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    • 42. 发明申请
    • Substrate processing system, substrate processing method, sealed container storing apparatus, program for implementing the substrate processing method, and storage medium storing the program
    • 基板处理系统,基板处理方法,密封容器存储装置,用于实施基板处理方法的程序以及存储程序的存储介质
    • US20060105473A1
    • 2006-05-18
    • US11202317
    • 2005-08-12
    • Satoshi YamazakiTsukasa Makino
    • Satoshi YamazakiTsukasa Makino
    • H01L21/00
    • H01L21/67236H01L21/67069H01L21/67276H01L21/67772Y10S414/14
    • A substrate processing system which is capable of preventing dust from becoming attached to substrates without increasing the degree of cleanliness of a clean room to a predetermined level, and also capable of increasing the substrate processing throughput without increasing the burden on workers. a plasma processing apparatus 2 that subjects semiconductor wafers W to plasma processing in a cleaned atmosphere. A SMIF 4 has a enclosure 23 that is connected to the plasma processing apparatus 2 and has a cleaned atmosphere therein, a pod stage 26 on which a pod 3 housing semiconductor wafers W is mounted, a pod mounting portion 24 that carries out removal of semiconductor wafers W from the pod 3 and housing of semiconductor wafers W into the pod 3, and a wafer cassette transfer arm 27 that transfers semiconductor wafers W between the pod stage 26 and the plasma processing apparatus 2 via the enclosure 23. A preliminary loader 5 having a stage-shaped unprocessed pod port 28 that stores a pod 3 housing semiconductor wafers W that have not been subjected to the plasma processing, a shelf-like processed pod port 29 that stores a sealed container housing semiconductor wafers W that have been subjected to the plasma processing, and a pod moving mechanism 30 that moves the pods 3 between the stage-shaped unprocessed pod port 28 and the pod stage 26, and between the pod stage 26 and the shelf-like processed pod port 29.
    • 一种基板处理系统,其能够防止灰尘附着到基板上,而不会将洁净室的清洁度提高到预定水平,并且还能够增加基板处理生产量而不增加对工人的负担。 等离子体处理装置2,其使半导体晶片W在清洁的气氛中进行等离子体处理。 SMIF 4具有连接到等离子体处理装置2并具有清洁气氛的外壳23,容纳半导体晶片W的容器3的荚台26,进行半导体移除的荚安装部24 来自容器3的晶片W和半导体晶片W的壳体插入到容器3中,以及晶片盒传送臂27,其经由外壳23在荚状台26和等离子体处理装置2之间传送半导体晶片W。 具有阶梯形未加工的容器端口28的初步装载机5,其存储容纳未经受等离子体处理的半导体晶片W的容器3,存储容纳半导体晶片W的密封容器的搁架状处理容器端口29, 已经进行了等离子体处理,以及荚移动机构30,其使荚果3在阶梯形未处理的荚果端口28和荚果台26之间以及荚果台26和搁架状处理的荚果口29之间移动。
    • 43. 发明申请
    • Load allocation when executing image processing using parallel processing
    • 使用并行处理执行图像处理时的负载分配
    • US20060050955A1
    • 2006-03-09
    • US11212430
    • 2005-08-24
    • Satoshi YamazakiToshiaki KakutaniTeruyuki TakataKohei Utsunomiya
    • Satoshi YamazakiToshiaki KakutaniTeruyuki TakataKohei Utsunomiya
    • G06K9/00
    • H04N1/46
    • For image processes performed repeatedly using a plurality of processing units on a plurality of partial images aligned mutually adjacent to each other, specified processing is performed. This image process includes (i) a first-type process segment on first partial image data representing a partial image to generate M types (M is an integer of 2 or greater) of second partial image data; and (ii) the respectively corresponding M types of second-type process segments on the M types of second partial image data. When executing image processing, parallel processing is performed for the second-type process segment relating to the i-th (i is a positive integer) partial image and the first-type process segment relating to any of the (i+1)-th to the (i+p)-th (p is a positive integer) partial images.
    • 对于使用多个相互相邻的多个局部图像上的多个处理单元重复执行的图像处理,执行指定的处理。 该图像处理包括(i)第一部分图像数据上的第一类型处理段,其表示部分图像以生成第二部分图像数据的M种类型(M为2或更大的整数); 和(ii)M种类型的第二部分图像数据上的分别对应的M种类型的第二类型处理段。 当执行图像处理时,对与第i(i是正整数)局部图像相关的第二类型处理段执行并行处理,并且与第(i + 1) 到(i + p)(p是正整数)部分图像。
    • 50. 发明授权
    • Hologram and method of reading the same
    • 全息图和阅读方法
    • US5644412A
    • 1997-07-01
    • US191619
    • 1994-02-04
    • Satoshi YamazakiRyuji Horiguchi
    • Satoshi YamazakiRyuji Horiguchi
    • G03H1/22G06K19/16G03H1/00
    • G03H1/22G06K19/16
    • A hologram which contains the record of a parallel bar-shaped pattern, like a bar code pattern, and which can be read with a single light-receiving element of simple structure with fewer restrictions on the installation position of the light-receiving element and with a minimal lowering in the read accuracy even if the light-receiving element is disposed a little out-of-position. Also disclosed is a method of reading such a hologram. A hologram is recorded in a region that extends in a direction intersecting each bar of a reconstructed bar-shaped pattern and that is not shorter than the length of the reconstructed bar-shaped pattern at least in the above-described direction. Alternatively, the hologram is recorded in a stripe region elongated at the above-described direction. The hologram is read by illuminating it with a reconstructing light beam of small diameter which illuminates only a limited portion of the recording region, receiving diffracted light from the hologram with a single light-receiving element at a position which is coincident with an imagery position where an image of the bar-shaped pattern is formed, or closer to the hologram than imagery position, and at which beams of diffracted light from the hologram are separate from each other, and moving the hologram relative to the reconstructing light beam and the single light-receiving element in a direction intersecting each bar of the reconstructed bar-shaped pattern.
    • 包含平行条形图案的记录的全息图,如条形码图案,并且可以用简单结构的单个光接收元件读取,对光接收元件的安装位置的限制较少, 即使光接收元件设置在一点位置,读取精度也降低很小。 还公开了读取这样的全息图的方法。 全息图被记录在沿着与重构的棒状图案的每个条相交的方向延伸的区域中,并且至少在上述方向上不等于重建的条形图案的长度。 或者,全息图被记录在沿上述方向伸长的条纹区域中。 通过用仅照射记录区域的有限部分的小直径的重建光束来照射全息图,在与图像位置一致的位置处用单个光接收元件从全息图接收衍射光,其中 形成条形图案的图像,或者比图像位置更靠近全息图,并且来自全息图的衍射光束彼此分离,并且相对于重建光束和单个光线移动全息图 在与重建的条形图案的每个条相交的方向上的接收元件。