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    • 53. 发明授权
    • Servo control in a patterned-media magnetic recording disk drive using a reference table
    • 使用参考表在图形媒体磁记录磁盘驱动器中进行伺服控制
    • US08625229B2
    • 2014-01-07
    • US13492880
    • 2012-06-10
    • Thomas R. AlbrechtMichael Konrad Grobis
    • Thomas R. AlbrechtMichael Konrad Grobis
    • G11B21/02G11B5/09G11B5/596
    • G11B5/5965G11B5/59666
    • A patterned-media magnetic recording disk drive has head positioning servo sectors on the disk that do not contain special patterns but merely use the same type of dots that are used for data. The “data” dots in angularly spaced sectors of the data tracks function as the servo sectors and are denoted as D-servo regions. The D-servo regions extend across an annular band of the disk, which may be a bootstrap band for self-servowriting. The dots in the annular band are randomly magnetized so that each track in each D-servo region provides a generally random readback signal at the data frequency. The precise radial and circumferential position of the read/write head within a D-servo region is determined by comparing the readback signal with a set of reference signal waveforms from a look-up reference table and finding the reference signal waveform that matches the readback signal.
    • 图形介质磁记录磁盘驱动器在磁盘上具有不包含特殊图案的头部定位伺服扇区,但仅使用与数据相同类型的点。 数据轨道的角度间隔扇区中的“数据”点用作伺服扇区,并被表示为D伺服区域。 D伺服区域延伸穿过盘的环形带,其可以是用于自伺服驱动的自举带。 环形带中的点被随机磁化,使得每个D伺服区域中的每个轨道在数据频率处提供大致随机的回读信号。 通过将读回信号与来自查找参考表的一组参考信号波形进行比较并找到与回读信号相匹配的参考信号波形来确定读/写头在D伺服区域内的精确径向和圆周位置 。
    • 54. 发明授权
    • Method for making a master disk for nanoimprinting patterned magnetic recording disks
    • 制造用于纳米压印图案化磁记录盘的母盘的方法
    • US08323515B2
    • 2012-12-04
    • US13151981
    • 2011-06-02
    • Thomas R. Albrecht
    • Thomas R. Albrecht
    • B44C1/22
    • G11B5/855B82Y10/00G11B5/743G11B5/82
    • A method for making a master disk to be used for nanoimprinting patterned-media magnetic recording disks uses sidewall lithography. In one implementation, the master disk substrate has a first pattern of concentric rings formed on it by sidewall lithography, followed by a second pattern of generally radially-directed pairs of parallel lines, also formed by sidewall lithography, with the pairs of parallel lines intersecting the rings. An etching process is then performed, using the upper pattern as an etch mask, to remove unprotected portions of the underlying concentric rings. This leaves a pattern of pillars on the substrate, which then serve as an etch mask for an etching process that etches unprotected portions of the master disk substrate. The resulting master disk then has pillars of substrate material arranged in a pattern of concentric rings and generally radially-directed pairs of parallel lines.
    • 用于制造用于纳米压印图案化介质磁记录盘的母盘的方法使用侧壁光刻。 在一个实施方案中,母盘基板具有通过侧壁光刻在其上形成的同心环的第一图案,随后是也通过侧壁光刻形成的大致径向定向的一对平行线的第二图案,并且所述平行线对相交 戒指。 然后使用上部图案作为蚀刻掩模进行蚀刻工艺,以去除下面的同心环的未受保护的部分。 这在衬底上留下了柱状图案,其然后用作用于蚀刻母盘衬底的未受保护部分的蚀刻工艺的蚀刻掩模。 所得到的母盘然后具有以同心环和大体上径向指向的平行线对图案布置的基底材料柱。
    • 56. 发明授权
    • Method for making a master mold with high bit-aspect-ratio for nanoimprinting patterned magnetic recording disks, master mold made by the method, and disk imprinted by the master mold
    • 用于制造具有高比特宽比的用于纳米压印图案化磁记录盘的母模的方法,通过该方法制造的母模和由母模印制的盘
    • US08003236B2
    • 2011-08-23
    • US12141060
    • 2008-06-17
    • Thomas R. AlbrechtBarry Cushing StipeHenry Hung Yang
    • Thomas R. AlbrechtBarry Cushing StipeHenry Hung Yang
    • G11B5/64
    • G11B5/855
    • A method for making a master mold to be used for nanoimprinting patterned-media magnetic recording disks results in a master mold having topographic pillars arranged in a pattern of annular bands of concentric rings. The ratio of circumferential density of the pillars to the radial density of the concentric rings in a band is greater than 1. The method uses sidewall lithography to first form a pattern of generally radially-directed pairs of parallel lines on the master mold substrate, with the lines being grouped into annular zones or bands. The sidewall lithography process can be repeated, resulting in a doubling of the number of lines each time the process is repeated. Conventional lithography is used to form concentric rings over the radially-directed pairs of parallel lines. After etching and resist removal, the master mold has pillars arranged in circular rings, with the rings grouped into annular bands. The master mold may be used to nanoimprint the disks, resulting in disks having a BAR greater than 1, wherein BAR is the ratio of data track spacing in the radial direction to the data island spacing in the circumferential direction.
    • 用于制造用于纳米压印图案化介质磁记录盘的母模的方法导致具有布置成同心环的环形带图案的形状柱的母模。 柱的圆周密度与带中同心环的径向密度的比率大于1.该方法使用侧壁光刻法首先在母模基底上形成大致径向定向的平行线对图案,其中, 线路被分组成环形区域或带。 可以重复侧壁光刻处理,导致每次重复该过程的行数加倍。 常规光刻用于在径向对平行线上形成同心环。 在蚀刻和抗蚀剂去除之后,主模具有布置成圆形环的柱,其中环被分组成环形带。 主模可以用于纳米压印盘,导致具有大于1的BAR的盘,其中BAR是径向方向上的数据轨道间隔与圆周方向上的数据岛间隔的比率。
    • 58. 发明授权
    • Self-assembly structures used for fabricating patterned magnetic media
    • 用于制造图案化磁性介质的自组装结构
    • US07969686B2
    • 2011-06-28
    • US11964680
    • 2007-12-26
    • Thomas R. AlbrechtXiao Z. WuHenry Hung Yang
    • Thomas R. AlbrechtXiao Z. WuHenry Hung Yang
    • G11B5/82
    • G11B5/855B82Y10/00G11B5/743G11B5/82G11B5/865
    • Methods of defining servo patterns and data patterns for forming patterned magnetic media are described. For one method, a lithographic process is performed to define a servo pattern in servo regions on a substrate. The lithographic process also defines a first data pattern in data regions of the substrate. The first data pattern is then transferred to (i.e., etched into) the data regions. Self-assembly structures are then formed on the data pattern in the data regions to define a second data pattern. The servo pattern is then transferred to the servo regions and the second data pattern is transferred to the data regions. Thus, the servo pattern is defined through lithographic processes while the data pattern is defined by a combination of lithographic processes and self-assembly.
    • 描述了定义用于形成图案化磁性介质的伺服图案和数据图案的方法。 对于一种方法,执行光刻处理以在衬底上的伺服区域中定义伺服图案。 光刻工艺还定义了衬底的数据区域中的第一数据模式。 然后将第一数据模式转移到(即蚀刻)数据区。 然后在数据区域中的数据模式上形成自组装结构以定义第二数据模式。 然后将伺服模式传送到伺服区域,并将第二数据模式传送到数据区域。 因此,通过光刻工艺定义伺服图案,同时通过光刻工艺和自组装的组合来定义数据图案。