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    • 7. 发明授权
    • Carrier head with multiple chambers
    • 具有多个腔室的承载头
    • US07207871B1
    • 2007-04-24
    • US11245867
    • 2005-10-06
    • Steven M. ZunigaHung Chih ChenThomas BrezoczkySteven T. Mear
    • Steven M. ZunigaHung Chih ChenThomas BrezoczkySteven T. Mear
    • B24B5/00
    • B24B37/30B24B49/16
    • A system for chemical mechanical polishing having a carrier head with pressurizeable chambers that can be configured into pressure zones is described. The system includes a carrier head with a membrane for contacting a substrate during polishing. Pressurizeable chambers behind the membrane are in communication with pressure inputs. The pressure inputs can each supply a different pressure to the pressurizeable chambers. Some of the pressurizeable chambers can be in communication with more than one pressure input. Zones of pressure can be arranged, where each zone includes one or more pressurizeable chambers. The zones can be configurable by altering the pressurizeable chambers that make up each zone.
    • 描述了一种用于化学机械抛光的系统,该系统具有可被构造成压力区的具有可加压室的载体头。 该系统包括具有用于在抛光期间接触基底的膜的载体头部。 膜后面的可加压室与压力输入连通。 压力输入可以为可加压室提供不同的压力。 一些可加压室可以与多于一个的压力输入连通。 可以布置压力区域,其中每个区域包括一个或多个可加压室。 这些区域可以通过改变构成每个区域的可加压室来配置。