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41. 发明授权

US06550158B2 Substrate handling chamber 有权
标题翻译：基板处理室
公开(公告)号：US06550158B2
公开(公告)日：2003-04-22
申请号：US09727736
申请日：2000-12-01
申请人： Allan Doley , Dennis Goodwin , Kenneth O'Neill , Gerben Vrijburg , David Rodriguez , Ravinder Aggarwal
发明人： Allan Doley , Dennis Goodwin , Kenneth O'Neill , Gerben Vrijburg , David Rodriguez , Ravinder Aggarwal
IPC分类号： F26B300
CPC分类号： C30B29/14 , C23C16/4401 , C23C16/4408 , C30B25/08 , Y10S414/139
摘要： An apparatus and method for reducing particles in reactors. The apparatus includes an enclosure with a wafer handling chamber connected by an isolation gate valve to a processing chamber. Pipes deliver purge gas into the wafer handling chamber to eliminate particles from the enclosure. A pilot operated back pressure regulator regulates the delivery and removal of the purge gas. The apparatus actuates the isolation gate valve in a controlled rate to reduce disturbances from the purge gas entering into the enclosure. A Bernoulli wand is provided for lifting and holding a single semiconductor wafer. A dome loaded regulator actuated by a pilot gas is used to control the ramp rates of gas to the Bernoulli wand. The ramping rates of the Bernoulli wand gas can be controlled by restrictions and check valves in the pilot gas line. The apparatus also utilizes ionizers in the purge gas lines entering the wafer handling chamber and load locks. Through the use of an alpha particle emission source in the purge gas line prior to the load lock and wafer handling chamber, the purged gas molecules are ionized. The ionized gas is conductive and therefore discharges static so that wafers are no longer attracted to each other by electrostatic force. In addition, the apparatus includes means for reducing gas flow turbulence when switching valves within the reactor.
摘要翻译：用于还原反应器中的颗粒的装置和方法。该装置包括具有通过隔离闸阀连接到处理室的晶片处理室的外壳。管道将净化气体输送到晶片处理室中以消除外壳中的颗粒。先导操作的背压调节器调节吹扫气体的输送和去除。该设备以受控的速率驱动隔离闸阀，以减少进入外壳的吹扫气体的干扰。提供伯努利棒用于提升和保持单个半导体晶片。使用由先导气体驱动的圆顶加载式调节器来控制伯努利魔杖的气体斜坡速率。伯努利魔杖气体的斜率可以通过先导气体管线中的限制和止回阀来控制。该设备还在进入晶片处理室的清洗气体管线和负载锁定中使用电离器。通过在负载锁定和晶片处理室之前在吹扫气体管线中使用α粒子发射源，将净化的气体分子电离。电离气体是导电的，因此放电静电，使得晶片不再被静电力彼此吸引。另外，该设备包括当在反应器内切换阀时减少气流湍流的装置。

42. 发明授权

US06521503B2 High temperature drop-off of a substrate 有权
公开(公告)号：US06521503B2
公开(公告)日：2003-02-18
申请号：US09840532
申请日：2001-04-23
申请人： Paul Jacobson , Ivo Raaijmakers , Ravinder Aggarwal , Robert C. Haro
发明人： Paul Jacobson , Ivo Raaijmakers , Ravinder Aggarwal , Robert C. Haro
IPC分类号： H01L21336
CPC分类号： H01L21/28556
摘要： A substrate to be processed in a high temperature processing chamber is preheated to avoid the problems associated with thermal shock when the substrate is dropped onto a heated susceptor. Preheating is effected by holding the substrate over a susceptor maintained at or near the processing temperature until the temperature of the substrate approaches the processing temperature. Thus, wafer warping and breakage are greatly reduced, and wafer throughput is improved because of time saved in maintaining the susceptor at constant temperature without cool down and reheat periods.

43. 发明授权

US6162006A Stackable cassette for use with wafer cassettes 失效
标题翻译：用于晶圆盒的可堆放盒式磁带
公开(公告)号：US6162006A
公开(公告)日：2000-12-19
申请号：US83833
申请日：1998-05-22
申请人： Ronald R. Stevens , Ravinder Aggarwal
发明人： Ronald R. Stevens , Ravinder Aggarwal
IPC分类号： B65B31/00 , H01L21/673 , B65G49/07
CPC分类号： H01L21/67346 , H01L21/67253 , H01L21/67353 , H01L21/67379 , Y10S414/137 , Y10S414/14
摘要： A stackable cassette for testing at least one separate wafer during the processing of a plurality of semiconductor wafers is disclosed. The stackable cassette includes a bottom surface which conforms to a top portion of a base cassette having a plurality of wafers. In addition, the stackable cassette includes two or more supports which extend vertically from the bottom surface and a top surface horizontally connected to the two supports. The supports include ribs which form channels for holding at least one wafer. When processing the plurality of wafers, the stackable cassette is placed on top of a base cassette. A specified processed wafer is placed within the stackable cassette. The stackable cassette is then removed for inspection of the test wafer.
摘要翻译：公开了一种用于在多个半导体晶片的处理期间测试至少一个单独晶片的可堆叠盒。可堆叠盒包括与具有多个晶片的基座的顶部一致的底表面。此外，可堆叠盒包括从底表面垂直延伸的两个或更多个支撑件和与两个支撑件水平连接的顶表面。支撑件包括形成用于保持至少一个晶片的通道的肋。当处理多个晶片时，可堆叠盒被放置在基座的顶部上。将指定的经处理的晶片放置在可堆叠盒内。然后拆下可堆叠盒以检查测试晶片。

44. 发明授权

US08486191B2 Substrate reactor with adjustable injectors for mixing gases within reaction chamber 有权
标题翻译：具有可调喷射器的基板反应器，用于在反应室内混合气体
公开(公告)号：US08486191B2
公开(公告)日：2013-07-16
申请号：US12420010
申请日：2009-04-07
申请人： Ravinder Aggarwal , Rand Conner , John Disanto , James A. Alexander
发明人： Ravinder Aggarwal , Rand Conner , John Disanto , James A. Alexander
IPC分类号： C23C16/455 , C23C16/52 , C23F1/00 , H01L21/306 , C23C16/06 , C23C16/22
CPC分类号： C23C16/45574 , C23C16/04 , C23C16/45504 , C23C16/45563
摘要： Methods and apparatuses for separately injecting gases into a reactor for a substrate processing system. The flow profiles of the gases are controlled with two or more sets of adjustable gas flow injectors. The methods are particularly useful for selective deposition of gases in a CVD system using volatile combinations of precursors and etchants. In either case, the gases are provided along separate flow paths that intersect in a relatively open reaction space, rather than in more confined upstream locations.
摘要翻译：将气体分别注入用于基板处理系统的反应器的方法和装置。气体的流量分布由两组或多组可调气流注入器控制。该方法对于使用前体和蚀刻剂的易失性组合在CVD系统中选择性沉积气体特别有用。在任一情况下，气体沿着在相对开放的反应空间中相交的分开的流动路径而不是在更限制的上游位置中提供。

45. 发明授权

US08067061B2 Reaction apparatus having multiple adjustable exhaust ports 有权
标题翻译：具有多个可调排气口的反应装置
公开(公告)号：US08067061B2
公开(公告)日：2011-11-29
申请号：US11924418
申请日：2007-10-25
申请人： Ravinder Aggarwal , Jeroen Stoutjesdijk
发明人： Ravinder Aggarwal , Jeroen Stoutjesdijk
IPC分类号： C23C16/00
CPC分类号： C23C16/4412 , C23C16/455 , C23C16/45502 , C23C16/45504 , C23C16/45563 , C23C16/458 , C23C16/4582 , C23C16/4583 , C23C16/4584
摘要： A reaction apparatus for a semiconductor fabrication apparatus, wherein the reaction apparatus includes at least two adjustable outlet ports for withdrawing reactant gases from the reaction chamber. Adjustment of the flow rate through each of the outlet ports selectively modifies the flow pattern of the reactant gases within the reaction chamber to maintain a desired flow pattern therewithin, such as a substantially uniform flow over the surface of a substrate being processed, and/or minimization of turbulence within the reactor.
摘要翻译：一种用于半导体制造装置的反应装置，其中反应装置包括至少两个可调节的出口，用于从反应室中抽出反应气体。通过每个出口端口的流量的调节选择性地修改反应室内的反应气体的流动模式，以在其中维持所需的流动模式，例如在正被处理的基底的表面上的基本均匀的流动，和/或反应器内湍流的最小化。

46. 发明授权

US07993057B2 Redundant temperature sensor for semiconductor processing chambers 有权
标题翻译：用于半导体处理室的冗余温度传感器
公开(公告)号：US07993057B2
公开(公告)日：2011-08-09
申请号：US11961671
申请日：2007-12-20
申请人： Ravinder Aggarwal , Mark Kleshock , Loren Jacobs
发明人： Ravinder Aggarwal , Mark Kleshock , Loren Jacobs
IPC分类号： G01K7/00
CPC分类号： G01K7/04 , G01K13/00 , G01K15/00 , H01L21/67248
摘要： Systems are provided for measuring temperature in a semiconductor processing chamber. Embodiments provide a multi-junction thermocouple comprising a first junction and a second junction positioned to measure temperature at substantially the same portion of a substrate. A controller may detect failures in the first junction, the second junction, a first wire pair extending from the first junction, or a second wire pair extending from the second junction. The controller desirably responds to a detected failure of the first junction or first wire pair by selecting the second junction and second wire pair. Conversely, the controller desirably responds to a detected failure of the second junction or second wire pair by selecting the first junction and first wire pair. Systems taught herein may permit accurate and substantially uninterrupted temperature measurement despite failure of a junction or wire pair in a thermocouple.
摘要翻译：提供用于测量半导体处理室中的温度的系统。实施例提供了一种多结热电偶，其包括第一接头和第二接头，其定位成测量基板的基本相同部分处的温度。控制器可以检测第一连接点，第二接头，从第一接头延伸的第一线对或从第二接头延伸的第二线对的故障。控制器期望地通过选择第二连接点和第二线对来响应检测到的第一结或第一线对的故障。相反，控制器期望地通过选择第一连接点和第一线对来响应检测到的第二连接点或第二线对的故障。尽管本文教导的系统可能允许精确和基本上不间断的温度测量，尽管热电偶中的接头或线对失效。

47. 发明申请

US20100284438A1 Thermocouple 有权
标题翻译：热电偶
公开(公告)号：US20100284438A1
公开(公告)日：2010-11-11
申请号：US12436315
申请日：2009-05-06
申请人： Ravinder Aggarwal , Rand Conner
发明人： Ravinder Aggarwal , Rand Conner
IPC分类号： G01K7/02
CPC分类号： H01L21/67248 , C23C16/4586 , G01K1/14 , G01K7/02
摘要： A thermocouple having at least one inner alignment feature or at least one outer alignment feature, or a combination thereof for positively positioning and aligning at least one thermocouple junction within a bore formed in a susceptor ring of a semiconductor substrate processing reactor. The outer alignment feature is configured to positively align the junction(s) longitudinally within the bore. The inner alignment feature configured to positively position the junction(s) rotationally within the sheath of the thermocouple relative to the bore.
摘要翻译：具有至少一个内部对准特征或至少一个外部对准特征或其组合的热电偶用于在半导体衬底处理反应器的基座环内形成的孔内积极地定位和对准至少一个热电偶结。外部对准特征构造成在孔内纵向对准接头。所述内部对准特征构造成相对于所述孔将所述接合部在所述热电偶的护套内旋转地定位。

48. 发明申请

US20100190343A1 LOAD LOCK HAVING SECONDARY ISOLATION CHAMBER 有权
标题翻译：负载二次隔离室
公开(公告)号：US20100190343A1
公开(公告)日：2010-07-29
申请号：US12695072
申请日：2010-01-27
申请人： Ravinder Aggarwal , Jeroen Stoutjesdijk , Eric Hill , Loring G. Davis , John T. DiSanto
发明人： Ravinder Aggarwal , Jeroen Stoutjesdijk , Eric Hill , Loring G. Davis , John T. DiSanto
IPC分类号： H01L21/465 , B23Q3/00 , H01L21/677 , H01L21/673 , B65D85/30
CPC分类号： C30B25/025 , C30B23/002 , C30B23/02 , C30B25/16 , H01L21/67201
摘要： A load lock includes a chamber including an upper portion, a lower portion, and a partition between the upper portion and the lower portion, the partition including an opening therethrough. The load lock further includes a first port in communication with the upper portion of the chamber and a second port in communication with the lower portion of the chamber. The load lock includes a rack disposed within the chamber and a workpiece holder mounted on a first surface of the rack, wherein the rack and the workpiece holder are movable by an indexer that is capable of selectively moving wafer slots of the rack into communication with the second port. The indexer can also move the rack into an uppermost position, at which the first surface of the boat and the partition sealingly separate the upper portion and the lower portion to define an upper chamber and a lower chamber. Auxiliary processing, such as wafer pre-cleaning, or metrology can be conducted in the upper portion.
摘要翻译：负载锁包括一个包括上部，下部和在上部和下部之间的隔板的腔室，该隔板包括一个通过其的开口。负载锁还包括与腔室的上部连通的第一端口和与腔室的下部连通的第二端口。负载锁包括设置在室内的机架和安装在机架的第一表面上的工件保持架，其中机架和工件保持器可通过分度器移动，分度器能够选择性地移动机架的晶片槽与第二个港口。分度器还可以将齿条移动到最上位置，在该最上部位置处，船的第一表面和分隔件密封地分离上部和下部以限定上部腔室和下部腔室。可以在上部进行辅助处理，例如晶片预清洁或计量。

49. 发明申请

US20090159000A1 REDUNDANT TEMPERATURE SENSOR FOR SEMICONDUCTOR PROCESSING CHAMBERS 有权
标题翻译：用于半导体处理器的冗余温度传感器
公开(公告)号：US20090159000A1
公开(公告)日：2009-06-25
申请号：US11961671
申请日：2007-12-20
申请人： Ravinder Aggarwal , Mark Kleshock , Loren Jacobs
发明人： Ravinder Aggarwal , Mark Kleshock , Loren Jacobs
IPC分类号： B05C11/00 , G01K7/02
CPC分类号： G01K7/04 , G01K13/00 , G01K15/00 , H01L21/67248
摘要： Systems are provided for measuring temperature in a semiconductor processing chamber. Embodiments provide a multi-junction thermocouple comprising a first junction and a second junction positioned to measure temperature at substantially the same portion of a substrate. A controller may detect failures in the first junction, the second junction, a first wire pair extending from the first junction, or a second wire pair extending from the second junction. The controller desirably responds to a detected failure of the first junction or first wire pair by selecting the second junction and second wire pair. Conversely, the controller desirably responds to a detected failure of the second junction or second wire pair by selecting the first junction and first wire pair. Systems taught herein may permit accurate and substantially uninterrupted temperature measurement despite failure of a junction or wire pair in a thermocouple.
摘要翻译：提供用于测量半导体处理室中的温度的系统。实施例提供了一种多结热电偶，其包括第一接头和第二接头，其定位成测量基板的基本相同部分处的温度。控制器可以检测第一连接点，第二接头，从第一接头延伸的第一线对或从第二接头延伸的第二线对的故障。控制器期望地通过选择第二连接点和第二线对来响应检测到的第一结或第一线对的故障。相反，控制器期望地通过选择第一连接点和第一线对来响应检测到的第二连接点或第二线对的故障。尽管本文教导的系统可能允许精确和基本上不间断的温度测量，尽管热电偶中的接头或线对失效。

50. 发明申请

US20080175571A1 Movable radiant heat sources 有权
标题翻译：活动辐射热源
公开(公告)号：US20080175571A1
公开(公告)日：2008-07-24
申请号：US11655556
申请日：2007-01-19
申请人： Ravinder Aggarwal , Jeroen Stoutjesdijk
发明人： Ravinder Aggarwal , Jeroen Stoutjesdijk
IPC分类号： F26B19/00
CPC分类号： H01L21/67115
摘要： A semiconductor processing apparatus including a processing chamber and a plurality of radiant heat sources. The radiant heat sources heat a workpiece within the chamber. At least one of the radiant heat sources is movable during processing in an oscillatory motion along a path less than about 10 mm from a geometric center of the oscillatory motion.
摘要翻译：一种半导体处理装置，包括处理室和多个辐射热源。辐射热源加热室内的工件。辐射热源中的至少一个在沿着振荡运动的几何中心小于约10mm的路径的振荡运动的处理期间是可移动的。

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