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31. 发明申请

US20070194941A1 Oil level detection device for internal combustion engine 有权
标题翻译：内燃机油位检测装置
公开(公告)号：US20070194941A1
公开(公告)日：2007-08-23
申请号：US11698037
申请日：2007-01-26
申请人： Kazutomo Nishida , Kazumi Miyashita , Toshikazu Nakamura , Toru Taniguchi
发明人： Kazutomo Nishida , Kazumi Miyashita , Toshikazu Nakamura , Toru Taniguchi
IPC分类号： G08B21/00
CPC分类号： G01F23/74 , F01M11/12
摘要： An oil level detection device for an internal combustion engine, which comprises: a housing permitting entry therein of oil; a float provided within the housing and vertically movable with the oil entered in the housing; a switch for performing switching operation in response to the vertical movement of the float within the housing; protrusions provided, on the upper surface of the float, for preventing the float from sticking to the ceiling of the housing due to viscosity of the oil; and protrusions provided, on the bottom of the housing, for preventing the float from sticking to the bottom of the housing due to viscosity of the oil.
摘要翻译：一种用于内燃机的油位检测装置，包括：容许油进入的壳体; 设置在壳体内的浮子，并且可随着进入壳体中的油垂直移动; 用于响应于所述浮体在所述壳体内的垂直移动而执行切换操作的开关; 在浮子的上表面上设置有用于防止由于油的粘度使浮子粘附到壳体的天花板上的突起; 以及在所述壳体的底部上设置的用于防止由于油的粘度使浮子粘附到壳体的底部的突起。

32. 发明申请

US20060231473A1 Apparatus and method for mixing by agitation in a multichambered mixing apparatus including a pre-agitation mixing chamber 有权
标题翻译：在包括预搅拌混合室的多重混合装置中通过搅拌进行混合的装置和方法
公开(公告)号：US20060231473A1
公开(公告)日：2006-10-19
申请号：US11430918
申请日：2006-05-10
申请人： Toru Taniguchi
发明人： Toru Taniguchi
IPC分类号： B01F7/24
CPC分类号： B01F3/1271 , B01F1/0011 , B01F3/1221 , B01F3/1228 , B01F5/10 , B01F7/00391 , B01F7/0045 , B01F11/0082 , B01F13/1044 , B01F15/00019 , B01F15/0251 , B01F2001/0094 , B01F2003/0028 , B01F2013/1083 , B01F2015/00084
摘要： An apparatus for agitation mixing comprises a casing including a flow channel through which fluid passes, an agitation body consisting of a shaft installed in the casing and connected to a motor and an agitation blade mounted on the perimeter of the shaft, a powder inlet attached to the casing to feed a powder into the casing, a liquid inlet attached to the casing in the vicinity of the powder inlet to feed a liquid into the casing, a powder inlet duct connected to the powder inlet, and an introducer placed in the powder inlet duct and connected to a motor.
摘要翻译：用于搅拌混合的装置包括：壳体，其包括流体通过的流动通道，由安装在壳体中并连接到马达的轴组成的搅拌体和安装在轴的周边上的搅拌叶片;粉末入口，用于将粉末供给到壳体中的壳体，在粉末入口附近附接到壳体的液体入口以将液体进料到壳体中，连接到粉末入口的粉末入口管道和放置在粉末入口中的引入器管道并连接到电机。

33. 发明授权

US07090391B2 Apparatus and method for mixing by agitation in a multichambered mixing apparatus including a pre-agitation mixing chamber 有权
标题翻译：在包括预搅拌混合室的多重混合装置中通过搅拌进行混合的装置和方法
公开(公告)号：US07090391B2
公开(公告)日：2006-08-15
申请号：US10665158
申请日：2003-09-22
申请人： Toru Taniguchi
发明人： Toru Taniguchi
IPC分类号： B01F11/00 , B01F15/02
CPC分类号： B01F3/1271 , B01F1/0011 , B01F3/1221 , B01F3/1228 , B01F5/10 , B01F7/00391 , B01F7/0045 , B01F11/0082 , B01F13/1044 , B01F15/00019 , B01F15/0251 , B01F2001/0094 , B01F2003/0028 , B01F2013/1083 , B01F2015/00084
摘要： An apparatus for agitation mixing comprises a casing 12 including a flow channel through which fluid passes, an agitation body consisting of a shaft 14 installed in the casing 12 and connected to a motor 18 and an agitation blade 16 mounted on the perimeter of the shaft 14, a powder inlet 52 attached to the casing 12 to feed a powder 34 into the casing 12, a liquid inlet 50 attached to the casing 12 in the vicinity of the powder inlet 52 to feed a liquid 24 into the casing 12, a powder inlet duct 30 connected to the powder inlet 52, and an introducer 36 placed in the powder inlet duct 30 and connected to a motor 32.
摘要翻译：用于搅拌混合的装置包括壳体12，壳体12包括流体通过的流动通道，由安装在壳体12中并连接到马达18的轴14和安装在轴14的周边上的搅拌叶片16组成的搅拌体，附接到壳体12以将粉末34供给到壳体12中的粉末入口52，在粉末入口52附近附接到壳体12以将液体24供给到壳体12中的液体入口50，粉末入口连接到粉末入口52的导管30和放置在粉末入口导管30中并连接到马达32的引导器36。

34. 发明申请

US20060080949A1 Air cleaner 有权
标题翻译：空气净化器
公开(公告)号：US20060080949A1
公开(公告)日：2006-04-20
申请号：US11248871
申请日：2005-10-12
申请人： Hiroshi Moriyama , Toru Taniguchi
发明人： Hiroshi Moriyama , Toru Taniguchi
IPC分类号： B01D46/00
CPC分类号： B01D46/10 , B01D46/0049 , B01D2271/022 , B01D2279/60 , F02M35/024
摘要： An air cleaner including a casing body and a sealing frame is disclosed. The casing body has a fitting part for allowing engagement of the sealing frame therein. A filter is mounted inside the sealing frame in a tightly contacted relation with the latter. The sealing frame has a groove extending along its outer peripheral surface and opening on its front surface.
摘要翻译：公开了一种包括壳体和密封框架的空气净化器。壳体具有用于允许密封框架在其中接合的配合部件。过滤器与密封框架紧密接触地安装在密封框架的内部。密封框架具有沿着其外周面延伸并且在其前表面上开口的凹槽。

35. 发明授权

US4103046A Method of impregnating carbon electrodes 失效
标题翻译：浸渍碳电极的方法
公开(公告)号：US4103046A
公开(公告)日：1978-07-25
申请号：US742084
申请日：1976-11-16
申请人： Toru Taniguchi
发明人： Toru Taniguchi
IPC分类号： C25B11/12 , C04B41/81 , C25B11/14 , C25C7/02
CPC分类号： C25C7/02 , C25B11/14
摘要： In a method of impregnating carbon electrodes, a step of heating and drying carbon electrodes is separately juxtaposed to a step of pitch impregnation and cooling so that respective palettes are transported on separate courses for the respective steps, and at a position where said courses approach each other, the electrodes are transferred from a palette for said heating and drying step to a palette for said impregnation and cooling step so that the palette in the step of impregnation and cooling does not pass through a heating and drying furnace in the other step.
摘要翻译：在浸渍碳电极的方法中，加热和干燥碳电极的步骤与间距浸渍和冷却步骤分开并列，使得各个调色板在用于各个步骤的单独的路线上运输，并且在所述进程各自接近的位置另一方面，将电极从用于所述加热和干燥步骤的调色板转移到用于所述浸渍和冷却步骤的调色板中，使得浸渍和冷却步骤中的调色板在另一步骤中不通过加热和干燥炉。

36. 发明授权

US08629133B2 Dispiropyrrolidine derivatives 有权
标题翻译：二螺吡咯烷衍生物
公开(公告)号：US08629133B2
公开(公告)日：2014-01-14
申请号：US13416061
申请日：2012-03-09
申请人： Yuuichi Sugimoto , Kouichi Uoto , Takanori Wakabayashi , Masaki Miyazaki , Masaki Setoguchi , Toru Taniguchi , Keisuke Yoshida , Akitake Yamaguchi , Shoko Yoshida
发明人： Yuuichi Sugimoto , Kouichi Uoto , Takanori Wakabayashi , Masaki Miyazaki , Masaki Setoguchi , Toru Taniguchi , Keisuke Yoshida , Akitake Yamaguchi , Shoko Yoshida
IPC分类号： A61K31/407 , C07D487/10
CPC分类号： C07D487/20 , A61K9/14 , A61K9/1623 , A61K9/1652 , A61K9/2018 , A61K9/2054 , A61K9/2059 , C07D471/20 , C07D487/10
摘要： A compound that inhibits interaction between murine double minute 2 (Mdm2) protein and p53 protein and exhibits anti-tumor activity is provided. The present invention provides a dispiropyrrolidine derivative represented by the following formula (1), which has various substituents, inhibits interaction between Mdm2 protein and p53 protein and exhibits anti-tumor activity, wherein R1, R2, R3, ring A, and ring B in formula (1) respectively have the same meanings as defined in the specification.
摘要翻译：提供抑制鼠双分钟2（Mdm2）蛋白和p53蛋白之间的相互作用并表现出抗肿瘤活性的化合物。本发明提供由下式（1）表示的去甲吡咯烷衍生物，其具有各种取代基，抑制Mdm2蛋白与p53蛋白之间的相互作用并表现出抗肿瘤活性，其中R1，R2，R3，环A和环B在式（1）分别具有与说明书中定义的相同的含义。

37. 发明申请

US20120264738A1 DISPIROPYRROLIDINE DERIVATIVES 有权
标题翻译：吡咯啉衍生物
公开(公告)号：US20120264738A1
公开(公告)日：2012-10-18
申请号：US13416061
申请日：2012-03-09
申请人： Yuuichi Sugimoto , Kouichi Uoto , Takanori Wakabayashi , Masaki Miyazaki , Masaki Setoguchi , Toru Taniguchi , Keisuke Yoshida , Akitake Yamaguchi , Shoko Yoshida
发明人： Yuuichi Sugimoto , Kouichi Uoto , Takanori Wakabayashi , Masaki Miyazaki , Masaki Setoguchi , Toru Taniguchi , Keisuke Yoshida , Akitake Yamaguchi , Shoko Yoshida
IPC分类号： C07D487/10 , A61P35/02 , A61K31/438 , A61P35/00 , A61K31/407 , C07D471/10
CPC分类号： C07D487/20 , A61K9/14 , A61K9/1623 , A61K9/1652 , A61K9/2018 , A61K9/2054 , A61K9/2059 , C07D471/20 , C07D487/10
摘要： A compound that inhibits interaction between murine double minute 2 (Mdm2) protein and p53 protein and exhibits anti-tumor activity is provided. The present invention provides a dispiropyrrolidine derivative represented by the following formula (1), which has various substituents, inhibits interaction between Mdm2 protein and p53 protein and exhibits anti-tumor activity, wherein R1, R2, R3, ring A, and ring B in formula (1) respectively have the same meanings as defined in the specification.
摘要翻译：提供抑制鼠双分钟2（Mdm2）蛋白和p53蛋白之间的相互作用并表现出抗肿瘤活性的化合物。本发明提供由下式（1）表示的去甲吡咯烷衍生物，其具有各种取代基，抑制Mdm2蛋白与p53蛋白之间的相互作用并表现出抗肿瘤活性，其中R1，R2，R3，环A和环B在式（1）分别具有与说明书中定义的相同的含义。

38. 发明授权

US08283252B2 Method of manufacturing semiconductor wafer 有权
标题翻译：制造半导体晶片的方法
公开(公告)号：US08283252B2
公开(公告)日：2012-10-09
申请号：US12585400
申请日：2009-09-14
申请人： Toru Taniguchi , Etsuro Morita , Satoshi Matagawa , Seiji Harada , Isoroku Ono , Mitsuhiro Endo , Fumihiko Yoshida
发明人： Toru Taniguchi , Etsuro Morita , Satoshi Matagawa , Seiji Harada , Isoroku Ono , Mitsuhiro Endo , Fumihiko Yoshida
IPC分类号： H01L21/302
CPC分类号： B24B37/08 , B24B37/042 , B24B37/24 , B24B37/28
摘要： A method of manufacturing a semiconductor wafer, including a step of differentiating the glossiness of a front surface from that of a rear surface of the wafer by holding the semiconductor wafer in a wafer holding hole formed in a carrier plate, and simultaneously polishing a front and back surface of said semiconductor wafer by driving said carrier plate to make a circular motion associated with no rotation on its own axis within a plane parallel with a surface of said carrier plate between a pair of polishing members disposed to face to each other, by using an abrasive body with a semiconductor wafer sink rate different in polishing from that of an abrasive body for one of a polishing member on an upper surface plate and a polishing member on a lower surface plate so as to simultaneously polish both the front and rear surfaces of the semiconductor wafer, or differentiating by differentiating the rotating speed of the upper surface plate from that of the lower surface plate.
摘要翻译：一种制造半导体晶片的方法，包括通过将半导体晶片保持在形成在载板上的晶片保持孔中，将前表面的光泽度与晶片的后表面的光泽度区分开的步骤，所述半导体晶片的后表面通过驱动所述承载板而形成圆周运动，所述圆周运动与平行于所述承载板的表面的平面之间在其自身轴线上不旋转，所述平面布置在彼此面对的一对抛光构件之间，通过使用具有与用于上表面板上的抛光构件和下表面板上的抛光构件之一的研磨体的抛光不同的半导体晶片沉降速率的研磨体，以同时抛光前表面和后表面半导体晶片，或者通过区分上表面板的转速与下表面板的转速来区分。

39. 发明申请

US20100009605A1 Method of manufacturing semiconductor wafer 有权
标题翻译：制造半导体晶片的方法
公开(公告)号：US20100009605A1
公开(公告)日：2010-01-14
申请号：US12585400
申请日：2009-09-14
申请人： Toru Taniguchi , Etsuro Morita , Satoshi Matagawa , Seiji Harada , Isoroku Ono , Mitsuhiro Endo , Fumihiko Yoshida
发明人： Toru Taniguchi , Etsuro Morita , Satoshi Matagawa , Seiji Harada , Isoroku Ono , Mitsuhiro Endo , Fumihiko Yoshida
IPC分类号： H01L21/463
CPC分类号： B24B37/08 , B24B37/042 , B24B37/24 , B24B37/28
摘要： A method of manufacturing a semiconductor wafer, including a step of differentiating the glossiness of a front surface from that of a rear surface of the wafer by holding the semiconductor wafer in a wafer holding hole formed in a carrier plate, and simultaneously polishing a front and back surface of said semiconductor wafer by driving said carrier plate to make a circular motion associated with no rotation on its own axis within a plane parallel with a surface of said carrier plate between a pair of polishing members disposed to face to each other, by using an abrasive body with a semiconductor wafer sink rate different in polishing from that of an abrasive body for one of a polishing member on an upper surface plate and a polishing member on a lower surface plate so as to simultaneously polish both the front and rear surfaces of the semiconductor wafer, or differentiating by differentiating the rotating speed of the upper surface plate from that of the lower surface plate.
摘要翻译：一种制造半导体晶片的方法，包括通过将半导体晶片保持在形成在载板上的晶片保持孔中，将前表面的光泽度与晶片的后表面的光泽度区分开的步骤，所述半导体晶片的后表面通过驱动所述承载板而形成圆周运动，所述圆周运动与平行于所述承载板的表面的平面之间在其自身轴线上不旋转，所述平面布置在彼此面对的一对抛光构件之间，通过使用具有与用于上表面板上的抛光构件和下表面板上的抛光构件之一的研磨体的抛光不同的半导体晶片沉降速率的研磨体，以同时抛光前表面和后表面半导体晶片，或者通过区分上表面板的转速与下表面板的转速来区分。

40. 发明授权

US07470169B2 Method of polishing semiconductor wafers by using double-sided polisher 有权
标题翻译：使用双面抛光机研磨半导体晶片的方法
公开(公告)号：US07470169B2
公开(公告)日：2008-12-30
申请号：US10296498
申请日：2001-05-31
申请人： Toru Taniguchi , Isoroku Ono , Seiji Harada
发明人： Toru Taniguchi , Isoroku Ono , Seiji Harada
IPC分类号： B24B1/00 , B24B7/00
CPC分类号： B24B37/08 , B24B37/042 , B24B37/16
摘要： During polishing of the semiconductor wafer by using a double-sided polisher, a larger difference as compared to the prior art is created between a frictional resistance acting on a front surface of a silicon wafer from an upper surface plate side and a frictional resistance acting on a back surface of the silicon wafer from a lower surface plate side. Thereby, respective wafers can be rotated at as 0.1 - 1.0 rpm within corresponding wafer holding holes. Accordingly, the rotation of the wafer would not be suspended even if there were any defective condition induced during polishing. Further, partial variation or deviation in polishing volume particular in the outer periphery of the wafer would be hard to occur. Therefore, the polish-sagging is suppressed and thus the improved degree of flatness of the wafer could be obtained.
摘要翻译：在使用双面抛光机抛光半导体晶片时，与现有技术相比，在从上表面板侧作用在硅晶片的前表面上的摩擦阻力和作用于硅片的摩擦阻力之间产生较大的差异硅晶片的背表面从下表面板侧。因此，相应的晶片可以在相应的晶片保持孔内以0.1-1.0rpm的速度旋转。因此，即使在抛光期间引起任何缺陷状况，晶片的旋转也不会被暂停。此外，晶片外周特定的抛光体积的部分变化或偏差将难以发生。因此，抑制了抛光下垂，因此可以获得晶片的平坦度的提高。

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