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41. 发明授权

US08380962B2 Systems and methods for efficient sequential logging on caching-enabled storage devices 有权
标题翻译：高效顺序记录启用缓存的存储设备的系统和方法
公开(公告)号：US08380962B2
公开(公告)日：2013-02-19
申请号：US12856985
申请日：2010-08-16
申请人： Ajay Kumar , Rajesh Chepuri , Shailesh Marathe , Niranjan Pendharkar
发明人： Ajay Kumar , Rajesh Chepuri , Shailesh Marathe , Niranjan Pendharkar
IPC分类号： G06F12/00
CPC分类号： G06F12/126 , G06F11/0709 , G06F11/0787 , G06F12/0866
摘要： A computer-implemented method for efficient sequential logging on caching-enabled storage devices may include 1) identifying a storage device with a cache, 2) allocating space on the storage device for a sequential log, 3) calculating a target size for the sequential log based at least in part on an input/output load directed to the sequential log, and then 4) restricting the sequential log to a portion of the allocated space corresponding to the target size. Various other methods, systems, and computer-readable media are also disclosed.
摘要翻译：用于在启用高速缓存的存储设备上有效顺序登录的计算机实现的方法可以包括：1）使用高速缓存识别存储设备，2）在存储设备上分配用于顺序日志的空间，3）计算顺序日志的目标大小至少部分地基于指向顺序日志的输入/输出负载，然后4）将顺序日志限制为对应于目标大小的所分配的空间的一部分。还公开了各种其它方法，系统和计算机可读介质。

42. 发明申请

US20120322237A1 LASER AND PLASMA ETCH WAFER DICING USING PHYSICALLY-REMOVABLE MASK 有权
标题翻译：激光和等离子体刻蚀使用物理可拆卸的面膜
公开(公告)号：US20120322237A1
公开(公告)日：2012-12-20
申请号：US13161036
申请日：2011-06-15
申请人： Wei-Sheng Lei , Saravjeet Singh , Madhava Rao Yalamanchili , Brad Eaton , Ajay Kumar
发明人： Wei-Sheng Lei , Saravjeet Singh , Madhava Rao Yalamanchili , Brad Eaton , Ajay Kumar
IPC分类号： H01L21/78 , C23F1/08
CPC分类号： B23K26/40 , B23K26/0624 , B23K26/364 , B23K2103/172 , B23K2103/50 , H01L21/3081 , H01L21/31127 , H01L21/78
摘要： Methods of dicing semiconductor wafers, each wafer having a plurality of integrated circuits, are described. A method includes forming a mask above the semiconductor wafer. The mask covers and protects the integrated circuits. The mask is patterned with a laser scribing process to provide a patterned mask with gaps. The patterning exposes regions of the semiconductor wafer between the integrated circuits. The semiconductor wafer is then etched through the gaps in the patterned mask to form singulated integrated circuits. The patterned mask is then separated from the singulated integrated circuits.
摘要翻译：对具有多个集成电路的每个晶片进行切割的半导体晶片的方法进行了说明。一种方法包括在半导体晶片上形成掩模。面罩覆盖并保护集成电路。用激光划线工艺对掩模进行图案化以提供具有间隙的图案化掩模。图案化使得集成电路之间的半导体晶片的区域露出。然后通过图案化掩模中的间隙蚀刻半导体晶片，以形成单独的集成电路。然后将图案化掩模与单个集成电路分离。

43. 发明申请

US20120322236A1 WAFER DICING USING PULSE TRAIN LASER WITH MULTIPLE-PULSE BURSTS AND PLASMA ETCH 有权
标题翻译：使用多脉冲激光脉冲激光和等离子体蚀刻的脉冲激光
公开(公告)号：US20120322236A1
公开(公告)日：2012-12-20
申请号：US13161026
申请日：2011-06-15
申请人： Wei-Sheng Lei , Saravjeet Singh , Madhava Rao Yalamanchili , Brad Eaton , Ajay Kumar
发明人： Wei-Sheng Lei , Saravjeet Singh , Madhava Rao Yalamanchili , Brad Eaton , Ajay Kumar
IPC分类号： H01L21/82 , C23F1/08
CPC分类号： H01L21/3086 , B23K26/06 , B23K26/0622 , B23K26/0624 , B23K26/0626 , B23K26/364 , B23K26/40 , B23K2103/172 , B23K2103/50 , H01L21/67207 , H01L21/78
摘要： Methods of dicing semiconductor wafers, each wafer having a plurality of integrated circuits, are described. A method includes forming a mask above the semiconductor wafer. The mask is composed of a layer covering and protecting the integrated circuits. The mask is patterned with a pulse train laser scribing process using multiple-pulse bursts to provide a patterned mask with gaps. The patterning exposes regions of the semiconductor wafer between the integrated circuits. The semiconductor wafer is then etched through the gaps in the patterned mask to singulate the integrated circuits.
摘要翻译：对具有多个集成电路的每个晶片进行切割的半导体晶片的方法进行了说明。一种方法包括在半导体晶片上形成掩模。掩模由覆盖和保护集成电路的层组成。使用多脉冲脉冲串的脉冲串激光划线方法对掩模进行构图，以提供具有间隙的图案化掩模。图案化使得集成电路之间的半导体晶片的区域露出。然后通过图案化掩模中的间隙蚀刻半导体晶片，以对集成电路进行分离。

44. 发明授权

US08293430B2 Method for etching a molybdenum layer suitable for photomask fabrication 失效
标题翻译：蚀刻适用于光掩模制造的钼层的方法
公开(公告)号：US08293430B2
公开(公告)日：2012-10-23
申请号：US11044358
申请日：2005-01-27
申请人： Madhavi Chandrachood , Ajay Kumar , Wai-Fan Yau
发明人： Madhavi Chandrachood , Ajay Kumar , Wai-Fan Yau
IPC分类号： G03F1/00
CPC分类号： G03F1/32 , G03F1/54 , G03F1/80
摘要： Methods for fabricating a photomask are disclosed herein. In one embodiment, a method for fabricating a photomask includes providing a filmstack having a molybdenum layer and a light-shielding layer in a processing chamber, patterning a first resist layer on the light-shielding layer, etching the light-shielding layer using the first resist layer as an etch mask, and etching the molybdenum layer using the patterned light-shielding layer and the patterned first resist layer as a composite mask.
摘要翻译：本文公开了制造光掩模的方法。在一个实施例中，一种制造光掩模的方法包括在处理室中提供具有钼层和遮光层的薄膜层，对遮光层上的第一抗蚀剂层进行图案化，使用第一抗蚀剂层作为蚀刻掩模，并且使用图案化遮光层和图案化的第一抗蚀剂层作为复合掩模蚀刻钼层。

45. 发明申请

US20120042125A1 Systems and Methods for Efficient Sequential Logging on Caching-Enabled Storage Devices 有权
标题翻译：高效顺序记录缓存启用存储设备的系统和方法
公开(公告)号：US20120042125A1
公开(公告)日：2012-02-16
申请号：US12856985
申请日：2010-08-16
申请人： Ajay Kumar , Rajesh Chepuri , Shailesh Marathe , Niranjan Pendharkar
发明人： Ajay Kumar , Rajesh Chepuri , Shailesh Marathe , Niranjan Pendharkar
IPC分类号： G06F12/02 , G06F12/08 , G06F12/00
CPC分类号： G06F12/126 , G06F11/0709 , G06F11/0787 , G06F12/0866
摘要： A computer-implemented method for efficient sequential logging on caching-enabled storage devices may include 1) identifying a storage device with a cache, 2) allocating space on the storage device for a sequential log, 3) calculating a target size for the sequential log based at least in part on an input/output load directed to the sequential log, and then 4) restricting the sequential log to a portion of the allocated space corresponding to the target size. Various other methods, systems, and computer-readable media are also disclosed.
摘要翻译：用于在启用高速缓存的存储设备上有效顺序登录的计算机实现的方法可以包括：1）使用高速缓存识别存储设备，2）在存储设备上分配用于顺序日志的空间，3）计算顺序日志的目标大小至少部分地基于指向顺序日志的输入/输出负载，然后4）将顺序日志限制为对应于目标大小的所分配的空间的一部分。还公开了各种其它方法，系统和计算机可读介质。

46. 发明申请

US20110312157A1 WAFER DICING USING FEMTOSECOND-BASED LASER AND PLASMA ETCH 有权
标题翻译：使用基于FEMTOSECOND的激光和等离子体蚀刻的抛光
公开(公告)号：US20110312157A1
公开(公告)日：2011-12-22
申请号：US13160713
申请日：2011-06-15
申请人： Wei-Sheng Lei , Brad Eaton , Madhava Rao Yalamanchili , Saravjeet Singh , Ajay Kumar , James M. Holden
发明人： Wei-Sheng Lei , Brad Eaton , Madhava Rao Yalamanchili , Saravjeet Singh , Ajay Kumar , James M. Holden
IPC分类号： H01L21/822 , H01L21/3065 , H01L21/82
CPC分类号： H01L21/822 , B23K26/36 , H01J37/32889 , H01J37/32899 , H01L21/3065 , H01L21/3083 , H01L21/67069 , H01L21/67092 , H01L21/67207 , H01L21/6836 , H01L21/78 , H01L23/544 , H01L2221/68327 , H01L2924/0002 , H01L2924/00
摘要： Methods of dicing semiconductor wafers, each wafer having a plurality of integrated circuits, are described. A method includes forming a mask above the semiconductor wafer. The mask is composed of a layer covering and protecting the integrated circuits. The mask is patterned with a femtosecond-based laser scribing process to provide a patterned mask with gaps. The patterning exposes regions of the semiconductor wafer between the integrated circuits. The semiconductor wafer is then etched through the gaps in the patterned mask to singulate the integrated circuits.
摘要翻译：对具有多个集成电路的每个晶片进行切割的半导体晶片的方法进行了说明。一种方法包括在半导体晶片上形成掩模。掩模由覆盖和保护集成电路的层组成。使用基于飞秒的激光划线工艺对掩模进行图案化以提供具有间隙的图案化掩模。图案化使得集成电路之间的半导体晶片的区域露出。然后通过图案化掩模中的间隙蚀刻半导体晶片，以对集成电路进行分离。

47. 发明授权

US08017029B2 Plasma mask etch method of controlling a reactor tunable element in accordance with the output of an array of optical sensors viewing the mask backside 有权
标题翻译：根据观察掩模背面的光学传感器阵列的输出来控制反应器可调谐元件的等离子体掩模蚀刻方法
公开(公告)号：US08017029B2
公开(公告)日：2011-09-13
申请号：US11589477
申请日：2006-10-30
申请人： Madhavi R. Chandrachood , Michael N. Grimbergen , Khiem K. Nguyen , Richard Lewington , Ibrahim M. Ibrahim , Sheeba J. Panayil , Ajay Kumar
发明人： Madhavi R. Chandrachood , Michael N. Grimbergen , Khiem K. Nguyen , Richard Lewington , Ibrahim M. Ibrahim , Sheeba J. Panayil , Ajay Kumar
IPC分类号： G01R31/00
CPC分类号： H01J37/32935 , G03F1/80
摘要： A plasma etch method includes simultaneously illuminating an array of plural locations on front surface of the workpiece through the backside of the workpiece with light of a wavelength range for which the workpiece is transparent, while viewing light reflected from the array of plural locations to the backside of the workpiece. The method further includes determining plural etch depths at the array of locations from the light reflected from the array of locations on the front side of the workpiece, and deducing from the plural etch depths a spatial distribution of etch rate across the array of locations. The method also includes changing the etch rate distribution by adjusting a tunable element of the reactor.
摘要翻译：等离子体蚀刻方法包括通过工件的背面同时以工件为透明的波长范围的光照亮工件的前表面上的多个位置的阵列，同时观察从多个位置的阵列反射到背面的光的工件。该方法还包括：从位于工件前侧的位置阵列反射的光中确定多个位置阵列处的多个蚀刻深度，并从多个蚀刻深度中推导穿过该阵列阵列的蚀刻速率的空间分布。该方法还包括通过调节反应器的可调谐元件来改变蚀刻速率分布。

48. 发明授权

US07829471B2 Cluster tool and method for process integration in manufacturing of a photomask 有权
标题翻译：用于光掩模制造中的工艺集成的集群工具和方法
公开(公告)号：US07829471B2
公开(公告)日：2010-11-09
申请号：US11192989
申请日：2005-07-29
申请人： Ajay Kumar
发明人： Ajay Kumar
IPC分类号： H01L21/302
CPC分类号： C23F4/00 , G03F1/32 , G03F1/80 , H01L21/67069 , H01L21/67207
摘要： A method and apparatus for process integration in manufacture of a photomask are disclosed. In one embodiment, a cluster tool suitable for process integration in manufacture of a photomask including a vacuum transfer chamber having coupled thereto at least one hard mask deposition chamber and at least one plasma chamber configured for etching chromium. In another embodiment, a method for process integration in manufacture of a photomask includes depositing a hard mask on a substrate in a first processing chamber, depositing a resist layer on the substrate, patterning the resist layer, etching the hard mask through apertures formed in the patterned resist layer in a second chamber; and etching a chromium layer through apertures formed in the hard mask in a third chamber.
摘要翻译：公开了一种用于制造光掩模中的工艺集成的方法和装置。在一个实施例中，适用于制造光掩模中的工艺集成的集群工具，该光掩模包括与至少一个硬掩模沉积室耦合的真空传送室和被配置用于蚀刻铬的至少一个等离子体室。在另一个实施例中，用于制造光掩模中的工艺集成的方法包括在第一处理室中的基板上沉积硬掩模，在衬底上沉积抗蚀剂层，图案化抗蚀剂层，通过形成在图案化的抗蚀剂层在第二室中; 以及通过在第三室中形成在硬掩模中的孔蚀刻铬层。

49. 发明授权

US07788346B2 System and method for state data back-up in a distributed data system 有权
标题翻译：分布式数据系统中状态数据备份的系统和方法
公开(公告)号：US07788346B2
公开(公告)日：2010-08-31
申请号：US10087224
申请日：2002-03-01
申请人： Ajay Kumar , Hanumantha Rao Susarla , Prakash Khemani
发明人： Ajay Kumar , Hanumantha Rao Susarla , Prakash Khemani
IPC分类号： G06F15/16
CPC分类号： G06F11/1464 , G06F11/1451
摘要： A client-server system may include a distributed store configured to maintain a primary state of session data including one or more attributes. One or more other nodes may include other instances of the primary state. The system may compare the primary state to a benchmark primary state to generate a subset of the attributes of the session data that have been modified in the primary state. Another instance of the primary state may be synchronized with the primary state using the subset of the attributes. In one embodiment, the comparing may include performing binary differencing of binary representations of the primary state and the benchmark primary state to determine the modified attributes. In another embodiment, the comparing may include performing object graph differencing of object graph representations of the primary state and the benchmark primary state to determine the modified attributes.
摘要翻译：客户机 - 服务器系统可以包括被配置为维持包括一个或多个属性的会话数据的主要状态的分布式存储。一个或多个其他节点可以包括主状态的其他实例。系统可以将主状态与基准主状态进行比较，以生成在主状态下修改的会话数据的属性的子集。主状态的另一个实例可以使用属性的子集与主状态同步。在一个实施例中，比较可以包括执行主状态和基准主状态的二进制表示的二进制差分以确定修改的属性。在另一个实施例中，比较可以包括执行主状态和基准主状态的对象图表示的对象图差分以确定修改的属性。

50. 发明授权

US07743083B2 Common transaction manager interface for local and global transactions 有权
标题翻译：用于本地和全球交易的通用事务管理器界面
公开(公告)号：US07743083B2
公开(公告)日：2010-06-22
申请号：US10422453
申请日：2003-04-24
申请人： Sankara R. Bhogi , Ajay Kumar , Bala Dutt , Venugopal Rao K , Senthil K. Krishnan , Srinivasan Kannan
发明人： Sankara R. Bhogi , Ajay Kumar , Bala Dutt , Venugopal Rao K , Senthil K. Krishnan , Srinivasan Kannan
IPC分类号： G06F7/00
CPC分类号： G06F9/466
摘要： A system and method for implementing a common transaction manager interface. A system may implement an application server with a transaction manager module configured to provide a common application interface to a local transaction manager and a global transaction manager. The transaction manager module may be configured to determine if a transaction initiated by an application component should be managed by the local transaction manager or the global transaction manager. The local transaction manger may be configured to create a local transaction object for each transaction managed by the local transaction manager, and the global transaction manger may be configured to create a global transaction object for each transaction managed by the global transaction manager. The local transaction objects and the global transaction objects may provide a common application interface for implementing their respective transactions.
摘要翻译：用于实现公共事务管理器接口的系统和方法。系统可以实现具有事务管理器模块的应用服务器，该事务管理器模块被配置为向本地事务管理器和全局事务管理器提供公共应用接口。事务管理器模块可以被配置为确定由应用组件发起的事务是否应由本地事务管理器或全局事务管理器来管理。可以将本地事务管理器配置为为由本地事务管理器管理的每个事务创建本地事务对象，并且可以将全局事务管理器配置为为由全局事务管理器管理的每个事务创建全局事务对象。本地事务对象和全局事务对象可以提供用于实现其相应事务的通用应用接口。

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