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41. 发明申请

US20120034566A1 MICRO-CHANNEL DEVICE AND METHOD FOR FABRICATING MICRO-CHANNEL DEVICE 审中-公开
标题翻译：用于制造微通道器件的微通道器件和方法
公开(公告)号：US20120034566A1
公开(公告)日：2012-02-09
申请号：US13259840
申请日：2010-03-29
申请人： Hiroo Wada , Hiroshi Tamura , Hiroshi Kobayashi , Tomofumi Kiyomoto , Seokhyoung Hong
发明人： Hiroo Wada , Hiroshi Tamura , Hiroshi Kobayashi , Tomofumi Kiyomoto , Seokhyoung Hong
IPC分类号： B01L3/00 , B23P17/04 , G01N30/00 , G03F7/20
CPC分类号： G01N30/6095 , B01J19/0093 , B01J2219/00826 , B01J2219/00828 , B01J2219/00833 , B01J2219/0086 , B01J2219/00984 , B01L3/502746 , B01L2300/0816 , B01L2300/0883 , B01L2400/0487 , G01N27/44704 , G01N27/44791 , G01N30/6086 , Y10T29/49
摘要： A micro-channel device provided in a solution analysis system using pressure liquid feed comprises a plurality of straight-line channels and curved channels connecting the ends of the neighboring straight-line channels. The width w of each curved channel is smaller than the width t of each straight-line channel. The radius of curvature r of each curved channel is set so that the value of a expressed by formula (1) is equal to or smaller than the value of a at a local maximum point of the theoretical step height H expressed by formula (2) and based on the shape of the curved channel. a=w/r (1) H = u c  w 2 64  γ   D m × a 2  ( a + 2 ) a + 1 ( 2 ) Where, w is a width of the curved channel, uc is a channel passing speed of a solution in the curved channel, γ is a molecular diffusion inhibition factor by basic members present in the curved channel, and Dm is a molecular diffusion coefficient of the solution.
摘要翻译：设置在使用压力液体进料的溶液分析系统中的微通道装置包括多个直线通道和连接相邻直线通道的端部的弯曲通道。每个弯曲通道的宽度w小于每个直线通道的宽度t。每个弯曲通道的曲率半径r被设定为使由公式（1）表示的a的值等于或小于由公式（2）表示的理论台阶高度H的局部最大点处的a值，并基于弯曲通道的形状。 a = w / r（1）H = uc w w 2 64γD m×a 2（a + 2）a + 1（2）其中，w是弯曲通道的宽度，uc是弯曲通道中溶液的通道通过速度，γ是弯曲通道中存在的碱性成分的分子扩散抑制因子，Dm是溶液的分子扩散系数。

42. 发明授权

US08081081B2 Electronic apparatus and method of manufacturing the same 失效
标题翻译：电子设备及其制造方法
公开(公告)号：US08081081B2
公开(公告)日：2011-12-20
申请号：US12191539
申请日：2008-08-14
申请人： Hiroshi Kobayashi , Kenji Kobae , Takashi Kubota
发明人： Hiroshi Kobayashi , Kenji Kobae , Takashi Kubota
IPC分类号： G08B13/14 , G08B23/00 , H01L23/02
CPC分类号： G06K19/07749 , G06K19/02 , G06K19/027 , G06K19/07728 , G06K19/07758 , H01L2224/16225 , H01L2224/32225 , H01L2224/73204 , H01L2924/1815 , Y10T428/2462 , H01L2924/00
摘要： The electronic apparatus includes a base sheet; a conductive pattern formed on the base sheet; a circuit chip mounted on the base sheet and connected to the conductive pattern; and plural protrusions arranged on at least one of a frontside and a backside of the base sheet to overlap at least a portion of the conductive pattern. The plural protrusions protrude in a direction away from the base sheet.
摘要翻译：电子设备包括基片; 形成在基片上的导电图案; 电路芯片，安装在基片上并连接到导电图案; 以及布置在所述基片的前侧和后侧中的至少一个上的多个突起，以与所述导电图案的至少一部分重叠。多个突起在远离基片的方向上突出。

43. 发明申请

US20110238952A1 INSTRUCTION FETCH APPARATUS, PROCESSOR AND PROGRAM COUNTER ADDITION CONTROL METHOD 有权
标题翻译：指令设备，处理器和程序计数器附加控制方法
公开(公告)号：US20110238952A1
公开(公告)日：2011-09-29
申请号：US13024580
申请日：2011-02-10
申请人： Hitoshi Kai , Hiroaki Sakaguchi , Hiroshi Kobayashi , Katsuhiko Metsugi , Haruhisa Yamamoto , Yousuke Morita , Koichi Hasegawa , Taichi Hirao
发明人： Hitoshi Kai , Hiroaki Sakaguchi , Hiroshi Kobayashi , Katsuhiko Metsugi , Haruhisa Yamamoto , Yousuke Morita , Koichi Hasegawa , Taichi Hirao
IPC分类号： G06F9/38
CPC分类号： G06F9/321 , G06F9/30101 , G06F9/30156 , G06F9/30167 , G06F9/30178 , G06F9/3804 , G06F9/3842
摘要： An instruction fetch apparatus is disclosed which includes: a program counter configured to manage the address of an instruction targeted to be executed in a program in which instructions belonging to a plurality of instruction sequences are placed sequentially; a change designation register configured to designate a change of an increment value on the program counter; an increment value register configured to hold the changed increment value; and an addition control section configured such that if the change designation register designates the change of the increment value on the program counter, then the addition control section increments the program counter based on the changed increment value held in the increment value register, the addition control section further incrementing the program counter by an instruction word length if the change designation register does not designate any change of the increment value on the program counter.
摘要翻译：一种提取指令装置，其特征在于包括：程序计数器，被配置为在其中顺序放置属于多个指令序列的指令的程序中管理目标要执行的指令的地址; 变更指定寄存器，被配置为指定所述程序计数器上的增量值的变化; 增量值寄存器，被配置为保持所述改变的增量值; 以及附加控制部分，其被配置为使得如果所述改变指定寄存器指定所述程序计数器上的所述增量值的改变，则所述相加控制部分基于所述增量值寄存器中保持的改变的增量值来增加所述程序计数器，所述加法控制如果改变指定寄存器没有指定程序计数器上的增量值的任何改变，则进一步将程序计数器递增指令字长度。

44. 发明授权

US08015786B2 Guide member for a lawnmower 有权
标题翻译：割草机指导员
公开(公告)号：US08015786B2
公开(公告)日：2011-09-13
申请号：US12792099
申请日：2010-06-02
申请人： Fumio Minami , Hiroshi Hojo , Hiroshi Kobayashi , Kenzo Shimada , Kazuki Shimozono
发明人： Fumio Minami , Hiroshi Hojo , Hiroshi Kobayashi , Kenzo Shimada , Kazuki Shimozono
IPC分类号： A01D67/00
CPC分类号： A01D42/005
摘要： A lawnmower including a cut grass storage container for storing cut grass. The lawnmower also includes a cutting blade, a downwardly-opening housing, and a cut grass conveyor passage. The cut grass storage container is provided to the cut grass conveyor passage. Grass that has been cut is delivered to the cut grass conveyor passage while revolving about a shaft inside the housing. A guide member is provided inside the housing. The guide member guides the revolving grass to the cut grass conveyor passage while guiding the grass to the outer periphery of the housing.
摘要翻译：一种割草机，包括用于存放草地的草地储藏容器。割草机还包括切割刀片，向下开口的壳体和切割草地输送通道。将切草储存容器设置到切草输送通道。被切割的草被转移到切割的草地输送通道上，同时围绕壳体内的轴旋转。引导构件设置在壳体内。引导构件在将草地引导到壳体的外周边的同时将旋转草地引导到切草输送器通道。

45. 发明授权

US08003066B2 Method for scrubbing amine-type extractant 有权
标题翻译：洗涤胺型萃取剂的方法
公开(公告)号：US08003066B2
公开(公告)日：2011-08-23
申请号：US12232868
申请日：2008-09-25
申请人： Hiroshi Kobayashi , Hirofumi Shoji
发明人： Hiroshi Kobayashi , Hirofumi Shoji
IPC分类号： B01D11/00 , B01D15/04 , C01G3/00 , C01G5/00 , C01G7/00 , C01G1/00 , C01G49/00 , C01G51/00 , C01G53/00 , C22B11/00 , C22B15/00 , C22B1/00 , C22B23/00 , B01F1/00
CPC分类号： C01G49/00 , C01G9/00
摘要： A method for scrubbing an amine extractant (A) containing an amine added with hydrochloric acid, and an amine binding a metal chloro complex ion, in a scrubbing stage constituting a solvent extraction step, characterized by substituting a chloride ion of the amine, which is added with hydrochloric acid, with sulfuric acid ion, by bringing the amine extractant (A) into contact with a sulfuric acid solution with a concentration of 3 to 10 N, and subsequently, by eliminating a metal by bringing the substituted amine extractant (B) into contact with water.
摘要翻译：一种在构成溶剂萃取步骤的洗涤阶段中洗涤含有加入盐酸的胺的胺萃取剂（A）和与金属氯络合物离子结合的胺的方法，其特征在于，将胺的氯离子通过使胺萃取剂（A）与浓度为3至10N的硫酸溶液接触，然后通过将取代的胺提取剂（B）除去金属来加入盐酸，用硫酸离子，与水接触。

46. 发明申请

US20100307685A1 MICROWAVE PLASMA PROCESSING APPARATUS 审中-公开
标题翻译：微波等离子体加工设备
公开(公告)号：US20100307685A1
公开(公告)日：2010-12-09
申请号：US12865519
申请日：2009-01-30
申请人： Kinya Ota , Caizhong Tian , Hiroshi Kobayashi , Yoshihiro Sato , Toshihiko Shiozawa , Koji Maekawa
发明人： Kinya Ota , Caizhong Tian , Hiroshi Kobayashi , Yoshihiro Sato , Toshihiko Shiozawa , Koji Maekawa
IPC分类号： C23F1/08
CPC分类号： H05H1/46 , C23C16/511 , H01J37/32192 , H01J37/3222 , H01J37/32238
摘要： In a microwave plasma processing apparatus, when a surface of a planar antenna 31 for radiating a microwave to form a plasma is concentrically divided into a central region 31a, an outer circumferential region 31c and a middle region 31b therebetween, a plurality of pairs of microwave radiating holes 32 elongated in different directions are concentrically arranged in the central region 31a and the outer circumferential region 31c and no microwave radiating hole is formed in the middle region 31b, and a microwave radiating surface of a microwave transmitting plate 28 is provided with a concave portion 28a.
摘要翻译：在微波等离子体处理装置中，当用于放射微波以形成等离子体的平面天线31的表面同心地分成中间区域31a，外周区域31c和中间区域31b之间时，多对微波沿中心区域31a和外周区域31c同心地布置有沿不同方向伸长的辐射孔32，在中间区域31b中不形成微波辐射孔，并且微波辐射板28的微波辐射表面设置有凹部部分28a。

47. 发明授权

US07786725B2 Magnetic field detection apparatus for detecting an external magnetic field applied to a magnetoresistance effect element, and method of adjusting the same 有权
标题翻译：用于检测施加到磁阻效应元件的外部磁场的磁场检测装置及其调整方法
公开(公告)号：US07786725B2
公开(公告)日：2010-08-31
申请号：US11509609
申请日：2006-08-25
申请人： Taisuke Furukawa , Hiroshi Kobayashi , Takashi Takenaga , Takeharu Kuroiwa , Sadeh Beysen , Masakazu Taki
发明人： Taisuke Furukawa , Hiroshi Kobayashi , Takashi Takenaga , Takeharu Kuroiwa , Sadeh Beysen , Masakazu Taki
IPC分类号： G01B7/30
CPC分类号： G01R33/093 , B82Y25/00 , G01R15/205
摘要： A magnetic field detection apparatus capable of changing the detection range and detection sensitivity as desired for a specific application is disclosed. A magnetoresistance effect element is applied a bias magnetic field and an external magnetic field. The bias magnetic field and the external magnetic field are generated on the same straight line, and therefore the bias magnetic field functions to hamper the external magnetic field applied to the magnetoresistance effect element. Thus, the magnetization of the free layer of the magnetoresistance effect element is suppressed, and the rotational angle of the magnetized vector is reduced. As a result, the characteristic of the resistance value of the magnetoresistance effect element to the external magnetic field is shifted by an amount equivalent to the bias magnetic field.
摘要翻译：公开了能够根据具体应用需要改变检测范围和检测灵敏度的磁场检测装置。磁阻效应元件施加偏置磁场和外部磁场。在相同的直线上产生偏置磁场和外部磁场，因此偏置磁场用于阻止施加到磁阻效应元件的外部磁场。因此，磁阻效应元件的自由层的磁化被抑制，并且磁化矢量的旋转角度减小。结果，磁阻效应元件对外部磁场的电阻值的特性偏移与偏置磁场相当的量。

48. 发明申请

US20100190116A1 SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD 有权
标题翻译：基板处理装置和基板处理方法
公开(公告)号：US20100190116A1
公开(公告)日：2010-07-29
申请号：US12754872
申请日：2010-04-06
申请人： Koji Kaneyama , Akihiro Hisai , Toru Asano , Hiroshi Kobayashi , Tsuyoshi Okumura , Shuichi Yasuda , Masashi Kanaoka , Tadashi Miyagi , Kazuhito Shigemori
发明人： Koji Kaneyama , Akihiro Hisai , Toru Asano , Hiroshi Kobayashi , Tsuyoshi Okumura , Shuichi Yasuda , Masashi Kanaoka , Tadashi Miyagi , Kazuhito Shigemori
IPC分类号： G03F7/20 , B05D3/00
CPC分类号： G03F7/70991 , G03F7/70341
摘要： A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, and an interface block. An exposure device is arranged adjacent to an interface block. The interface block comprises a drying processing group including two drying processing units and an interface transport mechanism. After a substrate is subjected to exposure processing by the exposure device, the substrate is transported to the drying processing units in the drying processing group by the interface transport mechanism, where the substrate is subjected to cleaning and drying processings.
摘要翻译：基板处理装置包括分度器块，抗反射膜处理块，抗蚀剂膜处理块，显影处理块和界面块。曝光装置被布置成与界面块相邻。接口块包括干燥处理组，其包括两个干燥处理单元和界面输送机构。在通过曝光装置对基板进行曝光处理之后，通过界面传送机构将基板输送到干燥处理组中的干燥处理单元，其中对基板进行清洁和干燥处理。

49. 发明申请

US20100151742A1 CONNECTOR 有权
标题翻译：连接器
公开(公告)号：US20100151742A1
公开(公告)日：2010-06-17
申请号：US12089121
申请日：2007-09-11
申请人： Satoru Shindo , Yuji Miyazaki , Hiroshi Kobayashi
发明人： Satoru Shindo , Yuji Miyazaki , Hiroshi Kobayashi
IPC分类号： H01R25/00
CPC分类号： H01R13/533 , H01R13/6277 , H01R13/639 , H01R2201/26
摘要： The present invention provides a connector capable of being simply and easily connected without loss of electrical continuity even in a harsh environment.First joining terminals 201a and 201b are supported by a female housing 200, and second joining terminals 401a and 401b electrically connected to the first joining terminals 201a and 201b are supported by a male housing 400. The male housing 400 is inserted to mate with the female housing 200, which performs electrical connection. Further, slit ribs 205a to 205d are formed in the direction of mating in the female housing 200, and slits 405a to 405d along the direction of mating are formed in the male housing 400. The slit ribs 205a to 205d have recessed tapered shapes formed at a predetermined rate of angular change and a predetermined rate of width change, and the slits 405a to 405d have tapered shapes having a rate of angular change and a rate of width change which are respectively greater than the predetermined rate of angular change and the predetermined rate of width change of the slit ribs.
摘要翻译：本发明提供一种连接器，即使在恶劣的环境下也能简单且容易地连接而不损失电连续性。第一接合端子201a和201b由阴壳体200支撑，并且电连接到第一接合端子201a和201b的第二接合端子401a和401b由阳壳体400支撑。阳壳体400被插入以与母体外壳200，进行电气连接。此外，狭槽肋205a至205d在阴壳体200中在配合方向上形成，并且沿着配合方向的狭缝405a至405d形成在阳壳体400中。狭缝肋205a至205d具有形成在角度变化的预定速率和预定的宽度变化率，狭缝405a至405d具有分别大于预定角度变化率和预定速率的角度变化率和宽度变化率的锥形形状狭缝肋的宽度变化。

50. 发明申请

US20090309116A1 SEMICONDUCTOR DEVICE MEMBER, PRODUCTION METHOD OF SEMICONDUCTOR-DEVICE-MEMBER FORMATION LIQUID AND SEMICONDUCTOR DEVICE MEMBER, AND SEMICONDUCTOR-DEVICE-MEMBER FORMATION LIQUID, PHOSPHOR COMPOSITION, SEMICONDUCTOR LIGHT-EMITTING DEVICE, LIGHTING SYSTEM AND IMAGE DISPLAY SYSTEM USING THE SAME 有权
标题翻译：半导体器件部件，半导体器件形成液体和半导体器件部件的制造方法以及半导体器件成员液体，磷光体组合物，半导体发光器件，照明系统和使用其的图像显示系统
公开(公告)号：US20090309116A1
公开(公告)日：2009-12-17
申请号：US12438283
申请日：2007-08-22
申请人： Hanako Kato , Yutaka Mori , Hiroshi Kobayashi , Tsubasa Tomura
发明人： Hanako Kato , Yutaka Mori , Hiroshi Kobayashi , Tsubasa Tomura
IPC分类号： H01L33/00 , C09K11/02
CPC分类号： C09K11/7774 , C09K11/7721 , C09K11/7734 , C09K11/7735 , C09K11/7738 , C09K11/774 , C09K11/7775 , C09K11/7781 , C09K11/7789 , C09K11/7794 , C09K11/7795 , H01L23/24 , H01L23/293 , H01L24/17 , H01L33/507 , H01L33/54 , H01L33/58 , H01L2224/32245 , H01L2224/32257 , H01L2224/45144 , H01L2224/48091 , H01L2224/48227 , H01L2224/48247 , H01L2224/48257 , H01L2224/49107 , H01L2224/73265 , H01L2224/8592 , H01L2924/01004 , H01L2924/01012 , H01L2924/01019 , H01L2924/0102 , H01L2924/01021 , H01L2924/01025 , H01L2924/01046 , H01L2924/01057 , H01L2924/01063 , H01L2924/01066 , H01L2924/01067 , H01L2924/01068 , H01L2924/01077 , H01L2924/01078 , H01L2924/01079 , H01L2924/01322 , H01L2924/10253 , H01L2924/12041 , H01L2924/12042 , H01L2924/181 , H01L2924/19041 , H01L2924/00014 , H01L2924/00 , H01L2924/00012
摘要： To provide a semiconductor device member that is superior in heat resistance, light resistance, film-formation capability and adhesion, and is capable of sealing a semiconductor device and holding a phosphor without causing cracks, peelings and colorings even after used for a long period of time, the weight loss at the time of heating, measured by a predetermined weight-loss at-the-time-of-heating measurement method, is 50 weight % or lower and the ratio of peeling, measured by a predetermined adhesion evaluation method, is 30% or lower, in the semiconductor device member.
摘要翻译：为了提供耐热性，耐光性，成膜性和粘合性优异的半导体器件部件，并且即使在长时间使用之后也能够密封半导体器件和保持荧光体而不引起裂纹，剥离和着色时间，通过预定的加热温度测量方法的重量损失测量的加热时的重量损失为50重量％以下，通过预定的粘合性评价方法测定的剥离比例，在半导体器件部件中为30％以下。

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