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    • 47. 发明申请
    • Cerium oxide sol and abrasive
    • 氧化铈溶胶和磨料
    • US20020086618A1
    • 2002-07-04
    • US10015675
    • 2001-12-17
    • NISSAN CHEMICAL INDUSTRIES, LTD.
    • Isao OtaKenji TanimotoTohru Nishimura
    • B24B001/00
    • B82Y30/00C01F17/0043C01P2002/01C01P2002/72C01P2004/10C01P2004/61C01P2004/62C01P2004/64C01P2006/12C09G1/02C09K3/1472
    • There is provided an abrasive used for polishing a substrate which comprises silica as a main component, for example a rock crystal, a quartz glass for photomask, for CMP of an organic film, Inter Layer Dielectric (ILD) and shallow trench isolation of a semiconductor device, or for polishing a hard disk made of glass. A sol which particles are dispersed in a medium, wherein the particles have a particle size of 0.005 to 1 nullm and comprise as a main component crystalline cerium oxide of the cubic system and as an additional component a lanthanum compound, a neodymium compound or a combination thereof, wherein the additional component is contained in X/(CenullX) molar ratio of 0.001 to 0.5 in which X is lanthanum atoms, neodymium atoms or a combination thereof. The sol is prepared by reacting an aqueous solution which a cerium (III) salt is mixed with a lanthanum (III) salt and/or a neodymium (III) salt, with an alkaline substance to give a suspension in which cerium (III) hydroxide is homogeneously mixed with lanthanum (III) hydroxide and/or neodymium (III) hydroxide, and blowing oxygen or a gas containing oxygen into the suspension.
    • 提供了用于抛光基底的磨料,其包括二氧化硅作为主要成分,例如岩石晶体,用于光掩模的石英玻璃,用于有机膜的CMP,层间介电(ILD)和半导体的浅沟槽隔离 装置或用于抛光由玻璃制成的硬盘。 一种溶胶,其中颗粒分散在介质中,其中颗粒的粒度为0.005-1μm,并且包含作为主要组分的立方晶系的结晶二氧化铈,并且作为附加组分的镧化合物,钕化合物或组合 其中所述附加成分以X =(Ce + X)摩尔比为0.001〜0.5,X为镧原子,钕原子或其组合。 通过使铈(III)盐与镧(III)盐和/或钕(III)盐混合的水溶液与碱性物质反应制备溶胶,得到悬浮液,其中氢氧化铈(III) 与氢氧化镧(III)和/或氢氧化钕(III)均匀混合,并将氧气或含有氧的气体吹入悬浮液中。