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    • 46. 发明授权
    • Process and apparatus for spectral reflectance and transmission
measurements
    • 光谱反射率和透射测量的过程和设备
    • US5764352A
    • 1998-06-09
    • US691137
    • 1996-08-01
    • Peter KappelWerner LenzWalter MullerChristian SchafferWilhelm SchebestaUlrich BaslerJens MondryJurgen Gobel
    • Peter KappelWerner LenzWalter MullerChristian SchafferWilhelm SchebestaUlrich BaslerJens MondryJurgen Gobel
    • G01J3/02G01M11/00G01N21/27G01N21/47G01J1/42
    • G01N21/958G01N21/474G01N21/5907G01N21/8422
    • Optical measuring apparatus for determining chromaticity of thin films on a substrate includes a light source for illuminating the substrate and a measuring apparatus for dispersing light into various wavelengths and making wavelength dependent intensity measurements. Radiation from the light source is reflected or transmitted by the substrate to the measuring apparatus along a first beam path having a first diaphragm for cutting off the radiation from the substrate in a leak-tight manner. Radiation from the light source is also transmitted to the measuring apparatus directly along a second beam path having a second diaphragm for cutting off radiation from the light source in a leak-tight manner. The light source (6a) consists of a globe photometer (6a), in which a lamp (4) is provided. A steadily burning light source, especially a halogen lamp, is used as the lamp (4). Long-term instabilities are corrected essentially by means of a white reference standard, whereas short-term instabilities are corrected under consideration of the characteristic emission spectrum of the selected lamp (4). For determining the chromaticity of reflecting and transparent thin-film layers applied to substrate, a process for reflectance curve determination is used, in which apparatus-related instabilities interfering with the chromaticity measurement are corrected by normalization of the measured relative spectral energy distributions to the current measurement light spectrum and by taking into consideration the effects of foreign light on the measurement light spectrum.
    • 用于确定基板上的薄膜的色度的光学测量装置包括用于照射基板的光源和用于将光分散到各种波长并进行波长依赖的强度测量的测量装置。 来自光源的辐射被基板反射或传输到具有第一光阑的第一光束路径的测量装置,该第一光阑用于以不透气的方式切断来自基板的辐射。 来自光源的辐射也沿着具有第二光阑的第二光束路径直接传送到测量装置,用于以不透漏的方式切断来自光源的辐射。 光源(6a)由球状光度计(6a)组成,其中设置有灯(4)。 使用稳定燃烧的光源(特别是卤素灯)作为灯(4)。 长期不稳定性基本上通过白色参考标准进行校正,而在考虑所选择的灯(4)的特征发射光谱的情况下校正短期不稳定性。 为了确定施加到基板的反射和透明薄膜层的色度,使用反射曲线确定的处理,其中通过将测量的相对光谱能量分布归一化为电流来校正与色度测量相干扰的与装置有关的不稳定性 测量光谱,并考虑到异物对测量光谱的影响。