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    • 41. 发明授权
    • Silicon nitride sintered body and method for producing same
    • 氮化硅烧结体及其制造方法
    • US5114888A
    • 1992-05-19
    • US612691
    • 1990-11-15
    • Kenichi MizunoYo TajimaMasakazu Watanabe
    • Kenichi MizunoYo TajimaMasakazu Watanabe
    • C04B35/593
    • C04B35/5935
    • Silicon nitride base sintered body consists of: 1 to 20 wt % (as oxides) of at least one of rare earth elements; 0.5 to 8 wt % of V (as V.sub.2 O.sub.5); 0.5 to 8 wt % (as oxides) of at least one of Nb, Ta, Cr, Mo and W; sum of the Va and VIa group elements according to the Periodic Table of the International Version (as oxides) being 1 to 10 wt %; and balance silicon nitride. It has high strength of 690-880 MPa (70-90 kgf/mm.sup.2) and high oxidation resistance both at 1350.degree. C. It is produced by 2 stage gas-pressure sintering in pressurized N.sub.2 atmosphere, primarily at 1700.degree.-1900.degree. C. at 1 MPa (10 atm) or less and secondarily at 1600.degree.-1900 C. at 10 MPa (100 atm) or above.
    • 氮化硅基烧结体由以下组成:1〜20重量%(作为氧化物)的稀土元素中的至少一种; 0.5至8重量%的V(作为V 2 O 5); Nb,Ta,Cr,Mo和W中的至少一种为0.5〜8重量%(作为氧化物) 根据国际版本(作为氧化物)的周期表,Va和VIa族元素的总和为1至10wt%; 并平衡氮化硅。 它在1350℃下具有690-880MPa(70-90kgf / mm2)的高强度和高抗氧化性。它在加压N 2气氛中,主要在1700°-1900℃下通过2级气压烧结 在10MPa(100大气压)以上,在1MPa(10atm)以下,二次在1600〜1900℃。
    • 48. 发明授权
    • Sintered body of silicon nitride and its manufacture
    • 氮化硅烧结体及其制造
    • US5045513A
    • 1991-09-03
    • US393726
    • 1989-08-15
    • Kenichi MizunoKatsuhisa YabutaMasakazu Watanabe
    • Kenichi MizunoKatsuhisa YabutaMasakazu Watanabe
    • C04B35/584C04B35/593
    • C04B35/5935
    • A sintered body of silicon nitride with high density, strength, toughness, and hardness, which can be used for a structural part of an engine, etc. The sintered body of the invention includes 80 to 94 wt % Si.sub.3 N.sub.4, 2 to 10 wt % Mg compound calculated in MgO equivlent, and 2 to 10 wt % Y compound calculated in Y.sub.2 O.sub.3 equivalent. The Si.sub.3 N.sub.4 contains 5 to 40% .alpha.-phase. The sintered body is manufactured in the following steps: (a) mixing powdery Si.sub.3 N.sub.4 with a Mg compound and a Y compound in the above proportions, and then molding the mixture in which the Si.sub.3 N.sub.4 powder contains 80% or more .alpha.-phase and its grains are 1 .mu.m or less in diameter on average; (b) performing primary sintering at 1,600.degree. C. or less in an atmospher of nitrogen or of an inert gas at 20 atm or less; and (c) performing secondary sintering at 1,400.degree. to 1,600.degree. C. in an atmosphere of nitrogen or of an inert gas at 300 atm or more.
    • 具有高密度,强度,韧性和硬度的氮化硅烧结体,其可用于发动机的结构部件等。本发明的烧结体包含80〜94重量%的Si 3 N 4,2〜10重量% 镁化合物按MgO计算,和2〜10重量%的Y化合物按Y2O3当量计算。 Si3N4含有5〜40%的α-相。 该烧结体按以下步骤制造:(a)以上述比例混合粉末状Si 3 N 4与Mg化合物和Y化合物,然后将其中Si 3 N 4粉末含有80%以上的α-相及其晶粒的混合物 平均直径1米以下; (b)在大气压的氮气或20atm以下的惰性气体中,在1600℃以下进行初次烧结; 和(c)在氮气气氛中或在大气压为300atm以上的惰性气体中,在1400℃〜1600℃进行二次烧结。
    • 50. 发明授权
    • Semiconductor device and manufacturing method of same
    • 半导体器件及其制造方法
    • US09293555B2
    • 2016-03-22
    • US13944316
    • 2013-07-17
    • Masakazu Watanabe
    • Masakazu Watanabe
    • H01L29/51H01L29/739H01L29/06
    • H01L29/511H01L29/063H01L29/7397H01L2924/0002H01L2924/00
    • A semiconductor device includes a semiconductor substrate; an insulating film arranged on the semiconductor substrate; an electrode that contacts a portion of a side surface of the insulating film; a first passivation film that is arranged extending from the electrode to the insulating film, and contacts a surface of the insulating film, and contacts a surface of the electrode; and a second passivation film that is arranged on the first passivation film. A difference between a linear expansion coefficient of the first passivation film and a linear expansion coefficient of the insulating film is smaller than a difference between the linear expansion coefficient of the first passivation film and a linear expansion coefficient of the electrode, and a position where the first passivation film contacts a boundary between the electrode and the insulating film is positioned lower than an upper surface of the insulating film.
    • 半导体器件包括半导体衬底; 布置在所述半导体衬底上的绝缘膜; 与所述绝缘膜的侧面的一部分接触的电极; 第一钝化膜,其从所述电极延伸到所述绝缘膜,并且与所述绝缘膜的表面接触并接触所述电极的表面; 以及布置在第一钝化膜上的第二钝化膜。 第一钝化膜的线膨胀系数与绝缘膜的线膨胀系数之差小于第一钝化膜的线膨胀系数与电极的线膨胀系数之差, 第一钝化膜接触电极和绝缘膜之间的边界位于比绝缘膜的上表面低的位置。