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41. 发明授权

US06005879A Pulse energy control for excimer laser 失效
标题翻译：准分子激光脉冲能量控制
公开(公告)号：US06005879A
公开(公告)日：1999-12-21
申请号：US34870
申请日：1998-03-04
申请人： Richard L. Sandstrom , Herve Andre Besaucele , Igor V. Fomenkov , Palash P. Das
发明人： Richard L. Sandstrom , Herve Andre Besaucele , Igor V. Fomenkov , Palash P. Das
IPC分类号： H01S3/038 , G03F7/20 , H01S3/03 , H01S3/034 , H01S3/036 , H01S3/08 , H01S3/081 , H01S3/0971 , H01S3/134 , H01S3/225 , H01S3/00
CPC分类号： G03F7/70025 , G03F7/70041 , G03F7/70216 , G03F7/70558 , G03F7/70575 , H01S3/03 , H01S3/134 , H01S3/225 , H01S3/036 , H01S3/08009 , H01S3/0812 , H01S3/09713 , H01S3/2251 , H01S3/2256
摘要： A process for controlling pulse energy and integrated energy dose in bursts of pulses produced by an excimer laser. The energy of each pulse in each burst is measured. The rate of change of pulse energy with charging voltage is determined. A pulse energy error is determined for a previous pulse of the present burst. An integrated dose error is also determined for all previous pulses in the current burst. A charging voltage for the next pulse is determined using the pulse energy error, the integrated dose error, the rate of change of energy with charging voltage and a reference voltage. In a preferred embodiment, the rate of change of energy with voltage is determined by dithering the voltage during two pulses of each burst, once lower and once higher. The reference voltage is a voltage calculated using prior energy and voltage data. In this embodiment, the method of determining the reference voltage during a first portion of the pulse is different from the method used during a latter portion of the burst. During the first set of pulses (40 in this embodiment), for each pulse, a specified voltage calculated using voltage and energy data from a corresponding pulse in a previous burst is utilized as a prediction of the voltage needed to produce a pulse energy converging on a target pulse energy. For pulses 41 and thereafter the reference voltage for each pulse is the specified voltage for the previous pulse.
摘要翻译：用于在由准分子激光器产生的脉冲脉冲中控制脉冲能量和积分能量剂量的过程。测量每个脉冲中每个脉冲的能量。确定脉冲能量随充电电压的变化率。针对当前脉冲串的先前脉冲确定脉冲能量误差。还针对当前突发中的所有先前脉冲确定积分剂量误差。使用脉冲能量误差，积分剂量误差，带充电电压的能量变化率和参考电压确定下一个脉冲的充电电压。在优选实施例中，通过在每个脉冲串的两个脉冲期间抖动电压来确定能量与电压的变化率，一旦较低和一次较高。参考电压是使用先前的能量和电压数据计算的电压。在本实施例中，在脉冲的第一部分期间确定参考电压的方法与在脉冲串的后一部分期间使用的方法不同。在第一组脉冲（在本实施例中为40）中，对于每个脉冲，使用从先前脉冲串中的对应脉冲的电压和能量数据计算的指定电压作为产生脉冲能量收敛所需的电压的预测目标脉冲能量。对于脉冲41，此后每个脉冲的参考电压是先前脉冲的指定电压。

42. 发明授权

US5887014A Process for selecting operating range for narrow band excimer laser 失效
标题翻译：选择窄带准分子激光器工作范围的方法
公开(公告)号：US5887014A
公开(公告)日：1999-03-23
申请号：US915030
申请日：1997-08-20
申请人： Palash P. Das
发明人： Palash P. Das
IPC分类号： G03F7/20 , H01S3/097 , H01S3/134 , H01S3/225 , H01S3/22 , H01S3/223
CPC分类号： H01S3/225
摘要： A process for selecting an operating range for a narrow band KrF or ArF excimer laser. The laser is operated at a desired pulse energy until the fluorine concentration has depleted sufficiently so that the charging voltage needed for the desired pulse energy is at or near a predetermined maximum range. The average charging voltage, the average line width, and the average energy sigma are recorded; and the fluorine concentration is estimated or determined. A quantity of fluorine, at least sufficient to cause a measurable decrease in the charging voltage needed to produce the desired pulse energy, is injected; and another set of data is recorded. Another similar quantity of fluorine is injected, and another set of data is recorded. These two steps are repeated until the voltage is at or near a predetermined minimum voltage range. The recorded data are used to select an optional operating range. The data may be plotted to make the selection easier. The selection criteria may be determined based on the needs of the laser user. Normally, the selection process will involve an intelligent compromise in which minimum values of charging voltage, fluorine concentration, line width and energy sigma are desired. For most uses, the optimal operating range will be a voltage range of 20% of the total possible voltage range and not close to either the minimum operating range or the maximum operating range.
摘要翻译：用于选择窄带KrF或ArF准分子激光器的操作范围的方法。激光以期望的脉冲能量运行，直到氟浓度充分耗尽，使得所需脉冲能量所需的充电电压处于或接近预定的最大范围。记录平均充电电压，平均线宽和平均能量sigma; 并且氟浓度被估计或确定。注入至少足以引起产生期望的脉冲能量所需的充电电压的可测量的降低量的氟的量; 并记录另一组数据。注入另一类似量的氟，并记录另一组数据。重复这两个步骤，直到电压处于或接近预定的最小电压范围。记录的数据用于选择可选的操作范围。可以绘制数据以使选择更容易。选择标准可以基于激光用户的需要来确定。通常，选择过程将涉及智能折中，其中期望充电电压，氟浓度，线宽和能量Σ的最小值。对于大多数用途，最佳工作范围是电压范围为总可能电压范围的20％，不能接近最小工作范围或最大工作范围。

43. 发明授权

US5377215A Excimer laser 失效
标题翻译：准分子激光
公开(公告)号：US5377215A
公开(公告)日：1994-12-27
申请号：US975652
申请日：1992-11-13
申请人： Palash P. Das , Donald G. Larson
发明人： Palash P. Das , Donald G. Larson
IPC分类号： H01S3/038 , H01S3/03 , H01S3/036 , H01S3/04 , H01S3/041 , H01S3/134 , H01S3/225
CPC分类号： H01S3/134 , H01S3/036 , H01S3/041 , H01S3/225
摘要： A housing in a laser system encloses a cathode and a displaced anode and gases ionizable and reactive chemically when a voltage pulse produces a cathode-anode electrical discharge. Moving air cools the components (capacitors, thyratron and triggering circuitry) for producing the voltage pulses. The laser gas temperature is continuously regulated at a particular value whether or not there is an electrical discharge. The concentration of one of the gases in the chamber is regulated to values alternately on opposite sides of an optimal value to provide an optimal energy in each chemical reaction of the gases. The gases are recirculated as by a fan driven on a shaft by a pair of motors and are filtered during such recirculation. The shaft speed is regulated at a particular value and the motor currents are regulated to be equal. Any ozone formed in a compartment holding the high voltage terminals is purged by passing a neutral gas (nitrogen) through the compartment to the atmosphere. The neutral gas is passed into the housing through a hose which also holds a high voltage wire in insulated relationship to other electrical components. A collar arrangement at one wire end provides for the introduction of voltage from the collar to the anode of the thyratron with the hose coupled to the housing and grounds the collar with the wire decoupled from the housing. The different high voltage components are sequentially tested for their operability by a system and method unique to this invention.
摘要翻译：当电压脉冲产生阴极 - 阳极放电时，激光系统中的外壳包围阴极和置换的阳极以及可电化学和化学反应的气体。移动空气冷却组件（电容器，闸流管和触发电路）以产生电压脉冲。激光气体温度是否连续地调节在特定值，不管是否有放电。腔室中的一种气体的浓度在最佳值的相对侧交替地调节为值，以在气体的每个化学反应中提供最佳能量。气体通过由一对电动机驱动在轴上的风扇再循环，并且在这种再循环期间被过滤。轴速度被调节在特定值，并且电动机电流被调节为相等。通过将中性气体（氮气）通过隔室传送到大气中来清洁在保持高电压端子的隔室中形成的任何臭氧。中性气体通过软管进入壳体，该软管还保持与其它电气部件绝缘的高压电线。在一个线端处的套环布置提供了从套环到闸流管的阳极的电压的引入，其中软管联接到壳体并且将线圈与线分离的壳体接合。通过本发明特有的系统和方法，对不同的高压部件依次测试其可操作性。

44. 发明授权

US08737438B2 Systems and methods for implementing an interaction between a laser shaped as line beam and a film deposited on a substrate 有权
标题翻译：用于实现激光成形为线束和沉积在基底上的膜之间的相互作用的系统和方法
公开(公告)号：US08737438B2
公开(公告)日：2014-05-27
申请号：US13571129
申请日：2012-08-09
申请人： Palash P. Das , Thomas Hofmann , Jesse D. Davis , Richard L. Sandstrom
发明人： Palash P. Das , Thomas Hofmann , Jesse D. Davis , Richard L. Sandstrom
IPC分类号： H01S3/10
CPC分类号： B23K26/043 , B23K26/04 , B23K26/0622 , B23K26/0738 , C30B1/023 , C30B13/24
摘要： A laser crystallization apparatus and method are disclosed for selectively melting a film such as amorphous silicon that is deposited on a substrate. The apparatus may comprise an optical system for producing stretched laser pulses for use in melting the film. In still another aspect of an embodiment of the present invention, a system and method are provided for stretching a laser pulse. In another aspect, a system is provided for maintaining a divergence of a pulsed laser beam (stretched or non-stretched) at a location along a beam path within a predetermined range. In another aspect, a system may be provided for maintaining the energy density at a film within a predetermined range during an interaction of the film with a shaped line beam.
摘要翻译：公开了一种激光结晶装置和方法，用于选择性地熔融沉积在基底上的诸如非晶硅的膜。该装置可以包括用于产生用于熔化膜的拉伸激光脉冲的光学系统。在本发明实施例的另一方面，提供一种用于拉伸激光脉冲的系统和方法。在另一方面，提供了一种系统，用于在预定范围内沿着光束路径的位置维持脉冲激光束的发散（拉伸或未拉伸）。在另一方面，可以提供一种系统，用于在膜与成形线束的相互作用期间将膜处的能量密度保持在预定范围内。

45. 发明授权

US07471455B2 Systems and methods for generating laser light shaped as a line beam 有权
标题翻译：用于产生形成为线束的激光的系统和方法
公开(公告)号：US07471455B2
公开(公告)日：2008-12-30
申请号：US11261948
申请日：2005-10-28
申请人： Palash P. Das , Albert P. Cefalo , David S. Knowles , Vitaliy Shklover , Holger Muenz
发明人： Palash P. Das , Albert P. Cefalo , David S. Knowles , Vitaliy Shklover , Holger Muenz
IPC分类号： G02B27/10
CPC分类号： G02B19/0009 , G02B7/004 , G02B19/0028 , G02B19/0052 , G02B27/095 , G02B27/0977 , G02B27/0988
摘要： Systems and methods are disclosed for shaping a laser beam for interaction with a film in which the laser beam travels along a beam path and defines a short-axis and a long-axis. In one aspect, the system may include a first short-axis element having an edge positioned at a distance, d1, along the beam path from the film and a second short-axis element having an edge positioned at a distance, d2, along the beam path from the film, with d2
摘要翻译：公开了用于成形激光束以与激光束沿着光束路径行进并且限定短轴和长轴的膜相互作用的系统和方法。在一个方面，该系统可以包括第一短轴元件，该第一短轴元件具有沿着从胶片的光束路径定位在距离d1处的边缘，以及第二短轴元件，其具有沿着距离的距离d2定位的边缘来自胶片的光束路径，d2

46. 发明授权

US07190707B2 Gas discharge laser light source beam delivery unit 有权
标题翻译：气体放电激光光源射束单元
公开(公告)号：US07190707B2
公开(公告)日：2007-03-13
申请号：US10739961
申请日：2003-12-17
申请人： Palash P. Das , Khurshid Ahmed , Gregory Francis , Holger Glatzel , Alexei Lukashev , Jeremy Tyler , R. Kyle Webb
发明人： Palash P. Das , Khurshid Ahmed , Gregory Francis , Holger Glatzel , Alexei Lukashev , Jeremy Tyler , R. Kyle Webb
IPC分类号： H01S3/22
CPC分类号： B23K26/12 , B23K26/128 , B23K26/705 , G01J1/04 , G01J1/0418 , G01J1/4257 , G01J2001/0285 , G03F7/70025 , G03F7/70041 , G03F7/7055 , G03F7/70575 , G03F7/70933 , H01S3/005 , H01S3/0057 , H01S3/0071 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/0943 , H01S3/097 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333 , H01S3/2366
摘要： A beam delivery unit and method of delivering a laser beam from a laser light source for excimer or molecular fluorine gas discharge laser systems in the DUV and smaller wavelengths is disclosed, which may comprise: a beam delivery enclosure defining an output laser light pulse beam delivery pat from an output of a gas discharge laser to an input of a working apparatus employing the light contained in the output laser light pulse beam; a purge mechanism operatively connected to the beam delivery enclosure; an in-situ beam parameter monitor and adjustment mechanism within the enclosure, comprising a retractable bean redirecting optic; a beam analysis mechanism external to the enclosure; and, a retraction mechanism within the enclosure and operable from outside the enclosure and operative to move the retractable beam redirecting optic from a retracted position out of the beam path to an operative position in the beam path. The BDU may also include a beam attenuator unit contained within the enclosure adjustably mounted within the enclosure for positioning within the beam delivery pat. The BDU may have at least two enclosure isolation mechanisms comprising a first enclosure isolation mechanism on a first side of the enclosure from the at least one optic module and a second enclosure isolation mechanism on a second side of the enclosure from the at least one optic module, each respective enclosure isolation mechanism comprising a flapper valve having a metal to metal seating mechanism and a locking pin assembly. A precision offset ratchet driver operative to manipulate actuator mechanisms in difficult to reach locations may be provided. An external kinematic alignment tool may be provided. A method of contamination control for a BDU is disclosed comprising selection of allowable materials and fabrication processes.
摘要翻译：公开了一种束传递单元和从DUV和较小波长的准分子或分子氟气体放电激光系统的激光光源传送激光束的方法，其可以包括：限定输出激光光脉冲束传送从气体放电激光器的输出拍摄到使用包含在输出激光脉冲光束中的光的工作装置的输入; 可操作地连接到射束输送罩的清洗机构; 外壳内的原位波束参数监视和调节机构，包括可伸缩的豆重定向光学元件; 外壳外部的光束分析机构; 以及在所述外壳内的收缩机构，并且可从所述外壳的外部操作，并且可操作地将所述可伸缩的束重定向光学器件从缩回位置移出所述光束路径到所述光束路径中的操作位置。 BDU还可以包括容纳在外壳内的光束衰减器单元，其可调节地安装在外壳内用于定位在光束输送光点内。 BDU可以具有至少两个机壳隔离机构，该机构包括位于外壳的第一侧面上的至少一个光学模块的第一外壳隔离机构和位于外壳的第二侧的第二外壳隔离机构，所述第二外壳隔离机构与所述至少一个光学模块每个相应的外壳隔离机构包括具有金属对金属安置机构和锁销组件的挡板阀。可以提供操作来操作难以到达位置的致动器机构的精密偏移棘轮驱动器。可以提供外部运动学对准工具。公开了一种用于BDU的污染控制方法，包括选择允许的材料和制造工艺。

47. 发明授权

US06671294B2 Laser spectral engineering for lithographic process 有权
公开(公告)号：US06671294B2
公开(公告)日：2003-12-30
申请号：US09918773
申请日：2001-07-27
申请人： Armen Kroyan , Ivan Lalovic , Igor V. Fomenkov , Palash P. Das , Richard L. Sandstrom , John M. Algots , Khurshid Ahmed
发明人： Armen Kroyan , Ivan Lalovic , Igor V. Fomenkov , Palash P. Das , Richard L. Sandstrom , John M. Algots , Khurshid Ahmed
IPC分类号： H01S310
CPC分类号： G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70575 , G03F7/70933 , H01S3/02 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/08009 , H01S3/08036 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/1024 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/13 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2308
摘要： An integrated circuit lithography technique called spectral engineering by Applicants, for bandwidth control of an electric discharge laser. In a preferred process, a computer model is used to model lithographic parameters to determine a desired laser spectrum needed to produce a desired lithographic result. A fast responding tuning mechanism is then used to adjust center wavelength of laser pulses in a burst of pulses to achieve an integrated spectrum for the burst of pulses approximating the desired laser spectrum. The laser beam bandwidth is controlled to produce an effective beam spectrum having at least two spectral peaks in order to produce improved pattern resolution in photo resist film. Line narrowing equipment is provided having at least one piezoelectric drive and a fast bandwidth detection control system having a time response of less than about 2.0 millisecond. In a preferred embodiment, a wavelength tuning mirror is dithered at dither rates of more than 500 dithers per second in phase with the repetition rate of the laser. In one case, the piezoelectric drive was driven with a square wave signal and in a second case it was driven with a sine wave signal. In another embodiment, the maximum displacement was matched on a one-to-one basis with the laser pulses in order to produce a desired average spectrum with two peaks for a series of laser pulses. Other preferred embodiments utilize three separate wavelength tuning positions producing a spectrum with three separate peaks.

48. 发明授权

US06529531B1 Fast wavelength correction technique for a laser 有权
标题翻译：用于激光的快速波长校正技术
公开(公告)号：US06529531B1
公开(公告)日：2003-03-04
申请号：US09597812
申请日：2000-06-19
申请人： George J. Everage , Igor V. Fomenkov , Palash P. Das , Richard L. Sandstrom , Frederick G. Erie , John M. Algots
发明人： George J. Everage , Igor V. Fomenkov , Palash P. Das , Richard L. Sandstrom , Frederick G. Erie , John M. Algots
IPC分类号： H01S310
CPC分类号： G03F7/70333 , G03F7/70575 , G03F7/70933 , H01S3/036 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/13 , H01S3/134 , H01S3/139 , H01S3/225
摘要： Electric discharge laser with fast chirp correction. Fast wavelength chirp correction equipment includes at least one piezoelectric drive and a fast wavelength detection means and has a feedback response time of less than 1.0 millisecond. In a preferred embodiment a simple learning algorithm is described to allow advance tuning mirror adjustment in anticipation of the learned chirp pattern. Techniques include a combination of a relatively slow stepper motor and a very fast piezoelectric driver. In another preferred embodiment chirp correction is made on a pulse-to-pulse basis where the wavelength of one pulse is measured and the wavelength of the next pulse is corrected based on the measurement. This correction technique is able to function at repetition rates as rapid as 2000 Hz and greater.
摘要翻译：具有快速啁啾校正的放电激光器。快速波长啁啾校正装置包括至少一个压电驱动器和快速波长检测装置，并具有小于1.0毫秒的反馈响应时间。在优选实施例中，描述了一种简单的学习算法，以便在预期学习的啁啾模式中允许预调谐镜调节。技术包括相对较慢的步进电机和非常快的压电驱动器的组合。在另一个优选实施例中，在脉冲对脉冲基础上进行啁啾校正，其中测量一个脉冲的波长，并且基于测量校正下一个脉冲的波长。该校正技术能够以2000Hz及更高的重复速率工作。

49. 发明授权

US06493374B1 Smart laser with fast deformable grating 失效
标题翻译：具有快速可变形光栅的智能激光
公开(公告)号：US06493374B1
公开(公告)日：2002-12-10
申请号：US09703317
申请日：2000-10-31
申请人： Igor V. Fomenkov , Frederick G. Erie , Jesse D. Buck , Palash P. Das
发明人： Igor V. Fomenkov , Frederick G. Erie , Jesse D. Buck , Palash P. Das
IPC分类号： H01S308
CPC分类号： H01S3/13 , G03F7/70025 , G03F7/70575 , H01S3/02 , H01S3/03 , H01S3/0401 , H01S3/08059 , H01S3/0812 , H01S3/086 , H01S3/1055 , H01S3/134 , H01S3/139 , H01S3/1392 , H01S3/225 , H01S3/2256
摘要： A smart laser having automatic computer control of pulse energy, wavelength and bandwidth using feedback signals from a wavemeter. Pulse energy is controlled by controlling discharge voltage, wavelength by controlling the position of an RMAX mirror and bandwidth is controller by adjusting the curvature of a grating to shapes more complicated than simple convex or simple concave. A preferred embodiment provides seven piezoelectric driven pressure-tension locations on the back side of the grating at 5 horizontal locations to produce shapes such as S shapes, W shapes and twisted shapes. Preferred embodiments include automatic feedback control of horizontal and vertical beam profile by automatic adjustment of a prism plate on which beam expander prisms are located and automatic adjustment of the RMAX tilt.
摘要翻译：智能激光器具有使用来自波形计的反馈信号自动计算脉冲能量，波长和带宽的计算机控制。通过控制RMAX镜的位置来控制放电电压，波长来控制脉冲能量，通过调整光栅的曲率使形状比简单的凸形或简单的凹形更复杂，带宽是控制器。优选实施例在5个水平位置上在光栅背面提供七个压电驱动压力 - 张力位置，以产生诸如S形，W形和扭曲形状的形状。优选实施例包括通过自动调节光束扩展器棱镜所在的棱镜板和自动调整RMAX倾斜来自动反馈水平和垂直光束轮廓。

50. 发明授权

US6141081A Stepper or scanner having two energy monitors for a laser 失效
标题翻译：具有两个用于激光的能量监视器的步进或扫描器
公开(公告)号：US6141081A
公开(公告)日：2000-10-31
申请号：US908862
申请日：1997-08-08
申请人： Palash P. Das , Igor V. Fomenkov
发明人： Palash P. Das , Igor V. Fomenkov
IPC分类号： G03F7/20 , H01L21/027 , H01S3/225 , G03B27/42 , G03B27/74 , G03C5/00 , G21G5/00
CPC分类号： G03F7/70358 , G03F7/70558 , H01S3/225
摘要： A first laser light intensity detector is positioned within a stepper or scanner proximate to a reticle so that attenuation due to stepper optics has already occurred prior to the laser light impinging upon the light intensity detector. Preferably, the first light intensity detector is mounted as closed to the wafer as practical. A second light intensity detector is located at the output of the laser. The light intensity detected from the outputs of the first and second light intensity detectors, in conjunction, forms part of a feedback mechanism which adjusts the light output of the laser, during wafer fabrication, so that the light intensity detected by the first light intensity detector is an optimum value.
摘要翻译：第一激光强度检测器位于靠近光罩的步进器或扫描仪内，使得在激光照射在光强度检测器之前已经发生由步进光学器件引起的衰减。优选地，第一光强度检测器被实际地安装在晶片上。第二个光强度检测器位于激光器的输出端。从第一和第二光强度检测器的输出检测到的光强度一起形成反馈机构的一部分，该反馈机构在晶片制造期间调节激光器的光输出，使得由第一光强度检测器检测的光强度是最佳值。

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