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1. 发明授权

US07725012B2 Movable radiant heat sources 有权
标题翻译：活动辐射热源
公开(公告)号：US07725012B2
公开(公告)日：2010-05-25
申请号：US11655556
申请日：2007-01-19
申请人： Ravinder Aggarwal , Jeroen Stoutjesdijk
发明人： Ravinder Aggarwal , Jeroen Stoutjesdijk
IPC分类号： A21B2/00 , C23C16/00
CPC分类号： H01L21/67115
摘要： A semiconductor processing apparatus including a processing chamber and a plurality of radiant heat sources. The radiant heat sources heat a workpiece within the chamber. At least one of the radiant heat sources is movable during processing in an oscillatory motion along a path less than about 10 mm from a geometric center of the oscillatory motion.
摘要翻译：一种半导体处理装置，包括处理室和多个辐射热源。辐射热源加热室内的工件。辐射热源中的至少一个在沿着振荡运动的几何中心小于约10mm的路径的振荡运动的处理期间是可移动的。

2. 发明申请

US20120031340A1 REACTION APPARATUS HAVING MULTIPLE ADJUSTABLE EXHAUST PORTS 审中-公开
标题翻译：具有多个可调节排气口的反应装置
公开(公告)号：US20120031340A1
公开(公告)日：2012-02-09
申请号：US13276515
申请日：2011-10-19
申请人： Ravinder Aggarwal , Jeroen Stoutjesdijk
发明人： Ravinder Aggarwal , Jeroen Stoutjesdijk
IPC分类号： C23C16/455 , C23C16/458 , C23C16/52 , B01J19/00
CPC分类号： C23C16/4412 , C23C16/455 , C23C16/45502 , C23C16/45504 , C23C16/45563 , C23C16/458 , C23C16/4582 , C23C16/4583 , C23C16/4584
摘要： A reaction apparatus for a semiconductor fabrication apparatus, wherein the reaction apparatus includes at least two adjustable outlet ports for withdrawing reactant gases from the reaction chamber. Adjustment of the flow rate through each of the outlet ports selectively modifies the flow pattern of the reactant gases within the reaction chamber to maintain a desired flow pattern therewithin, such as a substantially uniform flow over the surface of a substrate being processed, and/or minimization of turbulence within the reactor.
摘要翻译：一种用于半导体制造装置的反应装置，其中反应装置包括至少两个可调节的出口，用于从反应室中抽出反应气体。通过每个出口端口的流量的调节选择性地修改反应室内的反应气体的流动模式，以在其中维持所需的流动模式，例如在正被处理的基底的表面上的基本均匀的流动，和/或反应器内湍流的最小化。

3. 发明授权

US09551069B2 Reaction apparatus having multiple adjustable exhaust ports 有权
标题翻译：具有多个可调排气口的反应装置
公开(公告)号：US09551069B2
公开(公告)日：2017-01-24
申请号：US13276515
申请日：2011-10-19
申请人： Ravinder Aggarwal , Jeroen Stoutjesdijk
发明人： Ravinder Aggarwal , Jeroen Stoutjesdijk
IPC分类号： C23C16/44 , C23C16/455 , C23C16/458
CPC分类号： C23C16/4412 , C23C16/455 , C23C16/45502 , C23C16/45504 , C23C16/45563 , C23C16/458 , C23C16/4582 , C23C16/4583 , C23C16/4584
摘要： A reaction apparatus for a semiconductor fabrication apparatus, wherein the reaction apparatus includes at least two adjustable outlet ports for withdrawing reactant gases from the reaction chamber. Adjustment of the flow rate through each of the outlet ports selectively modifies the flow pattern of the reactant gases within the reaction chamber to maintain a desired flow pattern therewithin, such as a substantially uniform flow over the surface of a substrate being processed, and/or minimization of turbulence within the reactor.
摘要翻译：一种用于半导体制造装置的反应装置，其中反应装置包括至少两个可调节的出口，用于从反应室中抽出反应气体。通过每个出口端口的流量的调节选择性地修改反应室内的反应气体的流动模式，以在其中维持所需的流动模式，例如在正被处理的基底的表面上的基本均匀的流动，和/或反应器内湍流的最小化。

4. 发明授权

US08440048B2 Load lock having secondary isolation chamber 有权
公开(公告)号：US08440048B2
公开(公告)日：2013-05-14
申请号：US12695072
申请日：2010-01-27
申请人： Ravinder Aggarwal , Jeroen Stoutjesdijk , Eric Hill , Loring G. Davis , John T. DiSanto
发明人： Ravinder Aggarwal , Jeroen Stoutjesdijk , Eric Hill , Loring G. Davis , John T. DiSanto
IPC分类号： C23F1/00 , H01L21/306
CPC分类号： C30B25/025 , C30B23/002 , C30B23/02 , C30B25/16 , H01L21/67201
摘要： A load lock includes a chamber including an upper portion, a lower portion, and a partition between the upper portion and the lower portion, the partition including an opening therethrough. The load lock further includes a first port in communication with the upper portion of the chamber and a second port in communication with the lower portion of the chamber. The load lock includes a rack disposed within the chamber and a workpiece holder mounted on a first surface of the rack, wherein the rack and the workpiece holder are movable by an indexer that is capable of selectively moving wafer slots of the rack into communication with the second port. The indexer can also move the rack into an uppermost position, at which the first surface of the boat and the partition sealingly separate the upper portion and the lower portion to define an upper chamber and a lower chamber. Auxiliary processing, such as wafer pre-cleaning, or metrology can be conducted in the upper portion.

5. 发明授权

US07585142B2 Substrate handling chamber with movable substrate carrier loading platform 有权
标题翻译：衬底处理室，带可移动衬底载体装载平台
公开(公告)号：US07585142B2
公开(公告)日：2009-09-08
申请号：US11724853
申请日：2007-03-16
申请人： Ravinder Aggarwal , Jeroen Stoutjesdijk
发明人： Ravinder Aggarwal , Jeroen Stoutjesdijk
IPC分类号： B65G49/07
CPC分类号： B65G37/02 , B65G2201/0297 , H01L21/67775 , Y10S414/137
摘要： An apparatus for processing substrates may include a substrate handling chamber having a substrate load port on a side wall, and a movable platform movably engaged with the handling chamber between a first position and a second position. The first position is such that a substrate carrier on the movable platform is inaccessible by a substrate handling robot inside the chamber. The second position is near to the load port such that a substrate carrier on the movable platform is accessible by a substrate handling robot inside the handling chamber. The movable platform is configured to rotate about a generally vertical axis between the first and second positions.
摘要翻译：用于处理基板的设备可以包括：基板处理室，其具有侧壁上的基板负载端口;以及可移动平台，其在第一位置和第二位置之间可移动地与处理室接合。第一位置使得可移动平台上的基板载体由腔室内的基板处理机器人无法访问。第二位置靠近负载端口，使得可移动平台上的基板载体可由处理室内部的基板处理机器人接近。可移动平台构造成在第一和第二位置之间围绕大致垂直的轴线旋转。

6. 发明申请

US20090101633A1 REACTOR WITH SMALL LINEAR LAMPS FOR LOCALIZED HEAT CONTROL AND IMPROVED TEMPERATURE UNIFORMITY 审中-公开
标题翻译：用于局部热控制和改善温度均匀性的小线性灯泡的反应器
公开(公告)号：US20090101633A1
公开(公告)日：2009-04-23
申请号：US11875259
申请日：2007-10-19
申请人： Ravinder Aggarwal , Jeroen Stoutjesdijk , Paul Jacobson
发明人： Ravinder Aggarwal , Jeroen Stoutjesdijk , Paul Jacobson
IPC分类号： F27D11/00
CPC分类号： F27B17/0025 , H01L21/67115
摘要： An arrangement of short linear heat lamps is provided which allows for localized control of temperature nonuniformities in a substrate during semiconductor processing. A reactor includes a substrate holder positioned between a top bank and a bottom bank of linear heat lamps. Alternatively, only one such bank may be provided. At least one of the banks includes lamps of a plurality of different lengths, at least some of the lengths being shorter than a diameter of the substrate holder. In some configurations, the lamps in a bank are disposed substantially parallel to each other in a repeating pattern. In some other configurations, the lamps in a bank are disposed in a radial direction with respect to a vertical axis of the substrate holder. Power output of the short lamps can be adjusted individually or in groups to provide localized control of temperature of the substrate.
摘要翻译：提供了短线性热灯的布置，其允许在半导体处理期间对衬底中的温度不均匀性进行局部控制。反应器包括位于顶部组和底部的线状加热灯之间的衬底保持器。或者，可以仅提供一个这样的银行。至少一个组包括多个不同长度的灯，至少一些长度短于衬底保持器的直径。在一些配置中，组中的灯基本上以重复图案彼此平行地设置。在一些其它配置中，组中的灯相对于衬底保持器的垂直轴线沿径向方向设置。短灯的功率输出可以单独或分组调整，以提供基板温度的局部控制。

7. 发明申请

US20080226428A1 Substrate handling chamber with movable substrate carrier loading platform 有权
标题翻译：衬底处理室，带可移动衬底载体装载平台
公开(公告)号：US20080226428A1
公开(公告)日：2008-09-18
申请号：US11724853
申请日：2007-03-16
申请人： Ravinder Aggarwal , Jeroen Stoutjesdijk
发明人： Ravinder Aggarwal , Jeroen Stoutjesdijk
IPC分类号： B65G25/00
CPC分类号： B65G37/02 , B65G2201/0297 , H01L21/67775 , Y10S414/137
摘要： An apparatus for processing substrates may include a substrate handling chamber having a substrate load port on a side wall, and a movable platform movably engaged with the handling chamber between a first position and a second position. The first position is such that a substrate carrier on the movable platform is inaccessible by a substrate handling robot inside the chamber. The second position is near to the load port such that a substrate carrier on the movable platform is accessible by a substrate handling robot inside the handling chamber. The movable platform is configured to rotate about a generally vertical axis between the first and second positions.
摘要翻译：用于处理基板的设备可以包括：基板处理室，其具有侧壁上的基板负载端口;以及可移动平台，其在第一位置和第二位置之间可移动地与处理室接合。第一位置使得可移动平台上的基板载体由腔室内的基板处理机器人无法访问。第二位置靠近负载端口，使得可移动平台上的基板载体可由处理室内部的基板处理机器人接近。可移动平台构造成在第一和第二位置之间围绕大致垂直的轴线旋转。

8. 发明授权

US08067061B2 Reaction apparatus having multiple adjustable exhaust ports 有权
标题翻译：具有多个可调排气口的反应装置
公开(公告)号：US08067061B2
公开(公告)日：2011-11-29
申请号：US11924418
申请日：2007-10-25
申请人： Ravinder Aggarwal , Jeroen Stoutjesdijk
发明人： Ravinder Aggarwal , Jeroen Stoutjesdijk
IPC分类号： C23C16/00
CPC分类号： C23C16/4412 , C23C16/455 , C23C16/45502 , C23C16/45504 , C23C16/45563 , C23C16/458 , C23C16/4582 , C23C16/4583 , C23C16/4584
摘要： A reaction apparatus for a semiconductor fabrication apparatus, wherein the reaction apparatus includes at least two adjustable outlet ports for withdrawing reactant gases from the reaction chamber. Adjustment of the flow rate through each of the outlet ports selectively modifies the flow pattern of the reactant gases within the reaction chamber to maintain a desired flow pattern therewithin, such as a substantially uniform flow over the surface of a substrate being processed, and/or minimization of turbulence within the reactor.
摘要翻译：一种用于半导体制造装置的反应装置，其中反应装置包括至少两个可调节的出口，用于从反应室中抽出反应气体。通过每个出口端口的流量的调节选择性地修改反应室内的反应气体的流动模式，以在其中维持所需的流动模式，例如在正被处理的基底的表面上的基本均匀的流动，和/或反应器内湍流的最小化。

9. 发明申请

US20100190343A1 LOAD LOCK HAVING SECONDARY ISOLATION CHAMBER 有权
标题翻译：负载二次隔离室
公开(公告)号：US20100190343A1
公开(公告)日：2010-07-29
申请号：US12695072
申请日：2010-01-27
申请人： Ravinder Aggarwal , Jeroen Stoutjesdijk , Eric Hill , Loring G. Davis , John T. DiSanto
发明人： Ravinder Aggarwal , Jeroen Stoutjesdijk , Eric Hill , Loring G. Davis , John T. DiSanto
IPC分类号： H01L21/465 , B23Q3/00 , H01L21/677 , H01L21/673 , B65D85/30
CPC分类号： C30B25/025 , C30B23/002 , C30B23/02 , C30B25/16 , H01L21/67201
摘要： A load lock includes a chamber including an upper portion, a lower portion, and a partition between the upper portion and the lower portion, the partition including an opening therethrough. The load lock further includes a first port in communication with the upper portion of the chamber and a second port in communication with the lower portion of the chamber. The load lock includes a rack disposed within the chamber and a workpiece holder mounted on a first surface of the rack, wherein the rack and the workpiece holder are movable by an indexer that is capable of selectively moving wafer slots of the rack into communication with the second port. The indexer can also move the rack into an uppermost position, at which the first surface of the boat and the partition sealingly separate the upper portion and the lower portion to define an upper chamber and a lower chamber. Auxiliary processing, such as wafer pre-cleaning, or metrology can be conducted in the upper portion.
摘要翻译：负载锁包括一个包括上部，下部和在上部和下部之间的隔板的腔室，该隔板包括一个通过其的开口。负载锁还包括与腔室的上部连通的第一端口和与腔室的下部连通的第二端口。负载锁包括设置在室内的机架和安装在机架的第一表面上的工件保持架，其中机架和工件保持器可通过分度器移动，分度器能够选择性地移动机架的晶片槽与第二个港口。分度器还可以将齿条移动到最上位置，在该最上部位置处，船的第一表面和分隔件密封地分离上部和下部以限定上部腔室和下部腔室。可以在上部进行辅助处理，例如晶片预清洁或计量。

10. 发明申请

US20080175571A1 Movable radiant heat sources 有权
标题翻译：活动辐射热源
公开(公告)号：US20080175571A1
公开(公告)日：2008-07-24
申请号：US11655556
申请日：2007-01-19
申请人： Ravinder Aggarwal , Jeroen Stoutjesdijk
发明人： Ravinder Aggarwal , Jeroen Stoutjesdijk
IPC分类号： F26B19/00
CPC分类号： H01L21/67115
摘要： A semiconductor processing apparatus including a processing chamber and a plurality of radiant heat sources. The radiant heat sources heat a workpiece within the chamber. At least one of the radiant heat sources is movable during processing in an oscillatory motion along a path less than about 10 mm from a geometric center of the oscillatory motion.
摘要翻译：一种半导体处理装置，包括处理室和多个辐射热源。辐射热源加热室内的工件。辐射热源中的至少一个在沿着振荡运动的几何中心小于约10mm的路径的振荡运动的处理期间是可移动的。

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