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    • 45. 发明申请
    • Method for manufacturing cell culture substrate
    • 细胞培养基质的制造方法
    • US20050279730A1
    • 2005-12-22
    • US11062674
    • 2005-02-22
    • Hideyuki MiyakeHideshi HattoriYoichi Takahashi
    • Hideyuki MiyakeHideshi HattoriYoichi Takahashi
    • B01L3/00B01L3/02B41J2/01B41J2/06C12N5/00
    • B01L3/0268B01L3/5085B01L2200/12B01L2300/069B01L2300/10B01L2300/1888B01L2400/0439C12M23/20C12M25/06C12N5/0068C12N2533/12C12N2535/10
    • A main object of the invention is to provide a new method for producing a cell culture substrate used to cause cells to adhere in a highly precise form onto a base material and then culture the cells. To attain the object, the invention provides a method for producing a cell culture substrate comprising: a patterning substrate forming process of forming, on a base material, a cell culture patterning layer wherein a cell adhesion portion having cell adhesive properties and a cell adhesion-inhibiting portion having cell adhesion-inhibiting properties can be formed by action of a photocatalyst by energy irradiation, thereby forming a patterning substrate; an energy irradiating process of irradiating the energy onto the cell culture patterning layer, thereby forming the cell adhesion portion and the cell adhesion-inhibiting portion in a pattern form by action of the photocatalyst; and a cell-containing liquid applying process of applying a cell-containing liquid onto the cell adhesion portion by a region-selecting applying method of applying the cell-containing liquid selectively onto the patterned cell adhesion portion.
    • 本发明的主要目的是提供一种用于生产细胞培养基质的新方法,该方法用于使细胞以高度精确的形式粘附在基材上,然后培养细胞。 为了达到上述目的,本发明提供一种细胞培养基材的制造方法,其特征在于,包括:在基材上形成细胞培养图案形成层的图案形成基板的形成工序,其中,具有细胞粘合性的细胞粘附部, 通过能量照射可以通过光催化剂的作用形成具有细胞粘附抑制特性的抑制部分,从而形成图案化衬底; 将能量照射到细胞培养图案化层上的能量照射方法,由此通过光催化剂的作用形成图案形式的细胞粘附部分和细胞粘附抑制部分; 以及通过选择性地将细胞含有液体施加到图案化细胞粘附部分上的区域选择施加方法将含细胞的液体施加到细胞粘附部分上的含细胞的液体施加方法。
    • 47. 发明授权
    • Phase shift layer-containing photomask, and its production and correction
    • 含相移层的光掩模及其生产和校正
    • US5688617A
    • 1997-11-18
    • US644856
    • 1996-05-09
    • Koichi MikamiHiroyuki MiyashitaYoichi TakahashiHiroshi FujitaMasa-aki Kurihara
    • Koichi MikamiHiroyuki MiyashitaYoichi TakahashiHiroshi FujitaMasa-aki Kurihara
    • G03F1/00G03F9/00
    • G03F1/72G03F1/26G03F1/29G03F1/30
    • The present invention relates particularly to a process for producing phase shift layer-containing photomasks, which can produce phase shift photomasks through a reduced or limited number of steps to reduce or limit the incidence of phase shifter pattern deficiencies or other defects and at lower costs as well. For instance, a photomask blank of the structure that a substrate is provided thereon with an electrically conductive layer and a light-shielding thin film in this order is used to coat a starting material for spin-on-glass uniformly on a light-shielding pattern formed thereon. A pattern is directly drawn on the coaxed-spin-on-glass layer with energy beams emanating from electron beam exposure hardware, etc., and the substrate is developed with a solvent after pattern drawing with energy beams to wash off an excessive spin-on-glass portion other than the spin-on-glass layer irradiated with the ionizing radiations. Finally, the post-development substrate is baked to form a phase shifter pattern.
    • 本发明特别涉及一种用于生产含相移层的光掩模的方法,其可以通过减少或限制数量的步骤产生相移光掩模,以减少或限制移相器图案缺陷或其它缺陷的发生,并以较低的成本 好。 例如,使用具有依次设置有导电层和遮光薄膜的基板的结构的光掩模坯料,以均匀地在遮光图案上涂布旋涂玻璃原料 形成在其上。 通过从电子束曝光硬件等发出的能量束,在哄骗的旋涂玻璃层上直接绘制图案,并且在用能量束进行图案绘制之后,用溶剂对基板进行显影,以洗涤过度旋转 除了用电离辐射照射的旋涂玻璃层以外的玻璃部分。 最后,烘烤后显影衬底以形成移相器图案。