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    • 43. 发明授权
    • Photomultiplier having a multilayer semiconductor device
    • 具有多层半导体器件的光电倍增管
    • US5654536A
    • 1997-08-05
    • US557541
    • 1995-11-14
    • Motohiro SuyamaMasaharu MuramatsuMakoto OishiYoshitaka IshikawaKoei Yamamoto
    • Motohiro SuyamaMasaharu MuramatsuMakoto OishiYoshitaka IshikawaKoei Yamamoto
    • H01J43/04H01J43/12H01L31/107H01J40/14
    • H01L31/1075H01J43/04H01J43/12
    • In a photomultiplier of the present invention, a semiconductor device arranged in an envelope to oppose a photocathode is constituted by a semiconductor substrate of a first conductivity type, a carrier multiplication layer of a second conductivity type different from the first conductivity type, which is formed on the semiconductor substrate by opitaxial growth, a breakdown voltage control layer of the second conductivity type, which is formed on the carrier multiplication layer and has a dopant concentration higher than that of the carrier multiplication layer, a first insulating layer formed on the breakdown voltage control layer and said carrier multiplication layer while partially exposing the surface of the breakdown voltage control layer as a receptor for photoelectrons and consisting of a nitride, and an ohmic electrode layer formed on a peripheral surface portion of the receptor of the breakdown voltage control layer. When the dopant concentration distribution in the carrier multiplication layer is uniformly controlled on the basis of epitaxial growth, the uniformity of an avalanche multiplication gain for photoelectrons incident at different positions on the receptor of the semiconductor device is improved, thereby largely increasing the energy resolving power.
    • 在本发明的光电倍增器中,布置在外壳中以与光电阴极相对的半导体器件由第一导电类型的半导体衬底,不同于第一导电类型的第二导电类型的载流子倍增层构成,形成 在所述半导体衬底上通过外延生长形成第二导电类型的击穿电压控制层,所述第二导电类型的击穿电压控制层形成在所述载体倍增层上并且具有高于载流子倍增层的掺杂剂浓度的第一绝缘层, 控制层和所述载体倍增层,同时部分地暴露作为光电子的受体的击穿电压控制层的表面,并由氮化物和形成在击穿电压控制层的受体的外围表面部分上的欧姆电极层组成。 当基于外延生长均匀地控制载体倍增层中的掺杂剂浓度分布时,提高入射在半导体器件的接收器上的不同位置处的光电子的雪崩倍增益的均匀性,从而大大提高能量分辨能力 。
    • 45. 发明授权
    • Optical waveform measuring device
    • 光学波形测量装置
    • US5168164A
    • 1992-12-01
    • US858861
    • 1992-03-27
    • Tsuneyuki UrakamiMotohiro Suyama
    • Tsuneyuki UrakamiMotohiro Suyama
    • G01J11/00
    • G01J11/00
    • When sampling light and light to be measured each having a wavelength longer than an upper wavelength limit of the sensitivity of a photocathode are incident on the photocathode of a multiphoton absorption-type electron tube, light-light sampling is enabled by two-photon absorption and one-photoelectron emission. A delaying unit adjusts an incident timing of the sampling light from an optical pulse generating unit on the elctron tube in synchronism with an incident timing of the light to be measured on the electron tube. A half mirror causes the sampling light and the light to be measured to coincide on the photocathode of the electron tube. A controlling unit controls the delaying unit to sequentially shift the incident timing of the sampling light on the electron tube. Thus, the operation of a display unit can be controlled in synchronism with the incident timing of the sampling light so that a series of sampling outputs from the electron tube can be converted to the optical waveform of the light to be measured and displayed on the display unit.