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    • 1. 发明申请
    • DIFFUSER GRAVITY SUPPORT
    • DIFFUSER GRAVITY支持
    • US20090007846A1
    • 2009-01-08
    • US12234359
    • 2008-09-19
    • ERNST KELLERJohn M. WhiteRobin L. TinerJiri KuceraSoo Young ChoiBeom Soo ParkMichael Starr
    • ERNST KELLERJohn M. WhiteRobin L. TinerJiri KuceraSoo Young ChoiBeom Soo ParkMichael Starr
    • C23C16/00
    • H01J37/3244C23C16/45565
    • An apparatus and method for supporting a substantial center portion of a gas distribution plate is disclosed. At least one support member is capable of engaging and disengaging the diffuser with a mating connection without prohibiting flow of a gas or gases through the diffuser and is designed to provide vertical suspension to a diffuser that is supported at its perimeter, or capable of supporting the diffuser without a perimeter support. In one aspect, the at least one support member is a portion of a gas delivery conduit and in another embodiment is a plurality of support members separated from the gas delivery conduit. The at least one support member is capable of translating vertical lift, or vertical compression to a center area of the diffuser. A method and apparatus for controlling gas flow from the gas delivery conduit to the gas distribution plate is also disclosed.
    • 公开了一种用于支撑气体分布板的大部分中心部分的装置和方法。 至少一个支撑构件能够通过配合连接件接合和分离扩散器,而不阻止气体或气体流过扩散器,并且被设计成向在其周边支撑的扩散器提供垂直悬架,或者能够支撑 扩散器没有周界支撑。 在一个方面,所述至少一个支撑构件是气体输送导管的一部分,并且在另一个实施例中是与气体输送导管分离的多个支撑构件。 至少一个支撑构件能够将垂直升降或垂直压缩平移到扩散器的中心区域。 还公开了一种用于控制从气体输送管道到气体分配板的气流的方法和装置。
    • 2. 发明授权
    • Diffuser gravity support
    • 扩散器重力支撑
    • US08075690B2
    • 2011-12-13
    • US12234359
    • 2008-09-19
    • Ernst KellerJohn M. WhiteRobin L. TinerJiri KuceraSoo Young ChoiBeom Soo ParkMichael Starr
    • Ernst KellerJohn M. WhiteRobin L. TinerJiri KuceraSoo Young ChoiBeom Soo ParkMichael Starr
    • C23C16/455C23F1/00H01L21/306C23C16/06C23C16/22
    • H01J37/3244C23C16/45565
    • An apparatus and method for supporting a substantial center portion of a gas distribution plate is disclosed. At least one support member is capable of engaging and disengaging the diffuser with a mating connection without prohibiting flow of a gas or gases through the diffuser and is designed to provide vertical suspension to a diffuser that is supported at its perimeter, or capable of supporting the diffuser without a perimeter support. In one aspect, the at least one support member is a portion of a gas delivery conduit and in another embodiment is a plurality of support members separated from the gas delivery conduit. The at least one support member is capable of translating vertical lift, or vertical compression to a center area of the diffuser. A method and apparatus for controlling gas flow from the gas delivery conduit to the gas distribution plate is also disclosed.
    • 公开了一种用于支撑气体分布板的大部分中心部分的装置和方法。 至少一个支撑构件能够通过配合连接件接合和分离扩散器,而不阻止气体或气体流过扩散器,并且被设计成向在其周边支撑的扩散器提供垂直悬架,或者能够支撑 扩散器没有周界支撑。 在一个方面,所述至少一个支撑构件是气体输送导管的一部分,并且在另一个实施例中是与气体输送导管分离的多个支撑构件。 至少一个支撑构件能够将垂直升降或垂直压缩平移到扩散器的中心区域。 还公开了一种用于控制从气体输送管道到气体分配板的气流的方法和装置。
    • 3. 发明授权
    • Diffuser gravity support
    • 扩散器重力支撑
    • US07429410B2
    • 2008-09-30
    • US11188922
    • 2005-07-25
    • Ernst KellerJohn M. WhiteRobin L. TinerJiri KuceraSoo Young ChoiBeom Soo ParkMichael Starr
    • Ernst KellerJohn M. WhiteRobin L. TinerJiri KuceraSoo Young ChoiBeom Soo ParkMichael Starr
    • H05H1/24
    • H01J37/3244C23C16/45565
    • An apparatus and method for supporting a substantial center portion of a gas distribution plate is disclosed. At least one support member is capable of engaging and disengaging the diffuser with a mating connection without prohibiting flow of a gas or gasses through the diffuser and is designed to provide vertical suspension to a diffuser that is supported at its perimeter, or capable of supporting the diffuser without a perimeter support. In one aspect, the at least one support member is a portion of a gas delivery conduit and in another embodiment is a plurality of support members separated from the gas delivery conduit. The at least one support member is capable of translating vertical lift, or vertical compression to a center area of the diffuser. A method and apparatus for controlling gas flow from the gas delivery conduit to the gas distribution plate is also disclosed.
    • 公开了一种用于支撑气体分布板的大部分中心部分的装置和方法。 至少一个支撑构件能够通过配合连接件接合和分离扩散器,而不阻止气体或气体流过扩散器,并且被设计成向在其周边支撑的扩散器提供垂直悬架,或者能够支撑 扩散器没有周界支撑。 在一个方面,所述至少一个支撑构件是气体输送导管的一部分,并且在另一个实施例中是与气体输送导管分离的多个支撑构件。 至少一个支撑构件能够将垂直升降或垂直压缩平移到扩散器的中心区域。 还公开了一种用于控制从气体输送管道到气体分配板的气流的方法和装置。
    • 4. 发明申请
    • Diffuser gravity support
    • 扩散器重力支撑
    • US20060060138A1
    • 2006-03-23
    • US11188922
    • 2005-07-25
    • Ernst KellerJohn M. WhiteRobin TinerJiri KuceraSoo ChoiBeom ParkMichael Starr
    • Ernst KellerJohn M. WhiteRobin TinerJiri KuceraSoo ChoiBeom ParkMichael Starr
    • C23C16/00
    • H01J37/3244C23C16/45565
    • An apparatus and method for supporting a substantial center portion of a gas distribution plate is disclosed. At least one support member is capable of engaging and disengaging the diffuser with a mating connection without prohibiting flow of a gas or gasses through the diffuser and is designed to provide vertical suspension to a diffuser that is supported at its perimeter, or capable of supporting the diffuser without a perimeter support. In one aspect, the at least one support member is a portion of a gas delivery conduit and in another embodiment is a plurality of support members separated from the gas delivery conduit. The at least one support member is capable of translating vertical lift, or vertical compression to a center area of the diffuser. A method and apparatus for controlling gas flow from the gas delivery conduit to the gas distribution plate is also disclosed.
    • 公开了一种用于支撑气体分布板的大部分中心部分的装置和方法。 至少一个支撑构件能够通过配合连接件接合和分离扩散器,而不阻止气体或气体流过扩散器,并且被设计成向在其周边支撑的扩散器提供垂直悬架,或者能够支撑 扩散器没有周界支撑。 在一个方面,所述至少一个支撑构件是气体输送导管的一部分,并且在另一个实施例中是与气体输送导管分离的多个支撑构件。 至少一个支撑构件能够将垂直升降或垂直压缩平移到扩散器的中心区域。 还公开了一种用于控制从气体输送管道到气体分配板的气流的方法和装置。
    • 5. 发明申请
    • Substrate temperature regulating support pins
    • 基板温度调节支脚
    • US20070040041A1
    • 2007-02-22
    • US11206650
    • 2005-08-18
    • Hien-Minh LeMichael Starr
    • Hien-Minh LeMichael Starr
    • G05D23/12F25D23/12
    • G05D23/121
    • A method and apparatus for regulating the temperature of substrates positioned within a chamber are provided. In one embodiment, a substrate support pin is provided that includes a body having a substrate support region defined at a first end and a mounting region defined at a second end of the body. A mounting feature is formed at the mounting region and is adapted to couple the body to a vacuum chamber body. A passage extends from the mounting region to the support region. An outlet formed through the body and orientated at an angle greater than zero relative to a centerline of the body is p provided to deliver fluids flowing through the passage out the first end of the body. In another embodiment, a chamber includes a pin configured to provide a temperature controlled fluid to an underside of a substrate supported on the pin.
    • 提供了一种用于调节位于腔室内的衬底的温度的方法和装置。 在一个实施例中,提供了一种衬底支撑销,其包括具有限定在第一端处的衬底支撑区域和限定在身体的第二端处的安装区域的主体。 安装特征形成在安装区域处,并且适于将主体连接到真空室主体。 通道从安装区域延伸到支撑区域。 提供通过本体形成的并且相对于主体的中心线以大于零的角度定向的出口,以将流过通道的流体输送出身体的第一端。 在另一个实施例中,腔室包括构造成将温度控制的流体提供给支撑在销上的衬底的下侧的销。