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    • 39. 发明授权
    • Grinding machine
    • 磨床
    • US06685542B2
    • 2004-02-03
    • US09986408
    • 2001-11-08
    • Takashi MoriHiroshi SasayamaToru Takazawa
    • Takashi MoriHiroshi SasayamaToru Takazawa
    • B24B704
    • B24B7/04B24B7/228B24B41/047
    • A grinding machine includes at least a turntable, rotary chuck tables for holding workpieces to be machined, a first grinding device for grinding the workpiece held on the chuck table and a second grinding device for grinding the first-ground workpiece held on the chuck table. The first grinding device comprises at least a first grinding wheel having pieces of grindstone set so as to define together a first grinding plane, and a first spindle fixed to the first grinding wheel. Likewise, the second grinding device comprises a second grinding wheel having pieces of grindstone set so as to define together a second grinding plane and a second spindle fixed to the second grinding wheel. The first and second grinding devices are so arranged that the first angle formed between the linear line connecting from the center of rotation of the turntable to the center of rotation of a selected chuck table and the linear line connecting from the center of rotation of the selected chuck table to the center of rotation of the first spindle is equal to the second angle formed between the linear line connecting from the center of rotation of the turntable to the center of rotation of the selected chuck table and the linear line connecting from the center of rotation of the selected chuck table to the center of rotation of the second spindle. This arrangement assures that all finished workpieces have the same thickness.
    • 研磨机至少包括用于保持要加工的工件的转盘,旋转卡盘台,用于研磨保持在卡盘台上的工件的第一研磨装置和用于研磨保持在卡盘台上的第一接地工件的第二研磨装置。 第一磨削装置包括至少第一砂轮,其具有被设置为一起限定第一研磨平面的磨石块和固定到第一砂轮的第一轴的第一砂轮。 同样地,第二研磨装置包括第二砂轮,该第二砂轮具有被设置为一起限定第二研磨平面的磨石块和固定到第二砂轮的第二轴。 第一和第二研磨装置被布置成使得在从转台的旋转中心连接到所选择的卡盘台的旋转中心的线性线之间形成的第一角度和从所选择的卡盘的旋转中心连接的线性线 卡盘台到第一主轴的旋转中心等于从转台的旋转中心到所选择的卡盘台的旋转中心的线性线之间形成的第二角度,以及从中心 所选择的卡盘台的旋转到第二主轴的旋转中心。 这种布置确保所有成品的工件具有相同的厚度。
    • 40. 发明授权
    • Projection exposure apparatus and method, and illumination optical system thereof
    • 投影曝光装置及方法及其照明光学系统
    • US06526118B2
    • 2003-02-25
    • US09391171
    • 1999-09-07
    • Hideki KomatsudaTakashi Mori
    • Hideki KomatsudaTakashi Mori
    • G21K500
    • G03F7/70066G03F7/702G03F7/70233G03F7/70283G03F7/70358G03F7/707G03F7/70708
    • In a projection exposure apparatus used in lithography process for transferring a predetermined pattern formed on a reflection type mask onto a photosensitive substrate, the reflection mask and the substrate are moved relative to each other by a scanning driver, and the illumination optical system located between a radiation light source and the reflection mask includes a field stop located near a position conjugate with the reflection mask. In another embodiment a scanning driver changes the positional relationship between the reflection mask and the projection optical system, or/and between the substrate and the projection optical system. In another embodiment an image of the field stop is formed on the reflection mask by a relay optical system, preferably a catoptric system, forming the predetermined pattern. The projection optical system located between the reflection mask and the substrate directs the light reflected from the mask to the substrate, and illuminance distribution of the light on the exposure area of the substrate is adjustable by changing the position of reflection optical elements located along the optical path of the radiation light in the illumination optical system.
    • 在用于将形成在反射型掩模上的预定图案转印到感光基板上的光刻工艺中的投影曝光装置中,反射掩模和基板通过扫描驱动器相对于彼此移动,并且照明光学系统位于 辐射光源和反射掩模包括位于与反射掩模共轭的位置附近的场停止。 在另一个实施例中,扫描驱动器改变反射掩模与投影光学系统之间,或/和基板与投影光学系统之间的位置关系。 在另一个实施例中,通过形成预定图案的中继光学系统,优选地是反射系统,在反射掩模上形成场光阑的图像。 位于反射掩模和衬底之间的投影光学系统将从掩模反射的光引导到衬底,并且通过改变沿着光学器件的反射光学元件的位置来调节光在衬底的曝光区域上的照度分布 在照明光学系统中辐射光的路径。