专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

51. 发明申请

US20060145274A1 NFETs using gate induced stress modulation 审中-公开
公开(公告)号：US20060145274A1
公开(公告)日：2006-07-06
申请号：US11365502
申请日：2006-03-02
申请人： Dureseti Chidambarrao , Omer Dokumaci , Oleg Gluschenkov
发明人： Dureseti Chidambarrao , Omer Dokumaci , Oleg Gluschenkov
IPC分类号： H01L29/94
CPC分类号： H01L29/7842 , H01L21/823807 , H01L21/823828
摘要： A method for manufacturing an integrated circuit comprising a plurality of semiconductor devices including an n-type field effect transistor and a p-type field effect transistor by covering the p-type field effect transistor with a mask, and oxidizing a portion of a gate polysilicon of the n-type field effect transistor, such that tensile mechanical stresses are formed within a channel of the n-type field effect transistor.

52. 发明申请

US20060124993A1 SIDEWALL SEMICONDUCTOR TRANSISTORS 有权
标题翻译：端子半导体晶体管
公开(公告)号：US20060124993A1
公开(公告)日：2006-06-15
申请号：US10905041
申请日：2004-12-13
申请人： Huilong Zhu , Lawrence Clevenger , Omer Dokumaci , Kaushik Kumar , Carl Radens , Dureseti Chidambarrao
发明人： Huilong Zhu , Lawrence Clevenger , Omer Dokumaci , Kaushik Kumar , Carl Radens , Dureseti Chidambarrao
IPC分类号： H01L29/76
CPC分类号： H01L29/785 , H01L29/1083 , H01L29/66795
摘要： A novel transistor structure and method for fabricating the same. The transistor structure comprises (a) a substrate and (b) a semiconductor region, a gate dielectric region, and a gate region on the substrate, wherein the gate dielectric region is sandwiched between the semiconductor region and the gate region, wherein the semiconductor region is electrically insulated from the gate region by the gate dielectric region, wherein the semiconductor region comprises a channel region and first and second source/drain regions, wherein the channel region is sandwiched between the first and second source/drain regions, wherein the first and second source/drain regions are aligned with the gate region, wherein the channel region and the gate dielectric region (i) share an interface surface which is essentially perpendicular to a top surface of the substrate, and (ii) do not share any interface surface that is essentially parallel to a top surface of the substrate.
摘要翻译：一种新颖的晶体管结构及其制造方法。晶体管结构包括（a）衬底和（b）衬底上的半导体区域，栅极介电区域和栅极区域，其中栅极电介质区域夹在半导体区域和栅极区域之间，其中半导体区域通过所述栅极电介质区域与所述栅极区域电绝缘，其中所述半导体区域包括沟道区域和第一和第二源极/漏极区域，其中所述沟道区域夹在所述第一和第二源极/漏极区域之间，其中所述第一和/ 第二源极/漏极区域与栅极区域对准，其中沟道区域和栅极电介质区域（i）共享基本上垂直于衬底顶表面的界面，以及（ii）不共享任何界面表面其基本上平行于衬底的顶表面。

53. 发明授权

US07045873B2 Dynamic threshold voltage MOSFET on SOI 有权
标题翻译： SOI上的动态阈值电压MOSFET
公开(公告)号：US07045873B2
公开(公告)日：2006-05-16
申请号：US10728750
申请日：2003-12-08
申请人： Xiangdong Chen , Dureseti Chidambarrao , Geng Wang
发明人： Xiangdong Chen , Dureseti Chidambarrao , Geng Wang
IPC分类号： H01L29/00
CPC分类号： H01L29/783
摘要： Provision of a body control contact adjacent a transistor and between the transistor and a contact to the substrate or well in which the transistor is formed allows connection and disconnection of the substrate of the transistor to and from a zero (ground) or substantially arbitrary low voltage in accordance with control signals applied to the gate of the transistor to cause the transistor to exhibit a variable threshold which maintains good performance at low supply voltages and reduces power consumption/dissipation which is particularly advantageous in portable electronic devices. Floating body effects (when the transistor substrate in disconnected from a voltage source in the “on” state) are avoided since the substrate is discharged when the transistor is switched to the “off” state. The transistor configuration can be employed with both n-type and p-type transistors which may be in complementary pairs.
摘要翻译：提供与晶体管相邻并且晶体管与形成晶体管的衬底或阱的接触之间的身体控制接触允许晶体管的衬底与零（接地）或基本上任意的低电压的连接和断开根据施加到晶体管的栅极的控制信号，使晶体管呈现可变阈值，其在低电源电压下保持良好的性能，并降低了在便携式电子设备中特别有利的功耗/耗散。避免浮体效应（当晶体管基板与电压源处于“导通”状态断开时），因为当晶体管切换到“关闭”状态时，衬底被放电。晶体管配置可以与可以互补对的n型和p型晶体管一起使用。

54. 发明申请

US20060091442A1 Out of the box vertical transistor for eDRAM on SOI 失效
公开(公告)号：US20060091442A1
公开(公告)日：2006-05-04
申请号：US11298800
申请日：2005-12-09
申请人： James Adkisson , Gary Bronner , Dureseti Chidambarrao , Ramachandra Divakaruni , Carl Radens
发明人： James Adkisson , Gary Bronner , Dureseti Chidambarrao , Ramachandra Divakaruni , Carl Radens
IPC分类号： H01L29/94
CPC分类号： H01L27/10841 , H01L27/10864 , H01L27/10867
摘要： The present invention provides a vertical memory device formed in a silicon-on-insulator substrate, where a bitline contacting the upper surface of the silicon-on-insulator substrate is electrically connected to the vertical memory device through an upper strap diffusion region formed through a buried oxide layer. The upper strap diffusion region is formed by laterally etching a portion of the buried oxide region to produce a divot, in which doped polysilicon is deposited. The upper strap region diffusion region also provides the source for the vertical transistor of the vertical memory device. The vertical memory device may also be integrated with a support region having logic devices formed atop the silicon-on-insulator substrate.

55. 发明授权

US07037770B2 Method of manufacturing strained dislocation-free channels for CMOS 有权
标题翻译：制造用于CMOS的应变无位错通道的方法
公开(公告)号：US07037770B2
公开(公告)日：2006-05-02
申请号：US10687608
申请日：2003-10-20
申请人： Dureseti Chidambarrao , Omer H. Dokumaci
发明人： Dureseti Chidambarrao , Omer H. Dokumaci
IPC分类号： H01L21/00
CPC分类号： H01L29/1054 , H01L21/823807 , H01L21/84 , H01L27/1203 , H01L29/66621 , Y10S438/933
摘要： A semiconductor device and method of manufacturing a semiconductor device. The semiconductor device includes channels for a pFET and an nFET. An SiGe layer is grown in the channel of the nFET channel and a Si:C layer is grown in the pFET channel. The SiGe and Si:C layer match a lattice network of the underlying Si layer to create a stress component in an overlying grown epitaxial layer. In one implementation, this causes a compressive component in the pFET channel and a tensile component in the nFET channel. In a further implementation, the SiGe layer is grown in both the nFET and pFET channels. In this implementation, the stress level in the pFET channel should be greater than approximately 3 GPa.
摘要翻译：半导体器件及半导体器件的制造方法。半导体器件包括用于pFET和nFET的沟道。在nFET沟道的沟道中生长SiGe层，并且在pFET沟道中生长Si：C层。 SiGe和Si：C层与下层Si层的晶格网络匹配，以在覆盖的生长的外延层中产生应力分量。在一个实现中，这导致pFET沟道中的压缩分量和nFET沟道中的拉伸分量。在另一实施方案中，SiGe层在nFET和pFET沟道中生长。在这种实现中，pFET通道中的应力水平应该大于3GPa。

56. 发明申请

US20060019458A1 CREATING INCREASED MOBILITY IN A BIPOLAR DEVICE 失效
标题翻译：在双极设备中创建增加的移动性
公开(公告)号：US20060019458A1
公开(公告)日：2006-01-26
申请号：US10710548
申请日：2004-07-20
申请人： Dureseti Chidambarrao , Gregory Freeman , Marwan Khater
发明人： Dureseti Chidambarrao , Gregory Freeman , Marwan Khater
IPC分类号： H01L21/331 , H01L21/8222
CPC分类号： H01L29/66242 , H01L29/0804 , H01L29/0821 , H01L29/1004 , H01L29/41708 , H01L29/42304 , H01L29/66272 , H01L29/732 , H01L29/7378
摘要： The mobility of charge carriers in a bipolar (BJT) device is increased by creating compressive strain in the device to increase mobility of electrons in the device, and creating tensile strain in the device to increase mobility of holes in the device. The compressive and tensile strain are created by applying a stress film adjacent an emitter structure of the device and atop a base film of the device. In this manner, the compressive and tensile strain are located in close proximity to an intrinsic portion of the device. A suitable material for the stress film is nitride. The emitter structure may be “T-shaped”, having a lateral portion atop an upright portion, a bottom of the upright portion forms a contact to the base film, and the lateral portion overhangs the base film.
摘要翻译：双极（BJT）器件中的载流子的迁移率通过在器件中产生压缩应变以增加器件中电子的迁移率而增加，并且在器件中产生拉伸应变以增加器件中的孔的移动性。通过在装置的发射极结构附近施加应力膜并且在器件的基底上方施加应力膜来产生压缩和拉伸应变。以这种方式，压缩和拉伸应变位于设备本身部分附近。适用于应力膜的材料是氮化物。发射体结构可以是“T形”，其具有在直立部分顶部的侧面部分，直立部分的底部形成与基底膜的接触，并且侧向部分悬垂在基底膜上。

57. 发明申请

US20050269561A1 Strained Si on multiple materials for bulk or SOI substrates 有权
标题翻译：应变Si在多种材料上用于体或SOI衬底
公开(公告)号：US20050269561A1
公开(公告)日：2005-12-08
申请号：US10859736
申请日：2004-06-03
申请人： Dureseti Chidambarrao , Omer Dokumaci , Oleg Gluschenkov , Huilong Zhu
发明人： Dureseti Chidambarrao , Omer Dokumaci , Oleg Gluschenkov , Huilong Zhu
IPC分类号： H01L21/00 , H01L21/8238 , H01L21/84 , H01L27/12 , H01L29/06 , H01L29/10 , H01L29/78
CPC分类号： H01L29/78 , H01L21/823807 , H01L21/823878 , H01L21/84 , H01L27/1203 , H01L29/1054
摘要： The present invention provides a strained-Si structure, in which the nFET regions of the structure are strained in tension and the pFET regions of the structure are strained in compression. Broadly the strained-Si structure comprises a substrate, a first layered stack atop the substrate, the first layered stack comprising a first Si-containing portion of the substrate, a compressive layer atop the Si-containing portion of the substrate, and a semiconducting silicon layer atop the compressive layer; and a second layered stack atop the substrate, the second layered stack comprising a second-silicon containing layer portion of the substrate, a tensile layer atop the second Si-containing portion of the substrate, and a second semiconducting silicon-layer atop the tensile layer.
摘要翻译：本发明提供一种应变Si结构，其中该结构的nFET区域被拉紧并且该结构的pFET区域被压缩而变形。广义上，应变Si结构包括衬底，在衬底顶部的第一层叠堆叠，第一层叠堆叠包括衬底的第一含Si部分，衬底的含Si部分顶部的压缩层和半导体硅层在压缩层顶上; 以及在所述衬底顶部的第二层叠叠层，所述第二层叠堆叠包括所述衬底的第二硅含有层部分，在所述衬底的所述第二含Si部分顶部的拉伸层，以及在所述拉伸层顶部的第二半导体硅层。

58. 发明申请

US20050148133A1 Method of making strained channel CMOS transistors having lattice-mismatched epitaxial 有权
标题翻译：制造具有晶格失配外延的应变通道CMOS晶体管的方法
公开(公告)号：US20050148133A1
公开(公告)日：2005-07-07
申请号：US11052675
申请日：2005-02-07
申请人： Huaje Chen , Dureseti Chidambarrao , Omer Dokumaci , Haining Yang
发明人： Huaje Chen , Dureseti Chidambarrao , Omer Dokumaci , Haining Yang
IPC分类号： H01L21/265 , H01L21/336 , H01L21/8238 , H01L29/78 , H01L29/00
CPC分类号： H01L29/6653 , H01L21/26586 , H01L21/823807 , H01L21/823814 , H01L21/823835 , H01L21/823864 , H01L29/665 , H01L29/6656 , H01L29/7833 , H01L29/7848
摘要： A method is provided in which an n-type field effect transistor (NFET) and a p-type field effect transistor (PFET) each have a channel region disposed in a first single-crystal semiconductor region having a first composition. A stress is applied at a first magnitude to a channel region of the PFET but not at that magnitude to the channel region of the NFET. The stress is applied by a single-crystal semiconductor layer having a second composition such that the single-crystal semiconductor layer is lattice-mismatched to the first region. The semiconductor layer is formed over the source and drain regions and optionally over the extension regions of the PFET at a first distance from the channel region of the PFET and is formed over the source and drain regions of the NFET at a second, greater distance from the channel region of the NFET, or the semiconductor layer having the second composition is not formed at all in the NFET.
摘要翻译：提供一种方法，其中n型场效应晶体管（NFET）和p型场效应晶体管（PFET）各自具有设置在具有第一组成的第一单晶半导体区域中的沟道区。应力以第一幅度施加到PFET的沟道区，但不以该尺寸施加到NFET的沟道区。应力由具有第二组成的单晶半导体层施加使得单晶半导体层与第一区域晶格失配。半导体层形成在源极和漏极区域上，并且任选地在距离PFET的沟道区第一距离处的PFET的延伸区域上方形成，并且形成在NFET的源极和漏极区域之上，距离 NFET的沟道区域或具有第二组成的半导体层完全不形成在NFET中。

59. 发明申请

US20050142700A1 Strained silicon on a SiGe on SOI substrate 有权
标题翻译： SOI衬底上的SiGe上的应变硅
公开(公告)号：US20050142700A1
公开(公告)日：2005-06-30
申请号：US11061444
申请日：2005-02-22
申请人： Kangguo Cheng , Dureseti Chidambarrao
发明人： Kangguo Cheng , Dureseti Chidambarrao
IPC分类号： H01L21/20 , H01L21/336 , H01L21/762 , H01L29/10 , H01L29/786 , H01L21/00 , C30B1/00 , H01L21/36 , H01L21/76 , H01L21/84
CPC分类号： H01L29/78687 , H01L21/02381 , H01L21/02532 , H01L21/02658 , H01L21/2007 , H01L21/76251 , H01L29/1054 , H01L29/66742 , H01L29/78603 , Y10S438/933
摘要： A semiconductor device with an undercut relaxed SiGe layer having voids beneath the SiGe layer. The voids may be filled with a dielectric such as SiO2. A strained Si layer may be epitaxially grown on the relaxed SiGe layer to combine the benefits of a defect-free strained Si surface and a silicon-on-insulator substrate. The relaxed SiGe layer may be relatively thin, with a thickness below the critical thickness. Thus, the structure accommodates shallow junctions, which exhibit reduced junction capacitance.
摘要翻译：具有在SiGe层下面具有空隙的底切弛豫SiGe层的半导体器件。空隙可以用诸如SiO 2的电介质填充。可以在松弛的SiGe层上外延生长应变Si层，以结合无缺陷应变Si表面和绝缘体上硅衬底的优点。松弛的SiGe层可以相对薄，厚度低于临界厚度。因此，该结构容纳浅结，这表现出减小的结电容。

60. 发明申请

US20050139930A1 Strained dislocation-free channels for CMOS and method of manufacture 有权
标题翻译：用于CMOS的应变无位错通道和制造方法
公开(公告)号：US20050139930A1
公开(公告)日：2005-06-30
申请号：US11061445
申请日：2005-02-22
申请人： Dureseti Chidambarrao , Omer Dokumaci
发明人： Dureseti Chidambarrao , Omer Dokumaci
IPC分类号： H01L20060101 , H01L21/00 , H01L21/8238 , H01L21/84 , H01L27/12 , H01L29/04 , H01L31/036 , H01R4/64
CPC分类号： H01L29/1054 , H01L21/823807 , H01L21/84 , H01L27/1203 , H01L29/66621 , Y10S438/933
摘要： A semiconductor device and method of manufacturing a semiconductor device. The semiconductor device includes channels for a pFET and an nFET. An SiGe layer is grown in the channel of the nFET channel and a Si:C layer is grown in the pFET channel. The SiGe and Si:C layer match a lattice network of the underlying Si layer to create a stress component in an overlying grown epitaxial layer. In one implementation, this causes a compressive component in the pFET channel and a tensile component in the nFET channel. In a further implementation, the SiGe layer is grown in both the nFET and pFET channels. In this implementation, the stress level in the pFET channel should be greater than approximately 3 GPa.
摘要翻译：半导体器件及半导体器件的制造方法。半导体器件包括用于pFET和nFET的沟道。在nFET沟道的沟道中生长SiGe层，并且在pFET沟道中生长Si：C层。 SiGe和Si：C层与下层Si层的晶格网络匹配，以在覆盖的生长的外延层中产生应力分量。在一个实现中，这导致pFET沟道中的压缩分量和nFET沟道中的拉伸分量。在另一实施方案中，SiGe层在nFET和pFET沟道中生长。在这种实现中，pFET通道中的应力水平应该大于3GPa。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式