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1. 发明授权

US08623587B2 Residue removing liquid composition and method for cleaning semiconductor element using same 有权
标题翻译：残渣除去液组合物及使用其的半导体元件的清洗方法
公开(公告)号：US08623587B2
公开(公告)日：2014-01-07
申请号：US13057338
申请日：2009-07-07
申请人： Kyoko Kamata , Keiichi Tanaka , Hiroshi Matsunaga
发明人： Kyoko Kamata , Keiichi Tanaka , Hiroshi Matsunaga
IPC分类号： G03F7/26
CPC分类号： H01L21/02071 , C11D7/10 , C11D7/244 , C11D7/261 , C11D7/34 , C11D7/5004 , C11D7/5013 , C11D7/5022 , C11D11/0047 , H01L21/02063
摘要： Provided are a residue removing liquid composition capable of completely removing a resist residue and a titanium (Ti)-derived residue that remains after dry etching and ashing in via hole formation in a production process for a semiconductor substrate having metal wiring of aluminum (Al) or an Al alloy, at a low temperature in a short time, not corroding parts of an interlayer insulating material, a wiring material and others, and a cleaning method for semiconductor devices using it.The residue removing liquid composition contains (A) ammonium fluoride, (B) methanesulfonic acid, (C) a carbon-carbon triple bond-having compound, (D) a water-soluble organic solvent, and (E) water, wherein the content of (A), (C), (D) and (E) in the residue removing liquid composition is from 0.005 to 2% by mass, from 0.1 to 10% by mass, from 60 to 75% by mass and from 5 to 38% by mass, respectively, and (B) is contained in an amount of from 0.9 to 1.5 times (by mol) the amount of (A).
摘要翻译：本发明提供一种残留物除去液体组合物，其能够在具有铝（Al）金属配线的半导体基板的制造工序中完全除去抗蚀剂残渣和残留在通孔形成中的干法蚀刻和灰化之后残留的钛（Ti）或Al合金，在短时间内的低温下，不会腐蚀层间绝缘材料的部分，布线材料等，以及使用它的半导体器件的清洁方法。除去残渣的液体组合物含有（A）氟化铵，（B）甲磺酸，（C）具有碳 - 碳三键的化合物，（D）水溶性有机溶剂和（E）水，残渣除去液组合物中的（A），（C），（D）和（E）为0.005〜2质量％，0.1〜10质量％，60〜75质量％ 38质量％，（B）的含量为（A）的量的0.9〜1.5倍（摩尔）。

2. 发明申请

US20110256483A1 RESIDUE REMOVING LIQUID COMPOSITION AND METHOD FOR CLEANING SEMICONDUCTOR ELEMENT USING SAME 有权
标题翻译：残留液体组合物的清除方法及使用其清洗半导体元件的方法
公开(公告)号：US20110256483A1
公开(公告)日：2011-10-20
申请号：US13057338
申请日：2009-07-07
申请人： Kyoko Kamata , Keiichi Tanaka , Hiroshi Matsunaga
发明人： Kyoko Kamata , Keiichi Tanaka , Hiroshi Matsunaga
IPC分类号： G03F7/20 , C11D7/60
CPC分类号： H01L21/02071 , C11D7/10 , C11D7/244 , C11D7/261 , C11D7/34 , C11D7/5004 , C11D7/5013 , C11D7/5022 , C11D11/0047 , H01L21/02063
摘要： Provided are a residue removing liquid composition capable of completely removing a resist residue and a titanium (Ti)-derived residue that remains after dry etching and ashing in via hole formation in a production process for a semiconductor substrate having metal wiring of aluminium (Al) or an Al alloy, at a low temperature in a short time, not corroding parts of an interlayer insulating material, a wiring material and others, and a cleaning method for semiconductor devices using it.The residue removing liquid composition contains (A) ammonium fluoride, (B) methanesulfonic acid, (C) a carbon-carbon triple bond-having compound, (D) a water-soluble organic solvent, and (E) water, wherein the content of (A), (C), (D) and (E) in the residue removing liquid composition is from 0.005 to 2% by mass, from 0.1 to 10% by mass, from 60 to 75% by mass and from 5 to 38% by mass, respectively, and (B) is contained in an amount of from 0.9 to 1.5 times (by mol) the amount of (A).
摘要翻译：本发明提供一种残留物除去液体组合物，其能够在具有铝（Al）金属配线的半导体基板的制造工序中完全除去抗蚀剂残渣和残留在通孔形成中的干法蚀刻和灰化之后残留的钛（Ti）或Al合金，在短时间内的低温下，不会腐蚀层间绝缘材料的部分，布线材料等，以及使用它的半导体器件的清洁方法。除去残渣的液体组合物含有（A）氟化铵，（B）甲磺酸，（C）具有碳 - 碳三键的化合物，（D）水溶性有机溶剂和（E）水，残渣除去液组合物中的（A），（C），（D）和（E）为0.005〜2质量％，0.1〜10质量％，60〜75质量％ 38质量％，（B）的含量为（A）的量的0.9〜1.5倍（摩尔）。

3. 发明授权

US09375640B2 Information processing system, computer-readable storage medium, and information processing method 有权
标题翻译：信息处理系统，计算机可读存储介质和信息处理方法
公开(公告)号：US09375640B2
公开(公告)日：2016-06-28
申请号：US13271510
申请日：2011-10-12
申请人： Hiroshi Matsunaga
发明人： Hiroshi Matsunaga
IPC分类号： A63F13/00 , A63F13/20
CPC分类号： A63F13/428 , A63F13/06 , A63F13/2145 , A63F13/218 , A63F13/26 , A63F13/5252 , A63F2300/1056 , A63F2300/1068 , A63F2300/1075 , A63F2300/301 , A63F2300/403 , A63F2300/6045 , A63F2300/6669
摘要： A load applied to a first input device is sequentially detected, and a first display image to be displayed on a portable display device is sequentially generated based on load data. The portable display device obtains image data representing the first display image, and sequentially displays the first display image represented by the obtained image data. In this exemplary embodiment, when a user performs an operation based on his/her action and thereby a process based on the user's action is performed, the user is allowed to view the result of the process in a favorable situation.
摘要翻译：顺序地检测施加到第一输入装置的负载，并且基于负载数据顺序地生成要显示在便携式显示装置上的第一显示图像。便携式显示装置获取表示第一显示图像的图像数据，并顺序地显示由所获得的图像数据表示的第一显示图像。在该示例性实施例中，当用户基于他/她的动作执行操作，从而执行基于用户动作的处理时，允许用户在有利的情况下查看处理结果。

4. 发明授权

US08420529B2 Copper wiring surface protective liquid and method for manufacturing semiconductor circuit 有权
标题翻译：铜布线表面保护液及制造半导体电路的方法
公开(公告)号：US08420529B2
公开(公告)日：2013-04-16
申请号：US13119539
申请日：2009-09-02
申请人： Kenji Yamada , Kenji Shimada , Hiroshi Matsunaga
发明人： Kenji Yamada , Kenji Shimada , Hiroshi Matsunaga
IPC分类号： H01L21/28
CPC分类号： H01L21/321 , H01L21/02063 , H01L21/02074
摘要： A copper wiring material surface protective liquid for production of a semiconductor device is provided, containing an oxyalkylene adduct of an acetylenediol containing an acetylenediol having an oxyalkylene having 2 or 3 carbon atoms added thereto. A method for producing a semiconductor circuit device is provided, containing: forming an insulating film and/or a diffusion preventing film on a silicon substrate; then forming a copper film by a sputtering method; then forming a copper wiring containing 80% by mass or more of copper thereon by a plating method; and flattening the wiring by a chemical mechanical polishing (CMP) method, thereby providing a semiconductor substrate containing a copper wiring, the semiconductor substrate having an exposed surface of a copper wiring material being treated by making in contact with the copper wiring material surface protective liquid.
摘要翻译：提供一种用于制造半导体器件的铜布线材料表面保护液，其含有含有具有2或3个碳原子的氧化烯的乙炔二醇的乙炔二醇的氧化烯加成物。提供一种制造半导体电路器件的方法，包括：在硅衬底上形成绝缘膜和/或防扩散膜; 然后通过溅射法形成铜膜; 然后通过电镀法形成含有80质量％以上的铜的铜布线; 并通过化学机械抛光（CMP）方法使布线变平，从而提供含有铜布线的半导体基板，该半导体基板具有通过与铜布线材料表面保护液体接触来处理铜布线材料的暴露表面。

5. 发明授权

US07977292B2 Cleaning composition and process for producing semiconductor device 有权
标题翻译：清洁组合物和半导体器件制造工艺
公开(公告)号：US07977292B2
公开(公告)日：2011-07-12
申请号：US12530766
申请日：2008-03-06
申请人： Hiroshi Matsunaga , Masaru Ohto , Hideo Kashiwagi , Hiroshi Yoshida
发明人： Hiroshi Matsunaga , Masaru Ohto , Hideo Kashiwagi , Hiroshi Yoshida
IPC分类号： C11D7/18
CPC分类号： H01L21/31133 , C11D3/3947 , C11D7/06 , C11D7/36 , C11D11/0047 , G03F7/423 , G03F7/425 , H01L21/02063
摘要： A cleaning composition of a semiconductor device for laminating an organosiloxane-based thin film and a photoresist layer in this order on a substrate having a low dielectric interlayer insulation film and a copper wiring or a copper alloy wiring, then applying selective exposure and development treatments to the subject photoresist layer to form a photoresist pattern, subsequently applying a dry etching treatment to the organosiloxane-based thin film and the low dielectric interlayer insulation film while using this resist pattern as a mask and then removing the organosiloxane-based thin film, a residue generated by the dry etching treatment, a modified photoresist having been modified by the dry etching treatment and an unmodified photoresist layer located in a lower layer than the modified photoresist, the cleaning composition containing from 15 to 20% by mass of hydrogen peroxide, from 0.0001 to 0.003% by mass of an amino polymethylene phosphonic acid, from 0.02 to 0.5% by mass of potassium hydroxide and water and having a pH of from 7.5 to 8.5, is provided. Also, a method for manufacturing a semiconductor device using the subject cleaning composition is provided.
摘要翻译：一种用于在具有低介电层间绝缘膜和铜布线或铜合金布线的基板上依次层叠有机硅氧烷类薄膜和光致抗蚀剂层的半导体装置的清洗组合物，然后对其进行选择性曝光和显影处理该主体光致抗蚀剂层形成光致抗蚀剂图案，随后在使用该抗蚀剂图案作为掩模的同时对有机硅氧烷类薄膜和低介电层间绝缘膜进行干蚀刻处理，然后除去有机硅氧烷类薄膜，残留物通过干蚀刻处理产生的改性光致抗蚀剂，通过干蚀刻处理改性的改性光致抗蚀剂和位于比改性光致抗蚀剂低的层中的未改性光致抗蚀剂层，清洗组合物含有15〜20质量％的过氧化氢，0.0001 至0.003质量％的氨基聚亚甲基膦酸，为0.02〜0.5质量％氢氧化钾和水，pH为7.5至8.5。另外，提供了使用该被检体组合物的半导体装置的制造方法。

6. 发明申请

US20100197136A1 COMPOSITION FOR CLEANING AND RUST PREVENTION AND PROCESS FOR PRODUCING SEMICONDUCTOR ELEMENT OR DISPLAY ELEMENT 有权
标题翻译：用于生产半导体元件或显示元件的清洁和防腐组合物及其制造方法
公开(公告)号：US20100197136A1
公开(公告)日：2010-08-05
申请号：US12668695
申请日：2008-07-03
申请人： Kenji Shimada , Hiroshi Matsunaga , Kojiro Abe , Kenji Yamada
发明人： Kenji Shimada , Hiroshi Matsunaga , Kojiro Abe , Kenji Yamada
IPC分类号： H01L21/768 , C11D3/28 , G03F7/20 , H01L21/306
CPC分类号： C23G1/103 , C11D3/0073 , C11D3/28 , C11D3/33 , C11D7/10 , C11D7/265 , C11D7/3209 , C11D7/3245 , C11D7/3263 , C11D7/3281 , C11D11/0047 , C23G1/06 , H01L21/02063 , H01L21/02068
摘要： A composition for cleaning and corrosion inhibition which is used in a step of manufacturing a semiconductor device or a display device having a copper-containing metallic wiring is provided, wherein the corrosion inhibitor component is any one of pyrazole, a pyrazole derivative such as 3,5-dimethylpyrazole, a triazole derivative such as 1,2,4-triazole, an aminocarboxylic acid such as iminodiacetic acid or ethylenediaminedipropionic acid hydrochloride, or a disulfide compound such as diisopropyl disulfide or diethyl disulfide; and the cleaning agent component is any one of ammonium fluoride, tetramethylammonium fluoride, ammonium acetate, acetic acid, glyoxylic acid, oxalic acid, ascorbic acid, 1,2-diaminopropane or dimethylacetamide. Also, a method for manufacturing a semiconductor device or the like using the composition for cleaning and corrosion inhibition is provided.
摘要翻译：提供了用于制造半导体器件或具有含铜金属布线的显示器件的步骤中用于清洁和腐蚀抑制的组合物，其中所述腐蚀抑制剂成分是吡唑，吡唑衍生物如3，咪唑衍生物如1,2,4-三唑，氨基羧酸如亚氨基二乙酸或乙二胺二丙酸盐酸盐，或二硫化物化合物如二异丙基二硫化物或二乙基二硫醚; 清洗剂成分为氟化铵，四甲基氟化铵，乙酸铵，乙酸，乙醛酸，草酸，抗坏血酸，1,2-二氨基丙烷或二甲基乙酰胺中的任一种。另外，提供了使用该清洗抑制组合物制造半导体装置等的方法。

7. 发明申请

US20100051066A1 COMPOSITION FOR REMOVING RESIDUE FROM WIRING BOARD AND CLEANING METHOD 审中-公开
标题翻译：用于从接线板上除去残留物的组合物和清洁方法
公开(公告)号：US20100051066A1
公开(公告)日：2010-03-04
申请号：US12158077
申请日：2006-12-14
申请人： Eiko Kuwabara , Hideo Kashiwagi , Hiroshi Matsunaga , Masaru Ohto
发明人： Eiko Kuwabara , Hideo Kashiwagi , Hiroshi Matsunaga , Masaru Ohto
IPC分类号： C23G1/02 , C11D7/32
CPC分类号： H05K3/26 , C11D3/3947 , C11D7/3281 , C11D11/0047 , G03F7/423 , G03F7/425 , H05K3/0041 , H05K3/388 , H05K2203/0796 , H05K2203/124
摘要： A composition for removing a residue from a wiring board containing an oxidizing agent and an azole compound and having a pH of from 1 to 7 and a cleaning method of a wiring board for removing a residue after dry etching by using this composition are provided. By using the composition for removing a residue of the present invention, in manufacturing a wiring board, residues remaining after dry etching which are derived from a resist or metals can be effectively removed without corroding titanium or titanium alloys with high corrosiveness. In particular, a semiconductor device using a wiring board containing titanium or titanium alloys can be efficiently manufactured.
摘要翻译：提供一种用于从含有氧化剂和唑类化合物并且pH为1至7的布线板除去残余物的组合物，以及通过使用该组合物在干法蚀刻之后除去残留物的布线板的清洁方法。通过使用除去本发明的残渣的组合物，在制造布线板时，可以有效地除去从抗蚀剂或金属衍生的干蚀刻后剩余的残留物，而不会腐蚀具有高腐蚀性的钛或钛合金。特别地，可以有效地制造使用含有钛或钛合金的布线板的半导体装置。

8. 发明申请

US20090159823A1 MECHANICAL VALVE 审中-公开
标题翻译：机械阀门
公开(公告)号：US20090159823A1
公开(公告)日：2009-06-25
申请号：US12334326
申请日：2008-12-12
申请人： Hiroshi Matsunaga , Atsushi Saito
发明人： Hiroshi Matsunaga , Atsushi Saito
IPC分类号： F16K31/02
CPC分类号： F16K11/07 , F16K31/082
摘要： A mechanical valve has a main body having a cylinder hole formed therein, a movable element that is inserted into the cylinder hole and that moves forwardly and rearwardly, and a drive section that drives the movable element. A plurality of openings through which air passes are formed in an internal peripheral surface of the cylinder hole, and the openings are opened and closed as a result of forward and rearward movements of the movable element. A movable magnet is fastened to each of both ends of the movable element. Electromagnets opposing the respective movable magnets are provided in a drive section. The movable element is actuated by utilization of magnetic force of the electromagnets.
摘要翻译：机械阀具有形成在其中的气缸孔的主体，插入到气缸孔中并且向前和向后移动的可动元件和驱动可动元件的驱动部。空气通过的多个开口形成在气缸孔的内周表面中，并且由于可动元件的向前和向后运动，开口被打开和关闭。可移动磁体被固定到可动元件的两端中的每一端。与各可动磁铁相对的电磁铁设置在驱动部中。通过利用电磁铁的磁力来致动可动元件。

9. 发明申请

US20060216185A1 Hermetic rotary compressor 审中-公开
标题翻译：密封旋转压缩机
公开(公告)号：US20060216185A1
公开(公告)日：2006-09-28
申请号：US11387344
申请日：2006-03-23
申请人： Toru Aya , Toshiharu Yasu , Hiroshi Matsunaga
发明人： Toru Aya , Toshiharu Yasu , Hiroshi Matsunaga
IPC分类号： F01C1/02 , F03C2/00
CPC分类号： F04C28/065 , F04C18/3564 , F04C23/008 , F04C29/028
摘要： A hermetic rotary compressor operates two cylinders simultaneously in the regular operation; however it halts operating one of the cylinders when it selects an operation with a half capacity. A vane room of the halted cylinder is air-tightly sealed with respect to lubricant atmosphere in a hermetic case. An oil-supplying groove is provided to a vane groove of the halted cylinder, and lubricant is supplied to the oil-supplying groove in order to lubricate the vane.
摘要翻译：密封式旋转压缩机在正常运行中同时操作两个气缸; 然而，当它选择具有半容量的操作时，它停止操作一个气缸。停止的气缸的叶片室在密封的壳体中相对于润滑剂气氛气密密封。向停止的气缸的叶片槽设置供油槽，向供油槽供给润滑剂以润滑叶片。

10. 发明申请

US20060121985A1 Storage medium having game program stored thereon and game apparatus 有权
标题翻译：存储有游戏程序的存储介质和游戏装置
公开(公告)号：US20060121985A1
公开(公告)日：2006-06-08
申请号：US11266373
申请日：2005-11-04
申请人： Keigo Nakanishi , Hiroshi Matsunaga , Shinichi Ikematsu
发明人： Keigo Nakanishi , Hiroshi Matsunaga , Shinichi Ikematsu
IPC分类号： A63F9/24
CPC分类号： A63F13/426 , A63F13/10 , A63F13/2145 , A63F13/26 , A63F13/92 , A63F13/95 , A63F2300/1075 , A63F2300/204 , A63F2300/301 , A63F2300/6045
摘要： Reference coordinates in a coordinate system and designated coordinates in the coordinate system based on coordinate information outputted by a pointing device are set. A distance and direction between the reference coordinates and the designated coordinates are calculated. When the distance has a value smaller than a predetermined threshold value, the distance is converted into a game parameter using a first conversion function is determined. On the other hand, when the distance has a value greater than the predetermined threshold value, the distance is converted into a game parameter using a second conversion function for converting the distance into a value greater than a value into which the distance is converted using the first conversion function. The game is processed using the direction and the game parameter.
摘要翻译：基于由坐标系输出的坐标信息，坐标系中的参考坐标和坐标系中的指定坐标被设定。计算参考坐标与指定坐标之间的距离和方向。当距离具有小于预定阈值的值时，使用第一转换函数确定距离被转换为游戏参数。另一方面，当距离具有大于预定阈值的值时，使用第二转换功能将距离转换为游戏参数，用于将距离转换为大于使用第一个转换功能。游戏使用方向和游戏参数进行处理。

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