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    • 58. 发明申请
    • Exposure apparatus, and device manufacturing method
    • 曝光装置和装置制造方法
    • US20060209275A1
    • 2006-09-21
    • US11373172
    • 2006-03-13
    • Chiharu KidoHiroyuki Maruyama
    • Chiharu KidoHiroyuki Maruyama
    • G03B27/52
    • G03F7/70858
    • Disclosed is an exposure apparatus for exposing a substrate through a reticle, that includes a cooling device configured to cooling first water supplied from a facility by use of second water supplied fro the facility and having a temperature lower than the first water, and a supplying system for supplying water cooled by the cooling device, to a heat source inside the exposure apparatus. Also disclosed is an exposure apparatus for exposing a substrate through a reticle, that includes a chamber in which an exposure process is to be carried out, a circulation system configured to circulate a gas through the chamber, a supplying system configured to supply water, supplied from a facility, to a heat source inside the exposure apparatus, and a heat exchanger configured perform heat exchange between a gas discharged out of the chamber by the circulation system and the water to be supplied to the heat source by the supplying system.
    • 公开了一种曝光装置,用于使基板通过掩模版曝光,该曝光装置包括冷却装置,该冷却装置构造成通过使用从设备供应的第二水并且具有低于第一水的温度冷却从设施供应的第一水;以及供应系统 用于将由冷却装置冷却的水供应到曝光装置内部的热源。 还公开了一种曝光装置,用于通过掩模版露出衬底,该掩模版包括将要进行曝光处理的腔室,构造成使气体循环通过腔室的循环系统,被供应的供水系统 从设施到曝光装置内的热源,构成的热交换器通过循环系统进行从室排出的气体与由供给系统供给到热源的水之间的热交换。