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    • 42. 发明授权
    • Magnetically actuated ink jet printing device
    • 磁致动喷墨打印装置
    • US06234608B1
    • 2001-05-22
    • US08869946
    • 1997-06-05
    • Frank C. GenoveseJoel A. KubbyEric PeetersJinkuang ChenDan A. HaysStephen F. Pond
    • Frank C. GenoveseJoel A. KubbyEric PeetersJinkuang ChenDan A. HaysStephen F. Pond
    • B41J204
    • B41J2/1629B41J2/14B41J2/16B41J2/1631B41J2/1635B41J2/1639B41J2/1645B41J2/1646B41J2002/041B41J2002/14387B41J2202/13
    • A magnetically actuated ink jet printing device for use in an ink jet printer ejects ink droplets by deforming a diaphragm with the force generated on an electrode in a magnetic field when an electric current pulse is applied thereto. In one embodiment, the diaphragm of the device is provided by anisotropically etching a silicon substrate with an etch stop which provides a thin membrane of silicon material for use as the diaphragm. An electrode having an input and output terminal is patterned over the diaphragm and a sacrificial layer is deposited over the silicon substrate surface containing the diaphragm. The sacrificial layer is patterned to subsequently provide the ink ejection chamber over the diaphragm. A patternable layer is deposited over the silicon substrate surface including the sacrificial layer and patterned to provide the nozzles and expose the electrode terminals. The sacrificial layer is removed and an ink supply is connected to the space previously occupied by the sacrificial layer. Magnetic field generating means having a predetermined magnetic field strength are placed adjacent the device, and electric current applied to the electrode terminals in a predetermined direction relative to the magnetic field produces a force necessary to deform the diaphragm and eject an ink droplet from the nozzles of the printing device.
    • 在喷墨打印机中使用的磁致动喷墨打印装置在施加电流脉冲时,通过在电极上产生的力使膜片变形而喷射墨滴。 在一个实施例中,通过用提供用作隔膜的硅材料薄膜的蚀刻停止件各向异性地蚀刻硅衬底来提供器件的隔膜。 具有输入和输出端子的电极在隔膜上图案化,并且牺牲层沉积在包含隔膜的硅衬底表面上。 牺牲层被图案化以随后在隔膜上提供喷墨室。 在包括牺牲层的硅衬底表面上沉积可图案化层并且被图案化以提供喷嘴并暴露电极端子。 除去牺牲层,并且将墨水供应源连接到先前由牺牲层占据的空间。 具有预定磁场强度的磁场产生装置被放置在与装置相邻的位置,并且相对于磁场沿预定方向施加到电极端子的电流产生使膜片变形所需的力,并且从喷嘴的喷嘴喷出墨滴 打印设备。
    • 45. 发明授权
    • Wafer chuck for inducing an electrical bias across wafer heterojunctions
    • 用于在晶片异质结上引起电偏置的晶片卡盘
    • US5865938A
    • 1999-02-02
    • US670042
    • 1996-06-25
    • Eric PeetersJoel A. Kubby
    • Eric PeetersJoel A. Kubby
    • C23F4/00B81C1/00H01L21/302H01L21/3065H01L21/683H01L49/00C23F1/08C23F1/00
    • B81C1/00531H01L21/6833
    • A dry etch apparatus for micromachining a substrate having a first and a second layer of dissimilar materials joined together at a heterojunction includes a chuck for holding the substrate. The chuck has a first electrical contact positionable to contact the first layer, and second electrical contact positionable to contact the second layer, with the first and second electrical contacts being electrically isolated from each other. A voltage source is connected to the first electrical contact of the chuck to apply a voltage potential across the heterojunction of the substrate. When a plasma containing chemically reactive ions is directed against the second layer, etching of non-masked regions continues unless it is substantially stopped at the voltage biased substrate heterojunction. The substrate can be cooled or periodically recoated with erodable protective material to limit sidewall damage to the substrate while still allowing downward etching into the substrate. This dry etch process is well suited for construction of dimensionally accurate microdevices and microelectromechanical systems.
    • 用于微加工具有异质结连接在一起的第一和第二不同材料层的衬底的干蚀刻装置包括用于保持衬底的卡盘。 卡盘具有可定位成与第一层接触的第一电接触件和可定位成接触第二层的第二电接触件,第一和第二电接触件彼此电隔离。 电压源连接到卡盘的第一电触点,以跨越衬底的异质结施加电压电位。 当含有化学反应性离子的等离子体指向第二层时,非掩蔽区域的蚀刻继续进行,除非其基本上停在电压偏置衬底异质结上。 可以用可侵蚀的保护材料冷却或周期性地重新涂覆衬底,以限制对衬底的侧壁损伤,同时仍然允许向下蚀刻到衬底中。 这种干蚀刻工艺非常适用于尺寸精确的微型器件和微机电系统的构造。