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51. 发明申请

US20070081227A1 Low-emissivity coatings having high visible transmission and low solar heat gain coefficient 有权
标题翻译：低辐射涂层具有高可见透射率和低太阳能热增益系数
公开(公告)号：US20070081227A1
公开(公告)日：2007-04-12
申请号：US11360266
申请日：2006-02-23
申请人： Klaus Hartig
发明人： Klaus Hartig
IPC分类号： F21V9/04
CPC分类号： C03C17/36 , C03C17/3618 , C03C17/3639 , C03C17/3644 , C03C17/3652 , C03C17/366 , C03C2217/78 , Y10T428/231
摘要： The invention provides low-emissivity coatings that are highly reflective of infrared radiation. The coating includes three infrared-reflection film regions, which may each comprise silver.
摘要翻译：本发明提供高反射红外辐射的低发射率涂层。该涂层包括三个红外反射膜区域，其可以各自包含银。

52. 发明申请

US20070080056A1 Method and apparatus for cylindrical magnetron sputtering using multiple electron drift paths 审中-公开
标题翻译：使用多个电子漂移路径的圆柱形磁控溅射的方法和装置
公开(公告)号：US20070080056A1
公开(公告)日：2007-04-12
申请号：US11245651
申请日：2005-10-07
申请人： John German , Klaus Hartig
发明人： John German , Klaus Hartig
IPC分类号： C23C14/32 , C23C14/00
CPC分类号： C23C14/3407 , C23C14/35 , H01J37/3405 , H01J37/342 , H01J37/3461
摘要： A cylindrical cathode target assembly for use in sputtering target material onto a substrate comprises a generally cylindrical target, means for rotating the target about its axis during a sputtering operation, a magnetic array carried within the target for generation of a plasma-containing field including a plurality of electron drift paths adjacent an outer surface of the target, and a device for supporting the magnetic array independently of rotation of the target. In certain embodiments of the invention, the magnetic array may include a plurality of magnetic elements arranged to form a plurality of electron drift paths spaced along a substantial length of the target to promote generally uniform film deposition and uniform target utilization along its length.
摘要翻译：用于将目标材料溅射到衬底上的圆柱形阴极靶组件包括大致圆柱形的靶，用于在溅射操作期间使靶围绕其轴旋转的装置，用于产生包含等离子体的场的靶内的磁阵列与靶的外表面相邻的多个电子漂移路径，以及用于独立于靶的旋转而支撑磁阵列的装置。在本发明的某些实施例中，磁性阵列可以包括多个磁性元件，其被布置成形成沿靶的相当长度间隔开的多个电子漂移路径，以促进大体均匀的膜沉积并沿着其长度均匀的靶材利用。

53. 发明授权

US07192647B2 Concentration-modulated coatings 有权
标题翻译：浓度调制涂层
公开(公告)号：US07192647B2
公开(公告)日：2007-03-20
申请号：US10876254
申请日：2004-06-24
申请人： Klaus Hartig
发明人： Klaus Hartig
IPC分类号： B32B17/06
CPC分类号： C03C17/3613 , C03C17/36 , C03C17/3618 , C03C17/3639 , C03C17/3644 , C03C17/3652 , C03C17/366 , C03C17/3694 , C23C14/086 , C23C14/352 , C23C14/568 , Y10T428/265
摘要： The invention provides a substrate bearing a low-emissivity coating. The low-emissivity coating comprises at least one graded film region. In certain embodiments, at least one graded film region is provided between the two infrared-reflective layers of a double-type low-emissivity coating. The graded film region has a substantially continuously decreasing concentration of a first dielectric material and a substantially continuously increasing concentration of a second dielectric material. Also provided are methods of depositing such low-emissivity coatings and substrates bearing these coatings.
摘要翻译：本发明提供一种承载低发射率涂层的基片。低辐射涂层包括至少一个分级膜区域。在某些实施例中，在双型低辐射率涂层的两个红外反射层之间提供至少一个分级膜区域。分级膜区域具有基本上连续降低的第一介电材料的浓度和基本上连续增加的第二介电材料的浓度。还提供了沉积这种低辐射率涂层和承载这些涂层的基材的方法。

54. 发明申请

US20060272273A1 Window assembly masking bag 审中-公开
标题翻译：窗组装掩蔽袋
公开(公告)号：US20060272273A1
公开(公告)日：2006-12-07
申请号：US11418845
申请日：2006-05-05
申请人： Klaus Hartig
发明人： Klaus Hartig
IPC分类号： E04B1/00
CPC分类号： E04G21/30 , B65D85/64 , B65D2585/649 , E06B7/28
摘要： The invention provides methods and equipment for storing and protecting window assemblies. In certain embodiments, there is provided a bag configured to hold a window assembly therein following the assembly's manufacture up until after the installation of the assembly. The bag is configured to be sealed and to be form-fitted to the window assembly. As such, the likelihood of the bag allowing contaminants therein or catching on something and tearing is reduced. Following the installation of the window assembly, a portion of the bag is configured for removal from the exposed surfaces of the window assembly. A portion of the bag not removed is subsequently utilized as a protective barrier for the non-exposed surfaces of the window assembly. In certain embodiments, there is provided a method for storing and protecting a window assembly using a bag of the described nature.
摘要翻译：本发明提供了用于存储和保护窗组件的方法和设备。在某些实施例中，提供了一种构造成在组件的制造之后将窗户组件保持在其中直到安装组件之后的袋子。该袋被配置为密封并与窗组件成形。因此，袋子允许其中的污染物或捕获物质和撕裂的可能性降低。在安装窗组件之后，袋的一部分被配置成从窗组件的暴露表面移除。随后将未拆卸的袋的一部分用作窗组件的未暴露表面的保护屏障。在某些实施例中，提供了一种使用所述性质的袋存储和保护窗户组件的方法。

55. 发明申请

US20060272174A1 Deposition chamber desiccation systems and methods of use thereof 审中-公开
标题翻译：沉积室干燥系统及其使用方法
公开(公告)号：US20060272174A1
公开(公告)日：2006-12-07
申请号：US11437429
申请日：2006-05-19
申请人： Klaus Hartig
发明人： Klaus Hartig
IPC分类号： F26B21/08
CPC分类号： F26B21/001 , C23C14/564 , C23C16/4401 , F26B21/08
摘要： The present invention provides a system and method for removing contaminating moisture from a deposition chamber prior to use. Dry air, preferably hot dry air, is blown into the deposition chamber where it absorbs and removes moisture. This is done by connecting a desiccation system including a blower and a dryer to the deposition chamber. The deposition chamber is also provided with a vacuum source; this may be connected to the deposition chamber using the same line as that used for the desiccation source, or may be connected through a separate line. The dry air may re-circulate through the chamber during this flushing method, or the dry air may flow through the deposition chamber continuously. A heat exchanger may also be provided to efficiently reuse hot air used to recharge the desiccation system. The desiccation system and method are particularly suited for decontaminating a magnetron sputtering deposition chamber.
摘要翻译：本发明提供一种用于在使用之前从沉积室去除污染水分的系统和方法。干燥空气，优选热干燥空气，吹入沉积室，在其中吸收和去除水分。这通过将包括鼓风机和干燥器的干燥系统连接到沉积室来完成。沉积室还设有真空源; 这可以使用与用于干燥源的线相同的线连接到沉积室，或者可以通过单独的管线连接。在这种冲洗过程中干燥的空气可以通过室再循环，或者干燥的空气可以连续地流过沉积室。还可以提供热交换器以有效地再利用用于对干燥系统进行再充电的热空气。干燥系统和方法特别适用于对磁控溅射沉积室进行净化。

56. 发明授权

US07105056B2 Pneumatic handling and recoating apparatus and method of use 失效
标题翻译：气动处理和重涂装置及使用方法
公开(公告)号：US07105056B2
公开(公告)日：2006-09-12
申请号：US10334054
申请日：2002-12-30
申请人： Klaus Hartig , David Stebbins
发明人： Klaus Hartig , David Stebbins
IPC分类号： B05C19/04
CPC分类号： B65G49/061 , B05B13/0264 , B65G2249/04 , B65G2249/045
摘要： A pneumatic handling and recoating apparatus for handling workpieces, such as glass, is provided. The apparatus utilizes a holding device operatively connected to a vacuum assembly. The holding device engages workpieces by vacuum and subsequently releases them by a burst of gas. The burst of gas also facilitates the application of a coating material, such as a stain-retardant agent, to a workpiece upon release from the holding device.
摘要翻译：提供了用于处理诸如玻璃的工件的气动处理和重涂装置。该装置利用可操作地连接到真空组件的保持装置。保持装置通过真空接合工件，并随后通过气体爆裂而释放它们。气体爆裂也有助于在从保持装置释放时将诸如阻燃剂的涂料施加到工件上。

57. 发明申请

US20050026002A1 Concentration-modulated coatings 有权
标题翻译：浓度调制涂层
公开(公告)号：US20050026002A1
公开(公告)日：2005-02-03
申请号：US10876254
申请日：2004-06-24
申请人： Klaus Hartig
发明人： Klaus Hartig
IPC分类号： C03C17/36 , C23C14/08 , C23C14/56 , B32B17/06 , B32B19/00 , C23C14/32
CPC分类号： C03C17/3613 , C03C17/36 , C03C17/3618 , C03C17/3639 , C03C17/3644 , C03C17/3652 , C03C17/366 , C03C17/3694 , C23C14/086 , C23C14/352 , C23C14/568 , Y10T428/265
摘要： The invention provides a substrate bearing a low-emissivity coating. The low-emissivity coating comprises at least one graded film region. In certain embodiments, at least one graded film region is provided between the two infrared-reflective layers of a double-type low-emissivity coating. The graded film region has a substantially continuously decreasing concentration of a first dielectric material and a substantially continuously increasing concentration of a second dielectric material. Also provided are methods of depositing such low-emissivity coatings and substrates bearing these coatings.
摘要翻译：本发明提供一种承载低发射率涂层的基片。低辐射涂层包括至少一个分级膜区域。在某些实施例中，在双型低辐射率涂层的两个红外反射层之间提供至少一个分级膜区域。分级膜区域具有基本上连续降低的第一介电材料的浓度和基本上连续增加的第二介电材料的浓度。还提供了沉积这种低辐射率涂层和承载这些涂层的基材的方法。

58. 发明授权

US5262032A Sputtering apparatus with rotating target and target cooling 失效
标题翻译：具有旋转目标和目标冷却的溅射装置
公开(公告)号：US5262032A
公开(公告)日：1993-11-16
申请号：US918142
申请日：1992-07-23
申请人： Klaus Hartig , Anton Dietrich , Joachim Szczyrbowski
发明人： Klaus Hartig , Anton Dietrich , Joachim Szczyrbowski
IPC分类号： C23C14/34 , H01J37/34
CPC分类号： H01J37/3497 , C23C14/3407 , H01J37/3405
摘要： A sputtering apparatus is presented, especially one with a magnetron cathode and rotating target (1), and target cooling performed by a liquid coolant, preferably water, in which provision is made for the cooling to be concentrated on the area or areas of the rotating target (1) which are exposed to the heat produced by the plasma (12), and the magnets (28, 29, 30, 31) of the magnet assembly (23) form at least one cooling passage (34, 35).
摘要翻译：提出了一种溅射装置，特别是具有磁控管阴极和旋转靶（1）的溅射装置，并且由液体冷却剂（优选水）进行目标冷却，其中提供用于使冷却集中在旋转的区域或区域上暴露于由等离子体（12）产生的热的靶（1）和磁体组件（23）的磁体（28,29,30,31）形成至少一个冷却通道（34,35）。

59. 发明授权

US5170291A Coating, composed of an optically effective layer system, for substrates, whereby the layer system has a high anti-reflective effect, and method for manufacturing the coating 失效
标题翻译：由光学有效层系统组成的用于基板的涂层，由此层系统具有高的抗反射效果，以及制造涂层的方法
公开(公告)号：US5170291A
公开(公告)日：1992-12-08
申请号：US717027
申请日：1991-06-18
申请人： Joachim Szczyrbowski , Klaus Hartig , Wolfgang Lohwasser
发明人： Joachim Szczyrbowski , Klaus Hartig , Wolfgang Lohwasser
IPC分类号： C03C17/34 , G02B1/11
CPC分类号： G02B1/115 , C03C17/3417 , C03C17/3452 , C03C17/347
摘要： A coating for applying to a front side of a substrate, which side is facing an observer, comprises a four-layer system which is optically effective and has a high anti-reflective effect. A first layer of this system is applied onto the front side of the substrate and is, preferably, a highly-refracting TiO.sub.2 layer, the second layer is applied to the first layer and is a low-refracting Al.sub.2 O.sub.3 layer, a third layer of the system is applied to the second layer and is, preferably, a high-refracting TiO.sub.2, while the fourth layer applied to the third layer is, preferably, a low-refracting SiO.sub.2 layer. The layers can be formed by either a pyrolytic method, a plasma-supported chemical vapor deposition method, a sputtering method or a chemical vapor deposition method. Preferably, they are formed by a DC-reactive sputtering method with a magnetron.
摘要翻译：用于施加到基板的前侧的涂层，该涂层面向观察者，包括光学有效并具有高抗反射效果的四层体系。该系统的第一层被施加到基板的正面，并且优选地是高折射率的TiO 2层，第二层施加到第一层，并且是低折射Al 2 O 3层，第三层是系统被施加到第二层，并且优选地是高折射TiO 2，而施加到第三层的第四层优选地是低折射SiO 2层。这些层可以通过热解法，等离子体支持的化学气相沉积法，溅射法或化学气相沉积法形成。优选地，它们由具有磁控管的DC反应溅射法形成。

60. 发明授权

US5090984A Method for producing glass of high transmission in the visible spectral range and low solar energy transmission 失效
标题翻译：在可见光谱范围和低太阳能传输中生产高透射率玻璃的方法
公开(公告)号：US5090984A
公开(公告)日：1992-02-25
申请号：US516810
申请日：1990-04-30
申请人： Joachim Szczyrbowski , Stefan Rogels , Anton Dietrich , Klaus Hartig
发明人： Joachim Szczyrbowski , Stefan Rogels , Anton Dietrich , Klaus Hartig
IPC分类号： C03C17/245 , C03C17/34 , C23C14/08
CPC分类号： C23C14/08 , C03C17/2453 , C03C17/3417
摘要： In a method for the production of sheets of mineral glass with high transmission in the visible spectral range and with low solar energy transmission, a coating is sputtered onto the sheet in a coating chamber by cathode sputtering with a target of an alloy of 65% tin and 35% nickel in an atmosphere with an oxygen content. The sheet and coating are then heated at 640.degree. C. and then bent in the heated state, thus producing an especially stable and electrically conductive combination.
摘要翻译：在可见光谱范围内和低太阳能透射率下生产具有高透射率的矿物玻璃片的方法中，通过阴极溅射将涂层溅射到涂覆室中的片材上，其目的为65％锡合金靶和含氧量大气的35％的镍。然后将片和涂层在640℃下加热，然后在加热状态下弯曲，从而产生特别稳定且导电的组合。

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