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41. 发明申请

US20080316444A1 METHOD AND DEVICE FOR THE CORRECTION OF IMAGING DEFECTS 有权
标题翻译：用于校正图像缺陷的方法和装置
公开(公告)号：US20080316444A1
公开(公告)日：2008-12-25
申请号：US12171394
申请日：2008-07-11
申请人： Franz Sorg , Peter Deufel , Toralf Gruner
发明人： Franz Sorg , Peter Deufel , Toralf Gruner
IPC分类号： G03B27/68
CPC分类号： G03F7/70308 , G03F7/70825 , G03F7/70933
摘要： The disclosure relates to a microlithography projection exposure system having optical corrective elements configured to modify the imaging characteristics, as well as related systems and components.
摘要翻译：本公开涉及具有被配置为修改成像特性以及相关系统和组件的光学校正元件的微光刻投影曝光系统。

42. 发明申请

US20070165198A1 Projection objective for a microlithographic projection exposure apparatus 审中-公开
标题翻译：微光刻投影曝光装置的投影物镜
公开(公告)号：US20070165198A1
公开(公告)日：2007-07-19
申请号：US10597806
申请日：2004-12-27
申请人： Bernhard Kneer , Norbert Wabra , Toralf Gruner , Alexander Epple , Susanne Beder , Wolfgang Singer
发明人： Bernhard Kneer , Norbert Wabra , Toralf Gruner , Alexander Epple , Susanne Beder , Wolfgang Singer
IPC分类号： G03B27/00
CPC分类号： G03F7/70225 , G03F7/70241 , G03F7/70341 , G03F7/70958 , G03F7/70966
摘要： A projection objective of a microlithographic projection exposure apparatus (110) is designed for immersion operation in which an immersion liquid (134) adjoins a photosensitive layer (126). The refractive index of the immersion liquid is greater than the refractive index of a medium (L5; 142; L205; LL7; LL8; LL9). that adjoins the immersion liquid on the object side of the projection objective (120; 120′; 120″). The projection objective is designed such that the immersion liquid (134) is convexly curved towards the object plane (122) during immersion operation.
摘要翻译：微光刻投影曝光装置（110）的投影物镜被设计用于浸没操作，其中浸没液体（134）邻接感光层（126）。浸没液的折射率大于介质的折射率（L 5; 142; L 205; LL 7; LL 8; LL 9）。其邻接在投影物镜（120; 120'; 120“）的物体侧的浸没液体。投影物镜被设计成使得浸入液体（134）在浸入操作期间朝向物平面（122）凸形弯曲。

43. 发明申请

US20060215272A1 Objective in a microlithographic projection exposure apparatus 审中-公开
标题翻译：目的在微光刻投影曝光装置
公开(公告)号：US20060215272A1
公开(公告)日：2006-09-28
申请号：US11443077
申请日：2006-05-31
申请人： Toralf Gruner , Hans-Jurgen Mann
发明人： Toralf Gruner , Hans-Jurgen Mann
IPC分类号： G02B3/00
CPC分类号： G02B27/286 , G02B13/14 , G02B17/08 , G02B17/0892 , G03F7/70191 , G03F7/70225 , G03F7/70566
摘要： An objective in a microlithographic projection exposure apparatus has a first optical element that has polarization dependent properties causing intensity fluctuations in an image plane of the objective. These fluctuations may be produced by a second optical element that is arranged downstream of the first optical element. A gray filter disposed in the beam path reduces the intensity fluctuations.
摘要翻译：微光刻投影曝光装置中的目的是具有第一光学元件，该第一光学元件具有导致物镜的图像平面中的强度波动的偏振相关特性。这些波动可以由布置在第一光学元件的下游的第二光学元件产生。布置在光束路径中的灰色滤光器减小了强度波动。

44. 发明申请

US20060171020A1 Objective with fluoride crystal lenses 有权
标题翻译：目标是氟化物晶体镜片
公开(公告)号：US20060171020A1
公开(公告)日：2006-08-03
申请号：US11392027
申请日：2006-03-29
申请人： Daniel Krahmer , Toralf Gruner , Wilhelm Ulrich , Birgit Enkisch , Michael Gerhard , Martin Brunotte , Christian Wagner , Winfried Kaiser , Manfred Maul , Christoph Zaczek
发明人： Daniel Krahmer , Toralf Gruner , Wilhelm Ulrich , Birgit Enkisch , Michael Gerhard , Martin Brunotte , Christian Wagner , Winfried Kaiser , Manfred Maul , Christoph Zaczek
IPC分类号： G02B13/14 , G02B3/00
CPC分类号： G03F7/70966 , G02B1/02 , G02B1/08 , G02B5/3083 , G03F7/70225 , G03F7/70241 , G03F7/70566 , G03F7/70958 , Y10S359/90
摘要： An objective for a microlithography projection system has at least one fluoride crystal lens. The effects of birefringence, which are detrimental to the image quality, are reduced if the lens axis of the crystal lens is oriented substantially perpendicular to the {100}-planes or {100}-equivalent crystallographic planes of the fluoride crystal. If two or more fluoride crystal lenses are used, they should have lens axes oriented in the (100)-, (111)-, or (110)-direction of the crystallographic structure, and they should be oriented at rotated positions relative to each other. The birefringence-related effects are further reduced by using groups of mutually rotated (100)-lenses in combination with groups of mutually rotated (111)- or (110)-lenses. A further improvement is also achieved by applying a compensation coating to at least one optical element of the objective.
摘要翻译：微光刻投影系统的目的在于至少有一个氟化物晶体透镜。如果晶体透镜的透镜轴基本上垂直于氟化物晶体的{100} - 平面或{100}等价晶面而取向，对图像质量有害的双折射效应将被降低。如果使用两个或多个氟化物晶体透镜，它们应该具有在晶体结构的（100） - ，（111） - 或（110）方向上定向的透镜轴，并且它们应当相对于每个其他。通过使用相互旋转（100） - 相互组合的组相互旋转（111） - 或（110） - 相组合来进一步减少双折射相关效应。通过对物镜的至少一个光学元件施加补偿涂层也可实现进一步的改进。

45. 发明申请

US20060146427A1 Method for improving the imaging properties of at least two optical elements and photolithographic fabrication method 审中-公开
标题翻译：用于改善至少两个光学元件的成像特性和光刻制造方法的方法
公开(公告)号：US20060146427A1
公开(公告)日：2006-07-06
申请号：US11361345
申请日：2006-02-24
申请人： Birgit Kurz , Toralf Gruner , Alexander Kohl
发明人： Birgit Kurz , Toralf Gruner , Alexander Kohl
IPC分类号： G02B7/02
CPC分类号： G03F7/70591 , G02B5/3083 , G03F7/70258 , G03F7/70566 , G03F7/70966 , Y10S359/90
摘要： A method for improving imaging properties of two or more optical elements comprises the step of determining for at least one of the two optical elements a polarisation-dependent perturbation. In a further step a polarisation-independent perturbation is determined for at least one of the two optical elements. Then a target position for the at least one movable optical element is calculated such that, in the target position, the total perturbation of the at least two optical elements which is made up of the polarisation-dependent perturbations and polarisation-independent perturbations of the two optical elements, is minimized. Finally the at least one movable optical element is moved the to the calculated target position.
摘要翻译：一种用于改善两个或多个光学元件的成像特性的方法包括确定两个光学元件中的至少一个偏振相关扰动的步骤。在另一步骤中，确定两个光学元件中的至少一个的偏振无关扰动。然后，计算出至少一个可移动光学元件的目标位置，使得在目标位置中，由偏振相关扰动和两极偏振无关的扰动构成的至少两个光学元件的总扰动光学元件被最小化。最后，将至少一个可移动光学元件移动到计算出的目标位置。

46. 发明申请

US20060132917A1 Method for making an optical system with coated optical components and optical system made by the method 审中-公开
标题翻译：用该方法制造具有涂层光学部件和光学系统的光学系统的方法
公开(公告)号：US20060132917A1
公开(公告)日：2006-06-22
申请号：US11274152
申请日：2005-11-16
申请人： Christoph Zaczek , Thomas Muelders , Toralf Gruner
发明人： Christoph Zaczek , Thomas Muelders , Toralf Gruner
IPC分类号： G02B27/28
CPC分类号： G03F7/70958 , G02B27/0012 , G02B27/283 , G03F7/705
摘要： In a method for making an optical system for imaging a radiation distribution from an input surface of the optical system into an output surface of the optical system, the optical system has a multiplicity of optical components which determine an imaging quality of the optical system, which are arranged along an optical axis of the optical system and comprise at least one optical component which has a substrate with a substrate surface which is provided for carrying an interference layer system having a layer construction that determines the optical properties of the optical component covered with the interference layer system. The method includes: predefining an optimization target for at least one imaging quality parameter that represents the imaging quality of the system; determining the imaging quality of the optical system while taking account of the layer construction of the interference layer system; and varying the layer construction for approximating the imaging quality parameter to the optimization target. In accordance with the method, the determination of the optimum layer construction is coupled directly with an assessment and of the imaging quality of the total system including the interference layer system to be optimized.
摘要翻译：在制造用于将从光学系统的输入表面的辐射分布成像到光学系统的输出表面的光学系统的方法中，光学系统具有多个光学部件，其确定光学系统的成像质量，沿着光学系统的光轴布置并且包括至少一个光学部件，该光学部件具有衬底，该衬底具有衬底表面，衬底表面被提供用于承载具有层结构的干涉层系统，所述层结构决定了被覆盖的光学部件的光学特性干涉层系统。该方法包括：为表示系统的成像质量的至少一个成像质量参数预定义优化目标; 在考虑到干涉层系统的层结构的同时确定光学系统的成像质量; 并且改变用于将成像质量参数近似到优化目标的层结构。根据该方法，最佳层结构的确定直接与包括要优化的干涉层系统的总体系统的评估和成像质量相耦合。

47. 发明申请

US20060077371A1 Method for improving the imaging properties of a projection objective for a microlithographic projection exposure apparatus 有权
标题翻译：用于改善微光刻投影曝光装置的投影物镜的成像特性的方法
公开(公告)号：US20060077371A1
公开(公告)日：2006-04-13
申请号：US11220643
申请日：2005-09-08
申请人： Ulrich Wegmann , Vladimir Kamenov , Thomas Muelders , Toralf Gruner
发明人： Ulrich Wegmann , Vladimir Kamenov , Thomas Muelders , Toralf Gruner
IPC分类号： G03B27/54
CPC分类号： G03F7/706 , G03F7/701 , G03F7/70566 , G03F7/70591
摘要： In a method for improving the imaging properties of a projection objective of a microlithographic projection exposure apparatus, an appropriate illumination angle distribution adapted to a mask (24; 224) to be projected is selected. Then locations (40a, 40b; 60a, 60b; 80a, 80b, 80c) in an exit pupil of the projection objective (20), which are illuminated under these conditions by projection light during a projection of the mask, are determined. For at least one image point, an actual value of an imaging quantity, e.g. a wavefront profile or a polarization state, is determined that influences the imaging properties of the projection objective. Finally, corrective measures are calculated such that the actual value of the imaging quantity approximates a desired value at these locations. In this last step, however, deviations of the actual value from the desired value are taken into account exclusively at said locations illuminated in the exit pupil.
摘要翻译：在用于改善微光刻投影曝光装置的投影物镜的成像特性的方法中，选择适于投影的掩模（24; 224）的适当照明角度分布。然后在投影物镜（20）的出射光瞳处的位置（40a，40b; 60a，60b; 80a，80b，80c）处，面具，确定。对于至少一个图像点，成像量的实际值，例如，确定影响投影物镜的成像特性的波前轮廓或偏振状态。最后，计算校正措施，使得成像量的实际值在这些位置处接近期望值。然而，在最后一步中，实际值与期望值的偏差仅在出口光瞳上照亮的所述位置被考虑。

48. 发明授权

US07027237B2 Method for improving the imaging properties of at least two optical elements and photolithographic fabrication method 失效
标题翻译：用于改善至少两个光学元件的成像特性和光刻制造方法的方法
公开(公告)号：US07027237B2
公开(公告)日：2006-04-11
申请号：US11185066
申请日：2005-07-20
申请人： Birgit Mecking , Toralf Gruner , Alexander Kohl
发明人： Birgit Mecking , Toralf Gruner , Alexander Kohl
IPC分类号： G02B7/02
CPC分类号： G03F7/70591 , G02B5/3083 , G03F7/70258 , G03F7/70566 , G03F7/70966 , Y10S359/90
摘要： A method for improving imaging properties of two or more optical elements comprises the step of determining for at least one of the two optical elements a polarization-dependent perturbation. In a further step a polarization-independent perturbation is determined for at least one of the two optical elements. Then a target position for the at least one movable optical element is calculated such that, in the target position, the total perturbation of the at least two optical elements which is made up of the polarization-dependent perturbations and polarization-independent perturbations of the two optical elements, is minimized. Finally the at least one movable optical element is moved the to the calculated target position.
摘要翻译：一种用于改善两个或多个光学元件的成像特性的方法包括确定两个光学元件中的至少一个偏振相关扰动的步骤。在另一步骤中，确定两个光学元件中的至少一个的偏振无关扰动。然后，计算出至少一个可移动光学元件的目标位置，使得在目标位置中，由偏振相关扰动和两极偏振无关的扰动构成的至少两个光学元件的总扰动光学元件被最小化。最后，将至少一个可移动光学元件移动到计算出的目标位置。

49. 发明申请

US20050190446A1 Catadioptric reduction objective 审中-公开
标题翻译：反射折射减少目标
公开(公告)号：US20050190446A1
公开(公告)日：2005-09-01
申请号：US11019202
申请日：2004-12-23
申请人： Birgit Kuerz , Olaf Dittmann , Toralf Gruner , Vladimir Kamenov , Martin Brunotte
发明人： Birgit Kuerz , Olaf Dittmann , Toralf Gruner , Vladimir Kamenov , Martin Brunotte
IPC分类号： G02B1/02 , G02B13/14 , G02B17/08 , G02B27/28 , G03F7/20 , G02B17/00
CPC分类号： G02B17/0892 , G02B1/02 , G02B13/143 , G02B17/08 , G02B27/283 , G03F7/70225 , G03F7/70566
摘要： A catadioptric projection objective for projecting a pattern, which is located in the object plane of the projection objective, into the image plane of the projection objective has, between the object plane and the image plane, a catadioptric objective part provided with a concave mirror (17), with a first deviating mirror (16) and with at least one second deviating mirror (19). A polarization rotating device (26) rotates the preferred polarization direction of the light approximately 90° inside the light path between the deviating mirrors. This permits an at least partial compensation for polarization-dependent reflectivity differences and phase effect differences of the deviating mirrors thereby enabling a projection with a largely identical contrast for all structural directions.
摘要翻译：用于将位于投影物镜的物平面中的图案投影到投影物镜的像平面中的反射折射投射物镜在物平面和像平面之间具有设置有凹面镜的反射折射物镜部（ 17），具有第一偏转镜（16）和至少一个第二偏转镜（19）。偏振旋转装置（26）将偏光镜之间的光路内的光的优选偏振方向旋转大约90°。这允许偏振相关反射率差异和偏离反射镜的相位效应差异的至少部分补偿，从而使得能够对于所有结构方向具有大致相同的对比度的投影。

50. 发明授权

US08854606B2 Projection exposure system, method for manufacturing a micro-structured structural member by the aid of such a projection exposure system and polarization-optical element adapted for use in such a system 有权
标题翻译：投影曝光系统，借助于这种投影曝光系统和适于在这种系统中使用的偏振光学元件制造微结构结构构件的方法
公开(公告)号：US08854606B2
公开(公告)日：2014-10-07
申请号：US13161011
申请日：2011-06-15
申请人： Hans-Jürgen Mann , Wolfgang Singer , Toralf Gruner , Olaf Dittmann , Michael Totzeck
发明人： Hans-Jürgen Mann , Wolfgang Singer , Toralf Gruner , Olaf Dittmann , Michael Totzeck
IPC分类号： G03B27/72 , G03B27/54 , G03F7/20
CPC分类号： G03F7/70566 , G03F7/70058
摘要： The invention relates to a projection exposure system, in particular for micro-lithography. The projection exposure system according to the invention comprises a light source for producing light in the EUV region. The projection exposure system further comprises a first optical system for illuminating a mask by the light of the light source and a second optical system for imaging the mask on a component. At least one polarization-optical element is disposed on the beam path between the light source and the component.
摘要翻译：本发明涉及一种投影曝光系统，特别涉及微光刻技术。根据本发明的投影曝光系统包括用于在EUV区域中产生光的光源。投影曝光系统还包括用于通过光源的光照射掩模的第一光学系统和用于使部件上的掩模成像的第二光学系统。至少一个偏振光学元件设置在光源和部件之间的光束路径上。

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