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    • 7. 发明授权
    • Diamond substrate formation for electronic assemblies
    • 用于电子组件的金刚石基底形成
    • US07713839B2
    • 2010-05-11
    • US10960303
    • 2004-10-06
    • Chuan HuGregory M. ChryslerDaoqiang Lu
    • Chuan HuGregory M. ChryslerDaoqiang Lu
    • H01L21/30
    • H01L21/76259H01L23/3732H01L2924/0002Y10S148/012H01L2924/00
    • Electronic assemblies and methods for forming assemblies including a diamond substrate are described. One embodiment includes providing a diamond support and forming a porous layer of SiO2 on the diamond support. A diamond layer is formed by chemical vapor deposition on the porous layer so that the porous layer is between the diamond support and the diamond layer. A polycrystalline silicon layer is formed on the diamond layer. The polycrystalline silicon layer is polished to form a planarized surface. A semiconductor layer is coupled to the polysilicon layer. After coupling the semiconductor layer to the polysilicon layer, the diamond support is detached from the diamond layer by breaking the porous layer. The semiconductor layer on the diamond layer substrate is then further processed to form a semiconductor device.
    • 描述了包括金刚石基底的用于形成组件的电子组件和方法。 一个实施方案包括提供金刚石载体并在金刚石载体上形成多孔SiO 2层。 通过化学气相沉积在多孔层上形成金刚石层,使得多孔层位于金刚石支撑体和金刚石层之间。 在金刚石层上形成多晶硅层。 抛光多晶硅层以形成平坦化表面。 半导体层耦合到多晶硅层。 在将半导体层耦合到多晶硅层之后,金刚石支撑体通过破坏多孔层从金刚石层分离。 然后将金刚石层基板上的半导体层进一步处理以形成半导体器件。
    • 10. 发明申请
    • Diamond substrate formation for electronic assemblies
    • 用于电子组件的金刚石基底形成
    • US20060073640A1
    • 2006-04-06
    • US10960303
    • 2004-10-06
    • Chuan HuGregory ChryslerDaoqiang Lu
    • Chuan HuGregory ChryslerDaoqiang Lu
    • H01L21/50
    • H01L21/76259H01L23/3732H01L2924/0002Y10S148/012H01L2924/00
    • Electronic assemblies and methods for forming assemblies including a diamond substrate are described. One embodiment includes providing a diamond support and forming a porous layer of SiO2 on the diamond support. A diamond layer is formed by chemical vapor deposition on the porous layer so that the porous layer is between the diamond support and the diamond layer. A polycrystalline silicon layer is formed on the diamond layer. The polycrystalline silicon layer is polished to form a planarized surface. A semiconductor layer is coupled to the polysilicon layer. After coupling the semiconductor layer to the polysilicon layer, the diamond support is detached from the diamond layer by breaking the porous layer. The semiconductor layer on the diamond layer substrate is then further processed to form a semiconductor device.
    • 描述了包括金刚石基底的用于形成组件的电子组件和方法。 一个实施方案包括提供金刚石载体并在金刚石载体上形成SiO 2的多孔层。 通过化学气相沉积在多孔层上形成金刚石层,使得多孔层位于金刚石支撑体和金刚石层之间。 在金刚石层上形成多晶硅层。 抛光多晶硅层以形成平坦化表面。 半导体层耦合到多晶硅层。 在将半导体层耦合到多晶硅层之后,金刚石支撑体通过破坏多孔层从金刚石层分离。 然后将金刚石层基板上的半导体层进一步处理以形成半导体器件。