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    • 41. 发明申请
    • Electronic packages, assemblies, and systems with fluid cooling and associated methods
    • 具有流体冷却和相关方法的电子封装,组件和系统
    • US20060139883A1
    • 2006-06-29
    • US11363865
    • 2006-02-27
    • Chuan HuRavi Mahajan
    • Chuan HuRavi Mahajan
    • H05K7/20G06F1/20
    • H01L23/473H01L2924/0002Y10T29/4913H01L2924/00
    • To accommodate high power densities associated with high-performance integrated circuits, an integrated circuit (IC) package includes a heat-dissipating structure in which heat is dissipated from a surface of one or more dice to a heat spreader. The heat spreader has a fluid-conducting channel formed therein, and a fluid coolant may be circulated through the channel via a micropump. In an embodiment, the channel is located at or near a surface of the heat spreader, and a heat-generating IC is in thermal contact with the heat spreader. In an embodiment, the IC is a thinned die that is coupled to the heat spreader via a thinned thermal interface material. Methods of fabrication, as well as application of the package to an electronic assembly and to an electronic system, are also described.
    • 为了适应与高性能集成电路相关联的高功率密度,集成电路(IC)封装包括散热结构,其中热量从一个或多个骰子的表面散发到散热器。 散热器具有形成在其中的导流通道,并且流体冷却剂可以经由微型泵循环通过通道。 在一个实施例中,通道位于散热器的表面处或附近,并且发热IC与散热器热接触。 在一个实施例中,IC是经由变薄的热界面材料耦合到散热器的薄化管芯。 还描述了制造方法以及将包装应用于电子组件和电子系统。
    • 43. 发明申请
    • Diamond substrate formation for electronic assemblies
    • 用于电子组件的金刚石基底形成
    • US20060073640A1
    • 2006-04-06
    • US10960303
    • 2004-10-06
    • Chuan HuGregory ChryslerDaoqiang Lu
    • Chuan HuGregory ChryslerDaoqiang Lu
    • H01L21/50
    • H01L21/76259H01L23/3732H01L2924/0002Y10S148/012H01L2924/00
    • Electronic assemblies and methods for forming assemblies including a diamond substrate are described. One embodiment includes providing a diamond support and forming a porous layer of SiO2 on the diamond support. A diamond layer is formed by chemical vapor deposition on the porous layer so that the porous layer is between the diamond support and the diamond layer. A polycrystalline silicon layer is formed on the diamond layer. The polycrystalline silicon layer is polished to form a planarized surface. A semiconductor layer is coupled to the polysilicon layer. After coupling the semiconductor layer to the polysilicon layer, the diamond support is detached from the diamond layer by breaking the porous layer. The semiconductor layer on the diamond layer substrate is then further processed to form a semiconductor device.
    • 描述了包括金刚石基底的用于形成组件的电子组件和方法。 一个实施方案包括提供金刚石载体并在金刚石载体上形成SiO 2的多孔层。 通过化学气相沉积在多孔层上形成金刚石层,使得多孔层位于金刚石支撑体和金刚石层之间。 在金刚石层上形成多晶硅层。 抛光多晶硅层以形成平坦化表面。 半导体层耦合到多晶硅层。 在将半导体层耦合到多晶硅层之后,金刚石支撑体通过破坏多孔层从金刚石层分离。 然后将金刚石层基板上的半导体层进一步处理以形成半导体器件。