专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

31. 发明授权

US08603733B2 Pattern forming method, and resist composition, developer and rinsing solution used in the pattern forming method 有权
标题翻译：图案形成方法，图案形成方法中使用的抗蚀剂组合物，显影剂和漂洗溶液
公开(公告)号：US08603733B2
公开(公告)日：2013-12-10
申请号：US13196530
申请日：2011-08-02
申请人： Shinji Tarutani , Hideaki Tsubaki , Kazuyoshi Mizutani , Kenji Wada , Wataru Hoshino
发明人： Shinji Tarutani , Hideaki Tsubaki , Kazuyoshi Mizutani , Kenji Wada , Wataru Hoshino
IPC分类号： G03F7/00 , G03F7/004 , G03F7/32 , G03F7/20
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041 , G03F7/325 , G03F7/40
摘要： A pattern forming method comprising a step of applying a resist composition whose solubility in a negative tone developer decreases upon irradiation with an actinic ray or radiation and which contains a resin having an alicyclic hydrocarbon structure and a dispersity of 1.7 or less and being capable of increasing the polarity by the action of an acid, an exposure step, and a development step using a negative tone developer; a resist composition for use in the method; and a developer and a rinsing solution for use in the method, are provided, whereby a pattern with reduced line edge roughness and high dimensional uniformity can be formed.
摘要翻译：一种图案形成方法，包括施加抗蚀剂组合物的步骤，所述抗蚀剂组合物在负光谱显影剂中的溶解度随着光化射线或辐射的照射而降低，并且其含有具有脂环族烃结构和分散性为1.7以下并且能够增加的树脂通过酸的作用的极性，曝光步骤和使用负色调显影剂的显影步骤; 用于该方法的抗蚀剂组合物; 并且提供了用于该方法的显影剂和冲洗溶液，由此可以形成线边缘粗糙度降低且尺寸均匀性高的图案。

32. 发明授权

US08158326B2 Photosensitive composition, compound for use in the photosensitive composition, and method of pattern formation with the photosensitive composition 有权
标题翻译：感光组合物，用于光敏组合物的化合物，以及用感光组合物形成图案的方法
公开(公告)号：US08158326B2
公开(公告)日：2012-04-17
申请号：US12191153
申请日：2008-08-13
申请人： Kunihiko Kodama , Kenji Wada , Kaoru Iwato
发明人： Kunihiko Kodama , Kenji Wada , Kaoru Iwato
IPC分类号： G03F7/039 , G03F7/038
CPC分类号： G03F7/0045 , C07C309/65 , C07C311/09 , C07C381/12 , G03F7/0046 , G03F7/0382 , G03F7/0395 , G03F7/0397 , Y10S430/115 , Y10S430/12 , Y10S430/121 , Y10S430/122 , Y10S430/123
摘要： A compound which generates a sulfonic acid having one or more —SO3H groups and one or more —SO2— bonds upon irradiation with an actinic ray or a radiation; a photosensitive composition containing the compound; and a method of pattern formation with the photosensitive composition.
摘要翻译：在用光化射线或辐射照射时产生具有一个或多个-SO 3 H基团和一个或多个-SO 2 - 键的磺酸的化合物; 含有该化合物的光敏组合物; 以及用感光性组合物形成图案的方法。

33. 发明授权

US07923199B2 Photosensitive composition, compound for use in the photosensitive composition and pattern forming method using the photosensitive composition 有权
标题翻译：感光组合物，用于感光组合物的化合物和使用感光组合物的图案形成方法
公开(公告)号：US07923199B2
公开(公告)日：2011-04-12
申请号：US11337899
申请日：2006-01-24
申请人： Kenji Wada
发明人： Kenji Wada
IPC分类号： G03C5/00
CPC分类号： G03F7/0392 , G03F7/0045 , G03F7/0046 , G03F7/0382
摘要： The invention provides a photosensitive composition for use in the production process of a semiconductor such as IC, in the production of a circuit substrate of liquid crystal, thermal head and the like or in other photofabrication processes, a pattern forming method using the photosensitive composition, and a specific organic acid, which are: a photosensitive composition comprising a compound having a proton acceptor functional group and producing a sulfonic acid group upon irradiation with actinic rays or radiation to reduce or lose the acceptor property or change the proton acceptor functional group to be acidic, or a compound capable of generating a specific organic acid upon irradiation with actinic rays or radiation; a pattern forming method using the photosensitive composition; and a specific organic acid.
摘要翻译：本发明提供了一种用于半导体（例如IC）的制造中的液晶，热敏头等电路基板的制造中的光敏性组合物，或者其他的光加工工序，使用该感光性组合物的图案形成方法，和特定的有机酸，其是：包含具有质子受体官能团的化合物并在用光化射线或辐射照射时产生磺酸基以降低或失去受主性质或将质子受体官能团改变为酸性或能够在用光化射线或辐射照射时能够产生特定有机酸的化合物; 使用该感光性组合物的图案形成方法; 和特定的有机酸。

34. 发明授权

US07709547B2 Ink composition, inkjet recording method, printed material, production method of a planographic printing plate and planographic printing plate 有权
标题翻译：油墨组合物，喷墨记录方法，印刷材料，平版印刷版和平版印刷版的制造方法
公开(公告)号：US07709547B2
公开(公告)日：2010-05-04
申请号：US11602187
申请日：2006-11-21
申请人： Kazuhiro Yokoi , Ippei Nakamura , Kenji Wada
发明人： Kazuhiro Yokoi , Ippei Nakamura , Kenji Wada
IPC分类号： C08F2/50 , C08F2/46 , C08J3/28
CPC分类号： B41C1/1066 , C09D11/101 , C09D11/322
摘要： The present invention provides an ink composition, and inkjet recording method, a printed material, a production method of a planographic printing plate, and a planographic printing plate. The ink composition of the present invention contains a cationically polymerizable compound, a compound that generates an acid when irradiated with a radiation ray, and an onium salt compound that generates an organic acid compound having a basic nitrogen atom when irradiated with a radiation ray.
摘要翻译：本发明提供油墨组合物，喷墨记录方法，印刷材料，平版印刷版的制造方法和平版印刷版。本发明的油墨组合物含有阳离子聚合性化合物，用辐射线照射时产生酸的化合物，以及在用放射线照射时产生具有碱性氮原子的有机酸化合物的鎓盐化合物。

35. 发明申请

US20100040975A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE POSITIVE RESIST COMPOSITION 有权
标题翻译：积极抵抗组合物和形成方法使用积极抗性组合物
公开(公告)号：US20100040975A1
公开(公告)日：2010-02-18
申请号：US12523232
申请日：2008-01-28
申请人： Kenji Wada
发明人： Kenji Wada
IPC分类号： G03F7/20 , G03F7/004
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/0758 , G03F7/2041
摘要： A positive resist composition comprises: (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (B) a resin of which solubility in an alkali developer increases under action of an acid; and (C) a compound capable of decomposing under action of an acid to generate an acid.
摘要翻译：正型抗蚀剂组合物包括：（A）在用光化射线或辐射照射时能够产生酸的化合物; （B）在酸的作用下在碱性显影剂中的溶解度增加的树脂; 和（C）能够在酸作用下分解以产生酸的化合物。

36. 发明申请

US20090250182A1 Papermaking Method and Papermaking System 审中-公开
标题翻译：造纸方法和造纸系统
公开(公告)号：US20090250182A1
公开(公告)日：2009-10-08
申请号：US12084087
申请日：2006-10-23
申请人： Masaki Teramoto , Shinji Kobayashi , Kenji Wada
发明人： Masaki Teramoto , Shinji Kobayashi , Kenji Wada
IPC分类号： D21H23/04
CPC分类号： D21H17/53 , D21H21/06 , D21H23/04
摘要： A papermaking method according to this invention is carried out using a paper machine provided with a head box (3) including a cell-structure manifold (30). An aqueous solution (M) containing 0.03 to 0.4 wt % of viscous agent is added to a material pulp slurry (S), and the obtained mixed pulp slurry (MS) is introduced into the manifold (30).
摘要翻译：根据本发明的造纸方法使用具有包括电池结构歧管（30）的头箱（3）的造纸机进行。将含有0.03〜0.4重量％的粘性剂的水溶液（M）加入到浆料浆料（S）中，将得到的混合纸浆（MS）引入歧管30。

37. 发明授权

US07524609B2 Photo sensitive composition, pattern-forming method using the photosensitive composition and compound for use in the photosensitive composition 有权
标题翻译：感光组合物，使用光敏组合物和用于感光组合物的化合物的图案形成方法
公开(公告)号：US07524609B2
公开(公告)日：2009-04-28
申请号：US11716054
申请日：2007-03-09
申请人： Kenji Wada
发明人： Kenji Wada
IPC分类号： G03F7/004 , G03F7/30 , C07C69/62 , C07C309/29
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/0392 , G03F7/0395 , G03F7/0397 , Y10S430/121 , Y10S430/122
摘要： A photosensitive composition, which comprises (A) a compound capable of generating an organic acid represented by formula (I) upon irradiation with actinic ray or radiation: Z—A—X—B—R—(Y)n (I) wherein Z represents an organic acid group; A represents a divalent linking group; X represents a divalent linking group having a hetero atom; B represents an oxygen atom or —N(Rx)—; Rx represents a hydrogen atom or a monovalent organic group; R represents a monovalent organic group substituted with Y, and when B represents —N(Rx)—, R and Rx may be bonded to each other to form a cyclic structure; Y represents —COOH or —CHO, and when a plurality of Y's are present, the plurality of Y's may be the same or different; and n represents an integer of from 1 to 3.
摘要翻译：一种光敏组合物，其包含（A）在用光化射线或辐射照射时能够产生由式（I）表示的有机酸的化合物：<？在线公式描述=“在线式”末端=“铅 “？”ZAXBR-（Y）n（I）<？in-line-formula description =“In-line Formulas”end =“tail”？>其中Z表示有机酸基团; A表示二价连接基团; X表示具有杂原子的二价连接基团; B表示氧原子或-N（Rx） - ; Rx表示氢原子或一价有机基团; R表示被Y取代的一价有机基团，当B表示-N（Rx） - 时，R和Rx可以彼此键合形成环状结构; Y表示-COOH或-CHO，当存在多个Y时，多个Y可以相同或不同; n表示1〜3的整数。

38. 发明授权

US07341817B2 Photosensitive composition, compound for use in the photosensitive composition, and pattern forming method using the photosensitive composition 有权
标题翻译：感光组合物，用于感光组合物的化合物和使用该光敏组合物的图案形成方法
公开(公告)号：US07341817B2
公开(公告)日：2008-03-11
申请号：US10993094
申请日：2004-11-22
申请人： Kenji Wada , Kunihiko Kodama
发明人： Kenji Wada , Kunihiko Kodama
IPC分类号： G03F7/004 , G03F7/30
CPC分类号： C07C381/12 , C07C309/39 , C07C309/42 , C07C323/66 , G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/0392 , G03F7/0395 , G03F7/0397 , G03F7/0758 , G03F7/2041 , Y10S430/106 , Y10S430/111 , Y10S430/122
摘要： A photosensitive composition comprising a compound capable of generating a specific sulfonic acid upon irradiation with actinic rays or a radiation; a compound capable of generating a specific sulfonic acid upon irradiation with an actinic ray or a radiation; and a pattern forming method using a photosensitive composition comprising a compound capable of generating a specific sulfonic acid upon irradiation with an actinic ray or a radiation.
摘要翻译：一种光敏组合物，其包含能够在用光化射线或辐射照射时能够产生特定磺酸的化合物; 能够在用光化射线或辐射照射时能够产生特定磺酸的化合物; 以及使用光敏组合物的图案形成方法，其包含在用光化射线或辐射照射时能够产生特定磺酸的化合物。

39. 发明申请

US20080031799A1 Method For Refining Silicon And Silicon Refined Thereby 审中-公开
标题翻译：由此精制硅和硅的方法
公开(公告)号：US20080031799A1
公开(公告)日：2008-02-07
申请号：US11631312
申请日：2005-07-07
申请人： Toshiaki Fukuyama , Kenji Wada
发明人： Toshiaki Fukuyama , Kenji Wada
IPC分类号： C01B33/037
CPC分类号： C01B33/037
摘要： In order to provide silicon for solar batteries inexpensively by efficient refining and without lowering the refining rate, the present invention is directed to a method for refining molten silicon containing an impurity element. According to one aspect, the method includes the steps of: bringing a refine gas containing a component that reacts with the impurity element into contact with the molten silicone, thereby removing a product containing the impurity element from the molten silicon; and bringing a process gas, having small reactivity with the molten silicon, with the molten silicon, thereby removing a product generated by reaction of the molten silicon and the refine gas.
摘要翻译：为了通过有效的精炼提供廉价的太阳能电池的硅并且不降低精炼速度，本发明涉及一种用于精炼含有杂质元素的熔融硅的方法。根据一个方面，所述方法包括以下步骤：使含有与所述杂质元素反应的成分的精炼气体与所述熔融硅酮接触，从而从所述熔融硅除去含有所述杂质元素的物质; 并且将与熔融硅反应性小的工艺气体与熔融硅反应，从而除去由熔融硅与精炼气体反应产生的产物。

40. 发明申请

US20070141828A1 Multi-layered structure forming method, method of manufacturing wiring substrate, and method of manufacturing electronic apparatus 有权
公开(公告)号：US20070141828A1
公开(公告)日：2007-06-21
申请号：US11707022
申请日：2007-02-16
申请人： Tsuyoshi Shintate , Toshiaki Mikoshiba , Kenji Wada , Kazuaki Sakurada , Jun Yamada
发明人： Tsuyoshi Shintate , Toshiaki Mikoshiba , Kenji Wada , Kazuaki Sakurada , Jun Yamada
IPC分类号： H01L21/4763
CPC分类号： H05K3/4664 , H05K3/125 , H05K2203/013 , Y10S257/921
摘要： There is provided a multi-layered structure forming method comprising: (A) forming a first insulating material layer containing a first photo-curing material on a substrate; (B) semi-hardening the first insulating material layer by radiating light having a first wavelength to the first insulating material layer; (C) forming a conductive material layer on the semi-hardened first insulating material layer by ejecting droplets of a conductive material to the semi-hardened first insulating material layer from a nozzle of a liquid droplet ejecting apparatus; (D) forming a second insulating material layer containing a second photo-curing material so as to cover the semi-hardened first insulating material layer and the conductive material layer; and (E) forming a first insulating layer, a conductive layer positioned on the first insulating material, and a second insulating layer covering the first insulating layer and the conductive layer by simultaneously heating the first insulating material layer, the conductive material layer, and the second insulating material layer.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式