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41. 发明授权

US4099348A Machining arrangement with means to isolate vibrations from the working spindle 失效
标题翻译：具有隔离工作主轴振动的装置的加工布置
公开(公告)号：US4099348A
公开(公告)日：1978-07-11
申请号：US801373
申请日：1977-05-27
申请人： Shigeo Kato , Sakae Saito , Osamu Morita
发明人： Shigeo Kato , Sakae Saito , Osamu Morita
IPC分类号： F16H7/02 , B23Q5/04 , B23Q11/00 , B24B41/00 , B24B41/02
CPC分类号： B23Q11/0032 , B23Q5/04 , B24B41/00 , Y10T409/309576
摘要： A surfacing or finishing machine for precision machining of a workpiece which includes a grinding wheel or edging tool installed on a working spindle, a driving motor for rotating the working spindle, and a power transmitting system for transmitting power from the driving motor to the working spindle. The power transmitting system includes a flexible link mechanism fashioned of a number of link belts or the like interconnected in series by a number of rotatable pulleys. The driving motor and power transmitting system are so arranged with respect to the surfacing and finishing machine that the working spindle is isolated from adverse vibrations which result from the operation of the driving motor and power transmission system.
摘要翻译：一种用于精密加工工件的表面处理机或精加工机，其包括安装在工作主轴上的砂轮或磨边工具，用于旋转工作主轴的驱动电机和用于将动力从驱动电机传递到工作主轴的动力传递系统。动力传递系统包括由多个可转动的滑轮串联连接的多个连杆皮带等构成的柔性连杆机构。驱动电动机和动力传递系统相对于表面和精整机构布置，使得工作主轴与驱动电动机和动力传动系统的操作产生的不利振动隔离。

42. 发明授权

US09237638B2 Plasma processing apparatus and substrate processing method 有权
标题翻译：等离子体处理装置和基板处理方法
公开(公告)号：US09237638B2
公开(公告)日：2016-01-12
申请号：US13391310
申请日：2010-08-16
申请人： Kiyotaka Ishibashi , Osamu Morita
发明人： Kiyotaka Ishibashi , Osamu Morita
IPC分类号： C23C16/00 , C23F1/00 , H01L21/306 , H05H1/46 , C23C16/511 , H01J37/32
CPC分类号： H01J37/32192 , C23C16/455 , C23C16/511 , H01J37/3222 , H01J37/32229 , H01J37/3244 , H05H1/46 , H05H2001/463
摘要： A microwave supply unit 20 of a plasma processing apparatus 11 includes a stub member 51 configured to be extensible from the outer conductor 33 toward the inner conductor 32. The stub member 51 serves as a distance varying device for varying a distance in the radial direction between a part of the outer surface 36 of the inner conductor 32 and a facing member facing the part of the outer surface of the inner conductor 32 in the radial direction, i.e., the cooling plate protrusion 47. The stub member 51 includes a rod-shaped member 52 supported at the outer conductor 33 and configured to be extended in the radial direction; and a screw 53 as a moving distance adjusting member for adjusting a moving distance of the rod-shaped member 52 in the radial direction.
摘要翻译：等离子体处理装置11的微波供给单元20包括构造成可从外导体33向内导体32延伸的短截线构件51.短截线构件51用作变距装置，用于改变径向方向上的距离内导体32的外表面36的一部分和面向内径部分的内导体32的外表面的一部分的面对构件即冷却板突起47.短针构件51包括杆状构件52支撑在外导体33处并且构造成沿径向方向延伸; 以及作为用于调节棒状构件52在径向上的移动距离的移动距离调节构件的螺钉53。

43. 发明授权

US09111726B2 Plasma processing apparatus 有权
标题翻译：等离子体处理装置
公开(公告)号：US09111726B2
公开(公告)日：2015-08-18
申请号：US13454513
申请日：2012-04-24
申请人： Kazuki Moyama , Kiyotaka Ishibashi , Osamu Morita , Takehiro Tanikawa , Naoki Matsumoto , Naoki Mihara , Wataru Yoshikawa
发明人： Kazuki Moyama , Kiyotaka Ishibashi , Osamu Morita , Takehiro Tanikawa , Naoki Matsumoto , Naoki Mihara , Wataru Yoshikawa
IPC分类号： C23C16/00 , C23F1/00 , H01L21/306 , H01J37/32
CPC分类号： H01J37/32192 , H01J37/32229 , H01J37/3244
摘要： A plasma processing apparatus includes a processing chamber, a stage, a dielectric member, a microwave introduction device, an injector, and an electric field shield. The processing chamber has a processing space therein. The stage is provided within the processing chamber. The dielectric member has a through hole and is provided to face the stage. The microwave introduction device is configured to introduce microwave into the processing space via the dielectric member. The injector has at least one through hole and is made of a dielectric material, e.g., a bulk dielectric material. The injector is provided within the dielectric member. The injector and the through hole of the dielectric member form a path for supplying a processing gas into the processing space. The electric field shield encloses the injector.
摘要翻译：等离子体处理装置包括处理室，载物台，电介质构件，微波引入装置，注射器和电场屏蔽。处理室在其中具有处理空间。工作台设置在处理室内。电介质构件具有通孔并且设置成面向台。微波引入装置经由电介质构件将微波引入处理空间。喷射器具有至少一个通孔，并且由介电材料制成，例如大体电介质材料。喷射器设置在电介质构件内。介电构件的注射器和通孔形成用于将处理气体供应到处理空间的路径。电场屏蔽封闭注射器。

44. 发明授权

US08491106B2 Liquid supply member, method for manufacturing the same, and method for manufacturing liquid ejection head 失效
标题翻译：液体供给部件及其制造方法以及液体喷射头的制造方法
公开(公告)号：US08491106B2
公开(公告)日：2013-07-23
申请号：US12905885
申请日：2010-10-15
申请人： Masaru Iketani , Osamu Morita
发明人： Masaru Iketani , Osamu Morita
IPC分类号： B41J2/175
CPC分类号： B41J2/1634 , B29C65/1616 , B29C65/1635 , B29C65/1664 , B29C65/1667 , B29C65/1677 , B29C65/1687 , B29C66/112 , B29C66/114 , B29C66/242 , B29C66/244 , B29C66/54 , B29C66/71 , B29C66/73921 , B29C66/8322 , B29L2031/767 , B41J2/16 , Y10T29/49401 , Y10T137/8593 , B29K2071/12
摘要： A method is provided for manufacturing a liquid supply member including a transmissive member and a transmissive member, one of which having a groove, and configured to supply liquid to a liquid ejection port. The method includes bringing the transmissive member and the absorptive member into contact, with the groove inside; forming a supply passage by radiating laser light, via the transmissive member, from a plurality of first laser light sources disposed along a longitudinal direction of the groove toward a first contact portion at a periphery of the groove to weld the transmissive member and the absorptive member; and radiating laser light, via the transmissive member, from a second laser light source provided in a vicinity of a laser light source at an end of the groove in the longitudinal direction toward a vicinity portion of the absorptive member.
摘要翻译：提供一种用于制造包括透射构件和透射构件的液体供应构件的方法，其中一个具有凹槽，并且构造成将液体供应到液体喷射口。该方法包括使透射构件和吸收构件与槽内接触; 通过所述透射构件从沿着所述凹槽的纵向方向设置的多个第一激光光源朝向所述凹槽的周边处的第一接触部分辐射激光以形成供应通道，以焊接所述透射构件和所述吸收构件 ; 并且经由所述透射构件从设置在所述凹槽的纵向方向上的激光光源附近的第二激光源朝向所述吸收部件的附近部分照射激光。

45. 发明授权

US08483870B2 Substrate processing apparatus and method of displaying abnormal state of substrate processing apparatus 有权
标题翻译：基板处理装置及显示基板处理装置的异常状态的方法
公开(公告)号：US08483870B2
公开(公告)日：2013-07-09
申请号：US12704910
申请日：2010-02-12
申请人： Osamu Morita
发明人： Osamu Morita
IPC分类号： G06F7/00
CPC分类号： G05B19/4062 , G05B2219/42289 , H01L21/67288
摘要： Provided are a substrate processing apparatus and a method of displaying an abnormal state of the substrate processing apparatus. The substrate processing apparatus including: a manipulation unit including a manipulation screen displaying a state of at least one of a substrate carrying mechanism and a substrate processing mechanism; and a control unit including a carrying system controller controlling the substrate carrying mechanism. The manipulation unit comprises a setting screen through which detection conditions of sensors configured to detect states of the substrate carrying mechanism and the substrate processing mechanism, and information about a torque limitation including the enabling or disabling of the torque control and a torque control value are set for the substrate carrying mechanism. The carrying system controller assigns a motion of the substrate carrying mechanism to a carrying control module based on an instruction from the manipulation unit, and the carrying control module controls the substrate carrying mechanism according to the instruction and the information.
摘要翻译：提供了一种基板处理装置和显示基板处理装置的异常状态的方法。基板处理装置包括：操作单元，其包括显示基板搬运机构和基板处理机构中的至少一个的状态的操作画面; 以及控制单元，其包括控制所述基板承载机构的承载系统控制器。操作单元包括设定画面，通过该设定画面设定检测基板搬送机构的状态的传感器和基板处理机构的检测条件，以及关于包含使能或禁止转矩控制的转矩限制以及转矩控制值的信息用于基板承载机构。承载系统控制器基于来自操作单元的指令将基板承载机构的运动分配到承载控制模块，并且承载控制模块根据指示和信息来控制基板承载机构。

46. 发明申请

US20120222309A1 METHOD FOR MANUFACTURING LIQUID SUPPLY MEMBER AND METHOD FOR MANUFACTURING LIQUID DISCHARGE HEAD 有权
标题翻译：用于制造液体供应构件的方法和制造液体排出头的方法
公开(公告)号：US20120222309A1
公开(公告)日：2012-09-06
申请号：US13509246
申请日：2010-11-05
申请人： Osamu Morita
发明人： Osamu Morita
IPC分类号： B23P17/00
CPC分类号： B41J2/1603 , B29C65/1616 , B29C65/1635 , B29C65/1664 , B29C65/1667 , B29C65/1677 , B29C65/1687 , B29C66/112 , B29C66/114 , B29C66/242 , B29C66/244 , B29C66/345 , B29C66/54 , B29C66/71 , B29C66/7392 , B29C66/73921 , B29C66/7394 , B29C66/8322 , B29K2995/0027 , B29L2031/767 , B41J2/1623 , B41J2/1634 , B41J2/1752 , B41J2/1753 , B41J2/17553 , Y10T29/49401 , B29K2071/12
摘要： A method for manufacturing a liquid supply member that supplies a discharge port with liquid includes preparing a transparent member and an absorption member, at least one of both members having a groove for a supply path; bringing both members into contact; and forming the supply path by emitting laser beams simultaneously from a plurality of laser beam sources, toward a contact portion, which is provided in a vicinity of the groove and at which both members are in contact, to weld both members. Laser beams are emitted during the forming such that a total laser-beam irradiation amount per unit area for a first portion included in the contact portion and located in a vicinity of an end in a longitudinal direction of the groove is larger than that for part with a smallest irradiation amount of a second portion other than the first portion of the contact portion.
摘要翻译：用于制造向液体供给构件供给液体的方法包括制备透明构件和吸收构件，两个构件中的至少一个具有用于供给路径的凹槽; 使两个成员接触; 并且通过从多个激光束源同时发射激光束来形成供给路径，朝向设置在所述槽附近并且两个部件接触的接触部分焊接两个部件。在成形期间发射激光束，使得包含在接触部分中并位于槽的纵向方向上的端部附近的第一部分的每单位面积的总激光束照射量大于具有除了接触部分的第一部分之外的第二部分的最小照射量。

47. 发明授权

US08240050B2 Manufacturing method of heat equalizing member for fixing device and heat equalizing member for fixing device 有权
标题翻译：用于定影装置的热平衡构件和定影装置的均热构件的制造方法
公开(公告)号：US08240050B2
公开(公告)日：2012-08-14
申请号：US12480832
申请日：2009-06-09
申请人： Tetsuya Yamada , Etsuaki Urano , Osamu Morita
发明人： Tetsuya Yamada , Etsuaki Urano , Osamu Morita
IPC分类号： B23P6/00
CPC分类号： F28D15/0283 , B21D53/06 , B23P15/26 , B23P2700/09 , F28F19/04 , G03G15/2039 , G03G15/2042 , Y10T29/49353 , Y10T29/49364
摘要： In a manufacturing method of a heat equalizing member for a fixing device of the invention, first, an elongated cylindrical pipe is prepared which is made of a metallic material and which has one end sealed while the other end opened. Next, a heat-resistant releasing layer is formed on the outer face of the pipe in close contact therewith. Then, operating fluid is injected into the pipe from an outside through the other end of the pipe, while the other end is sealed by welding.
摘要翻译：在本发明的定影装置用热定形构件的制造方法中，首先，准备由金属材料制成的细长圆柱形管，并且在另一端打开时一端密封。接下来，在管的外表面上紧密接触形成耐热释放层。然后，工作流体从外部通过管的另一端注入管中，而另一端通过焊接密封。

48. 发明授权

US08215018B2 Method for manufacturing liquid discharge head 有权
标题翻译：液体排放头的制造方法
公开(公告)号：US08215018B2
公开(公告)日：2012-07-10
申请号：US12753725
申请日：2010-04-02
申请人： Osamu Morita , Kiyomitsu Kudo
发明人： Osamu Morita , Kiyomitsu Kudo
IPC分类号： B21D53/76
CPC分类号： B41J2/14024 , B29C65/1635 , B29C65/1658 , B29C65/1667 , B29C65/1677 , B29C66/002 , B29C66/112 , B29C66/1122 , B29C66/114 , B29C66/1142 , B29C66/232 , B29C66/242 , B29C66/244 , B29C66/54 , B29C66/545 , B29C66/73921 , B29C66/836 , B29K2995/0027 , B29L2031/767 , B41J2/175 , B41J2/17513 , B41J2/1752 , B41J2/1753 , B41J2/17556 , Y10T29/49126 , Y10T29/49128 , Y10T29/49165 , Y10T29/49401 , Y10T29/49428 , Y10T29/49432
摘要： There is provided a method for manufacturing a liquid discharge head that includes a discharge port, a supply path for supplying the liquid to the discharge port, a transparent member, and an absorptive member, wherein the transparent member and the absorptive member include supply path sections that become a part of a wall of the supply path. The method includes bringing the transparent and absorptive member into contact with each other in such a manner that surfaces of both members including the supply path sections are brought into contact with each other in the vicinity of the supply path sections, welding the both members by irradiating the contact portion where the both members are in contact with each other with the laser beam, and exhausting gas from an exhaust path formed on the liquid discharge head in the vicinity of the contact portion at least throughout the welding process.
摘要翻译：提供一种液体排出头的制造方法，该排液头包括排出口，用于将液体供给到排出口的供给路径，透明构件和吸收构件，其中，透明构件和吸收构件包括供给路径部这成为供应路径的一部分。该方法包括使透明和吸收构件彼此接触，使得包括供应路径部分的两个构件的表面在供应路径部分附近彼此接触，通过照射来焊接两个构件两个部件用激光束彼此接触的接触部分，以及至少在整个焊接过程中从形成在接触部分附近的排液头上的排气通道排出气体。

49. 发明申请

US20110083758A1 LIQUID SUPPLY MEMBER, METHOD OF MAKING LIQUID SUPPLY MEMBER, AND METHOD OF MAKING LIQUID DISCHARGE HEAD 有权
标题翻译：液体供应构件，制造液体供应构件的方法和制造液体排出头的方法
公开(公告)号：US20110083758A1
公开(公告)日：2011-04-14
申请号：US12898884
申请日：2010-10-06
申请人： Naoko Tsujiuchi , Osamu Morita
发明人： Naoko Tsujiuchi , Osamu Morita
IPC分类号： F15D1/00 , B23K26/00
CPC分类号： B29C66/71 , B29C65/1635 , B29C65/1654 , B29C65/1667 , B29C66/112 , B29C66/114 , B29C66/1142 , B29C66/244 , B29C66/30223 , B29C66/322 , B29C66/3242 , B29C66/543 , B29C66/547 , B29C66/54721 , B29C66/73921 , B29C66/81267 , B29C66/8322 , B29C66/92651 , B29K2995/0027 , B29L2031/7678 , B41J2/16 , B41J2/1623 , B41J2/1634 , B41J2/17513 , B41J2/1752 , B41J2/1753 , B41J2/17553 , B41J2/17559 , Y10T29/49401 , Y10T137/8593 , B29K2071/12
摘要： A method of making a liquid supply member includes a preparation step of preparing a transparent member including a first surface having a first opening portion and an absorption member including a second surface having a second opening portion, a contact step of making the transparent member and the absorption member contact each other at a contact portion so that the first opening portion and the second opening portion overlap, and a welding step of forming a first supply path by welding the transparent member and the absorption member to each other by irradiating the contact portion with a laser beam, the first supply path including the first opening portion and the second opening portion, wherein, after the contact step and before the welding step, a space is formed between the contact portion and the first supply path and between the first surface and the second surface.
摘要翻译：一种制造液体供应构件的方法包括制备透明构件的制备步骤，该透明构件包括具有第一开口部分的第一表面和包括具有第二开口部分的第二表面的吸收构件，制造透明构件的接触步骤和吸收构件在接触部分处彼此接触，使得第一开口部分和第二开口部分重叠;以及焊接步骤，通过将透明构件和吸收构件彼此照射来形成第一供给路径，激光束，所述第一供应路径包括所述第一开口部分和所述第二开口部分，其中在所述接触步骤之后和所述焊接步骤之前，在所述接触部分和所述第一供应路径之间以及在所述第一表面和第二个表面。

50. 发明申请

US20100257736A1 METHOD FOR MANUFACTURING LIQUID DISCHARGE HEAD 有权
标题翻译：制造液体放电头的方法
公开(公告)号：US20100257736A1
公开(公告)日：2010-10-14
申请号：US12753725
申请日：2010-04-02
申请人： Osamu Morita , Kiyomitsu Kudo
发明人： Osamu Morita , Kiyomitsu Kudo
IPC分类号： B21K21/08
CPC分类号： B41J2/14024 , B29C65/1635 , B29C65/1658 , B29C65/1667 , B29C65/1677 , B29C66/002 , B29C66/112 , B29C66/1122 , B29C66/114 , B29C66/1142 , B29C66/232 , B29C66/242 , B29C66/244 , B29C66/54 , B29C66/545 , B29C66/73921 , B29C66/836 , B29K2995/0027 , B29L2031/767 , B41J2/175 , B41J2/17513 , B41J2/1752 , B41J2/1753 , B41J2/17556 , Y10T29/49126 , Y10T29/49128 , Y10T29/49165 , Y10T29/49401 , Y10T29/49428 , Y10T29/49432
摘要： There is provided a method for manufacturing a liquid discharge head that includes a discharge port, a supply path for supplying the liquid to the discharge port, a transparent member, and an absorptive member, wherein the transparent member and the absorptive member include supply path sections that become a part of a wall of the supply path. The method includes bringing the transparent and absorptive member into contact with each other in such a manner that surfaces of both members including the supply path sections are brought into contact with each other in the vicinity of the supply path sections, welding the both members by irradiating the contact portion where the both members are in contact with each other with the laser beam, and exhausting gas from an exhaust path formed on the liquid discharge head in the vicinity of the contact portion at least throughout the welding process.
摘要翻译：提供一种液体排出头的制造方法，该排液头包括排出口，用于将液体供给到排出口的供给路径，透明构件和吸收构件，其中，透明构件和吸收构件包括供给路径部这成为供应路径的一部分。该方法包括使透明和吸收构件彼此接触，使得包括供应路径部分的两个构件的表面在供应路径部分附近彼此接触，通过照射来焊接两个构件两个部件用激光束彼此接触的接触部分，以及至少在整个焊接过程中从形成在接触部分附近的排液头上的排气通道排出气体。

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