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41. 发明授权

US08467595B2 Defect review system and method, and program 有权
标题翻译：缺陷审查制度和方法，程序
公开(公告)号：US08467595B2
公开(公告)日：2013-06-18
申请号：US13056353
申请日：2009-07-27
申请人： Noritsugu Takahashi , Muneyuki Fukuda , Tomoyasu Shojo , Naomasa Suzuki , Kenji Obara
发明人： Noritsugu Takahashi , Muneyuki Fukuda , Tomoyasu Shojo , Naomasa Suzuki , Kenji Obara
IPC分类号： G06K9/00
CPC分类号： G06T7/0004 , G06T2207/10061 , G06T2207/30148 , H01J37/265 , H01J37/28 , H01J2237/2811 , H01J2237/2817 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： A system is provided that realizes both reduction in coordinate error and improvement in throughput and allows observation of a micro-defect. The system includes: a function of measuring an amount of displacement between preliminarily calculated coordinates and an actual specimen position; a function of optimizing a coordinate correction formula so as to minimize the amount of displacement from the measured amount of displacement; and a function of calculating variation of displacement between the preliminarily calculated coordinates and the actual specimen position by statistical processing. When a value of coordinate variation is sufficiently small with respect to the field of view of an image for observation, which is to be a defect observation image, the system acquires only the image for observation without performing acquisition of an image for search, which is to be a defect search image.
摘要翻译：提供一种系统，其实现了坐标误差的降低和吞吐量的提高，并且允许观察微缺陷。该系统包括：测量预先计算的坐标与实际样本位置之间的位移量的功能; 优化坐标校正公式的功能，以使从所测量的位移量中的位移量最小化; 以及通过统计处理来计算预先计算的坐标与实际样本位置之间的位移变化的功能。当相对于作为缺陷观察图像的观察用图像的视场的坐标变化量足够小时，系统仅获取用于观察的图像，而不进行用于搜索的图像的获取，其是成为缺陷搜索图像。

42. 发明申请

US20130114881A1 METHOD AND APPARATUS FOR REVIEWING DEFECTS 有权
公开(公告)号：US20130114881A1
公开(公告)日：2013-05-09
申请号：US13729635
申请日：2012-12-28
申请人： Minoru HARADA , Ryo Nakagaki , Kenji Obara , Atsushi Miyamoto
发明人： Minoru HARADA , Ryo Nakagaki , Kenji Obara , Atsushi Miyamoto
IPC分类号： G06T7/00
CPC分类号： G06T7/004 , G01N21/9501 , G06T7/0004 , G06T7/001 , G06T7/70 , G06T2207/10061 , G06T2207/30148
摘要： Disclosed is a method for reviewing defects in a large number of samples within a short period of time through the use of a defect review apparatus. To collect defect images steadily and at high throughput, a defect detection method is selected before imaging and set up for each of review target defects in the samples in accordance with the external characteristics of the samples that are calculated from the design information about the samples. The defect images are collected after an imaging sequence is set up for the defect images and reference images in such a manner as to reduce the time required for stage movement in accordance with the defect coordinates of the samples and the selected defect detection method.

43. 发明授权

US08428336B2 Inspecting method, inspecting system, and method for manufacturing electronic devices 有权
标题翻译：检查方法，检查系统和电子设备制造方法
公开(公告)号：US08428336B2
公开(公告)日：2013-04-23
申请号：US11431709
申请日：2006-05-11
申请人： Yoko Ikeda , Junko Konishi , Hisafumi Iwata , Yuji Takagi , Kenji Obara , Ryo Nakagaki , Seiji Isogai , Yasuhiko Ozawa
发明人： Yoko Ikeda , Junko Konishi , Hisafumi Iwata , Yuji Takagi , Kenji Obara , Ryo Nakagaki , Seiji Isogai , Yasuhiko Ozawa
IPC分类号： G06K9/00
CPC分类号： G06F3/0486 , G06F2203/04803 , G06T7/0004 , G06T2200/24 , G06T2207/30148
摘要： A method for classifying defects, including: calculating feature quantifies of defect image which is obtained by imaging a defect on a sample; classifying the defect image into a classified category by using information on the calculated feature quantities; displaying the classified defect image in a region on a display screen which is defined to the classified category; adding information on the classified category to the displayed defect image; transferring the displayed defect image which is added the information on the classified category to one of the other categories and displaying the transferred defect image in a region on the display screen which is defined to the one of the other categories; and changing information on the category.
摘要翻译：一种用于对缺陷进行分类的方法，包括：通过对样品上的缺陷进行成像而获得的缺陷图像的特征量化计算; 通过使用关于计算的特征量的信息将缺陷图像分类成分类的类别; 在分类的类别的显示屏幕上的区域中显示分类的缺陷图像; 将分类类别的信息添加到所显示的缺陷图像; 将所述分类类别中的信息添加到所述其他类别中的所显示的缺陷图像，并且将所传送的缺陷图像显示在所述显示屏幕上定义为所述其他类别之一的区域中; 并更改关于该类别的信息。

44. 发明授权

US08309919B2 Inspection method for semiconductor wafer and apparatus for reviewing defects 有权
标题翻译：半导体晶圆检查方法及缺陷检查装置
公开(公告)号：US08309919B2
公开(公告)日：2012-11-13
申请号：US12352357
申请日：2009-01-12
申请人： Kenji Obara , Takehiro Hirai
发明人： Kenji Obara , Takehiro Hirai
IPC分类号： G01N23/00 , G21K7/00 , A61N5/00
CPC分类号： G01N23/2251 , H01J37/222 , H01J37/244 , H01J37/26 , H01J37/28 , H01J2237/24475 , H01J2237/2448 , H01J2237/24592 , H01J2237/28 , H01J2237/2809 , H01J2237/2817
摘要： An object of the present invention is to provide a suitable method of observing a wafer edge by using an electron microscope. The electron microscope includes a column which can take an image in being tilted, and thus allows a wafer edge to be observed from an oblique direction.
摘要翻译：本发明的目的是提供一种使用电子显微镜观察晶片边缘的合适方法。电子显微镜包括可以使图像倾斜的列，从而允许从倾斜方向观察晶片边缘。

45. 发明授权

US08108172B2 Defect review apparatus and method of reviewing defects 有权
标题翻译：缺陷检查设备和检查缺陷的方法
公开(公告)号：US08108172B2
公开(公告)日：2012-01-31
申请号：US12953170
申请日：2010-11-23
申请人： Takehiro Hirai , Kenji Obara , Kohei Yamaguchi
发明人： Takehiro Hirai , Kenji Obara , Kohei Yamaguchi
IPC分类号： G01C17/38 , G01N21/86
CPC分类号： H01J37/265 , H01J37/28 , H01J2237/221 , H01J2237/2817 , H01J2237/2826
摘要： A review apparatus for reviewing a specimen by moving the specimen to pre-calculated coordinate includes: a function to measure a deviation amount between the pre-calculated coordinates and coordinates of an actual position of the specimen; a function to optimize a coordinate correcting expression to minimize the measured deviation amount; and a function to determine that the deviation amounts have converged. When the deviation amounts have converged, the measurement for the coordinate-correcting-expression optimization is terminated, and a field of view necessary for the specimen to be within the field of view is set according to a convergence value of the calculated deviation amount.
摘要翻译：用于通过将样本移动到预先计算的坐标来检查样本的检查装置包括：测量预先计算的坐标和样本的实际位置的坐标之间的偏差量的函数; 优化坐标校正表达式以最小化所测量的偏差量的函数; 以及确定偏差量已经收敛的函数。当偏差量已经收敛时，终止坐标校正表达式优化的测量，并且根据计算的偏差量的收敛值来设定样本在视场内所必需的视场。

46. 发明授权

US07932493B2 Method and system for observing a specimen using a scanning electron microscope 有权
标题翻译：使用扫描电子显微镜观察样品的方法和系统
公开(公告)号：US07932493B2
公开(公告)日：2011-04-26
申请号：US12153333
申请日：2008-05-16
申请人： Minoru Harada , Ryo Nakagaki , Kenji Obara
发明人： Minoru Harada , Ryo Nakagaki , Kenji Obara
IPC分类号： G01N23/22 , G06K9/00
CPC分类号： G01N23/225 , H01J2237/216
摘要： It is intended to reduce the auto focusing time and to increase the stability in a case that a defect on a specimen that has been detected by an inspection apparatus is observed by using a scanning electron microscope. One or more regions to be used for auto focusing are set in an imaging region or its neighborhood on the basis of semiconductor design information. A target focusing position in the imaging region is determined by performing auto focusing using the thus-set regions. The determined target focusing position is used for low-magnification imaging and high-magnification imaging. An auto focusing mode that is suitable for each imaging region is selected on the basis of the semiconductor design information.
摘要翻译：为了减少自动聚焦时间，并且通过使用扫描电子显微镜来观察检查装置检测到的检体的缺陷的情况下的稳定性。用于自动聚焦的一个或多个区域基于半导体设计信息设置在成像区域或其邻域中。通过使用如此设定的区域进行自动聚焦来确定成像区域中的目标对焦位置。所确定的目标对焦位置用于低倍率成像和高倍率成像。基于半导体设计信息选择适合于每个成像区域的自动对焦模式。

47. 发明申请

US20100021047A1 AUTOMATIC DEFECT REVIEW AND CLASSIFICATION SYSTEM 有权
标题翻译：自动缺陷审查和分类系统
公开(公告)号：US20100021047A1
公开(公告)日：2010-01-28
申请号：US12573463
申请日：2009-10-05
申请人： Takehiro Hirai , Kazuo Aoki , Kenji Obara
发明人： Takehiro Hirai , Kazuo Aoki , Kenji Obara
IPC分类号： G06K9/00
CPC分类号： G05B19/41875 , G05B2219/32218 , Y02P90/22
摘要： The invention proposes a system that interrupts a processing associated with an ADC having low priority when an ADC processing cannot catch up with ADR by an ADC alone that is not under execution but uses an ADC for an ADR having high priority. To preferentially execute ADR/ADC having high priority, the invention employs an algorithm for serially selecting ADR/ADC in the order of higher processing capacity (in the order of greater numerical values in the expression by a DPH unit) from among ADR/ADCs that have the lowest priority, no matter whether the ADR/DC is now under execution or not.
摘要翻译：本发明提出了一种系统，当ADC处理不能通过一个ADC不能跟踪ADR而不能执行但对具有高优先级的ADR使用ADC时，中断与具有低优先级的ADC相关联的处理的系统。为了优先执行具有高优先级的ADR / ADC，本发明采用一种用于从ADR / ADC中的处理能力较高（按DPH单元的表达式中的较大数值的数量级）的顺序选择ADR / ADC的算法，优先级最低，无论ADR / DC是否在执行中。

48. 发明申请

US20090252403A1 METHOD AND ITS APPARATUS FOR REVIEWING DEFECTS 失效
标题翻译：用于评估缺陷的方法及其设备
公开(公告)号：US20090252403A1
公开(公告)日：2009-10-08
申请号：US12416273
申请日：2009-04-01
申请人： Minoru Harada , Ryo Nakagaki , Kenji Obara
发明人： Minoru Harada , Ryo Nakagaki , Kenji Obara
IPC分类号： G06K9/00
CPC分类号： G06K9/033 , G06K2209/19 , G06T7/001 , G06T2207/10056 , G06T2207/30148
摘要： A method for reviewing a defect on a sample involves the steps of imaging a defect image containing the defect in first magnification by using an image acquisition unit, synthesizing a reference image not containing the defect from the defect image, comparing the defect image acquired with the reference image synthesized to detect a defect applicant, executing a processing for classifying the defect applicant into a defect and a normal portion and imaging only the portion identified as the detect in second magnification. The method makes it possible to specify a defect position without error from the image taken in the first magnification and to image the defect in the second magnification when a large number of defects are observed within a short time by using the image acquisition unit.
摘要翻译：一种用于检查样本缺陷的方法包括以下步骤：通过使用图像获取单元对包含缺陷的缺陷图像进行成像，从缺陷图像合成不包含缺陷的参考图像，将获得的缺陷图像与用于检测缺陷申请人的参考图像，执行将缺陷申请人分类为缺陷和法线部分的处理，并且仅成像第二倍率中仅识别为检测的部分。该方法使得可以从第一倍率中拍摄的图像指定缺陷位置，并且在通过使用图像获取单元在短时间内观察到大量缺陷时，以第二倍率对缺陷进行成像。

49. 发明授权

US07584012B2 Automatic defect review and classification system 有权
标题翻译：自动缺陷审查和分类系统
公开(公告)号：US07584012B2
公开(公告)日：2009-09-01
申请号：US11892583
申请日：2007-08-24
申请人： Takehiro Hirai , Kazuo Aoki , Kenji Obara
发明人： Takehiro Hirai , Kazuo Aoki , Kenji Obara
IPC分类号： G06F19/00 , G06K9/00
CPC分类号： G05B19/41875 , G05B2219/32218 , Y02P90/22
摘要： An automatic defect review and classification system including at least one automatic defect review apparatus for specifically observing defect portions of a sample and at least one automatic defect classification apparatus for automatically classifying the defects, the system further comprising a device which outputs a status for combination of the automatic review apparatus and the automatic defect classification apparatus.
摘要翻译：一种自动缺陷检查和分类系统，包括至少一个用于特异性地观察样本的缺陷部分的自动缺陷检查装置和用于自动分类缺陷的至少一个自动缺陷分类装置，所述系统还包括输出状态用于组合的装置自动检查装置和自动缺陷分类装置。

50. 发明申请

US20090202166A1 SCANNING MICROSCOPE 有权
标题翻译：扫描显微镜
公开(公告)号：US20090202166A1
公开(公告)日：2009-08-13
申请号：US12420263
申请日：2009-04-08
申请人： Kohei YAMAGUCHI , Kazuo Aoki , Kenji Obara
发明人： Kohei YAMAGUCHI , Kazuo Aoki , Kenji Obara
IPC分类号： G06K9/40
CPC分类号： G01N23/2251
摘要： A method which, while displacing the field-of-view, allows the image in a target area to be acquired without degradations such as out-of-focus of the image. Plural pieces of images are acquired before and after a target area while displacing the field-of-view. Next, these images are grouped into groups each of which includes several pieces of images, and integrated images on each group basis are created. Moreover, a relational expression is calculated which holds between image displacement quantity calculated by comparing the integrated images with each other and the number of the photographed pieces of images. Furthermore, image displacement quantities between the acquired plural pieces of images are calculated from this relational expression. Finally, these images are corrected by the amounts of these displacement quantities, then being integrated. This process allows reconfiguration of the image in the target area.
摘要翻译：在移动视野的同时允许获取目标区域中的图像而不降低诸如图像的失焦的方法。在移动视野之前，在目标区域之前和之后获取多张图像。接下来，将这些图像分组成各自包括几个图像的组，并且创建基于每个组的集成图像。此外，计算出通过比较集成图像计算的图像位移量与拍摄的图像数量之间的关系表达式。此外，从该关系表达式计算所获取的多张图像之间的图像位移量。最后，这些图像被这些位移量的量校正，然后被整合。该过程允许重新配置目标区域中的图像。

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