专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

41. 发明申请

US20050201697A1 Tape-like optical fiber core, production method therefor, tape core-carrying connector, tape core-carrying optical fiber array, and optical wiring system 有权
标题翻译：带状光纤芯，其制造方法，带芯连接器，带载光纤阵列和光布线系统
公开(公告)号：US20050201697A1
公开(公告)日：2005-09-15
申请号：US10514813
申请日：2003-05-16
申请人： Kousuke Tanaka , Hiroyasu Sugiyama , Takehiro Hosokawa , Keiichi Tanaka , Tsuyoshi Ikada , Kazuaki Negishi , Yoshiaki Nagao , Toshio Akiyoshi , Kazuhiro Sato
发明人： Kousuke Tanaka , Hiroyasu Sugiyama , Takehiro Hosokawa , Keiichi Tanaka , Tsuyoshi Ikada , Kazuaki Negishi , Yoshiaki Nagao , Toshio Akiyoshi , Kazuhiro Sato
IPC分类号： G02B6/08 , G02B6/44
CPC分类号： G02B6/4436 , G02B6/08 , G02B6/4403 , G02B6/4495
摘要： An optical fiber ribbon comprising a plurality of the coated optical fibers 2 arranged in plane and flame-retardant films 4a and 4b to integrate the coated optical fibers 2 is provided. The flame-retardant films 4a and 4b have an adhesive layer 5 formed thereon, and a plurality of the coated optical fibers 2 arranged in plane are integrated by the adhesive layer. The optical fiber ribbon 1 in this constitution uses flame-retardant films, wherein the ribbon thickness can be lowered and separation of single fiber can be facilitated by tearing off the film.
摘要翻译：提供了包括布置在平面中的多个涂覆光纤2和用于使涂覆光纤2整合的阻燃膜4a和4b的光纤带。阻燃膜4a和4b在其上形成有粘合剂层5，并且布置在平面中的多个涂覆光纤2通过粘合剂层一体化。在这种结构中的光纤带1使用阻燃膜，其中可以降低带厚度，并且通过撕下膜可以促进单纤维的分离。

42. 发明授权

US06867534B2 Low-mass and compact stage devices exhibiting six degrees of freedom of fine motion, and microlithography systems comprising same 失效
标题翻译：具有六个微小自由度的低质量和紧凑的平台装置，以及包括它们的微光刻系统
公开(公告)号：US06867534B2
公开(公告)日：2005-03-15
申请号：US10159411
申请日：2002-05-29
申请人： Keiichi Tanaka
发明人： Keiichi Tanaka
IPC分类号： G12B5/00 , G03F7/20 , H01L21/027 , H01L21/68 , H02N2/00 , H01H41/08
CPC分类号： H01J37/20 , B82Y10/00 , B82Y40/00 , G03F7/70716 , G03F7/70758 , H01J37/3174 , H01J2237/2005 , H01J2237/202
摘要： Low-mass and compact stage devices are disclosed that exhibit, compared to conventional stage devices, reduced magnetic field fluctuations. An embodiment of such a stage device includes an X-Y coarse-movement stage portion that is drivable in the X-Y directions using respective air cylinders. A fine-movement stage portion is mounted on the X-Y coarse-movement stage portion. The fine-movement stage portion is drivable in any of the six degrees of freedom of motion (i.e., X, Y, Z, θX, θY, and θZ motions) relative to the coarse-movement stage portion. Such fine movements are achieved using six piezo actuators. In a stage device configured for use in a microlithography apparatus, a wafer table or reticle table can be mounted on the fine-movement table.
摘要翻译：公开了与传统的平台装置相比，减小的磁场波动的低质量和紧凑的平台装置。这种舞台装置的一个实施例包括可使用相应气缸在X-Y方向上驱动的X-Y粗动台部分。精细运动台部安装在X-Y粗动台部上。细运动台部分可以相对于粗移动台部分的六个运动自由度（即，X，Y，Z，θX，θY和θZ运动）中的任何一个是可驱动的。使用六个压电致动器实现这种精细的运动。在配置用于微光刻设备的台装置中，可以将晶片台或分划板台安装在微动台上。

43. 发明授权

US06861185B2 Method of manufacturing color filter, color filter, and display 有权
标题翻译：制造滤色片，滤色片和显示器的方法
公开(公告)号：US06861185B2
公开(公告)日：2005-03-01
申请号：US10751643
申请日：2004-01-06
申请人： Keiichi Tanaka , Satoru Kishimoto
发明人： Keiichi Tanaka , Satoru Kishimoto
IPC分类号： G02B5/20 , G02F1/1335 , G03F7/00 , G03F7/075 , G03F7/20 , G03F9/00
CPC分类号： G02F1/133555 , G02B5/201 , G02F1/133516 , G03F7/0007 , G03F7/0754 , G03F7/203
摘要： A method of manufacturing a color filter in accordance with the present invention includes: (i) a latent image forming step in which, with respect to a polysilane film, first and second exposure processes having different exposure patterns and different ultraviolet light exposure amounts are carried out, and colorants are applied to the polysilane film on which first and second latent images are formed; and a coloration step in which the first and second latent images are colored by applying colorants thereto. With this, it is possible to form a first density area corresponding to transmissive image reproduction and a second density area corresponding to a second density area. Accordingly a high-quality color filter for multi-scene displays can be manufactured with fewer manufacturing steps.
摘要翻译：根据本发明的制造滤色器的方法包括：（i）潜像形成步骤，其中相对于聚硅烷膜，承载具有不同曝光图案和不同紫外线曝光量的第一和第二曝光工艺并且将着色剂施加到其上形成有第一和第二潜像的聚硅烷膜; 以及通过对其施加着色剂使第一和第二潜像着色的着色步骤。由此，可以形成对应于透射图像再现的第一密度区域和对应于第二密度区域的第二密度区域。因此，可以以较少的制造步骤制造用于多场景显示器的高质量滤色器。

44. 发明授权

US06781669B2 Methods and apparatuses for substrate transporting, positioning, holding, and exposure processing, device manufacturing method and device 失效
标题翻译：用于基板输送，定位，保持和曝光处理的方法和装置，装置制造方法和装置
公开(公告)号：US06781669B2
公开(公告)日：2004-08-24
申请号：US09745432
申请日：2000-12-26
申请人： Keiichi Tanaka
发明人： Keiichi Tanaka
IPC分类号： G03B2742
CPC分类号： G03F7/70816 , G03F7/7075 , G03F7/70758 , G03F7/709 , G03F7/70991
摘要： Methods and apparatuses for transporting a substrate plate efficiently, for positioning the substrate plate to enable to minimize mechanical motions and generation of vibration associated with conventional substrate positioning, and for holding the substrate. For example, the present exposure apparatus has a plurality of electrodes arranged along the baseplate and a transport apparatus having a control apparatus to impress a voltage on each electrode to first generate static charges in the substrate plate, then to impress a voltage on each of the plurality of electrodes so that the charge code of the electrodes is the same as the charge code of the substrate plate, and to switch the voltage on the electrodes in accordance with the time interval required to produce dielectric polarization in the substrate plate. The substrate plate can be transported by electrostatic forces at high speed without contacting the baseplate.
摘要翻译：用于定位衬底板以便最小化与常规衬底定位相关的机械运动和产生振动以及用于保持衬底的方法和装置。例如，本曝光装置具有沿着基板排列的多个电极，以及具有控制装置的输送装置，其对每个电极施加电压，以首先在基板中产生静电荷，然后在每个电极上施加电压多个电极，使得电极的电荷代码与衬底板的电荷代码相同，并且根据在衬底板中产生电介质极化所需的时间间隔来切换电极上的电压。基板可以通过静电力高速运输而不与基板接触。

45. 发明授权

US06509957B1 Stage device and exposure apparatus 失效
公开(公告)号：US06509957B1
公开(公告)日：2003-01-21
申请号：US09722631
申请日：2000-11-28
申请人： Keiichi Tanaka
发明人： Keiichi Tanaka
IPC分类号： G03B2758
CPC分类号： G03F7/70733 , G03F7/70716 , G03F7/70758
摘要： A stage device includes a first stationary member, a second stationary member, a moving member and positioning devices. The first stationary member extends in a first direction. The second stationary member extends in the first direction and is spaced apart from the first stationary member in a second direction perpendicular to the first direction. The moving member can cooperate with the first stationary member and with the second stationary member. The positioning devices selectively position the moving member into cooperation with one of the first and second stationary members without physically contacting the moving member with the first and second stationary members. In addition, a stage device provided with a moving member that can move within a two-dimensional plane having a first direction and a second direction perpendicular to the first direction includes a first stationary member and a second stationary member. The first stationary member extends in the first direction and is supported at a first position in a third direction that is perpendicular to the two-dimensional plane. The second stationary member extends in the first direction and is supported at a second position in the third direction, different from the first position. The moving member has a first part that can cooperate with the first stationary member, and a second part that can cooperate with the second stationary member. When two stages are replaced, generation of a positional shift on an object on the stages is prevented, and separate processing can be performed simultaneously with respect to objects on the stages.

46. 发明授权

US06234107B1 Auxiliary vacuum chamber and vacuum processing unit using same 失效
标题翻译：辅助真空室和真空处理单元使用相同
公开(公告)号：US06234107B1
公开(公告)日：2001-05-22
申请号：US09235644
申请日：1999-01-22
申请人： Keiichi Tanaka , Masaki Sohma , Shinsuke Asao , Masahito Ozawa
发明人： Keiichi Tanaka , Masaki Sohma , Shinsuke Asao , Masahito Ozawa
IPC分类号： C23C1600
CPC分类号： H01L21/67751 , C23C14/566 , H01L21/67109 , H01L21/6719 , H01L21/67201
摘要： An auxiliary vacuum chamber 12 according to the invention comprises a container 30 having an opening 10, 14 for taking an object to be processed W into and out of the container. A holder 33a is movably placed in the container 30, which can hold the object W taken therein. The holder 33a can also form a hermetically closed space 32a with a portion of the container 30 when moved in the container 30. The container 30 is provided with supplying means 38a for supplying a gas from the outside of the container 30 into the hermetically closed space 32a. The container 30 is also provided with exhaust means 37 for exhausting the gas from the hermetically closed space 32a to the outside of the container 30. According to the invention, the auxiliary vacuum chamber 12 need not have gate-valves for being opened and shut to the other chambers 4 and 16.
摘要翻译：根据本发明的辅助真空室12包括容器30，容器30具有用于将待处理物体W进入和离开容器的开口10,14。保持器33a可移动地放置在容器30中，其可以保持被吸收在其中的物体W. 当容器30在容器30中移动时，保持器33a还可以形成具有容器30的一部分的气密封闭的空间32a。容器30设置有供应装置38a，用于将气体从容器30的外部供应到气密封闭的空间 32a。容器30还设置有用于将气体从气密封闭空间32a排出到容器30的外部的排气装置37.根据本发明，辅助真空室12不需要具有用于打开和关闭的闸阀其他腔室4和16。

47. 发明授权

US6118505A Liquid crystal display device having color organic film as the interlayer insulator 失效
标题翻译：具有彩色有机膜作为层间绝缘体的液晶显示装置
公开(公告)号：US6118505A
公开(公告)日：2000-09-12
申请号：US7536
申请日：1998-01-15
申请人： Hisashi Nagata , Keiichi Tanaka , Shingo Jogan
发明人： Hisashi Nagata , Keiichi Tanaka , Shingo Jogan
IPC分类号： G02B5/20 , G02F1/1333 , G02F1/1335 , G02F1/1343 , G02F1/136 , G02F1/1362 , G02F1/1368
CPC分类号： G02F1/136209 , G02F1/136213 , G02F1/136227 , G02F2001/133357 , G02F2001/136222
摘要： A method for fabricating a liquid crystal display device is provided. The liquid crystal display device includes an active matrix substrate, a counter substrate disposed to face the active matrix substrate, and a liquid crystal layer interposed between the active matrix substrate and the counter substrate. The active matrix substrate includes: gate signal lines for supplying control signals and source signal lines for supplying video signals formed to cross each other; switching elements formed at crossings of the gate signal lines and the source signal lines in a matrix, the switching elements being connected to the gate signal lines and the source signal lines; an interlayer insulating film formed on the resultant active matrix substrate; and pixel electrodes formed on the interlayer insulating film in a matrix, wherein a color organic film is used as the interlayer insulating film, and laminated to the resultant active matrix substrate.
摘要翻译：提供一种制造液晶显示装置的方法。液晶显示装置包括有源矩阵基板，配置在与有源矩阵基板相对的相对基板和插入在有源矩阵基板和对置基板之间的液晶层。有源矩阵基板包括：用于提供控制信号的栅极信号线和用于提供形成为交叉的视频信号的源极信号线; 在栅极信号线和源极信号线的交叉处形成矩阵的开关元件，开关元件连接到栅极信号线和源极信号线; 形成在所得有源矩阵基板上的层间绝缘膜; 以及在基板上形成在层间绝缘膜上的像素电极，其中使用彩色有机膜作为层间绝缘膜，并且层压到所得到的有源矩阵基板上。

48. 发明授权

US5953630A Suppression of tungsten film deposition on a semiconductor wafer bevel edge with a halogenide purge gas 失效
标题翻译：用卤化物吹扫气体抑制半导体晶片斜边上的钨膜沉积
公开(公告)号：US5953630A
公开(公告)日：1999-09-14
申请号：US892865
申请日：1997-07-14
申请人： Yuji Maeda , Katsumi Mitani , Manabu Yamazaki , Naomi Yoshida , Keiichi Tanaka
发明人： Yuji Maeda , Katsumi Mitani , Manabu Yamazaki , Naomi Yoshida , Keiichi Tanaka
IPC分类号： C23C16/14 , C23C16/44 , C23C16/455 , H01L21/205 , H01L21/28 , H01L21/285
CPC分类号： C23C16/45521 , C23C16/14 , C23C16/4404 , C23C16/45561 , H01L21/28556
摘要： Provided herein is a CVD method and apparatus for the deposition of tungsten in which formation of a film of tungsten material is suppressed at the peripheral edge of the semiconductor substrate. In accordance with the invention, a halogenide purge gas is supplied to the peripheral edge of the processing face of a semiconductor wafer during the chemical vapor deposition of tungsten. The halogenide purge gases interact with the processing gases and form a passivation film at the peripheral edge of the semiconductor wafer which suppresses or prevents the formation of a film of tungsten material on the edge surface. Consequently, CMP can be applied to the tungsten semiconductor wafer, and particles of the tungsten material, etc., are not generated from the intense polishing of the peripheral edge of the wafer. Therefore, an uncontaminated tungsten-coated semiconductor wafer with a precise multilayer electrode wiring structure can be manufactured in large volume and favorable yields.
摘要翻译：本文提供了一种用于沉积钨的CVD方法和装置，其中在半导体衬底的周边边缘处抑制形成钨材料的膜。根据本发明，在钨的化学气相沉积期间，将卤化物吹扫气体供应到半导体晶片的处理面的周边边缘。卤化物清洗气体与处理气体相互作用，并在半导体晶片的周缘形成钝化膜，其抑制或防止在边缘表面上形成钨材料膜。因此，可以将CMP施加到钨半导体晶片，并且由于晶片的周缘的强烈抛光不会产生钨材料等的粒子。因此，可以制造具有精确的多层电极布线结构的未被污染的钨涂覆的半导体晶片，其体积大且良好。

49. 发明授权

US08980121B2 Etching liquid for a copper/titanium multilayer thin film 有权
标题翻译：用于铜/钛多层薄膜的蚀刻液
公开(公告)号：US08980121B2
公开(公告)日：2015-03-17
申请号：US13575767
申请日：2011-01-28
申请人： Tomoyuki Adaniya , Satoshi Okabe , Toshiyuki Gotou , Taketo Maruyama , Kazuki Kobayashi , Keiichi Tanaka , Wataru Nakamura , Kenichi Kitoh , Tetsunori Tanaka
发明人： Tomoyuki Adaniya , Satoshi Okabe , Toshiyuki Gotou , Taketo Maruyama , Kazuki Kobayashi , Keiichi Tanaka , Wataru Nakamura , Kenichi Kitoh , Tetsunori Tanaka
IPC分类号： B44C1/22 , C23F1/00 , C03C15/00 , C03C25/68 , H01L21/302 , H01L21/461 , C09K13/00 , C09K13/08 , H01L21/3213 , C23F1/18 , C23F1/26 , C23F1/44 , H05K3/06 , H01L23/532
CPC分类号： H01L21/32134 , C23F1/18 , C23F1/26 , C23F1/44 , H01L23/53238 , H01L2924/0002 , H05K3/067 , H01L2924/00
摘要： The present invention provides an etching liquid for a multilayer thin film containing a copper layer and a titanium layer, and a method of using it for etching a multilayer thin film containing a copper layer and a titanium layer, that is, an etching liquid for a multilayer thin film containing a copper layer and a titanium layer, which comprises (A) hydrogen peroxide, (B) nitric acid, (C) a fluoride ion source, (D) an azole, (E) a quaternary ammonium hydroxide and (F) a hydrogen peroxide stabilizer and has a pH of from 1.5 to 2.5, and a etching method of using it.
摘要翻译：本发明提供了一种用于含有铜层和钛层的多层薄膜的蚀刻液及其用于蚀刻含有铜层和钛层的多层薄膜的方法，即，用于含有（A）过氧化氢，（B）硝酸，（C）氟化物离子源，（D）唑，（E）季铵氢氧化物和（F））的含有铜层和钛层的多层薄膜）过氧化氢稳定剂，pH为1.5〜2.5，使用其蚀刻方法。

50. 发明授权

US08623587B2 Residue removing liquid composition and method for cleaning semiconductor element using same 有权
标题翻译：残渣除去液组合物及使用其的半导体元件的清洗方法
公开(公告)号：US08623587B2
公开(公告)日：2014-01-07
申请号：US13057338
申请日：2009-07-07
申请人： Kyoko Kamata , Keiichi Tanaka , Hiroshi Matsunaga
发明人： Kyoko Kamata , Keiichi Tanaka , Hiroshi Matsunaga
IPC分类号： G03F7/26
CPC分类号： H01L21/02071 , C11D7/10 , C11D7/244 , C11D7/261 , C11D7/34 , C11D7/5004 , C11D7/5013 , C11D7/5022 , C11D11/0047 , H01L21/02063
摘要： Provided are a residue removing liquid composition capable of completely removing a resist residue and a titanium (Ti)-derived residue that remains after dry etching and ashing in via hole formation in a production process for a semiconductor substrate having metal wiring of aluminum (Al) or an Al alloy, at a low temperature in a short time, not corroding parts of an interlayer insulating material, a wiring material and others, and a cleaning method for semiconductor devices using it.The residue removing liquid composition contains (A) ammonium fluoride, (B) methanesulfonic acid, (C) a carbon-carbon triple bond-having compound, (D) a water-soluble organic solvent, and (E) water, wherein the content of (A), (C), (D) and (E) in the residue removing liquid composition is from 0.005 to 2% by mass, from 0.1 to 10% by mass, from 60 to 75% by mass and from 5 to 38% by mass, respectively, and (B) is contained in an amount of from 0.9 to 1.5 times (by mol) the amount of (A).
摘要翻译：本发明提供一种残留物除去液体组合物，其能够在具有铝（Al）金属配线的半导体基板的制造工序中完全除去抗蚀剂残渣和残留在通孔形成中的干法蚀刻和灰化之后残留的钛（Ti）或Al合金，在短时间内的低温下，不会腐蚀层间绝缘材料的部分，布线材料等，以及使用它的半导体器件的清洁方法。除去残渣的液体组合物含有（A）氟化铵，（B）甲磺酸，（C）具有碳 - 碳三键的化合物，（D）水溶性有机溶剂和（E）水，残渣除去液组合物中的（A），（C），（D）和（E）为0.005〜2质量％，0.1〜10质量％，60〜75质量％ 38质量％，（B）的含量为（A）的量的0.9〜1.5倍（摩尔）。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式