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41. 发明申请

US20120071067A1 RETAINING RING WITH SHAPED SURFACE 有权
标题翻译：具有形状表面的保持环
公开(公告)号：US20120071067A1
公开(公告)日：2012-03-22
申请号：US13305589
申请日：2011-11-28
申请人： Hung Chih Chen , Steven M. Zuniga , Charles C. Garretson , Douglas R. McAllister , Jian Lin , Stacy Meyer , Sidney P. Huey , Jeonghoon Oh , Trung T. Doan , Jeffrey Schmidt , Martin S. Wohlert , Kerry F. Hughes , James C. Wang , Danny Cam Toan Lu , Romain Beau De Lamenie , Venkata R. Balagani , Aden Martin Allen , Michael Jon Fong
发明人： Hung Chih Chen , Steven M. Zuniga , Charles C. Garretson , Douglas R. McAllister , Jian Lin , Stacy Meyer , Sidney P. Huey , Jeonghoon Oh , Trung T. Doan , Jeffrey Schmidt , Martin S. Wohlert , Kerry F. Hughes , James C. Wang , Danny Cam Toan Lu , Romain Beau De Lamenie , Venkata R. Balagani , Aden Martin Allen , Michael Jon Fong
IPC分类号： B24B41/06
CPC分类号： B24B37/32 , Y10T29/49815
摘要： A retaining ring can be shaped by machining or lapping the bottom surface of the ring to form a shaped profile in the bottom surface. The bottom surface of the retaining ring can include flat, sloped and curved portions. The lapping can be performed using a machine that dedicated for use in lapping the bottom surface of retaining rings. During the lapping the ring can be permitted to rotate freely about an axis of the ring. The bottom surface of the retaining ring can have curved or flat portions.
摘要翻译：保持环可以通过机械加工或研磨环的底部表面而在底面形成成形轮廓。保持环的底面可以包括平坦的，倾斜的和弯曲的部分。可以使用专用于研磨保持环底面的机器进行研磨。在研磨期间，可以允许环围绕环的轴线自由旋转。保持环的底面可以具有弯曲或平坦的部分。

42. 发明授权

US08066551B2 Retaining ring with shaped surface 有权
标题翻译：带环形表面的保持环
公开(公告)号：US08066551B2
公开(公告)日：2011-11-29
申请号：US13089174
申请日：2011-04-18
申请人： Hung Chih Chen , Steven M. Zuniga , Charles C. Garretson , Douglas R. McAllister , Jian Lin , Stacy Meyer , Sidney P. Huey , Jeonghoon Oh , Trung T. Doan , Jeffrey P. Schmidt , Martin S. Wohlert , Kerry F. Hughes , James C. Wang , Danny Cam Toan Lu , Romain Beau De Lamenie , Venkata R. Balagani , Aden Martin Allen , Michael Jon Fong
发明人： Hung Chih Chen , Steven M. Zuniga , Charles C. Garretson , Douglas R. McAllister , Jian Lin , Stacy Meyer , Sidney P. Huey , Jeonghoon Oh , Trung T. Doan , Jeffrey P. Schmidt , Martin S. Wohlert , Kerry F. Hughes , James C. Wang , Danny Cam Toan Lu , Romain Beau De Lamenie , Venkata R. Balagani , Aden Martin Allen , Michael Jon Fong
IPC分类号： B24B1/00
CPC分类号： B24B37/32 , Y10T29/49815
摘要： A retaining ring can be shaped by machining or lapping the bottom surface of the ring to form a shaped profile in the bottom surface. The bottom surface of the retaining ring can include flat, sloped and curved portions. The lapping can be performed using a machine that dedicated for use in lapping the bottom surface of retaining rings. During the lapping the ring can be permitted to rotate freely about an axis of the ring. The bottom surface of the retaining ring can have curved or flat portions.
摘要翻译：保持环可以通过机械加工或研磨环的底部表面而在底面形成成形轮廓。保持环的底面可以包括平坦的，倾斜的和弯曲的部分。可以使用专用于研磨保持环底面的机器进行研磨。在研磨期间，可以允许环围绕环的轴线自由旋转。保持环的底面可以具有弯曲或平坦的部分。

43. 发明申请

US20110195639A1 RETAINING RING WITH SHAPED SURFACE 有权
标题翻译：具有形状表面的保持环
公开(公告)号：US20110195639A1
公开(公告)日：2011-08-11
申请号：US13089174
申请日：2011-04-18
申请人： Hung Chih Chen , Steven M. Zuniga , Charles C. Garretson , Douglas R. McAllister , Jian Lin , Stacy Meyer , Sidney P. Huey , Jeonghoon Oh , Trung T. Doan , Jeffrey Schmidt , Martin S. Wohlert , Kerry F. Hughes , James C. Wang , Danny Cam Toan Lu , Romain Beau De Lamenie , Venkata R. Balagani , Aden Martin Allen , Michael Jon Fong
发明人： Hung Chih Chen , Steven M. Zuniga , Charles C. Garretson , Douglas R. McAllister , Jian Lin , Stacy Meyer , Sidney P. Huey , Jeonghoon Oh , Trung T. Doan , Jeffrey Schmidt , Martin S. Wohlert , Kerry F. Hughes , James C. Wang , Danny Cam Toan Lu , Romain Beau De Lamenie , Venkata R. Balagani , Aden Martin Allen , Michael Jon Fong
IPC分类号： B24B1/00 , B23P19/00
CPC分类号： B24B37/32 , Y10T29/49815
摘要： A retaining ring can be shaped by machining or lapping the bottom surface of the ring to form a shaped profile in the bottom surface. The bottom surface of the retaining ring can include flat, sloped and curved portions. The lapping can be performed using a machine that dedicated for use in lapping the bottom surface of retaining rings. During the lapping the ring can be permitted to rotate freely about an axis of the ring. The bottom surface of the retaining ring can have curved or flat portions.
摘要翻译：保持环可以通过机械加工或研磨环的底部表面而在底面形成成形轮廓。保持环的底面可以包括平坦的，倾斜的和弯曲的部分。可以使用专用于研磨保持环底面的机器进行研磨。在研磨过程中，可以允许环绕环的轴线自由旋转。保持环的底面可以具有弯曲或平坦的部分。

44. 发明申请

US20110070810A1 MULTIPLE ZONE CARRIER HEAD WITH FLEXIBLE MEMBRANE 有权
标题翻译：带有柔性膜的多区域载体头
公开(公告)号：US20110070810A1
公开(公告)日：2011-03-24
申请号：US12955803
申请日：2010-11-29
申请人： Hung Chih Chen , Jeonghoon Oh , Tsz-Sin Siu , Thomas Brezoczky , Steven M. Zuniga
发明人： Hung Chih Chen , Jeonghoon Oh , Tsz-Sin Siu , Thomas Brezoczky , Steven M. Zuniga
IPC分类号： B24B1/00
CPC分类号： B24B37/30
摘要： A carrier head for chemical mechanical polishing of a substrate includes a base and a flexible membrane extending beneath the base. The flexible membrane includes a central portion with an outer surface providing a substrate receiving surface, a perimeter portion connecting the central portion to the base, and at least one flap extending from an inner surface of the central portion. The flap divides a volume between the flexible membrane and the base into a plurality of chambers, and the flap includes a laterally extending first section and an angled second section extending beneath the first section and connecting the laterally extending first section to the central portion.
摘要翻译：用于基板的化学机械抛光的承载头包括基部和在基部下方延伸的柔性膜。柔性膜包括具有提供基板接收表面的外表面的中心部分，将中心部分连接到基部的周边部分和从中心部分的内表面延伸的至少一个折片。翼片将柔性膜和基部之间的体积分成多个室，并且该翼片包括横向延伸的第一部分和在第一部分下方延伸并且将横向延伸的第一部分连接到中心部分的成角度的第二部分。

45. 发明授权

US06436228B1 Substrate retainer 失效
标题翻译：基板保持架
公开(公告)号：US06436228B1
公开(公告)日：2002-08-20
申请号：US09080094
申请日：1998-05-15
申请人： Steven M. Zuniga , Hung Chih Chen
发明人： Steven M. Zuniga , Hung Chih Chen
IPC分类号： C23F102
CPC分类号： B24B37/32 , B24B37/28
摘要： A retainer is used with an apparatus for polishing a substrate. The substrate has upper and lower surfaces and a lateral, substantially circular, perimeter. The apparatus has a polishing pad with an upper polishing surface for contacting and polishing the lower face of the substrate. The retainer has an inward facing retaining face for engaging and retaining the substrate against lateral movement during polishing of the substrate. The retaining face engages a substrate perimeter at more than substantially a single discrete circumferential location along the perimeter.
摘要翻译：保持器用于抛光衬底的装置。衬底具有上表面和下表面以及侧面，基本上圆形的周边。该装置具有抛光垫，该抛光垫具有用于接触和抛光基底下表面的上抛光表面。保持器具有向内的保持面，用于在衬底的抛光期间接合和保持衬底以防止横向移动。保持面在沿着周边的基本上一个单独的离散圆周位置处接合基底周边。

46. 发明授权

US07883397B2 Substrate retainer 有权
标题翻译：基板保持架
公开(公告)号：US07883397B2
公开(公告)日：2011-02-08
申请号：US12259708
申请日：2008-10-28
申请人： Steven M. Zuniga , Hung Chih Chen
发明人： Steven M. Zuniga , Hung Chih Chen
IPC分类号： B24B37/04 , B24B41/06
CPC分类号： B24B37/32 , B24B37/28
摘要： A retainer is used with an apparatus for polishing a substrate. The substrate has upper and lower surfaces and a lateral, substantially circular, perimeter. The apparatus has a polishing pad with an upper polishing surface for contacting and polishing the lower face of the substrate. The retainer has an inward facing retaining face for engaging and retaining the substrate against lateral movement during polishing of the substrate. The retaining face engages a substrate perimeter at more than substantially a single discrete circumferential location along the perimeter.
摘要翻译：保持器用于抛光衬底的装置。衬底具有上表面和下表面以及侧面，基本上圆形的周边。该装置具有抛光垫，该抛光垫具有用于接触和抛光基底的下表面的上抛光表面。保持器具有向内的保持面，用于在衬底的抛光期间接合和保持衬底以防止横向移动。保持面在沿着周边的基本上一个单独的离散圆周位置处接合基底周边。

47. 发明申请

US20100099342A1 PAD CONDITIONER AUTO DISK CHANGE 审中-公开
标题翻译： PAD控制器自动盘更改
公开(公告)号：US20100099342A1
公开(公告)日：2010-04-22
申请号：US12255442
申请日：2008-10-21
申请人： Hung Chih Chen , Steven M. Zuniga , Donald J.K. Olgado
发明人： Hung Chih Chen , Steven M. Zuniga , Donald J.K. Olgado
IPC分类号： B24D9/08
CPC分类号： B24B53/017
摘要： A method and apparatus for replacing a polishing pad conditioning disk is a chemical mechanical polishing system is provided. The apparatus comprises a disk load/unload station for unloading used conditioning disks from a pad conditioning assembly and loading unused conditioning disks onto the pad conditioning assembly, on or more disk storage stations for storing both used and unused conditioning disks, and a central robot having a range of motion sufficient for transferring both used an unused conditioning disks between the disk load/unload station and the one or more disk storage stations. Embodiments described herein reduce the length of system interruption by eliminating the need to safety lock out the system for the replacement of polishing pad conditioning disks.
摘要翻译：一种用于更换抛光垫调节盘的方法和装置是提供化学机械抛光系统。该装置包括用于从衬垫调节组件卸载使用的调节盘并将未使用的调节盘装载到衬垫调节组件上的多个盘装载/卸载站，用于存储使用和未使用的调节盘的两个或多个盘存储站，以及一个中央机器人，足够的运动范围，用于在盘装载/卸载站和一个或多个盘存储站之间使用未使用的调节盘。本文所描述的实施例通过消除安全锁定系统来更换抛光垫调节盘来减少系统中断的长度。

48. 发明授权

US07344434B2 Retaining ring with shaped surface 有权
标题翻译：带环形表面的保持环
公开(公告)号：US07344434B2
公开(公告)日：2008-03-18
申请号：US10988211
申请日：2004-11-12
申请人： Hung Chih Chen , Steven M. Zuniga , Charles C. Garretson , Douglas R. McAllister , Stacy Meyer , Trung T. Doan , Daniel Cam Toan Lu , Romain Beau De Lamenie , Venkata R. Balagani , Aden Martin Allen , Michael Jon Fong
发明人： Hung Chih Chen , Steven M. Zuniga , Charles C. Garretson , Douglas R. McAllister , Stacy Meyer , Trung T. Doan , Daniel Cam Toan Lu , Romain Beau De Lamenie , Venkata R. Balagani , Aden Martin Allen , Michael Jon Fong
IPC分类号： B24B5/00
CPC分类号： B24B37/32 , Y10T29/49815
摘要： A retaining ring can be shaped by machining or lapping the bottom surface of the ring to form a shaped profile in the bottom surface. The bottom surface of the retaining ring can include flat, sloped and curved portions. The lapping can be performed using a machine that dedicated for use in lapping the bottom surface of retaining rings. During the lapping the ring can be permitted to rotate freely about an axis of the ring. The bottom surface of the retaining ring can have curved or flat portions.
摘要翻译：保持环可以通过机械加工或研磨环的底部表面而在底面形成成形轮廓。保持环的底面可以包括平坦的，倾斜的和弯曲的部分。可以使用专用于研磨保持环底面的机器进行研磨。在研磨期间，可以允许环围绕环的轴线自由旋转。保持环的底面可以具有弯曲或平坦的部分。

49. 发明申请

US20070281589A1 ROTATIONAL ALIGNMENT MECHANISM FOR LOAD CUPS 审中-公开
标题翻译：用于负载CUPS的旋转对准机构
公开(公告)号：US20070281589A1
公开(公告)日：2007-12-06
申请号：US11757193
申请日：2007-06-01
申请人： Jeonghoon Oh , Hung Chih Chen , Steven M. Zuniga
发明人： Jeonghoon Oh , Hung Chih Chen , Steven M. Zuniga
IPC分类号： B24B51/00 , B24B1/00
CPC分类号： B24B37/345 , H01L21/67748 , H01L21/68 , H01L21/68764
摘要： The present invention generally relates to a substrate transferring system having an alignment mechanism of a surface and to two points. One embodiment of the present invention provides a load cup for transferring a substrate. The load cup comprises a cup having a substrate supporting surface configured to support the substrate thereon, and two alignment pins protruding from the cup outside the substrate supporting surface, wherein the two alignment pins are both positioned at a first distance away from a center of the substrate supporting surface, and the cup is pivotable about a pivoting point positioned at a second distance away from the center.
摘要翻译：本发明一般涉及一种具有表面对准机构和两点的基片转印系统。本发明的一个实施例提供一种用于转移衬底的负载杯。负载杯包括具有构造成支撑其上的基板的基板支撑表面的杯和从基板支撑表面外部的杯突出的两个对准销，其中两个对准销都位于远离中心的第一距离处基板支撑表面，并且杯可围绕位于远离中心的第二距离的枢转点枢转。

50. 发明授权

US07273408B2 Paired pivot arm 有权
公开(公告)号：US07273408B2
公开(公告)日：2007-09-25
申请号：US11438497
申请日：2006-05-22
申请人： Hung Chih Chen , Steven M. Zuniga
发明人： Hung Chih Chen , Steven M. Zuniga
IPC分类号： B24B49/00 , B24B1/00
CPC分类号： B24B37/345 , B24B41/005
摘要： The present invention relates to an apparatus and method for polishing semiconductor substrates. In one embodiment, two polishing heads are mounted on two independent pivoting arms that share one pivot point. Each of the pivoting arms enable the corresponding polishing head direct access to two polishing stations. The polishing system of the present invention provides flexibility and improves throughput.

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