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41. 发明申请

US20100123205A1 METHOD TO PREVENT SURFACE DECOMPOSITION OF III-V COMPOUND SEMICONDUCTORS 有权
标题翻译：防止III-V化合物半导体表面分解的方法
公开(公告)号：US20100123205A1
公开(公告)日：2010-05-20
申请号：US12272129
申请日：2008-11-17
申请人： Joel P. de Souza , Keith E. Fogel , Edward W. Kiewra , Steven J. Koester , Christopher C. Parks , Devendra K. Sadana , Shahab Siddiqui
发明人： Joel P. de Souza , Keith E. Fogel , Edward W. Kiewra , Steven J. Koester , Christopher C. Parks , Devendra K. Sadana , Shahab Siddiqui
IPC分类号： H01L29/78 , H01L21/336
CPC分类号： H01L21/28264 , H01L29/78 , H01L2924/0002 , H01L2924/00
摘要： A method of preventing surface decomposition of a III-V compound semiconductor is provided. The method includes forming a silicon film having a thickness from 10 Å to 400 Å on a surface of an III-V compound semiconductor. After forming the silicon film onto the surface of the III-V compound semiconductor, a high performance semiconductor device including, for example, a MOSFET, can be formed on the capped/passivated III-V compound semiconductor. During the MOSFET fabrication, a high k dielectric can be formed on the capped/passivated III-V compound semiconductor and thereafter, activated source and drain regions can be formed into the III-V compound semiconductor.
摘要翻译：提供了防止III-V族化合物半导体的表面分解的方法。该方法包括在III-V族化合物半导体的表面上形成厚度为从至400的硅膜。在III-V族化合物半导体的表面上形成硅膜之后，可以在封盖/钝化的III-V化合物半导体上形成包括例如MOSFET的高性能半导体器件。在MOSFET制造期间，可以在封盖/钝化的III-V化合物半导体上形成高k电介质，此后可以将激活的源极和漏极区域形成为III-V族化合物半导体。

42. 发明申请

US20090134460A1 STRAINED SEMICONDUCTOR-ON-INSULATOR (sSOI) BY A SIMOX METHOD 有权
标题翻译：应变半导体绝缘体（sSOI）通过SIMOX方法
公开(公告)号：US20090134460A1
公开(公告)日：2009-05-28
申请号：US12363239
申请日：2009-01-30
申请人： Thomas N. Adam , Stephen W. Bedell , Joel P. de Souza , Keith E. Fogel , Alexander Reznicek , Devendra K. Sadana , Ghavam Shahidi
发明人： Thomas N. Adam , Stephen W. Bedell , Joel P. de Souza , Keith E. Fogel , Alexander Reznicek , Devendra K. Sadana , Ghavam Shahidi
IPC分类号： H01L27/00 , H01L21/71
CPC分类号： H01L21/76243 , H01L29/66772 , H01L29/7849 , H01L29/78654
摘要： A strained (tensile or compressive) semiconductor-on-insulator material is provided in which a single semiconductor wafer and a separation by ion implantation of oxygen process are used. The separation by ion implantation of oxygen process, which includes oxygen ion implantation and annealing creates, a buried oxide layer within the material that is located beneath the strained semiconductor layer. In some embodiments, a graded semiconductor buffer layer is located beneath the buried oxide layer, while in other a doped semiconductor layer including Si doped with at least one of B or C is located beneath the buried oxide layer.
摘要翻译：提供了一种应变（拉伸或压缩）半导体绝缘体材料，其中使用单个半导体晶片和通过氧气工艺的离子注入分离。通过离子注入氧气工艺的分离，其中包括氧离子注入和退火，产生位于应变半导体层之下的材料内的掩埋氧化物层。在一些实施例中，渐变半导体缓冲层位于掩埋氧化物层的下方，而在其它掺杂半导体层中，包含掺杂有B或C中的至少一个的掺杂半导体层位于掩埋氧化物层的下方。

43. 发明授权

US07485539B2 Strained semiconductor-on-insulator (sSOI) by a simox method 有权
标题翻译：应用绝缘体半导体（sSOI）通过simox方法
公开(公告)号：US07485539B2
公开(公告)日：2009-02-03
申请号：US11332564
申请日：2006-01-13
申请人： Thomas N. Adam , Stephen W. Bedell , Joel P. de Souza , Keith E. Fogel , Alexander Reznicek , Devendra K. Sadana , Ghavam Shahidi
发明人： Thomas N. Adam , Stephen W. Bedell , Joel P. de Souza , Keith E. Fogel , Alexander Reznicek , Devendra K. Sadana , Ghavam Shahidi
IPC分类号： H01L21/76
CPC分类号： H01L21/76243 , H01L29/66772 , H01L29/7849 , H01L29/78654
摘要： A strained (tensile or compressive) semiconductor-on-insulator material is provided in which a single semiconductor wafer and a separation by ion implantation of oxygen process are used. The separation by ion implantation of oxygen process, which includes oxygen ion implantation and annealing creates, a buried oxide layer within the material that is located beneath the strained semiconductor layer. In some embodiments, a graded semiconductor buffer layer is located beneath the buried oxide layer, while in other a doped semiconductor layer including Si doped with at least one of B or C is located beneath the buried oxide layer.
摘要翻译：提供了一种应变（拉伸或压缩）半导体绝缘体材料，其中使用单个半导体晶片和通过氧气工艺的离子注入分离。通过离子注入氧气工艺的分离，其中包括氧离子注入和退火，产生位于应变半导体层之下的材料内的掩埋氧化物层。在一些实施例中，渐变半导体缓冲层位于掩埋氧化物层的下方，而在其它掺杂半导体层中，包含掺杂有B或C中的至少一个的掺杂半导体层位于掩埋氧化物层的下方。

44. 发明申请

US20080277690A1 STRAINED SILICON-ON-INSULATOR BY ANODIZATION OF A BURIED p+ SILICON GERMANIUM LAYER 审中-公开
标题翻译：通过阳极氧化P +硅锗层的分级制备的绝缘硅绝缘体
公开(公告)号：US20080277690A1
公开(公告)日：2008-11-13
申请号：US12176624
申请日：2008-07-21
申请人： Thomas N. Adam , Stephen W. Bedell , Joel P. de Souza , Keith E. Fogel , Alexander Reznicek , Devendra K. Sadana , Ghavam Shahidi
发明人： Thomas N. Adam , Stephen W. Bedell , Joel P. de Souza , Keith E. Fogel , Alexander Reznicek , Devendra K. Sadana , Ghavam Shahidi
IPC分类号： H01L27/12
CPC分类号： H01L21/76259 , Y10S438/967
摘要： A cost efficient and manufacturable method of fabricating strained semiconductor-on-insulator (SSOI) substrates is provided that avoids wafer bonding. The method includes growing various epitaxial semiconductor layers on a substrate, wherein at least one of the semiconductor layers is a doped and relaxed semiconductor layer underneath a strained semiconductor layer; converting the doped and relaxed semiconductor layer into a porous semiconductor via an electrolytic anodization process, and oxidizing to convert the porous semiconductor layer into a buried oxide layer. The method provides a SSOI substrate that includes a relaxed semiconductor layer on a substrate; a high-quality buried oxide layer on the relaxed semiconductor layer; and a strained semiconductor layer on the high-quality buried oxide layer. In accordance with the present invention, the relaxed semiconductor layer and the strained semiconductor layer have identical crystallographic orientations.
摘要翻译：提供了制造应变半导体绝缘体（SSOI）衬底的成本有效和可制造的方法，其避免晶片接合。该方法包括在衬底上生长各种外延半导体层，其中半导体层中的至少一个是在应变半导体层下面的掺杂和弛豫半导体层; 通过电解阳极氧化处理将掺杂和松弛的半导体层转化成多孔半导体，并氧化以将多孔半导体层转化为掩埋氧化物层。该方法提供了在衬底上包括松弛半导体层的SSOI衬底; 在松弛的半导体层上形成高质量的掩埋氧化物层; 以及在高质量掩埋氧化物层上的应变半导体层。根据本发明，松弛半导体层和应变半导体层具有相同的晶体取向。

45. 发明授权

US07442993B2 Ultra-thin, high quality strained silicon-on-insulator formed by elastic strain transfer 有权
标题翻译：通过弹性应变转移形成的超薄，高品质应变绝缘体上的绝缘体
公开(公告)号：US07442993B2
公开(公告)日：2008-10-28
申请号：US11293774
申请日：2005-12-02
申请人： Stephen W. Bedell , Anthony G. Domenicucci , Keith E. Fogel , Effendi Leobandung , Devendra K. Sadana
发明人： Stephen W. Bedell , Anthony G. Domenicucci , Keith E. Fogel , Effendi Leobandung , Devendra K. Sadana
IPC分类号： H01L31/392
CPC分类号： H01L29/78696 , H01L21/0237 , H01L21/02439 , H01L21/02488 , H01L21/02502 , H01L21/02521 , H01L21/02667 , H01L21/02694 , H01L21/76251 , H01L29/7842
摘要： A method of forming a semiconductor structure comprising a first strained semiconductor layer over an insulating layer is provided in which the first strained semiconductor layer is relatively thin (less than about 500 Å) and has a low defect density (stacking faults and threading defects). The method of the present invention begins with forming a stress-providing layer, such a SiGe alloy layer over a structure comprising a first semiconductor layer that is located atop an insulating layer. The stress-providing layer and the first semiconductor layer are then patterned into at least one island and thereafter the structure containing the at least one island is heated to a temperature that causes strain transfer from the stress-providing layer to the first semiconductor layer. After strain transfer, the stress-providing layer is removed from the structure to form a first strained semiconductor island layer directly atop said insulating layer.
摘要翻译：提供了一种在绝缘层上形成包括第一应变半导体层的半导体结构的方法，其中第一应变半导体层相对较薄（小于约）并且具有低缺陷密度（堆垛层错和穿线缺陷）。本发明的方法开始于在包括位于绝缘层顶部的第一半导体层的结构上形成应力提供层，例如SiGe合金层。然后将应力提供层和第一半导体层图案化成至少一个岛，然后将含有至少一个岛的结构加热到使得应力转移从应力提供层到第一半导体层的温度。在应变转移之后，将应力提供层从结构上去除，以形成直接位于所述绝缘层顶部的第一应变半导体岛层。

46. 发明授权

US07317226B2 Patterned SOI by oxygen implantation and annealing 有权
标题翻译：通过氧气注入和退火进行图案化SOI
公开(公告)号：US07317226B2
公开(公告)日：2008-01-08
申请号：US10993270
申请日：2004-11-19
申请人： Keith E. Fogel , Mark C. Hakey , Steven J. Holmes , Devendra K. Sadana , Ghavam G. Shahidi
发明人： Keith E. Fogel , Mark C. Hakey , Steven J. Holmes , Devendra K. Sadana , Ghavam G. Shahidi
IPC分类号： H01L27/01
CPC分类号： H01L21/76243 , H01L21/26506 , H01L21/76267 , Y10T428/12674 , Y10T428/12681
摘要： Methods for forming a patterned SOI region in a Si-containing substrate is provided which has geometries of about 0.25 μm or less. Specifically, one method includes the steps of: forming a patterned dielectric mask on a surface of a Si-containing substrate, wherein the patterned dielectric mask includes vertical edges that define boundaries for at least one opening which exposes a portion of the Si-containing substrate; implanting oxygen ions through the at least one opening removing the mask and forming a Si layer on at least the exposed surfaces of the Si-containing substrate; and annealing at a temperature of about 1250° C. or above and in an oxidizing ambient so as to form at least one discrete buried oxide region in the Si-containing substrate. In one embodiment, the mask is not removed until after the annealing step; and in another embodiment, the Si-containing layer is formed after annealing and mask removal.
摘要翻译：提供了在含Si衬底中形成图案化SOI区的方法，其具有约0.25μm或更小的几何形状。具体而言，一种方法包括以下步骤：在含Si衬底的表面上形成图案化电介质掩模，其中，图案化电介质掩模包括垂直边缘，其限定至少一个露出一部分含Si衬底的开口的边界 ; 通过所述至少一个开口注入氧离子，去除所述掩模并在至少所述含Si衬底的暴露表面上形成Si层; 并在约1250℃或更高的温度下和在氧化环境中进行退火，以便在含Si衬底中形成至少一个离散的掩埋氧化物区域。在一个实施例中，直到退火步骤之后，掩模才被去除; 并且在另一个实施方案中，在退火和掩模去除之后形成含Si层。

47. 发明授权

US07304328B2 Use of hydrogen implantation to improve material properties of silicon-germanium-on-insulator material made by thermal diffusion 有权
标题翻译：使用氢气注入来改善由热扩散制成的绝缘体上硅材料的材料特性
公开(公告)号：US07304328B2
公开(公告)日：2007-12-04
申请号：US10982411
申请日：2004-11-05
申请人： Stephen W. Bedell , Keith E. Fogel , Devendra K. Sadana
发明人： Stephen W. Bedell , Keith E. Fogel , Devendra K. Sadana
IPC分类号： H01L21/336
CPC分类号： H01L21/76243 , H01L21/02378 , H01L21/02381 , H01L21/02488 , H01L21/02532 , H01L21/02664 , Y10S438/933
摘要： A method of forming a relaxed SiGe-on-insulator substrate having enhanced relaxation, significantly lower defect density and improved surface quality is provided. The method includes forming a SiGe alloy layer on a surface of a first single crystal Si layer. The first single crystal Si layer has an interface with an underlying barrier layer that is resistant to Ge diffusion. Next, ions that are capable of forming defects that allow mechanical decoupling at or near said interface are implanted into the structure and thereafter the structure including the implanted ions is subjected to a heating step which permits interdiffusion of Ge throughout the first single crystal Si layer and the SiGe layer to form a substantially relaxed, single crystal and homogeneous SiGe layer atop the barrier layer. SiGe-on-insulator substrates having the improved properties as well as heterostructures containing the same are also provided.
摘要翻译：提供了一种形成松弛的绝缘体上硅衬底的方法，其具有增强的松弛，显着降低缺陷密度和改进的表面质量。该方法包括在第一单晶Si层的表面上形成SiGe合金层。第一单晶硅层具有与Ge扩散耐受的下层阻挡层的界面。接下来，能够形成允许在界面处或附近机械解耦的缺陷的离子被注入到结构中，此后包括注入的离子的结构经受加热步骤，其允许Ge贯穿整个第一单晶Si层和 SiGe层，以形成在阻挡层顶上基本上松弛的单晶和均匀的SiGe层。还提供了具有改进性能的绝缘体上硅衬底以及含有其的异质结构。

48. 发明授权

US07084050B2 Formation of silicon-germanium-on-insulator (SGOI) by an integral high temperature SIMOX-Ge interdiffusion anneal 失效
标题翻译：通过整体高温SIMOX-Ge相互扩散退火形成绝缘体上硅锗（SGOI）
公开(公告)号：US07084050B2
公开(公告)日：2006-08-01
申请号：US11039602
申请日：2005-01-19
申请人： Stephen W. Bedell , Joel P. de Souza , Keith E. Fogel , Devendra K. Sadana , Ghavam G. Shahidi
发明人： Stephen W. Bedell , Joel P. de Souza , Keith E. Fogel , Devendra K. Sadana , Ghavam G. Shahidi
IPC分类号： H01L21/20 , H01L21/76 , H01L21/31
CPC分类号： H01L21/76243 , H01L21/26506 , H01L21/76267 , Y10T428/12674 , Y10T428/12681
摘要： A method of forming a substantially relaxed, high-quality SiGe-on-insulator substrate material using SIMOX and Ge interdiffusion is provided. The method includes first implanting ions into a Si-containing substrate to form an implanted-ion rich region in the Si-containing substrate. The implanted-ion rich region has a sufficient ion concentration such that during a subsequent anneal at high temperatures a barrier layer that is resistant to Ge diffusion is formed. Next, a Ge-containing layer is formed on a surface of the Si-containing substrate, and thereafter a heating step is performed at a temperature which permits formation of the barrier layer and interdiffusion of Ge thereby forming a substantially relaxed, single crystal SiGe layer atop the barrier layer.
摘要翻译：提供了使用SIMOX和Ge相互扩散形成基本上松弛的，优质的绝缘体上硅衬底材料的方法。该方法包括首先将离子注入到含Si衬底中以在含Si衬底中形成植入离子富集区。注入离子富集区具有足够的离子浓度，使得在随后的高温退火期间形成耐Ge扩散的阻挡层。接下来，在含Si衬底的表面上形成Ge含有层，然后在允许形成阻挡层和Ge的相互扩散的温度下进行加热步骤，从而形成基本上松弛的单晶SiGe层阻挡层顶部。

49. 发明授权

US06946373B2 Relaxed, low-defect SGOI for strained Si CMOS applications 有权
标题翻译：用于应变Si CMOS应用的轻松，低缺陷SGOI
公开(公告)号：US06946373B2
公开(公告)日：2005-09-20
申请号：US10300189
申请日：2002-11-20
申请人： Paul D. Agnello , Stephen W. Bedell , Robert H. Dennard , Anthony G. Domenicucci , Keith E. Fogel , Devendra K. Sadana
发明人： Paul D. Agnello , Stephen W. Bedell , Robert H. Dennard , Anthony G. Domenicucci , Keith E. Fogel , Devendra K. Sadana
IPC分类号： C30B25/02 , C30B29/52 , H01L21/20 , H01L21/205 , H01L21/324 , H01L21/337 , H01L21/84 , H01L21/477
CPC分类号： H01L21/324 , C30B25/02 , C30B29/52 , H01L21/02378 , H01L21/02381 , H01L21/02532 , H01L21/02664 , H01L21/7624 , H01L21/823807 , H01L21/823878 , H01L21/84 , H01L29/66893 , H01L29/78603
摘要： Thermal mixing methods of forming a substantially relaxed and low-defect SGOI substrate material are provided. The methods include a patterning step which is used to form a structure containing at least SiGe islands formed atop a Ge resistant diffusion barrier layer. Patterning of the SiGe layer into islands changes the local forces acting at each of the island edges in such a way so that the relaxation force is greater than the forces that oppose relaxation. The absence of restoring forces at the edges of the patterned layers allows the final SiGe film to relax further than it would if the film was continuous.
摘要翻译：提供形成基本上松弛和低缺陷的SGOI基底材料的热混合方法。所述方法包括图形化步骤，其用于形成至少包含形成在Ge抗蚀扩散阻挡层顶上的SiGe岛的结构。将SiGe层图案化成岛以这样的方式改变作用在每个岛边缘处的局部力，使得松弛力大于抵抗放松的力。在图案化层的边缘处没有恢复力允许最终的SiGe膜比如果膜是连续的那样进一步松弛。

50. 发明授权

US06825102B1 Method of improving the quality of defective semiconductor material 失效
标题翻译：提高缺陷半导体材料质量的方法
公开(公告)号：US06825102B1
公开(公告)日：2004-11-30
申请号：US10664714
申请日：2003-09-18
申请人： Stephen W. Bedell , Keith E. Fogel , Shreesh Narasimha , Devendra K. Sadana
发明人： Stephen W. Bedell , Keith E. Fogel , Shreesh Narasimha , Devendra K. Sadana
IPC分类号： H01L21263
CPC分类号： H01L21/02667 , H01L21/02529 , H01L21/02532 , H01L21/02538 , H01L21/2022 , Y10S438/933
摘要： A method in which a defective semiconductor crystal material is subjected to an amorphization step followed by a thermal treatment step is provided. The amorphization step amorphizes, partially or completely, a region, including the surface region, of a defective semiconductor crystal material. A thermal treatment step is next performed so as to recrystallize the amorphized region of the defective semiconductor crystal material. The recrystallization is achieved in the present invention by solid-phase crystal regrowth from the non-amorphized region of the defective semiconductor crystal material.
摘要翻译：提供一种方法，其中对缺陷半导体晶体材料进行非晶化步骤之后进行热处理步骤。非晶化步骤使部分地或完全地形成缺陷半导体晶体材料的区域，包括表面区域。接下来进行热处理步骤，以便使缺陷半导体晶体材料的非晶化区域再结晶。通过从缺陷半导体晶体材料的非非晶化区域的固相晶体再生长，在本发明中实现了重结晶。

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