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    • 33. 发明授权
    • Semiconductor device and fabrication method for the same
    • 半导体器件及其制造方法相同
    • US08569824B2
    • 2013-10-29
    • US12360488
    • 2009-01-27
    • Nobuyoshi TakahashiIchirou Matsuo
    • Nobuyoshi TakahashiIchirou Matsuo
    • H01L29/792
    • H01L27/11568
    • The semiconductor device includes: a plurality of bit lines formed in stripes in a semiconductor substrate of a first conductivity type, each of the bit lines being a diffusion layer of an impurity of a second conductivity type; a plurality of gate insulation films formed on regions of the semiconductor substrate between the bit lines; a plurality of word lines formed on the semiconductor substrate via the gate insulating films, the word lines extending in a direction intersecting with the bit lines; and a plurality of bit line isolation diffusion layers formed in regions of the semiconductor substrate between the word lines, each of the bit line isolation diffusion layers being a diffusion layer of an impurity of the first conductivity type. The bit line isolation diffusion layer includes a diffusion suppressor for suppressing diffusion of an impurity.
    • 半导体器件包括:在第一导电类型的半导体衬底中以条纹形成的多个位线,每个位线是第二导电类型的杂质的扩散层; 形成在位线之间的半导体衬底的区域上的多个栅极绝缘膜; 经由所述栅极绝缘膜形成在所述半导体衬底上的多个字线,所述字线在与所述位线相交的方向上延伸; 以及在所述字线之间的所述半导体衬底的区域中形成的多个位线隔离扩散层,所述位线隔离扩散层中的每一个为所述第一导电类型的杂质的扩散层。 位线隔离扩散层包括用于抑制杂质扩散的扩散抑制器。
    • 34. 发明申请
    • PROCESSING METHOD FOR RECOVERING IRON OXIDE AND HYDROCHLORIC ACID
    • 回收氧化铁和氢氯酸的处理方法
    • US20110158869A1
    • 2011-06-30
    • US13000216
    • 2009-06-18
    • Nobuyoshi TakahashiOsama TakiHerbert WeissenbaeckDieter Vogl
    • Nobuyoshi TakahashiOsama TakiHerbert WeissenbaeckDieter Vogl
    • C01G49/06C01B7/03
    • C01G49/06C01B7/0706C23G1/36
    • A method of processing waste iron chloride solution including ferrous chloride, ferric chloride or mixtures thereof and optionally free hydrochloric acid, includes concentrating waste iron chloride solution into concentrated liquid having iron chloride concentration of at least 30%-40% by weight; optionally oxidizing ferrous chloride in the concentrated liquid from the concentration step to ferric chloride providing liquid containing ferric chloride; hydrolyzing the liquid containing ferric chloride from the oxidation step at 155-350° C., maintaining the ferric chloride concentration at least at 65% by weight, generating steam containing hydrogen chloride and liquid containing ferric oxide; separating ferric oxide from the liquid containing ferric oxide in the hydrolysis step; condensing steam containing hydrogen chloride in the hydrolysis step, recovering hydrochloric acid at a concentration of at least 10%-15% by weight; and using condensation energy of the hydrogen chloride containing steam in the recovery step to heat the concentration step performed under reduced pressure.
    • 一种处理包括氯化亚铁,氯化铁或其混合物和任选的游离盐酸的废氯化铁溶液的方法包括将废铁水溶液浓缩至浓度为至少30%-40%(重量)的氯化铁浓缩液; 任选地将浓缩步骤中的浓缩液中的氯化亚铁氧化成三氯化铁提供含有氯化铁的液体; 在155-350℃下从氧化步骤水解含有氯化铁的液体,维持氯化铁浓度至少为65重量%,产生含有氯化氢的蒸汽和含有氧化铁的液体; 在水解步骤中从含有三氧化二铁的液体中分离出氧化铁; 在水解步骤中冷凝含有氯化氢的蒸汽,以至少10重量%-15重量%的浓度回收盐酸; 并且在回收步骤中使用含有氯化氢的蒸汽的冷凝能量来加热在减压下进行的浓缩步骤。
    • 35. 发明授权
    • Semiconductor device and fabrication method for the same
    • 半导体器件及其制造方法相同
    • US07834401B2
    • 2010-11-16
    • US12369283
    • 2009-02-11
    • Nobuyoshi Takahashi
    • Nobuyoshi Takahashi
    • H01L23/62
    • H01L27/11573H01L27/0248H01L27/0629H01L27/105
    • The semiconductor device includes: memory cells each having a first multilayer electrode including a first lower electrode made of a first conductive film and a first upper electrode made of a second conductive film formed one on the other with a first interface film therebetween; and a diode having a diode electrode made of the second conductive film and a second interface film as a silicon oxide film formed at the interface between the diode electrode and a substrate. The first interface film has a thickness with which electrical connection between the lower electrode and the upper electrode is maintained, and the second interface film has a thickness with which epitaxial growth between the substrate and the diode electrode is inhibited.
    • 半导体器件包括:各自具有第一多层电极的存储单元,所述第一多层电极包括由第一导电膜制成的第一下部电极和由其间形成有第一界面膜的第二导电膜形成的第一上部电极; 以及具有由第二导电膜制成的二极管电极和形成在二极管电极和基板之间的界面处的氧化硅膜的第二界面膜的二极管。 第一界面膜具有保持下电极和上电极之间的电连接的厚度,并且第二界面膜具有抑制衬底和二极管电极之间的外延生长的厚度。
    • 37. 发明申请
    • Semiconductor device and method for manufacturing the same
    • 半导体装置及其制造方法
    • US20060237757A1
    • 2006-10-26
    • US11405451
    • 2006-04-18
    • Nobuyoshi TakahashiFumihiko NoroKenji Sato
    • Nobuyoshi TakahashiFumihiko NoroKenji Sato
    • H01L29/94
    • H01L27/11568H01L27/115
    • A semiconductor device includes: a semiconductor region; a plurality of bit line diffusion layers formed in an upper portion of the semiconductor region and each extending in a row direction; a plurality of bit line insulating films formed on the bit line diffusion layers; a plurality of gate insulting films formed between the respective adjacent bit line diffusion layers on the semiconductor region; and a plurality of word lines each formed on the semiconductor region in a column direction and each intersecting with the bit line insulating films and the gate insulating films. Memory cells are formed at intersections of the gate insulating films and the word lines. A plurality of connection diffusion layers including connection parts electrically connected to the bit line diffusion layers are formed in the upper portion of the semiconductor region, and a level of upper faces of the connection parts is lower than a level of upper faces of the connection diffusion layers in the semiconductor region.
    • 半导体器件包括:半导体区域; 多个位线扩散层,其形成在所述半导体区域的上部,并且各自沿行方向延伸; 形成在位线扩散层上的多个位线绝缘膜; 形成在所述半导体区域上的各个相邻位线扩散层之间的多个栅极绝缘膜; 以及多个字线,各自在列方向上形成在半导体区域上,并且与字线绝缘膜和栅极绝缘膜交叉。 存储单元形成在栅极绝缘膜和字线的交点处。 包括与位线扩散层电连接的连接部分的多个连接扩散层形成在半导体区域的上部,并且连接部分的上表面的电平低于连接扩散部的上表面的高度 半导体区域中的层。
    • 39. 发明授权
    • Water producing air conditioning system
    • 生产空调系统
    • US4313312A
    • 1982-02-02
    • US133432
    • 1980-03-24
    • Toshio ItoHiromasa MatsuokaYoshio HirayamaNobuyoshi Takahashi
    • Toshio ItoHiromasa MatsuokaYoshio HirayamaNobuyoshi Takahashi
    • E03B3/28F24F3/14F24F5/00F25D23/00
    • F24F3/1411E03B3/28F24F3/1417F24F5/00F24F2003/144
    • A water producing-air conditioning system comprises a water producing apparatus which adsorbs moisture in the ambient air on an adsorbent or absorbent and evaporates water adsorbed on the adsorbent or absorbent by heating it and condenses steam to obtain water;a heat-exchanger which heat-exchange the ambient air with a hot dry air discharged from said water producing apparatus during adsorbing moisture on the adsorbent or absorbent; andan evaporation-cooling apparatus for forming a cold wet air by evaporating water and cooling it by contacting water with a dry air at the ambient temperature passed through said heat-exchanger.The hot air heated by said heat-exchanger or the cold air obtained from said evaporation-cooling apparatus is utilized for the air conditioning. The system can be used for comfortable living in a severe condition such as a desert by the effective combination of the evaporation-cooling apparatus with the water producing apparatus under utilizing heat-exchange in high efficiency.
    • 一种生产水的空调系统包括:将吸附剂或吸收剂上的环境空气中的水分吸附并通过加热吸附或吸收吸附剂吸收的水蒸发而蒸发得到水的水生产装置; 热交换器,在吸附剂或吸收剂吸附水分的同时,用从所述水处理设备排出的热干燥空气对周围空气进行热交换; 以及蒸发冷却装置,用于通过蒸发水形成冷湿空气,并通过使水与通过所述热交换器的环境温度下的干燥空气接触来冷却。 由所述热交换器加热的热空气或由所述蒸发冷却装置获得的冷空气用于空调。 通过在高效率地利用热交换的条件下,通过蒸发冷却装置与制水装置的有效结合,可以将系统用于沙漠等恶劣条件下的舒适生活。