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31. 发明授权

US08007461B2 Sterile drug-mixing syringe 有权
标题翻译：无菌药物混合注射器
公开(公告)号：US08007461B2
公开(公告)日：2011-08-30
申请号：US12297627
申请日：2006-09-12
申请人： Pingan Huo , Wenqing Zhang , Wuyuan Li , Yan Liu , Xinming Wang , Chunqing Jin
发明人： Pingan Huo , Wenqing Zhang , Wuyuan Li , Yan Liu , Xinming Wang , Chunqing Jin
IPC分类号： A61M37/00
CPC分类号： A61M5/31511 , A61J1/201 , A61J1/2013 , A61J1/2051 , A61J1/2065 , A61J1/2096 , A61M5/002 , A61M5/3135 , A61M5/31515 , A61M2005/31508 , A61M2005/31518
摘要： The invention is directed to a menstruum prepositioned type sterile drug-mixing syringe and a menstruum separately positioned type sterile drug-mixing syringe including a shell, a needle, a piston and a push-pull rod assembly. The syringe further includes a menstruum bottle, a solute bottle, a sliding sleeve and a needle loading assembly. The menstruum bottle may be fixed to the inner wall of a sliding sheath, and the solute bottle may be fixed to the inner of the shell. Piston may be disposed within the solute bottle. The sliding sleeve may be socketed to the front end of the shell in advance or disposed by other ways. The mouth of the menstruum bottle may be opposite to the mouth of the solute bottle and may be connected by a needle, which has two piercing tips, wherein the needle punctures and is securely connected to the needle loading assembly.
摘要翻译：本发明涉及一种月经预置型无菌药物混合注射器和包括壳，针，活塞和推拉杆组件的独立定位型无菌药物混合注射器的月经。注射器还包括液体瓶，溶质瓶，滑动套筒和针装载组件。液体瓶可以固定在滑动护套的内壁上，溶质瓶可以固定在壳体的内部。活塞可能被置于溶质瓶内。滑动套筒可以预先插入壳体的前端或通过其它方式布置。液体瓶的口可以与溶质瓶的口相对，并且可以通过具有两个刺穿尖端的针连接，其中针刺穿并牢固地连接到针装载组件。

32. 发明申请

US20110129334A1 WIND TURBINE HOLDING AND LIFTING SYSTEM AND MOVABLE OPERATING PLATFORM ABOVE WATER 审中-公开
标题翻译：风力发电机组和升降系统及水上运行平台
公开(公告)号：US20110129334A1
公开(公告)日：2011-06-02
申请号：US12729803
申请日：2010-03-23
申请人： Jialiang Wu , Xinming Wang , Yanlin Li , Junlei Bai
发明人： Jialiang Wu , Xinming Wang , Yanlin Li , Junlei Bai
IPC分类号： F03D11/00
CPC分类号： B63B35/4413 , F03D13/10 , F03D13/40 , F05B2230/6102 , F05B2240/95 , Y02E10/727 , Y02P70/523
摘要： The present invention which relates to the field of offshore wind turbine installation technology, discloses a wind turbine holding and lifting system for a movable operating platform above water. The wind turbine holding and lifting system comprises a door-type installation frame, a wind turbine lifting device and enclasping means for clamping the wind turbine tower, the door-type installation frame including a first leg, a second leg and no less than one beam fixed between the first and second legs, the wind turbine lifting device being attached to the door-type installation frame with its lifting end connected to the wind turbine tower. The wind turbine holding and lifting system with such a structure is available for a movable operating platform above water, the enclasping means and the wind turbine lifting device of the wind turbine holding and lifting system being capable of completely constraining the wind turbine such that the assembled wind turbine can be fixed in a wind turbine installation state. The present invention further discloses a movable operating platform above water.
摘要翻译：涉及海上风力发电机安装技术领域的本发明公开了一种用于水上移动操作平台的风力涡轮机保持和提升系统。风力涡轮机保持和提升系统包括门式安装框架，风力涡轮机提升装置和用于夹紧风力涡轮机塔架的包围装置，门型安装框架包括第一腿部，第二腿部和不少于一个梁固定在第一和第二腿之间，风力涡轮机提升装置连接到门式安装框架，其提升端连接到风力涡轮机塔架。具有这种结构的风力涡轮机保持和提升系统可用于水上的可移动操作平台，风力涡轮机保持和提升系统的包围装置和风力涡轮机提升装置能够完全约束风力涡轮机，使得组装风力涡轮机可以固定在风力涡轮机的安装状态。本发明还公开了一种在水上方的可移动操作平台。

33. 发明申请

US20090000549A1 Substrate processing method and apparatus 审中-公开
标题翻译：基板加工方法及装置
公开(公告)号：US20090000549A1
公开(公告)日：2009-01-01
申请号：US12216147
申请日：2008-06-30
申请人： Xinming Wang , Daisuke Takagi , Akihiko Tashiro , Akira Fukunaga
发明人： Xinming Wang , Daisuke Takagi , Akihiko Tashiro , Akira Fukunaga
IPC分类号： B05C11/00
CPC分类号： H01L21/76849 , C23C18/1608 , C23C18/1675 , C23C18/1692 , C23C18/1879 , H01L21/288 , H01L21/76864 , H01L21/76874 , H01L22/12 , H01L22/20 , H01L2223/54466
摘要： There is provided a substrate processing method and apparatus which can measure and monitor thickness and/or properties of a film formed on a substrate as needed, and quickly correct a deviation in process conditions, and which can therefore stably provide a product of constant quality. A substrate processing method for processing a substrate having a metal and an insulating material exposed on its surface in such a manner that a film thickness of the metal, with an exposed surface of the metal as a reference plane, is selectively or preferentially changed, including measuring a change in the film thickness and/or a film property of the metal during and/or immediately after processing, and monitoring processing and adjusting processing conditions based on results of this measurement.
摘要翻译：提供了可以根据需要测量和监测在基板上形成的膜的厚度和/或性能的基板处理方法和装置，并且可以快速地校正工艺条件的偏差，因此可以稳定地提供恒定品质的产品。一种基板处理方法，用于处理具有金属和绝缘材料的基板，所述基板以其金属的暴露表面作为基准面的方式选择性地或优先地改变的金属的膜厚度包括测量处理期间和/或紧随其后的金属的膜厚度和/或膜性质的变化，以及基于该测量结果的监测处理和调整处理条件。

34. 发明授权

US07374584B2 Interconnects forming method and interconnects forming apparatus 有权
标题翻译：互连形成方法和互连形成装置
公开(公告)号：US07374584B2
公开(公告)日：2008-05-20
申请号：US11783186
申请日：2007-04-06
申请人： Xinming Wang , Daisuke Takagi , Akihiko Tashiro , Yukio Fukunaga , Akira Fukunaga
发明人： Xinming Wang , Daisuke Takagi , Akihiko Tashiro , Yukio Fukunaga , Akira Fukunaga
IPC分类号： H01L21/00
CPC分类号： H01L21/76849 , H01L21/76819 , H01L21/7685 , Y10S438/976 , Y10T29/41
摘要： The present invention provides an interconnects-forming method and an interconnects-forming apparatus which can minimize the lowering of processing accuracy in etching, minimize light exposure processing for the formation of interconnect recesses in the production of multi-level interconnects, improve the electromigration resistance of interconnects without impairing the electrical properties of the interconnects, and enhance the reliability of the device. The interconnects-forming method, includes providing interconnect recesses in an insulating film formed in a surface of a substrate; embedding an interconnect material in the interconnect recesses while forming a metal film of the interconnect material on a surface of the insulating film; removing an extra metal material other than the metal material in the interconnect recesses and flattening the substrate surface, thereby forming interconnects; forming a first protective film of a conductive material selectively on exposed surfaces of the interconnects; forming a second protective film on the surface of the substrate having the thus-formed first protective film; forming an interlevel insulating film on the surface of the substrate having the thus-formed second protective film; and flattening a surface of the interlevel insulating film.
摘要翻译：本发明提供一种互连形成方法和互连形成装置，其能够最小化蚀刻中的处理精度的降低，使在多层互连的制造中形成互连凹槽的光曝光处理最小化，提高电镀迁移电阻互连，而不损害互连的电性能，并且增强器件的可靠性。互连形成方法包括在形成在基板的表面中的绝缘膜中提供互连凹槽; 在互连凹槽中嵌入互连材料，同时在绝缘膜的表面上形成互连材料的金属膜; 除去互连凹部中的金属材料以外的多余的金属材料，使基板表面变平，从而形成互连件; 在互连的暴露表面上选择性地形成导电材料的第一保护膜; 在具有如此形成的第一保护膜的基板的表面上形成第二保护膜; 在具有如此形成的第二保护膜的基板的表面上形成层间绝缘膜; 并平坦化层间绝缘膜的表面。

35. 发明申请

US20050009340A1 Method and apparatus for forming capping film 审中-公开
标题翻译：形成封盖膜的方法和装置
公开(公告)号：US20050009340A1
公开(公告)日：2005-01-13
申请号：US10885108
申请日：2004-07-07
申请人： Yasuhiko Saijo , Masashi Shimoyama , Hiroshi Yokota , Akihiko Tashiro , Xinming Wang , Daisuke Takagi
发明人： Yasuhiko Saijo , Masashi Shimoyama , Hiroshi Yokota , Akihiko Tashiro , Xinming Wang , Daisuke Takagi
IPC分类号： C23C18/18 , C23C18/16 , C23C18/30 , C23C18/31 , C23C18/50 , H01L21/00 , H01L21/28 , H01L21/288 , H01L21/3205 , H01L21/44 , H01L21/768 , H01L23/52
CPC分类号： H01L21/76874 , C23C18/1855 , C23C18/1893 , H01L21/288 , H01L21/76849
摘要： A capping film serving as an interconnect protective film formed on a surface of interconnect metal on a semiconductor substrate is formed after forming a catalyst layer for electroless plating under low oxygen concentration condition. A method for forming a capping film for protecting a surface of interconnect metal includes preparing a metal catalyst solution containing a metal element nobler than interconnect metal and having dissolved oxygen concentration of 7 ppm or less, bringing said metal catalyst solution into contact with a surface of interconnect metal to form a metal catalyst layer on the surface of the interconnect metal, and performing electroless plating to form a capping film on the surface of the interconnect metal.
摘要翻译：在低氧浓度条件下形成用于化学镀的催化剂层之后，形成用作半导体衬底上的互连金属表面上的互连保护膜的覆盖膜。形成用于保护互连金属的表面的封盖膜的方法包括制备含有比互连金属更高的金属元素并且具有7ppm或更低的溶解氧浓度的金属催化剂溶液，使所述金属催化剂溶液与互连金属，以在互连金属的表面上形成金属催化剂层，并进行化学镀以在互连金属的表面上形成覆盖膜。

36. 发明授权

US09165799B2 Substrate processing method and substrate processing unit 有权
标题翻译：基板加工方法和基板处理单元
公开(公告)号：US09165799B2
公开(公告)日：2015-10-20
申请号：US13455529
申请日：2012-04-25
申请人： Xinming Wang , Mitsuru Miyazaki , Kunimasa Matsushita
发明人： Xinming Wang , Mitsuru Miyazaki , Kunimasa Matsushita
IPC分类号： H01L21/02 , B08B3/02 , H01L21/67
CPC分类号： H01L21/67051 , B08B3/024
摘要： A substrate processing method includes jetting at least one fluid from a fluid nozzle toward a rotating substrate surface while moving the fluid nozzle from a center toward a periphery of the rotating substrate. The fluid nozzle is moved from the center of the substrate to a predetermined point at a constant initial movement speed. The fluid nozzle is subsequently moved from the predetermined point at a movement speed V(r) which satisfies the following relational expression: V(r)×rα=C (constant), where V(r) represents the movement speed of the fluid nozzle when it passes a position corresponding to a position on the substrate surface at a distance “r” from the center of the substrate, and α represents a power index.
摘要翻译：基板处理方法包括：从流体喷嘴朝向旋转基板表面喷射至少一种流体，同时使流体喷嘴从旋转基板的中心向周边移动。流体喷嘴以恒定的初始移动速度从基板的中心移动到预定点。流体喷嘴随后以满足以下关系式的运动速度V（r）从预定点移动：V（r）×rα= C（常数），其中V（r）表示流体喷嘴的移动速度当其与衬底表面上距离衬底中心距离“r”的位置相对应的位置时，α表示功率指数。

37. 发明授权

US09089881B2 Method and apparatus for cleaning substrate 有权
标题翻译：洗涤基材的方法和设备
公开(公告)号：US09089881B2
公开(公告)日：2015-07-28
申请号：US13037487
申请日：2011-03-01
申请人： Xinming Wang , Fumitoshi Oikawa , Haruko Ono , Teruaki Hombo
发明人： Xinming Wang , Fumitoshi Oikawa , Haruko Ono , Teruaki Hombo
IPC分类号： B08B1/04 , H01L21/67
CPC分类号： H01L21/67046 , B08B1/04
摘要： A substrate is cleaned by performing a scrubbing process on a surface to be cleaned of the rotating substrate with a roll-shaped cleaning member while holding an outer circumferential surface of the roll-shaped cleaning member in contact with the surface to be cleaned of the substrate across a predetermined contact width. During at least a part of the scrubbing process, the roll-shaped cleaning member is placed at an offset cleaning position where the central axis of the roll-shaped cleaning member is spaced from the central axis of the substrate by a distance which is 0.14 to 0.5 times the contact width. The surface to be cleaned of the substrate is scrubbed with more uniform cleaning intensity while taking into account the cleaning intensity at each position (area) along the radial direction of the surface to be cleaned of the substrate.
摘要翻译：通过在保持辊状清洁部件的外周面与基板的待清洗表面接触的同时用辊状清洁部件在旋转基板的待清洁表面上进行擦洗处理来清洁基板跨越预定的接触宽度。在洗涤过程的至少一部分期间，辊状清洁部件被放置在偏移清洁位置，其中辊状清洁部件的中心轴线与基板的中心轴线间隔开0.14至接触宽度的0.5倍。要清洁基材的表面，在考虑到沿基材待清洁表面的径向的每个位置（区域）处的清洁强度时，以更均匀的清洁强度进行擦洗。

38. 发明申请

US20120160267A1 CLEANING METHOD AND CLEANING APPARATUS 审中-公开
标题翻译：清洁方法和清洁装置
公开(公告)号：US20120160267A1
公开(公告)日：2012-06-28
申请号：US13227280
申请日：2011-09-07
申请人： Masako KODERA , Xinming Wang , Shinji Kajita
发明人： Masako KODERA , Xinming Wang , Shinji Kajita
IPC分类号： B08B7/00 , B08B1/00
CPC分类号： B08B1/04 , H01L21/02065 , H01L21/67046
摘要： A cleaning method according to embodiments of the present invention is a cleaning method of cleaning residues from a semiconductor substrate by rotating a roll brush, the method having cleaning residues from the semiconductor substrate while pressing the roll brush against the semiconductor substrate with a first pressure of 7.35 kPa or lower, and cleaning residues from the semiconductor substrate while pressing the roll brush against the semiconductor substrate with a second pressure higher than 7.35 kPa.
摘要翻译：根据本发明的实施方案的清洁方法是通过旋转辊刷从半导体衬底清洗残留物的清洁方法，该方法具有来自半导体衬底的清洁残留物，同时将辊刷压在半导体衬底上，以第一压力 7.35kPa或更低，并且在第二压力高于7.35kPa的情况下，将辊刷在半导体衬底上挤压的同时从半导体衬底清洗残留物。

39. 发明申请

US20110129304A1 Support Leg and A Mobile Offshore Work Platform 审中-公开
标题翻译：支持腿和移动离岸工作平台
公开(公告)号：US20110129304A1
公开(公告)日：2011-06-02
申请号：US12731867
申请日：2010-03-25
申请人： Jialiang Wu , Xinming Wang , Yanlin Li , Junlei Bai
发明人： Jialiang Wu , Xinming Wang , Yanlin Li , Junlei Bai
IPC分类号： E02D5/74
CPC分类号： E02B17/021 , B63B21/26 , E02B2017/0056 , E02B2017/0078 , E02D27/52 , Y02E10/72
摘要： The present invention discloses a support leg and a mobile offshore work platform having that leg. The disclosed support leg for a mobile offshore work platform comprises a support arm extending in a vertical direction, further comprising a support platform that has a cross section larger than that of the support arm, and that the lower end of said support arm is fixed to the upper surface of the support platform. When wind turbine installations or other offshore works are carried in sea areas of soft foundation ground, the support platform is supported on a soft foundation ground by a larger cross-sectional area, providing a greater support force and improving the stability of the mobile offshore work platform, and the mobile offshore work platform can be used to complete wind turbine installations and other predetermined works in sea areas of soft foundation ground.
摘要翻译：本发明公开了一种支撑腿和具有该腿的移动式海上作业平台。所公开的用于移动海上作业平台的支撑腿包括沿垂直方向延伸的支撑臂，还包括具有大于支撑臂的横截面的支撑平台，并且所述支撑臂的下端固定到支撑平台的上表面。当风力涡轮机设备或其他海上作业在软基础地面的海域运载时，支撑平台由较大的横截面积支撑在软基础地基上，提供更大的支撑力，提高移动式海上作业的稳定性平台和移动式海上作业平台，可用于完成软基地海域的风力发电机组和其他预定工程。

40. 发明申请

US20110126748A1 WIND TURBINE HOLDING AND LIFTING SYSTEM AND MOVABLE OPERATING PLATFORM ABOVE WATER 审中-公开
标题翻译：风力发电机组和升降系统及水上运行平台
公开(公告)号：US20110126748A1
公开(公告)日：2011-06-02
申请号：US12729823
申请日：2010-03-23
申请人： Jialiang WU , Xinming Wang , Yanlin Li , Junlei Bai
发明人： Jialiang WU , Xinming Wang , Yanlin Li , Junlei Bai
IPC分类号： B63B35/44 , F03D11/00 , F03D11/04 , F03D9/00 , B66D1/60 , B66F19/00 , B63B43/10 , F03B13/00
CPC分类号： F03D13/25 , E02B2017/0039 , E02B2017/0043 , E02B2017/0047 , E02B2017/0091 , F03D13/10 , F03D13/40 , F05B2240/93 , F05B2240/95 , Y02E10/727
摘要： The present invention which relates to the field of offshore wind turbine installation technology, discloses a wind turbine holding and lifting system for a movable operating platform above water. The wind turbine holding and lifting system comprises a first standing column, a second standing column, a beam lifting device, no less than one beam and enclasping means for holding the wind turbine tower; the first standing column and the second standing column are juxtaposed, and the opposed faces of the first and second standing columns are provided with guiding grooves for sliding the beams; the enclasping means is arranged on the beam, and the two ends of the beam are interfitted within the guiding grooves of the first and second standing columns; the beam lifting device is fixed to the first or second standing column, and the lifting end of the beam lifting device is connected to the beam. The wind turbine holding and lifting system with such a structure can fix the assembled wind turbine in the installation state and the wind turbine can be lifted and lowered. The present invention further discloses a movable operating platform above water.
摘要翻译：涉及海上风力发电机安装技术领域的本发明公开了一种用于水上移动操作平台的风力涡轮机保持和提升系统。风力涡轮机保持和提升系统包括第一立柱，第二立柱，梁提升装置，不少于一个梁和用于保持风力涡轮机塔架的包围装置; 第一立柱和第二立柱相并列，并且第一和第二立柱的相对面设置有用于滑动梁的引导槽; 包围装置设置在梁上，梁的两端与第一和第二立柱的导槽相互配合; 梁提升装置固定在第一或第二立柱上，梁提升装置的提升端连接到梁上。具有这种结构的风力涡轮机举升系统可以将组装的风力涡轮机固定在安装状态，并且可以提升和降低风力涡轮机。本发明还公开了一种在水上方的可移动操作平台。

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