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    • 46. 发明申请
    • Method for fabricating conductive bump of circuit board
    • 电路板导电凸块的制造方法
    • US20060051952A1
    • 2006-03-09
    • US11079389
    • 2005-03-15
    • Shih-Ping HsuSao-Hsia TangYing-Tung WangWen-Hung HuChao-Wen ShihMeng-Da Chou
    • Shih-Ping HsuSao-Hsia TangYing-Tung WangWen-Hung HuChao-Wen ShihMeng-Da Chou
    • H01L21/44
    • H05K3/3473H01L21/4853H01L23/49816H01L2224/0554H01L2224/05568H01L2224/05573H01L2224/16225H01L2924/00014H05K3/242H05K3/4602H05K2201/0352H05K2201/09436H05K2201/096H05K2203/043H05K2203/054H05K2203/0574H05K2203/1476H05K2203/1572H05K2203/1581H01L2224/05599H01L2224/0555H01L2224/0556
    • A method for fabricating conductive bumps of a circuit board is proposed. First of all, a circuit board having a first surface and a corresponding second surface is provided. A circuit structure having a plurality of conductive pads is formed on each of the first surface and the second surface, and conductive structures are formed in the circuit board for electrically connecting the circuit structures. Also, an insulating layer having a plurality of openings penetrating therethrough is formed on the circuit board for exposing the conductive pad. Then, a conductive layer is formed on a surface of the insulating layer having the opening formed on the first surface of the circuit board. An electroplating process is performed via the conductive layer and the conductive structure, such that a conductive bump is formed on the conductive pad located on the second surface of the circuit board. Subsequently, a resist layer is formed on the second surface of the circuit board to cover the conductive bump, and another resist layer having openings penetrating therethrough is formed on the first surface of the circuit board to expose the conductive pad. Finally, a conductive bump is formed on the conductive pad located on the first surface of the circuit board by an electroplating process. By such arrangement, the conductive bumps are successively formed on the first surface and the second surface of the circuit board.
    • 提出了一种用于制造电路板的导电凸块的方法。 首先,提供具有第一表面和相应的第二表面的电路板。 在所述第一表面和所述第二表面中的每一个上形成具有多个导电焊盘的电路结构,并且在所述电路板中形成导电结构以电连接所述电路结构。 此外,在电路板上形成具有贯穿其中的多个开口的绝缘层,用于暴露导电焊盘。 然后,在具有形成在电路板的第一表面上的开口的绝缘层的表面上形成导电层。 通过导电层和导电结构进行电镀处理,使得在位于电路板的第二表面上的导电焊盘上形成导电凸块。 随后,在电路板的第二表面上形成抗蚀剂层以覆盖导电凸块,并且在电路板的第一表面上形成具有贯穿其中的开口的另一个抗蚀剂层,以露出导电焊盘。 最后,通过电镀工艺在位于电路板的第一表面上的导电焊盘上形成导电凸块。 通过这种布置,导电凸块依次形成在电路板的第一表面和第二表面上。
    • 48. 发明授权
    • Substrate within a Ni/Au structure electroplated on electrical contact pads and method for fabricating the same
    • 在电接触焊盘上电镀的Ni / Au结构中的衬底及其制造方法
    • US06853084B2
    • 2005-02-08
    • US10364431
    • 2003-02-10
    • Shih-Ping HsuChiang-Du ChenYen-Hung Liu
    • Shih-Ping HsuChiang-Du ChenYen-Hung Liu
    • H01L21/48H01L23/498H05K3/24H01L23/52H01L23/48H01L29/40
    • H01L23/49811H01L21/4846H01L2924/0002H05K3/243H05K2203/0542H05K2203/0577H05K2203/1476H01L2924/00
    • The present invention discloses a substrate within a Ni/Au structure electroplated on electrical contact pads and a method for fabricating the same. The method comprises: providing a substrate with a circuit layout pattern and forming a conducting film on the surface of the substrate; depositing a first photoresist layer within an opening on said electrical conducting film surface to expose a portion of said circuit layout pattern to be electrical contact pads; removing the exposed conducting film uncovered by the first photoresist layer; depositing a second photoresist layer, covering the conducting film exposed in the openings of the first photoresist layer; electroplating Ni/Au covering the surface of the electrical contact pads; removing the first and second photoresists, and the conducting film covered by the photoresists; depositing solder mask on the substrate within an opening to expose said electrical contact pads. It improves the electrical coupling between gold wires and the electrical contact pads of the substrate, prevents the electrical contact pads from oxidation, and insurances the electrical interconnection performance.
    • 本发明公开了在电接触焊盘上电镀的Ni / Au结构内的基板及其制造方法。 该方法包括:提供具有电路布局图案的衬底并在衬底的表面上形成导电膜; 在所述导电膜表面上的开口内沉积第一光致抗蚀剂层,以将所述电路布局图案的一部分暴露为电接触焊盘; 去除未被所述第一光致抗蚀剂层覆盖的暴露的导电膜; 沉积第二光致抗蚀剂层,覆盖暴露在第一光致抗蚀剂层的开口中的导电膜; 覆盖电接触垫表面的电镀Ni / Au; 去除第一和第二光致抗蚀剂,以及由光致抗蚀剂覆盖的导电膜; 在开口内的衬底上沉积焊料掩模以暴露所述电接触焊盘。 它改善了金线和基片的电接触焊盘之间的电耦合,防止了电接触垫的氧化,并保证了电气互连性能。