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    • 1. 发明授权
    • Substrate within a Ni/Au structure electroplated on electrical contact pads and method for fabricating the same
    • 在电接触焊盘上电镀的Ni / Au结构中的衬底及其制造方法
    • US06853084B2
    • 2005-02-08
    • US10364431
    • 2003-02-10
    • Shih-Ping HsuChiang-Du ChenYen-Hung Liu
    • Shih-Ping HsuChiang-Du ChenYen-Hung Liu
    • H01L21/48H01L23/498H05K3/24H01L23/52H01L23/48H01L29/40
    • H01L23/49811H01L21/4846H01L2924/0002H05K3/243H05K2203/0542H05K2203/0577H05K2203/1476H01L2924/00
    • The present invention discloses a substrate within a Ni/Au structure electroplated on electrical contact pads and a method for fabricating the same. The method comprises: providing a substrate with a circuit layout pattern and forming a conducting film on the surface of the substrate; depositing a first photoresist layer within an opening on said electrical conducting film surface to expose a portion of said circuit layout pattern to be electrical contact pads; removing the exposed conducting film uncovered by the first photoresist layer; depositing a second photoresist layer, covering the conducting film exposed in the openings of the first photoresist layer; electroplating Ni/Au covering the surface of the electrical contact pads; removing the first and second photoresists, and the conducting film covered by the photoresists; depositing solder mask on the substrate within an opening to expose said electrical contact pads. It improves the electrical coupling between gold wires and the electrical contact pads of the substrate, prevents the electrical contact pads from oxidation, and insurances the electrical interconnection performance.
    • 本发明公开了在电接触焊盘上电镀的Ni / Au结构内的基板及其制造方法。 该方法包括:提供具有电路布局图案的衬底并在衬底的表面上形成导电膜; 在所述导电膜表面上的开口内沉积第一光致抗蚀剂层,以将所述电路布局图案的一部分暴露为电接触焊盘; 去除未被所述第一光致抗蚀剂层覆盖的暴露的导电膜; 沉积第二光致抗蚀剂层,覆盖暴露在第一光致抗蚀剂层的开口中的导电膜; 覆盖电接触垫表面的电镀Ni / Au; 去除第一和第二光致抗蚀剂,以及由光致抗蚀剂覆盖的导电膜; 在开口内的衬底上沉积焊料掩模以暴露所述电接触焊盘。 它改善了金线和基片的电接触焊盘之间的电耦合,防止了电接触垫的氧化,并保证了电气互连性能。
    • 2. 发明授权
    • Method for fabricating substrate within a Ni/Au structure electroplated on electrical contact pads
    • 在电接触焊盘上电镀的Ni / Au结构中制造衬底的方法
    • US06576540B2
    • 2003-06-10
    • US10104976
    • 2002-03-22
    • Shih-Ping HsuChiang-Du ChenYen-Hung Liu
    • Shih-Ping HsuChiang-Du ChenYen-Hung Liu
    • H01L2144
    • H01L23/49811H01L21/4846H01L2924/0002H05K3/243H05K2203/0542H05K2203/0577H05K2203/1476H01L2924/00
    • The present invention discloses a substrate within a Ni/Au structure electroplated on electrical contact pads and a method for fabricating the same. The method comprises: providing a substrate with a circuit layout pattern and forming a conducting film on the surface of the substrate; depositing a first photoresist layer within an opening on said electrical conducting film surface to expose a portion of said circuit layout pattern to be electrical contact pads; removing the exposed conducting film uncovered by the first photoresist layer; depositing a second photoresist layer, covering the conducting film exposed in the openings of the first photoresist layer; electroplating Ni/Au covering the surface of the electrical contact pads; removing the first and second photoresists, and the conducting film covered by the photoresists; depositing solder mask on the substrate within an opening to expose said electrical contact pads. It improves the electrical coupling between gold wires and the electrical contact pads of the substrate, prevents the electrical contact pads from oxidation, and insurances the electrical interconnection performance.
    • 本发明公开了在电接触焊盘上电镀的Ni / Au结构内的基板及其制造方法。 该方法包括:提供具有电路布局图案的衬底并在衬底的表面上形成导电膜; 在所述导电膜表面上的开口内沉积第一光致抗蚀剂层,以将所述电路布局图案的一部分暴露为电接触焊盘; 去除未被所述第一光致抗蚀剂层覆盖的暴露的导电膜; 沉积第二光致抗蚀剂层,覆盖暴露在第一光致抗蚀剂层的开口中的导电膜; 覆盖电接触垫表面的电镀Ni / Au; 去除第一和第二光致抗蚀剂,以及由光致抗蚀剂覆盖的导电膜; 在开口内的衬底上沉积焊料掩模以暴露所述电接触焊盘。 它改善了金线和基片的电接触焊盘之间的电耦合,防止了电接触垫的氧化,并保证了电气互连性能。