可调节的复合偏振器可以包括第一和第二板偏振器和调节装置。调节装置可以在保持这些板之间预定的最小距离的同时，调整第一和第二板偏振器的俯仰角和滚动角。在这种配置中，可调整的复合偏振器可以提供相对于入射平面的镜对称极化，同时提供任何偏振的柔性。

52. 发明申请

US20120026489A1 Multi-Spot Illumination for Wafer Inspection 有权
标题翻译：晶圆检测的多点照明
公开(公告)号：US20120026489A1
公开(公告)日：2012-02-02
申请号：US13187375
申请日：2011-07-20
申请人： Guoheng Zhao , Azmi Kadkly
发明人： Guoheng Zhao , Azmi Kadkly
IPC分类号： G01N21/01
CPC分类号： F21V5/008 , G01N21/8806 , G01N21/9501 , G01N21/9505
摘要： Illumination subsystems for multi-spot wafer inspection are provided.
摘要翻译：提供了多点晶圆检查的照明子系统。

53. 发明申请

US20050134841A1 Sample inspection system 审中-公开
标题翻译：样品检验系统
公开(公告)号：US20050134841A1
公开(公告)日：2005-06-23
申请号：US11031813
申请日：2005-01-07
申请人： Mehdi Vacz-Iravani , Stanley Stokowski , Guoheng Zhao
发明人： Mehdi Vacz-Iravani , Stanley Stokowski , Guoheng Zhao
IPC分类号： G01N21/21 , G01N21/47 , G01N21/95 , G01N21/88
CPC分类号： G01N21/956 , G01N21/21 , G01N21/47 , G01N21/9501 , G01N2021/8825 , G01N2021/8845 , G01N2021/8848
摘要： A curved mirrored surface is used to collect radiation scattered by a sample surface and originating from a normal illumination beam and an oblique illumination beam. The collected radiation is focused to a detector. Scattered radiation originating from the normal and oblique illumination beams may be distinguished by employing radiation at two different wavelengths, by intentionally introducing an offset between the spots illuminated by the two beams or by switching the normal and oblique illumination beams on and off alternately. Beam position error caused by change in sample height may be corrected by detecting specular reflection of an oblique illumination beam and changing the direction of illumination in response thereto. Butterfly-shaped spatial filters may be used in conjunction with curved mirror radiation collectors to restrict detection to certain azimuthal angles.
摘要翻译：弯曲的镜面用于收集样品表面散射的辐射，并起源于正常照明光束和倾斜照明光束。收集的辐射被聚焦到检测器。可以通过使用两个不同波长的辐射，通过有意地在由两个光束照射的光斑之间引入偏移，或者通过交替地切换正常和倾斜照明光束来区分源自正常和倾斜照明光束的散射辐射。可以通过检测倾斜照明光束的镜面反射并响应于其而改变照明方向来校正由样本高度的变化引起的光束位置误差。蝶形空间滤波器可以与曲面镜辐射收集器一起使用，以将检测限制在某些方位角。

54. 发明申请

US20090195779A1 SYSTEM FOR SCATTEROMETRIC MEASUREMENTS AND APPLICATIONS 有权
标题翻译： SCATTERMETRIC测量和应用系统
公开(公告)号：US20090195779A1
公开(公告)日：2009-08-06
申请号：US12410379
申请日：2009-03-24
申请人： Anatoly Fabrikant , Guoheng Zhao , Daniel C. Wack , Mehrdad Nikoonahad
发明人： Anatoly Fabrikant , Guoheng Zhao , Daniel C. Wack , Mehrdad Nikoonahad
IPC分类号： G01J4/00
CPC分类号： G01N21/45 , G01N21/21 , G01N21/4788 , G01N21/9501 , G01N2021/213 , G01N2021/217 , G01N2021/8416 , G02B5/18
摘要： Instead of constructing a full multi-dimensional look-up-table as a model to find the critical dimension or other parameters in scatterometry, regression or other optimized estimation methods are employed starting from a “best guess” value of the parameter. Eigenvalues of models that are precalculated may be stored and reused later for other structures having certain common characteristics to save time. The scatterometric data that is used to find the value of the one or more parameter can be limited to those at wavelengths that are less sensitive to the underlying film characteristics. A model for a three-dimensional grating may be constructed by slicing a representative structure into a stack of slabs and creating an array of rectangular blocks to approximate each slab. One dimensional boundary problems may be solved for each block which are then matched to find a two-dimensional solution for the slab. A three-dimensional solution can then be constructed from the two-dimensional solutions for the slabs to yield the diffraction efficiencies of the three-dimensional grating. This model can then be used for finding the one or more parameters of the diffracting structure in scatterometry. Line roughness of a surface can be measured by directing a polarized incident beam in an incident plane normal to the line grating and measuring the cross-polarization coefficient. The value of the one or more parameters may then be supplied to a stepper or etcher to adjust a lithographic or etching process.
摘要翻译：不需要构建一个完整的多维查找表作为模型来查找散点图中的关键维度或其他参数，而是从参数的“最佳猜测”值开始采用回归或其他优化的估计方法。预先计算的模型的特征值可以稍后存储并重用于具有某些共同特征的其他结构以节省时间。用于查找一个或多个参数的值的散点数据可以限于那些对底层薄膜特性较不敏感的波长数据。三维光栅的模型可以通过将代表性结构切片成一叠平板并且产生矩形块阵列来近似每个平板来构造。可以为每个块解决一维边界问题，然后将其匹配以找到板的二维解。然后可以从板的二维解决方案中构建三维解，以产生三维光栅的衍射效率。然后，该模型可用于在散射测量中找到衍射结构的一个或多个参数。可以通过将垂直于线光栅的入射平面中的偏振入射光束引导并测量交叉极化系数来测量表面的线粗糙度。然后可以将一个或多个参数的值提供给步进器或蚀刻器以调整光刻或蚀刻工艺。

55. 发明申请

US20080084567A1 System for Scatterometric Measurements and Applications 有权
标题翻译：散射测量和应用系统
公开(公告)号：US20080084567A1
公开(公告)日：2008-04-10
申请号：US11945949
申请日：2007-11-27
申请人： Anatoly Fabrikant , Guoheng Zhao , Daniel Wack , Mehrdad Nikoonahad
发明人： Anatoly Fabrikant , Guoheng Zhao , Daniel Wack , Mehrdad Nikoonahad
IPC分类号： G01B9/02 , G01B11/24 , G01J4/00
CPC分类号： G01N21/45 , G01N21/21 , G01N21/4788 , G01N21/9501 , G01N2021/213 , G01N2021/217 , G01N2021/8416 , G02B5/18
摘要： Instead of constructing a full multi-dimensional look-up-table as a model to find the critical dimension or other parameters in scatterometry, regression or other optimized estimation methods are employed starting from a “best guess” value of the parameter. Eigenvalues of models that are precalculated may be stored and reused later for other structures having certain common characteristics to save time. The scatterometric data that is used to find the value of the one or more parameter can be limited to those at wavelengths that are less sensitive to the underlying film characteristics. A model for a three-dimensional grating may be constructed by slicing a representative structure into a stack of slabs and creating an array of rectangular blocks to approximate each slab. One dimensional boundary problems may be solved for each block which are then matched to find a two-dimensional solution for the slab. A three-dimensional solution can then be constructed from the two-dimensional solutions for the slabs to yield the diffraction efficiencies of the three-dimensional grating. This model can then be used for finding the one or more parameters of the diffracting structure in scatterometry. Line roughness of a surface can be measured by directing a polarized incident beam in an incident plane normal to the line grating and measuring the cross-polarization coefficient. The value of the one or more parameters may then be supplied to a stepper or etcher to adjust a lithographic or etching process.
摘要翻译：不需要构建一个完整的多维查找表作为模型来查找散点图中的关键维度或其他参数，而是从参数的“最佳猜测”值开始采用回归或其他优化的估计方法。预先计算的模型的特征值可以稍后存储并重用于具有某些共同特征的其他结构以节省时间。用于查找一个或多个参数的值的散点数据可以限于那些对底层薄膜特性较不敏感的波长数据。三维光栅的模型可以通过将代表性结构切片成一叠平板并且产生矩形块阵列来近似每个平板来构造。可以为每个块解决一维边界问题，然后将其匹配以找到板的二维解。然后可以从板的二维解决方案中构建三维解，以产生三维光栅的衍射效率。然后，该模型可用于在散射测量中找到衍射结构的一个或多个参数。可以通过将垂直于线光栅的入射平面中的偏振入射光束引导并测量交叉极化系数来测量表面的线粗糙度。然后可以将一个或多个参数的值提供给步进器或蚀刻器以调整光刻或蚀刻工艺。

56. 发明授权

US07009704B1 Overlay error detection 失效
公开(公告)号：US07009704B1
公开(公告)日：2006-03-07
申请号：US09697025
申请日：2000-10-26
申请人： Mehrdad Nikoonahad , Guoheng Zhao , Andrei V. Shchegrov , Ben Tsai
发明人： Mehrdad Nikoonahad , Guoheng Zhao , Andrei V. Shchegrov , Ben Tsai
IPC分类号： G01B11/00 , G01K9/00
CPC分类号： G03F7/70633 , G01B11/272
摘要： An overlay target with gratings thereon is illuminated and radiation scattered by the target is imaged onto detectors. A phase difference is then detected between the outputs of the detectors to find the mis-alignment error. In another aspect, an overlay target with gratings or box-in-box structures is illuminated and radiation scattered by the target is imaged onto detectors located away from the specular reflection direction of the illumination in a dark field detection scheme. Medium numerical aperture optics may be employed for collecting the radiation from the overlay target in a bright or dark field configuration so that the system has a larger depth of focus and so that the two structures of the target at different elevations can be measured accurately at the same time. Analytical functions are constructed for the grating type targets. By finding the phase difference between the two gratings at different elevations, misalignment errors can be detected. Analytical functions are constructed as a model for box-in-box type targets where data points away from the edges of the box or bars can be used in the curve fitting. Symmetrical functions are employed to further reduce noise.

57. 发明授权

US06628397B1 Apparatus and methods for performing self-clearing optical measurements 有权
标题翻译：用于执行自清除光学测量的装置和方法
公开(公告)号：US06628397B1
公开(公告)日：2003-09-30
申请号：US09396143
申请日：1999-09-15
申请人： Mehrdad Nikoonahad , Shing M. Lee , Kalman Kele , Guoheng Zhao , Kurt R. Lehman
发明人： Mehrdad Nikoonahad , Shing M. Lee , Kalman Kele , Guoheng Zhao , Kurt R. Lehman
IPC分类号： G01N2155
CPC分类号： G01N21/15 , B24B37/005 , B24B49/12 , B24D7/12 , G01B11/00 , G01B11/0683
摘要： Disclosed is a self-clearing objective for directing a beam towards a sample and clearing away debris from an optical viewing path adjacent to the sample. The self-clearing objective includes an optical element and a substantially transparent fluid flowing between the optical element and the sample such that at least a portion adjacent to the sample is substantially cleared of debris. The optical element and the fluid cooperatively direct the beam towards the sample. This self-clearing objective may be coupled with various measurement devices to measure various characteristics of samples having debris that prevents clear optical measurements. Additionally, the measurement device may be integrated with or coupled to various sample processing systems so that the relevant process may be clearly monitored.
摘要翻译：公开了一种用于将光束引向样品并从邻近样品的光学观察路径清除碎屑的自清除目标。自清除物镜包括在光学元件和样品之间流动的光学元件和基本上透明的流体，使得与样品相邻的至少一部分基本上被清除。光学元件和流体协调地将光束引向样品。这种自清除物镜可以与各种测量装置耦合，以测量具有防止清晰光学测量的碎片的样品的各种特性。此外，测量装置可以与各种样品处理系统集成或耦合到可以清楚地监测相关过程。

58. 发明授权

US07515253B2 System for measuring a sample with a layer containing a periodic diffracting structure 有权
$System for measuring a sample with a layer containing a periodic diffracting structure$
标题翻译：用含有周期性衍射结构的层测量样品的系统
公开(公告)号：US07515253B2
公开(公告)日：2009-04-07
申请号：US11329500
申请日：2006-01-10
申请人： Noah Bareket , Daniel C. Wack , Guoheng Zhao
发明人： Noah Bareket , Daniel C. Wack , Guoheng Zhao
IPC分类号： G01B11/02
CPC分类号： G01N21/211 , G01N21/8422 , G01N2021/213
摘要： To measure the critical dimensions and other parameters of a one- or two-dimensional diffracting structure of a film, the calculation may be simplified by first performing a measurement of the thickness of the film, employing a film model that does not vary the critical dimension or parameters related to other characteristics of the structure. The thickness of the film may be estimated using the film model sufficiently accurately so that such estimate may be employed to simplify the structure model for deriving the critical dimension and other parameters related to the two-dimensional diffracting structure.
摘要翻译：为了测量膜的一维或二维衍射结构的临界尺寸和其它参数，可以通过首先进行薄膜厚度的测量来简化计算，使用不改变临界尺寸的膜模型或与结构的其他特征相关的参数。可以使用膜模型来充分准确地估计膜的厚度，使得可以采用这种估计来简化用于导出临界尺寸和与二维衍射结构相关的其它参数的结构模型。

59. 发明授权

US07375810B2 Overlay error detection 有权
标题翻译：叠加错误检测
公开(公告)号：US07375810B2
公开(公告)日：2008-05-20
申请号：US11313139
申请日：2005-12-19
申请人： Mehrdad Nikoonahad , Guoheng Zhao , Andrei V. Shchegrov , Ben Tsai
发明人： Mehrdad Nikoonahad , Guoheng Zhao , Andrei V. Shchegrov , Ben Tsai
IPC分类号： G01B11/00 , G06K9/00
CPC分类号： G03F7/70633 , G01B11/272
摘要： An overlay target with gratings thereon is illuminated and radiation scattered by the target is imaged onto detectors. A phase difference is then detected between the outputs of the detectors to find the mis-alignment error. In another aspect, an overlay target with gratings or box-in-box structures is illuminated and radiation scattered by the target is imaged onto detectors located away from the specular reflection direction of the illumination in a dark field detection scheme. Medium numerical aperture optics may be employed for collecting the radiation from the overlay target in a bright or dark field configuration so that the system has a larger depth of focus and so that the two structures of the target at different elevations can be measured accurately at the same time. Analytical functions are constructed for the grating type targets. By finding the phase difference between the two gratings at different elevations, misalignment errors can be detected. Analytical functions are constructed as a model for box-in-box type targets where data points away from the edges of the box or bars can be used in the curve fitting. Symmetrical functions are employed to further reduce noise.
摘要翻译：其上具有光栅的覆盖目标被照射，并且由目标散射的辐射被成像到检测器上。然后在检测器的输出之间检测到相位差，以发现错误对准误差。在另一方面，照射具有光栅或盒内盒结构的覆盖目标，并且由暗场散射的辐射在暗场检测方案中成像到远离照明的镜面反射方向的探测器上。可以采用中等数值孔径光学器件来收集来自覆盖目标的明亮或暗场配置的辐射，使得系统具有更大的聚焦深度，并且可以在不同高度处的靶的两个结构被精确地测量同时。为光栅类型目标构建分析功能。通过在不同高度上找到两个光栅之间的相位差，可以检测到不对准误差。分析功能被构造为盒装箱型目标的模型，其中数据指向远离箱体或杆的边缘可以在曲线拟合中使用。采用对称功能进一步降低噪音。

60. 发明授权

US07369233B2 Optical system for measuring samples using short wavelength radiation 有权
标题翻译：用于使用短波长辐射测量样品的光学系统
公开(公告)号：US07369233B2
公开(公告)日：2008-05-06
申请号：US10718126
申请日：2003-11-19
申请人： Mehrdad Nikoonahad , Shing Lee , Hidong Kwak , Sergio Edelstein , Guoheng Zhao , Gary Janik
发明人： Mehrdad Nikoonahad , Shing Lee , Hidong Kwak , Sergio Edelstein , Guoheng Zhao , Gary Janik
IPC分类号： G01N21/17
CPC分类号： G01N21/9501 , G01N21/8806
摘要： In an optical system measuring sample characteristics, by reducing the amount of ambient absorbing gas or gases and moisture present in at least a portion of the illumination and detection paths experienced by vacuum ultraviolet (VUV) radiation used in the measurement process, the attenuation of such wavelength components can be reduced. Such reduction can be accomplished by a process without requiring the evacuation of all gases and moisture from the measurement system. In one embodiment, the reduction can be accomplished by displacing at least some of the absorbing gas(es) and moisture present in at least a portion of the measuring paths so as to reduce the attenuation of VUV radiation. In this manner, the sample does not need to be placed in a vacuum, thereby enhancing system throughput.
摘要翻译：在测量样品特性的光学系统中，通过减少在测量过程中使用的真空紫外线（VUV）辐射所经历的照明和检测路径的至少一部分中存在的环境吸收气体或气体和水分的量，可以减少波长分量。这种还原可以通过一种方法来实现，而不需要从测量系统排出所有的气体和水分。在一个实施例中，可以通过置换至少部分测量路径中的至少一些吸收气体和水分来实现还原，以便减少VUV辐射的衰减。以这种方式，样品不需要放置在真空中，从而提高系统产量。

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