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51. 外观设计

USD635597S1 Lift pin 有权
标题翻译：提升针
公开(公告)号：USD635597S1
公开(公告)日：2011-04-05
申请号：US29328009
申请日：2008-11-17
申请人： Robin L. Tiner
设计人： Robin L. Tiner

52. 发明申请

US20100206483A1 RF Bus and RF Return Bus for Plasma Chamber Electrode 有权
标题翻译：射频总线和等离子腔室电极的RF返回总线
公开(公告)号：US20100206483A1
公开(公告)日：2010-08-19
申请号：US12705600
申请日：2010-02-13
申请人： Carl A. Sorensen , Jozef Kudela , Robin L. Tiner , Suhail Anwar , John M. White
发明人： Carl A. Sorensen , Jozef Kudela , Robin L. Tiner , Suhail Anwar , John M. White
IPC分类号： C23F1/08 , C23C16/00 , C23C16/50
CPC分类号： H01J37/32174 , H01J37/32091
摘要： For coupling RF power from an RF input of a plasma chamber to the interior of a plasma chamber, an RF bus conductor is connected between the RF input and a plasma chamber electrode. In one embodiment, an RF return bus conductor is connected to an electrically grounded wall of the chamber, and the RF bus conductor and the RF return bus conductor have respective surfaces that are parallel and face each other. In another embodiment, the RF bus conductor has a transverse cross section having a longest dimension oriented perpendicular to the surface of the plasma chamber electrode that is closest to the RF bus conductor.
摘要翻译：为了将来自等离子体室的RF输入的RF功率耦合到等离子体室的内部，RF总线导体连接在RF输入端和等离子体室电极之间。在一个实施例中，RF返回总线导体连接到室的电接地壁，并且RF总线导体和RF返回总线导体具有彼此平行并相对的相应表面。在另一个实施例中，RF总线导体具有垂直于等离子体室电极表面的最长尺寸的横截面，其最接近RF总线导体。

53. 发明申请

US20100122655A1 BALL SUPPORTED SHADOW FRAME 审中-公开
标题翻译：球支撑阴影框架
公开(公告)号：US20100122655A1
公开(公告)日：2010-05-20
申请号：US12614479
申请日：2009-11-09
申请人： Robin L. Tiner , John M. White , Kyung-Tae Kim
发明人： Robin L. Tiner , John M. White , Kyung-Tae Kim
IPC分类号： B05C11/00 , B23P11/00
CPC分类号： C23C16/4585 , C23C16/042 , Y10T29/49895
摘要： Embodiments disclosed herein generally include an alignment assembly for aligning a shadow frame on a susceptor. For producing large area flat panel displays or solar panels, the shadow frame that protects the areas of the susceptor not covered by the substrate from deposition may be so large that the shadow frame bends and doesn't properly align. By utilizing an alignment assembly having one or more ball bearings, the shadow frame may roll on the susceptor to a proper alignment position. Thus, the shadow frame may be prevented from bending and also align on the susceptor.
摘要翻译：本文公开的实施例通常包括用于对准基座上的阴影框架的对准组件。为了制造大面积平板显示器或太阳能电池板，保护未被基板覆盖的基座的区域沉积的阴影框架可能太大，使得阴影框架弯曲并且不能正确对准。通过利用具有一个或多个球轴承的对准组件，阴影框架可以在基座上滚动到适当的对准位置。因此，可以防止阴影框架弯曲并且在基座上对准。

54. 发明申请

US20090283039A1 ROBUST OUTLET PLUMBING FOR HIGH POWER FLOW REMOTE PLASMA SOURCE 审中-公开
标题翻译：大功率流量远程等离子体源的稳健出口
公开(公告)号：US20090283039A1
公开(公告)日：2009-11-19
申请号：US12467477
申请日：2009-05-18
申请人： JOHN M. WHITE , Soo Young Choi , Beom Soo Park , Gaku Furuta , Young Jin Choi , Robin L. Tiner
发明人： JOHN M. WHITE , Soo Young Choi , Beom Soo Park , Gaku Furuta , Young Jin Choi , Robin L. Tiner
IPC分类号： C23C16/54 , F28D7/00
CPC分类号： F28D7/00 , C23C16/4405 , F28D2021/0078 , F28F9/26
摘要： The present invention generally includes a coupling between components. When igniting a plasma remote from a processing chamber, the reactive gas ions may travel to the processing chamber through numerous components. The reactive gas ions may be quite hot and cause the various components to become very hot and thus, the seals between apparatus components may fail. Therefore, it may be beneficial to cool any metallic components through which the reactive gas ions may travel. However, at the interface between the cooled metallic component and a ceramic component, the ceramic component may experience a temperature gradient sufficient to crack the ceramic material due to the heat of the reactive gas ions and the coolness of the metallic component. Therefore, extending a flange of the metallic component into the ceramic component may lessen the temperature gradient at the interface and reduce cracking of the ceramic component.
摘要翻译：本发明通常包括组件之间的联接。当点燃离开处理室的等离子体时，反应气体离子可通过许多部件行进到处理室。反应气体离子可能相当热，并导致各种部件变得非常热，因此，装置部件之间的密封可能失效。因此，冷却反应气体离子可以通过其移动的任何金属组分可能是有益的。然而，在冷却的金属组分和陶瓷组分之间的界面处，由于反应气体离子的热量和金属组分的冷却，陶瓷组分可能经历足以破坏陶瓷材料的温度梯度。因此，将金属部件的凸缘延伸到陶瓷部件中可以减小界面处的温度梯度并减少陶瓷部件的开裂。

55. 发明申请

US20090071406A1 COOLED BACKING PLATE 审中-公开
标题翻译：冷却背板
公开(公告)号：US20090071406A1
公开(公告)日：2009-03-19
申请号：US11858020
申请日：2007-09-19
申请人： SOO YOUNG CHOI , Robin L. Tiner , John M. White
发明人： SOO YOUNG CHOI , Robin L. Tiner , John M. White
IPC分类号： C23C16/00
CPC分类号： C23C16/45572 , C03C17/002 , C03C17/02 , C03C17/245 , C03C2217/213 , C03C2218/153 , C23C16/4411 , C23C16/505
摘要： A plasma enhanced chemical vapor deposition chamber (PECVD) which includes a backing plate that provides support to a diffuser. The backing plate includes a plurality of fluid conduits adapted for circulation of a cooling fluid therethrough to remove excess heat generated in the chamber by the plasma to thereby maintain the backing plate in a stable condition thereby maintaining the diffuser in a stable position during the deposition of material from the plasma.
摘要翻译：等离子体增强化学气相沉积室（PECVD），其包括提供对扩散器的支撑的背板。背板包括适于使冷却流体循环通过其中的多个流体导管，以通过等离子体去除腔室中产生的多余热量，从而将背板保持在稳定状态，从而在沉积期间将扩散器保持在稳定的位置来自等离子体的材料

56. 发明申请

US20090007846A1 DIFFUSER GRAVITY SUPPORT 有权
标题翻译： DIFFUSER GRAVITY支持
公开(公告)号：US20090007846A1
公开(公告)日：2009-01-08
申请号：US12234359
申请日：2008-09-19
申请人： ERNST KELLER , John M. White , Robin L. Tiner , Jiri Kucera , Soo Young Choi , Beom Soo Park , Michael Starr
发明人： ERNST KELLER , John M. White , Robin L. Tiner , Jiri Kucera , Soo Young Choi , Beom Soo Park , Michael Starr
IPC分类号： C23C16/00
CPC分类号： H01J37/3244 , C23C16/45565
摘要： An apparatus and method for supporting a substantial center portion of a gas distribution plate is disclosed. At least one support member is capable of engaging and disengaging the diffuser with a mating connection without prohibiting flow of a gas or gases through the diffuser and is designed to provide vertical suspension to a diffuser that is supported at its perimeter, or capable of supporting the diffuser without a perimeter support. In one aspect, the at least one support member is a portion of a gas delivery conduit and in another embodiment is a plurality of support members separated from the gas delivery conduit. The at least one support member is capable of translating vertical lift, or vertical compression to a center area of the diffuser. A method and apparatus for controlling gas flow from the gas delivery conduit to the gas distribution plate is also disclosed.
摘要翻译：公开了一种用于支撑气体分布板的大部分中心部分的装置和方法。至少一个支撑构件能够通过配合连接件接合和分离扩散器，而不阻止气体或气体流过扩散器，并且被设计成向在其周边支撑的扩散器提供垂直悬架，或者能够支撑扩散器没有周界支撑。在一个方面，所述至少一个支撑构件是气体输送导管的一部分，并且在另一个实施例中是与气体输送导管分离的多个支撑构件。至少一个支撑构件能够将垂直升降或垂直压缩平移到扩散器的中心区域。还公开了一种用于控制从气体输送管道到气体分配板的气流的方法和装置。

57. 发明申请

US20080289284A1 PROCESS CHAMBER AND LOAD-LOCK SPLIT FRAME CONSTRUCTION 审中-公开
标题翻译：过程室和负载分离框架结构
公开(公告)号：US20080289284A1
公开(公告)日：2008-11-27
申请号：US12040284
申请日：2008-02-29
申请人： SUHAIL ANWAR , Eric Stegall , Robin L. Tiner , Janusz Jozwiak , Philip Vancas
发明人： SUHAIL ANWAR , Eric Stegall , Robin L. Tiner , Janusz Jozwiak , Philip Vancas
IPC分类号： E04B1/19
CPC分类号： F16M3/00
摘要： The present invention generally relates to a split frame assembly for supporting a chamber in a processing system. In order to adequately fit into the body of an airplane for transport, the frame may be split into two pieces. Once split, each piece may individually be loaded onto the airplane. The upper piece may comprise all of the various components necessary to operate the chamber including gas panels, control panels, or other panels. The lower piece may support the upper piece.
摘要翻译：本发明一般涉及一种用于在处理系统中支撑室的分割框架组件。为了充分适应飞机的运输体，框架可以分成两部分。一旦拆分，每件可以单独装载到飞机上。上部件可以包括操作室的所有各种部件，包括气体面板，控制面板或其他面板。下部件可以支撑上部件。

58. 发明申请

US20080286463A1 RF SHUTTER 有权
标题翻译：射频快门
公开(公告)号：US20080286463A1
公开(公告)日：2008-11-20
申请号：US12040298
申请日：2008-02-29
申请人： ROBIN L. TINER , Gaku Furuta , Yukinobu Adachi
发明人： ROBIN L. TINER , Gaku Furuta , Yukinobu Adachi
IPC分类号： C23C16/453
CPC分类号： H01J37/32082 , H01J37/32623 , H01J37/32651 , H01J2237/0206
摘要： The present invention generally comprises an RF shutter assembly for use in a plasma processing apparatus. The RF shutter assembly may reduce the amount of plasma creep below the substrate and shadow frame during processing, thereby reducing the amount of deposition that occurs on undesired surfaces. By reducing the amount of deposition on undesired surfaces, particle flaking and thus, substrate contamination may be reduced.
摘要翻译：本发明通常包括用于等离子体处理装置的RF快门组件。 RF快门组件可以在处理期间减少基板和阴影框架下方的等离子体蠕变的量，从而减少在不期望的表面上发生的沉积量。通过减少不期望的表面上的沉积量，可能会降低颗粒剥落，从而可能降低底物污染。

59. 发明申请

US20080187682A1 PREVENTION OF FILM DEPOSITION ON PECVD PROCESS CHAMBER WALL 有权
标题翻译：防止膜电沉积在PECVD工艺室壁上
公开(公告)号：US20080187682A1
公开(公告)日：2008-08-07
申请号：US11955575
申请日：2007-12-13
申请人： Beom Soo Park , Robin L. Tiner , Soo Young Choi , John M. White
发明人： Beom Soo Park , Robin L. Tiner , Soo Young Choi , John M. White
IPC分类号： C23C16/513 , C23C16/00
CPC分类号： C23C16/4401 , C23C16/5096 , H01J37/32623 , H01J37/32697
摘要： A method and apparatus for processing a substrate are provided. The chamber body comprises a chamber bottom and a sidewall having a slit valve. A substrate support comprising a support body is disposed in the chamber body. A first end of at least one wide RF ground strap is coupled with the support body and a second end of at least one RF ground strap is coupled with the chamber bottom. At least one extension bar is positioned along a peripheral edge of the support body. The method comprises providing a processing chamber having a slit valve and a substrate support, providing RF power to a distribution plate disposed over the substrate support, flowing gas through the distribution plate, plasma processing a substrate disposed on the substrate support, and reducing the generation of plasma adjacent to the slit valve.
摘要翻译：提供了一种用于处理衬底的方法和设备。腔室主体包括腔室底部和具有狭缝阀的侧壁。包括支撑体的基板支撑件设置在室主体中。至少一个宽RF接地带的第一端与支撑体耦合，并且至少一个RF接地带的第二端与腔室底部联接。至少一个延伸杆沿着支撑体的外围边缘定位。该方法包括提供具有狭缝阀和衬底支撑件的处理室，向布置在衬底支撑件上方的分配板提供RF功率，使气体流过分布板，等离子体处理设置在衬底支架上的衬底，并减少发电的等离子体。

60. 发明授权

US09580804B2 Diffuser support 有权
标题翻译：扩散器支持
公开(公告)号：US09580804B2
公开(公告)日：2017-02-28
申请号：US12749172
申请日：2010-03-29
申请人： John M. White , Robin L. Tiner , Yeh Kurt Chang
发明人： John M. White , Robin L. Tiner , Yeh Kurt Chang
IPC分类号： C23C16/00 , C23F1/00 , H01L21/306 , C23C16/455
CPC分类号： C23C16/45565
摘要： Embodiments of gas distribution apparatus comprise a diffuser support member coupled to a diffuser and movably disposed through a backing plate. Embodiments of methods of processing a substrate on a substrate receiving surface of a substrate support comprise providing a diffuser in which a diffuser support member supports the diffuser and is movably disposed through the backing plate.
摘要翻译：气体分配装置的实施例包括连接到扩散器并可移动地设置穿过背板的扩散器支撑构件。在衬底支撑件的衬底接收表面上处理衬底的方法的实施例包括提供扩散器，漫射器支撑构件支撑扩散器并且可移动地设置穿过背板。

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