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    • 42. 发明申请
    • NiO-based Resistive Random Access Memory and the Preparation Method Thereof
    • 基于NiO的电阻随机存取存储器及其制备方法
    • US20120305882A1
    • 2012-12-06
    • US13498973
    • 2011-09-23
    • Jingjing GuQingqing SunPengfei WangPeng ZhouWei Zhang
    • Jingjing GuQingqing SunPengfei WangPeng ZhouWei Zhang
    • H01L45/00H01L21/02
    • H01L45/146G11C13/0007H01L45/06H01L45/16
    • The present invention belongs to the technical field of memory storage and specially relates to a NiO-based resistive random access memory system (RRAM) and a preparation method thereof. The RRAM is comprised of a substrate and a metal-insulator-metal (MIM) structure, wherein the electrodes are metal films, such as copper, aluminum, etc., capable of being applied to the interconnection process, and the resistive switching insulator is an Al2O3/NiO/Al2O3 laminated dielectric film. The MIM structure in the invention shows stable switching between the bi-stable resistance states as well as memory features; compared with the RRAM that only uses a single NiO-based dielectric film, the storage window is increased, and the resistance stability is improved. Therefore, the NiO-based RRAM has a good prospect in actual application. The present invention further provides a method for preparing the abovementioned memory storage system.
    • 本发明属于存储器的技术领域,特别涉及一种基于NiO的电阻随机存取存储器(RRAM)及其制备方法。 RRAM由衬底和金属 - 绝缘体 - 金属(MIM)结构构成,其中电极是可应用于互连工艺的金属膜,例如铜,铝等,并且电阻式开关绝缘子是 Al2O3 / NiO / Al2O3层压电介质膜。 本发明的MIM结构显示了稳定的电阻状态和存储特征之间的稳定切换; 与仅使用单个NiO基电介质膜的RRAM相比,存储窗口增加,并且电阻稳定性得到改善。 因此,基于NiO的RRAM在实际应用中具有良好的前景。 本发明还提供了一种用于制备上述存储器存储系统的方法。
    • 44. 发明申请
    • GATE CONTROLLED PN FIELD-EFFECT TRANSISTOR AND THE CONTROL METHOD THEREOF
    • 门控制PN场效应晶体管及其控制方法
    • US20120200342A1
    • 2012-08-09
    • US13501826
    • 2011-05-19
    • Pengfei WangSonggan ZangQingqing SunWei Zhang
    • Pengfei WangSonggan ZangQingqing SunWei Zhang
    • G05F3/02H01L29/04H01L29/78
    • H01L29/7391H01L29/66356
    • The present invention belongs to the technical field of semiconductor devices, and more specifically, relates to a gate-controlled PN field-effect transistor and the control method thereof The gate-controlled PN field-effect transistor disclosed by the present invention comprises a semiconductor substrate region, a drain region and a source region on the left and right sides of the substrate region, and gate regions on the upper and lower sides of the substrate region. The gate-controlled PN field-effect transistor works in the positive bias state of the source-drain PN junction and is conducted from the middle of the substrate region. The gate-controlled PN field-effect transistor provided by the present invention decreases the leakage current and increases the drive current at the same time, namely decreases the chip power consumption and improves the chip performances at the same time. The present invention further discloses a method for controlling the gate-controlled PN field-effect transistor, including cut-off and conduction operation.
    • 本发明属于半导体器件的技术领域,更具体地涉及一种栅极控制PN场效应晶体管及其控制方法本发明公开的栅极控制PN场效应晶体管包括半导体衬底 区域,漏极区域和源极区域以及衬底区域的上侧和下侧上的栅极区域。 栅极控制的PN场效应晶体管工作在源极 - 漏极PN结的正偏置状态,并从衬底区域的中间传导。 本发明提供的栅控PN场效应晶体管同时降低漏电流并增加驱动电流,即降低芯片功耗,同时提高芯片性能。 本发明还公开了一种用于控制栅极控制的PN场效应晶体管的方法,包括截止和导通操作。
    • 45. 发明申请
    • Power Device Using Photoelectron Injection to Modulate Conductivity and the Method Thereof
    • 使用光电子注入的功率器件调制电导率及其方法
    • US20120182063A1
    • 2012-07-19
    • US13498778
    • 2011-04-21
    • Pengfei WangQingqing SunShijin DingWei Zhang
    • Pengfei WangQingqing SunShijin DingWei Zhang
    • H01L31/167
    • H01L31/1136H01L31/167
    • The present invention belongs to the technical field of semiconductor devices, and discloses a power device using photoelectron injection to modulate conductivity and the method thereof. The power device comprises at least one photoelectron injection light source and a power MOS transistor. The present invention uses photoelectron injection method to inject carriers to the drift region under the gate of the power MOS transistor, thus modulating the conductivity and further decreasing the specific on-resistance of the power MOS transistor. Moreover, as the doping concentration of the drift region can be decreased and the blocking voltage can be increased, the performance of the power MOS transistor can be greatly improved and the application of power MOS transistor can be expanded to high-voltage fields.
    • 本发明属于半导体器件的技术领域,并且公开了使用光电子注入来调节电导率的功率器件及其方法。 功率器件包括至少一个光电子注入光源和功率MOS晶体管。 本发明使用光电子注入方法将载流子注入功率MOS晶体管的栅极下方的漂移区域,从而调制导电率并进一步降低功率MOS晶体管的比导通电阻。 此外,随着漂移区域的掺杂浓度可以降低并且可以提高阻挡电压,可以大大提高功率MOS晶体管的性能,并且可以将功率MOS晶体管的应用扩展到高电压场。