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41. 发明授权

US5274557A Teaching and playback method for work machine 失效
标题翻译：作业机器教学与播放方法
公开(公告)号：US5274557A
公开(公告)日：1993-12-28
申请号：US720502
申请日：1991-07-29
申请人： Yukio Moriya , Toshio Yokoyama , Fujitoshi Takamura , Takumi Onoda
发明人： Yukio Moriya , Toshio Yokoyama , Fujitoshi Takamura , Takumi Onoda
IPC分类号： E02F9/20 , E02F3/43 , E02F9/22 , F15B21/02 , G05D3/12 , G06F15/20
CPC分类号： E02F3/438 , E02F9/2296
摘要： A teaching and playback method for a work machine that is applicable to construction equipment such as a hydraulic excavator to automatize operation. Data on the operator's operation of work machine actuators is stored, and the stored data is reproduced so that the same operation as that by the operator is automatically performed. The method is adapted to effect exactly the same operation as what has been taught even when, during playback, the load on the actuators has varied from the level applied during the teaching. For this purpose, the pump discharge amount and the amounts of flow supplied to the actuators which are present during the teaching are stored. During playback, when the load has varied, and the pump discharge has changed, the engine output is controlled in such a manner that the actual pump discharge becomes equal to the amount stored during the teaching. When the flows supplied to the actuators have changed, the flow control valve provided in an inflow circuit is controlled in such a manner that the actual flows become equal to the amounts stored during the teaching. Thus, even when the load during playback has varied from the level during the teaching, the actuators can operate exactly as taught, without involving a discrepancy in the locus of operation.
摘要翻译： PCT No.PCT / JP89 / 01270 Sec。 371日期1991年7月29日 102（e）日期1991年7月29日PCT 1989年12月18日PCT PCT。出版物WO90 / 07032 日期：1990年6月28日。一种适用于液压挖掘机等施工设备自动化操作的作业机械的教学播放方法。存储有关作业机械执行器的操作者的操作的数据，并且再现存储的数据，从而自动执行与操作者相同的操作。该方法适于实现与所教导的完全相同的操作，即使在播放期间，致动器上的负载与在教学期间施加的水平不同。为此，存储泵排出量和供给到执行器期间的流量。在重放期间，当负载变化并且泵排放改变时，发动机输出被控制为使得实际的泵排出量等于在教学期间存储的量。当提供给致动器的流动已经改变时，设置在流入回路中的流量控制阀被控制为使得实际流量变得等于在教学期间存储的量。因此，即使在回放期间的负载与教学期间的水平不同，致动器可以如所教导的那样精确地操作，而不涉及操作轨迹的差异。

42. 发明授权

US5197860A Hydraulic apparatus for construction machines 失效
标题翻译：液压装置用于建筑机械
公开(公告)号：US5197860A
公开(公告)日：1993-03-30
申请号：US391557
申请日：1989-07-27
申请人： Kimio Nishida , Toshio Yokoyama , Yukio Moriya , Takeshi Kobayashi
发明人： Kimio Nishida , Toshio Yokoyama , Yukio Moriya , Takeshi Kobayashi
IPC分类号： F04B49/00 , F02D29/04 , F04B49/06 , F04B49/20
CPC分类号： F04B49/20 , F04B49/065 , F04B2203/0605 , F04B2205/05
摘要： A hydraulic apparatus for a construction machine, which is adapted to prevent the number of revolutions of an engine from increasing when the flow of the fluid discharged by a variable displacement hydraulic pump driven by the engine is cut off. The hydraulic apparatus comprises a proportional solenoid (11) connected to a fuel supply control lever (13) so as to vary the horsepower characteristics of the engine, which are set by the action of a governor (12) based on manipulated variable of the fuel supply control lever (13) when the flow of the fluid discharged by said pump is cut off, and a controller (10) for controlling the proportional solenoid (11). In this apparatus, a decrement (.DELTA.Nr) in a target number of revolutions per minute (Nr) of the engine, which can be obtained by subtracting a target number of revolutions per minute (Nrb) of the engine at the desired engine horsepower characteristics (l.sub.2) from a target number of revolutions per minute (Nra) at the initial engine horsepower characteristics (l.sub.1) is computed, and said proportional solenoid (11) is operated in accordance with this decrement.

43. 发明授权

US4808934A Position sensor for detecting angular position 失效
标题翻译：用于检测角位置的位置传感器
公开(公告)号：US4808934A
公开(公告)日：1989-02-28
申请号：US27831
申请日：1987-03-19
申请人： Toshio Yokoyama , Iwao Shimane , Tsuneo Konno
发明人： Toshio Yokoyama , Iwao Shimane , Tsuneo Konno
IPC分类号： F02P7/067 , G01D5/14 , G01B7/30
CPC分类号： F02P7/0677 , G01D5/14
摘要： A light, compact angle-of-rotation sensor is comprised of a magnetic ring within which resin is used to fix the ring to the periphery of a shaft. Formed on the magnetic ring are insets into which the resin enters, providing a strong bond between the resin and the magnetic ring. In addition, a key inset into the shaft provides a strong bond between the resin and the shaft. Magnetized zones are formed on the outer surface of the magnetic ring, and magneto electric transducer means are arranged in the proximity of these zones to face said zones, and the angle of rotation is detected from the changes in magnetism that accompany the rotation.
摘要翻译：一个轻巧紧凑的转角传感器由一个磁环组成，在该环内使用树脂将环固定在轴的周边。在磁环上形成有树脂进入的插入件，树脂和磁环之间形成牢固的结合。此外，轴中的一个关键插入物提供了树脂和轴之间的牢固结合。磁性区域形成在磁环的外表面上，并且磁电换能器装置布置在这些区域附近以面对所述区域，并且根据伴随旋转的磁力变化来检测旋转角度。

44. 发明授权

US4796354A Method of manufacturing a position sensor for detecting angular position 失效
标题翻译：制造用于检测角位置的位置传感器的方法
公开(公告)号：US4796354A
公开(公告)日：1989-01-10
申请号：US27832
申请日：1987-03-19
申请人： Toshio Yokoyama , Iwao Shimane , Tsuneo Konno
发明人： Toshio Yokoyama , Iwao Shimane , Tsuneo Konno
IPC分类号： G01B7/00 , B29C45/14 , B29C70/84 , G01B7/30 , G01D5/245 , G01P3/487 , H03M1/24 , H01F41/02
CPC分类号： H03M1/245 , B29C45/14491 , B29C70/84 , B29C45/14622 , Y10T29/49012 , Y10T29/49075 , Y10T29/49076
摘要： A method of manufacturing an angle-of-rotation sensor comprises fabricating a rotating member by providing a shaft coaxially inside a magnetic ring made of ferrite magnetic material or the like, and filling the space between shaft and ring with resin. As the resin is first provided on the outer surface of the magnetic ring, then in the interior, a balance is achieved between tensile stress from within the ring and compressive stress from the outside of the ring, and as a result the ring is not broken or cracked. Thus, with this method it is possible to make the angle-of-rotation sensor small and light.
摘要翻译：制造旋转角度传感器的方法包括通过在由铁氧体磁性材料等制成的磁环内同轴地设置轴并且用树脂填充轴和环之间的空间来制造旋转构件。由于首先将树脂设置在磁环的外表面上，所以在内部，在环内的拉伸应力与来自环外部的压缩应力之间达到平衡，结果环不破裂或破裂。因此，通过这种方法，可以使旋转角度传感器变小和变小。

45. 发明授权

US4719883A Distributor 失效
标题翻译：经销商
公开(公告)号：US4719883A
公开(公告)日：1988-01-19
申请号：US39008
申请日：1987-04-15
申请人： Toshio Yokoyama , Iwao Shimane
发明人： Toshio Yokoyama , Iwao Shimane
IPC分类号： F02P7/04 , F02P7/02 , F02P7/07 , H01R39/00
CPC分类号： F02P7/07 , F02P7/021
摘要： A distributor accommodates an angle-of-rotation sensor having a magnetic rotating member which is provided to detect the crank angles in an internal combustion engine. The air vent of the distributor is provided with a magnetic trap means that collects any ferrous particles and other such dust in air drawn into the distributor from the outside, preventing such particles adhering to the magnetic rotating member and producing otherwise detection output errors.
摘要翻译：分配器容纳旋转角度传感器，其具有设置用于检测内燃机中的曲柄角的磁旋转部件。分配器的通风口设置有磁捕集装置，其从外部收集从分配器吸入的空气中的任何铁质颗粒和其它这样的灰尘，防止这些颗粒粘附到磁性旋转构件并产生另外的检测输出误差。

46. 发明申请

US20110237163A1 SUBSTRATE POLISHING APPARATUS AND METHOD 审中-公开
标题翻译：基板抛光装置和方法
公开(公告)号：US20110237163A1
公开(公告)日：2011-09-29
申请号：US13152374
申请日：2011-06-03
申请人： Seiji Katsuoka , Masahiko Sekimoto , Junji Kunisawa , Mitsuru Miyazaki , Teruyuki Watanabe , Kenichi Kobayashi , Masayuki Kumekawa , Toshio Yokoyama
发明人： Seiji Katsuoka , Masahiko Sekimoto , Junji Kunisawa , Mitsuru Miyazaki , Teruyuki Watanabe , Kenichi Kobayashi , Masayuki Kumekawa , Toshio Yokoyama
IPC分类号： B24B37/04 , B24B7/24 , B24B57/00 , B24B41/06 , B24B53/00 , B24B1/00
CPC分类号： B24B37/04 , B24B55/02 , Y10S451/914
摘要： A substrate polishing apparatus includes a substrate holding mechanism having a head for holding a substrate to be polished, and a polishing mechanism including a polishing table with a polishing pad mounted thereon. The substrate held by the head is pressed against the polishing pad on the polishing table to polish the substrate by relative movement of the substrate and the polishing pad. The substrate polishing apparatus also includes a substrate transfer mechanism for delivering the substrate to be polished to the head and receiving the polished substrate. The substrate transfer mechanism includes a substrate to-be-polished receiver for receiving the substrate to be polished, and a polished substrate receiver for receiving the substrate which has been polished.
摘要翻译：一种基板研磨装置，具备：具有保持被研磨基板的头部的基板保持机构，以及具备安装有研磨垫的研磨台的研磨机构。由头部保持的基板被压靠在抛光台上的抛光垫上，以通过基板和抛光垫的相对运动来抛光基板。基板抛光装置还包括用于将要抛光的基板输送到头部并且接收经抛光的基板的基板传送机构。基板转印机构包括用于接收待抛光的基板的待抛光基板和用于接收被抛光的基板的抛光的基板接收器。

47. 发明授权

US07959977B2 Substrate processing method and apparatus 有权
标题翻译：基板加工方法及装置
公开(公告)号：US07959977B2
公开(公告)日：2011-06-14
申请号：US12771176
申请日：2010-04-30
申请人： Seiji Katsuoka , Masahiko Sekimoto , Toshio Yokoyama , Teruyuki Watanabe , Takahiro Ogawa , Kenichi Kobayashi , Mitsuru Miyazaki , Yasuyuki Motojima
发明人： Seiji Katsuoka , Masahiko Sekimoto , Toshio Yokoyama , Teruyuki Watanabe , Takahiro Ogawa , Kenichi Kobayashi , Mitsuru Miyazaki , Yasuyuki Motojima
IPC分类号： B05D3/10 , C23C18/18 , C23C18/28 , C23C18/30
CPC分类号： H01L21/68721 , C23C18/163 , C23C18/1632 , C23C18/1886 , C25D7/123 , C25D17/001 , H01L21/67126 , H01L21/67766 , Y10S134/901
摘要： A substrate processing method and apparatus can securely carry out a pre-plating treatment that enables uniform plating in the necessary area of the surface of a substrate. The substrate processing method carries out a cleaning treatment and a catalyst-imparting treatment of a surface of a substrate as pre-plating treatments and then electroless plates a metal film on the catalyst-imparted surface of the substrate. The cleaning treatment is carried out in a wider area of the surface of the substrate than that area to which a catalyst is imparted by the catalyst-imparting treatment.
摘要翻译：基板处理方法和装置可以可靠地执行能够在基板的表面的必要区域中均匀镀覆的预镀处理。基板处理方法对作为预镀处理的基板的表面进行清洗处理和催化剂赋予处理，然后在基板的赋予催化剂的表面上化学镀金属膜。在通过催化剂赋予处理赋予催化剂的区域的基板的表面的更宽的区域中进行清洗处理。

48. 发明授权

US07735451B2 Substrate processing method and apparatus 有权
标题翻译：基板加工方法及装置
公开(公告)号：US07735451B2
公开(公告)日：2010-06-15
申请号：US10712373
申请日：2003-11-14
申请人： Seiji Katsuoka , Masahiko Sekimoto , Toshio Yokoyama , Teruyuki Watanabe , Takahiro Ogawa , Kenichi Kobayashi , Mitsuru Miyazaki , Yasuyuki Motojima
发明人： Seiji Katsuoka , Masahiko Sekimoto , Toshio Yokoyama , Teruyuki Watanabe , Takahiro Ogawa , Kenichi Kobayashi , Mitsuru Miyazaki , Yasuyuki Motojima
IPC分类号： B05C21/00
CPC分类号： H01L21/68721 , C23C18/163 , C23C18/1632 , C23C18/1886 , C25D7/123 , C25D17/001 , H01L21/67126 , H01L21/67766 , Y10S134/901
摘要： A substrate processing method and apparatus can securely carry out a pre-plating treatment that enables uniform plating in the necessary area of the surface of a substrate. The substrate processing method carries out a cleaning treatment and a catalyst-imparting treatment of a surface of a substrate as pre-plating treatments and then electroless plates a metal film on the catalyst-imparted surface of the substrate. The cleaning treatment is carried out in a wider area of the surface of the substrate than that area to which a catalyst is imparted by the catalyst-imparting treatment.
摘要翻译：基板处理方法和装置可以可靠地执行能够在基板的表面的必要区域中均匀镀覆的预镀处理。基板处理方法对作为预镀处理的基板的表面进行清洗处理和催化剂赋予处理，然后在基板的赋予催化剂的表面上化学镀金属膜。在通过催化剂赋予处理赋予催化剂的区域的基板的表面的更宽的区域中进行清洗处理。

49. 发明授权

US07735450B2 Substrate holding apparatus 有权
标题翻译：基板保持装置
公开(公告)号：US07735450B2
公开(公告)日：2010-06-15
申请号：US12076834
申请日：2008-03-24
申请人： Seiji Katsuoka , Masahiko Sekimoto , Teruyuki Watanabe , Ryo Kato , Toshio Yokoyama , Kenichi Suzuki , Kenichi Kobayashi
发明人： Seiji Katsuoka , Masahiko Sekimoto , Teruyuki Watanabe , Ryo Kato , Toshio Yokoyama , Kenichi Suzuki , Kenichi Kobayashi
IPC分类号： B05C13/02
CPC分类号： H01L21/288 , C23C2/003 , C23C18/1619 , C23C18/163 , C23C18/1642 , H01L21/6708 , H01L21/67742 , H01L21/6838 , H01L21/76849
摘要： A substrate processing unit includes: a vertically-movable substrate holder for holding a substrate; a pan surrounding a periphery of the substrate holder; a cell, located below the substrate holder and within the pan, having in its interior a chemical processing section; and a cell cover, capable of closing a top opening of the cell, having a plurality of spray nozzles for separately spraying at least two types of processing liquids, wherein the pan and the cell each have an individual liquid discharge line.
摘要翻译：基板处理单元包括：用于保持基板的可垂直移动的基板保持器; 围绕衬底保持器的周边的平底锅; 位于基板保持器下方并在锅内的电池，在其内部具有化学处理部分; 以及能够封闭电池的顶部开口的电池盖，具有用于分别喷射至少两种类型的处理液体的多个喷嘴，其中锅和电池单元各自具有单独的液体排出管线。

50. 发明授权

US07442257B2 Substrate processing apparatus and substrate processing method 有权
标题翻译：基板加工装置及基板处理方法
公开(公告)号：US07442257B2
公开(公告)日：2008-10-28
申请号：US11455736
申请日：2006-06-20
申请人： Seiji Katsuoka , Masahiko Sekimoto , Toshio Yokoyama , Teruyuki Watanabe , Takahiro Ogawa , Kenichi Kobayashi , Mitsuru Miyazaki , Yasuyuki Motoshima , Akira Owatari , Naoki Dai
发明人： Seiji Katsuoka , Masahiko Sekimoto , Toshio Yokoyama , Teruyuki Watanabe , Takahiro Ogawa , Kenichi Kobayashi , Mitsuru Miyazaki , Yasuyuki Motoshima , Akira Owatari , Naoki Dai
IPC分类号： B05C13/00
CPC分类号： H01L21/67161 , C23C18/1628 , C23C18/1893 , C25D7/123 , C25D17/001 , C25D17/08 , H01L21/67051 , H01L21/67126 , H01L21/67173 , H01L21/6719 , H01L21/67196 , H01L21/6723 , H01L21/67742 , H01L21/67751 , H01L21/67766 , H01L21/67781 , H01L21/68707 , H01L21/68721 , Y10S134/902 , Y10T279/11
摘要： The present invention relates to a substrate processing apparatus useful for plating a substrate or processing a substrate by dipping a substrate in a processing liquid. A substrate processing apparatus of the present invention includes: a loading/unloading area for carrying in and out a substrate; a cleaning area for cleaning the substrate; and a plating area for plating the substrate. The loading/unloading area is provided with a substrate transfer robot having a plurality of hands of dry-use design, a loading port mounted with a cassette for housing substrates, and a reversing machine of dry-use design for reversing the substrate from face up to face down.
摘要翻译：本发明涉及通过将基板浸渍在处理液中而用于电镀基板或加工基板的基板处理装置。本发明的基板处理装置包括：用于搬入和取出基板的装载/卸载区域; 用于清洁衬底的清洁区域; 以及用于电镀基板的电镀区域。装载/卸载区域设置有具有多个干用设计的手的基板传送机器人，安装有用于容纳基板的盒的装载端口和用于将基板从面朝上翻转的干式设计的反转机面对下来

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