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    • 36. 发明授权
    • Liquid processing method and liquid processing apparatus
    • 液体处理方法和液体处理装置
    • US07640885B2
    • 2010-01-05
    • US11812766
    • 2007-06-21
    • Tsunenaga NakashimaKenji UrataShinji OkadaNobuaki Matsuoka
    • Tsunenaga NakashimaKenji UrataShinji OkadaNobuaki Matsuoka
    • B05B15/02B05B3/00B05C11/02
    • B05C11/08H01L51/0005
    • In a nozzle unit 4 equipped with processing-liquid nozzles 4A to 4J, an air layer 73 and a solvent layer 74 for processing liquid are successively formed outside a processing-liquid layer 71 included in the tip of each nozzle 4A (4B to 4J). Next, the solvent layer 74 in the nozzle 4A is thrown out into a drain part 62 of a standby unit 6 and subsequently, the processing liquid is supplied from the nozzle 4A to the surface of a wafer W, performing a coating process. After completing the coating process, the processing liquid remaining in the nozzle 4A is sucked and continuously, respective tips of the nozzles 4A to 4J are dipped into respective solvents in solvent reservoir 62A to 62J, respectively. From this state, by sucking in the nozzle 4A, there are newly formed, outside the processing layer 71 in the tip of the nozzle 4A, an air layer 73 and a solvent layer 74. Thus, in supplying a substrate, such as semiconductor wafer, with a processing liquid by use of a nozzle unit having a plurality of processing-liquid nozzles integrated, it is possible to prevent dryness of the processing liquids in the respective nozzles while preventing the nozzle unit from being large-sized.
    • 在具有处理液喷嘴4A〜4J的喷嘴单元4中,在各喷嘴4A(4B〜4J)的前端包含的处理液层71的外侧依次形成有用于处理液体的空气层73和溶剂层74, 。 接着,喷嘴4A中的溶剂层74被排出到备用单元6的排出部分62中,随后将处理液从喷嘴4A供给至晶片W的表面,进行涂覆处理。 在完成涂布处理之后,吸附残留在喷嘴4A中的处理液,喷嘴4A至4J的各个末端分别浸入溶剂储存器62A至62J中的相应溶剂中。 从该状态,通过吸入喷嘴4A,在喷嘴4A的前端处的处理层71的外侧,空气层73和溶剂层74之间新形成。因此,在供给诸如半导体晶片的基板 通过使用具有一体化的多个处理液喷嘴的喷嘴单元,通过处理液体,可以防止喷嘴单元大尺寸的处理液在各喷嘴中的干燥。
    • 39. 发明申请
    • Pellicle and novel fluoropolymer
    • 薄膜和新型含氟聚合物
    • US20060240222A1
    • 2006-10-26
    • US11446242
    • 2006-06-05
    • Ikuo MatsukuraHiromasa YamamotoYuichiro IshibashiShinji OkadaNaoko Shirota
    • Ikuo MatsukuraHiromasa YamamotoYuichiro IshibashiShinji OkadaNaoko Shirota
    • B32B3/10
    • G03F1/62C08G65/007C08G65/226G03F7/0046Y10T428/24331Y10T428/3154
    • It is to provide a useful fluoropolymer excellent in transparency and durability to a short wavelength light (an ArF excimer laser having an irradiation wavelength of 193 nm and a F2 excimer laser having an irradiation wavelength of 157 nm) as e.g. a pellicle material. A pellicle wherein a polymer (I) to be used for a pellicle membrane and/or an adhesive is a polymer essentially containing the following unit (1). The unit (1) is a unit containing a fluorine atom, wherein a chain forming the polymer main chain comprises a carbon atom and an etheric oxygen atom, at least one carbon atom forming the main chain is a carbon atom forming a cyclic group, and at least one etheric oxygen atom forming the main chain is an oxygen atom forming no cyclic group. For example, a unit represented by the following formula (A1) (wherein n is 1 or 2, RF1 is —F or —CF3, and RF2 is —F or a C1-5 perfluoroalkyl group):
    • 本发明提供一种对短波长光(具有193nm的照射波长的ArF准分子激光和157nm的照射波长的F2准分子激光)的透明性和耐久性优异的氟系聚合物, 防护薄膜材料。 防护薄膜组件,其中用于防护薄膜和/或粘合剂的聚合物(I)是基本上包含以下单元(1)的聚合物。 单元(1)是包含氟原子的单元,其中形成聚合物主链的链包含碳原子和醚氧原子,形成主链的至少一个碳原子是形成环状基团的碳原子,并且 形成主链的至少一个醚性氧原子是不形成环状基团的氧原子。 例如,由下式(A1)(其中n为1或2,R F1)表示的单元为-F或-CF 3 3,R“ F 2是-F或C 1-5〜5全氟烷基):