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31. 发明授权

US07477353B2 Lithography apparatus, method of forming pattern and method of manufacturing semiconductor device 失效
标题翻译：平版印刷设备，形成图案的方法和制造半导体器件的方法
公开(公告)号：US07477353B2
公开(公告)日：2009-01-13
申请号：US11174722
申请日：2005-07-06
申请人： Shinichi Ito , Tsuyoshi Shibata
发明人： Shinichi Ito , Tsuyoshi Shibata
IPC分类号： G03B27/42 , G03B27/52 , G03B27/32 , G03F7/00
CPC分类号： G03F7/70991 , G03F7/70341 , G03F7/70858 , G03F7/70916 , G03F7/70925
摘要： A lithography apparatus includes a resist processing apparatus to perform a process of applying a resist on a substrate, a process of heating a resist film on the substrate, and a process of developing the resist film on the substrate, an immersion exposure apparatus including a projection optical system which projects an image of a pattern on a photomask onto the resist film and configured to perform exposure through liquid located on an optical path between the projection optical system and resist film, a transporting apparatus connected to the resist processing and immersion exposure apparatuses to perform transportation of the substrate between the resist processing and immersion exposure apparatuses, and a temperature/humidity control apparatus configured to control at least one of temperature and humidity in at least one of the resist processing and transporting apparatuses based on temperature and humidity or the in humidity the immersion exposure apparatus.
摘要翻译：光刻设备包括：抗蚀剂处理设备，用于执行在基板上施加抗蚀剂的工艺;加热基板上的抗蚀剂膜的工艺;以及在基板上显影抗蚀剂膜的工艺;浸渍曝光设备，包括：投影光学系统，其将光掩模上的图案的图像投影到抗蚀剂膜上，并且被配置为通过位于投影光学系统和抗蚀剂膜之间的光路上的液体进行曝光，连接到抗蚀剂处理和浸没曝光装置的传送装置在抗蚀剂处理和浸没曝光装置之间执行基板的传送，以及温度/湿度控制装置，其被配置为基于温度和湿度控制至少一个抗蚀剂处理和输送装置中的温度和湿度，湿度浸渍曝光设备。

32. 发明授权

US07472582B2 Leak diagnosis system and leak diagnosis method 失效
标题翻译：泄漏诊断系统和泄漏诊断方法
公开(公告)号：US07472582B2
公开(公告)日：2009-01-06
申请号：US11431651
申请日：2006-05-11
申请人： Shinichi Ito , Nobuhiro Takano
发明人： Shinichi Ito , Nobuhiro Takano
IPC分类号： G01M3/04
CPC分类号： F02M25/0809
摘要： An ECU drives a pump in a first stage at a first pumping capacity. The ECU drives the pump in a second stage after the first stage at a second pumping capacity, which is lower than the first pumping capacity. The second pumping capacity is set such that when at least one leak hole, which forms a predetermined total opening cross sectional area, exists in the purge apparatus, the driving of the pump at the second pumping capacity substantially maintains a predetermined reference pressure in the purge apparatus. The ECU diagnoses whether a leak hole exits in the purge apparatus based on the pressure measured with the pressure sensor in view of the predetermined reference pressure at the time of driving the pump in the second stage at the second pumping capacity.
摘要翻译： ECU以第一泵送能力在第一级驱动泵。 ECU在第一阶段之后的第二阶段中以比第一泵送能力低的第二泵送能力驱动泵。第二抽吸能力设定成使得当在净化装置中存在至少一个形成预定总开口横截面面积的泄漏孔时，在第二抽水能力下的泵的驱动基本上保持了吹扫中的预定参考压力仪器。考虑到在第二阶段以第二泵送能力驱动泵时的预定参考压力，ECU基于在压力传感器测量的压力下，泄漏孔是否泄漏在净化装置中。

33. 发明申请

US20080218715A1 IMMERSION EXPOSURE METHOD OF AND IMMERSION EXPOSURE APPARATUS FOR MAKING EXPOSURE IN A STATE WHERE THE SPACE BETWEEN THE PROJECTION LENS AND SUBSTRATE TO BE PROCESSED IS FILLED WITH A LIQUID 审中-公开
标题翻译：在投影镜头和待处理的衬底之间的空间填充液体的状态下，接触曝光方法和浸入曝光装置
公开(公告)号：US20080218715A1
公开(公告)日：2008-09-11
申请号：US12044439
申请日：2008-03-07
申请人： Masayuki HATANO , Shinichi Ito
发明人： Masayuki HATANO , Shinichi Ito
IPC分类号： G03B27/42
CPC分类号： G03F7/70358 , G03F7/70341 , G03F7/70425
摘要： An immersion exposure method is disclosed which, while causing a relative movement of an immersion area formed so as to intervene between a substrate to be exposed on an exposure stage and a projection lens to the substrate, exposes an irradiation area of the substrate covered with the immersion area. An exposure stage is moved in a first direction, thereby exposing a first exposure area of the substrate. The exposure stage is moved in a second direction opposite to the first direction, thereby exposing a second exposure area adjoining the first exposure area. In a state where the second exposure area is held inside the immersion boundary of the immersion area, the exposure stage is moved from the movement end position of the exposure stage in a first exposure moving process to the movement start position of the exposure stage in a second exposure moving process.
摘要翻译：公开了一种浸没曝光方法，其中，使形成的浸渍区域的相对运动在曝光台上待曝光的基板和投影透镜之间介入到基板的同时，使被覆盖的基板的照射区域曝光沉浸区域。曝光阶段沿第一方向移动，从而暴露基板的第一曝光区域。曝光阶段在与第一方向相反的第二方向上移动，从而暴露与第一曝光区域相邻的第二曝光区域。在第二曝光区域保持在浸没区域的浸没边界内的状态下，曝光阶段在第一曝光移动处理中从曝光台的移动结束位置移动到曝光台的移动开始位置第二曝光移动过程。

34. 发明授权

US07423728B2 Immersion exposure method and apparatus, and manufacturing method of a semiconductor device 有权
标题翻译：浸渍曝光方法和装置以及半导体装置的制造方法
公开(公告)号：US07423728B2
公开(公告)日：2008-09-09
申请号：US11315000
申请日：2005-12-23
申请人： Kentaro Matsunaga , Takuya Kono , Shinichi Ito
发明人： Kentaro Matsunaga , Takuya Kono , Shinichi Ito
IPC分类号： G03B27/54
CPC分类号： G03F7/70341
摘要： There is disclosed an immersion exposure method of carrying out an exposure process in a state that liquid is at least partly filled between a substrate to be exposed and a projection optical system of an exposure apparatus carrying out the exposure process, comprising carrying out a process of making large a contact angle to the liquid with at least outer peripheral portion of a main surface of the substrate compared with a contact angle to the liquid with an area adjacent to the outer peripheral portion of the substrate, which area is a part of a surface of a substrate supporting side of a substrate support member supporting the substrate included in the exposure apparatus, and carrying out the exposure process.
摘要翻译：公开了一种在液体至少部分地填充在待曝光的基板和进行曝光处理的曝光装置的投影光学系统之间进行曝光处理的浸渍曝光方法，包括进行以下处理：与具有与基板的外周部分相邻的区域的液体的接触角相比，与基板的主表面的至少外周部分形成与液体大的接触角，该区域是表面的一部分支撑包含在曝光装置中的基板的基板支撑部件的基板支撑侧，进行曝光处理。

35. 发明授权

US07413185B2 Paper sheet takeout apparatus 失效
标题翻译：纸张取出装置
公开(公告)号：US07413185B2
公开(公告)日：2008-08-19
申请号：US11132416
申请日：2005-05-19
申请人： Yusuke Mitsuya , Shinichi Ito
发明人： Yusuke Mitsuya , Shinichi Ito
IPC分类号： B65H3/52
CPC分类号： B65H1/14 , B65H1/025 , B65H3/0653 , B65H3/5246 , B65H2511/414 , B65H2513/10 , B65H2515/30 , B65H2557/23 , B65H2220/01 , B65H2220/02
摘要： A paper sheet takeout apparatus has a memory which has several processing modes, and stores parameters of a supply speed of a supply unit, a pressing force of a delivering roller and a separating force of a separating roller for each processing mode, a setting unit which selects one of several processing modes, and a controller which reads the parameters from the memory in accordance with the processing mode selected by the setting unit and which controls at least one of supply speed of the supply unit, a pressing force of a delivering roller and a separating force of the separating roller, on the basis of the parameters read from the memory.
摘要翻译：纸张取出装置具有多种处理模式的存储器，并存储用于每种处理模式的供给单元的供给速度，输送辊的按压力和分离辊的分离力的参数，设定单元，选择若干处理模式之一，以及控制器，其根据由设定单元选择的处理模式从存储器读取参数，并且控制供应单元的供给速度，输送辊的按压力和输送辊的压力中的至少一个，基于从存储器读取的参数，分离辊的分离力。

36. 发明授权

US07367557B2 Sheet material feeding apparatus 失效
标题翻译：片材送料装置
公开(公告)号：US07367557B2
公开(公告)日：2008-05-06
申请号：US11170800
申请日：2005-06-30
申请人： Shinichi Ito , Naruaki Hiramitsu , Yoshihiko Naruoka
发明人： Shinichi Ito , Naruaki Hiramitsu , Yoshihiko Naruoka
IPC分类号： B65H1/02
CPC分类号： B65H1/025 , B65H3/0653 , B65H2511/214 , B65H2701/1916 , B65H2220/02 , B65H2220/08
摘要： A sheet material feeding apparatus includes a feed-out device that brings the stacked sheet materials conveyed on a floor belt into contact with a pickup roller and feeds the sheet materials out in a direction crossing the conveying direction of the stacked sheet materials by rotation of the pickup roller, and an inclination correcting device provided in an upstream of the feed-out device in its sheet material feeding direction and including an upper roller located at a position higher than that of the pickup roller, that brings an upper side of the stacked sheet materials conveyed towards the feed-out device into contact with the upper roller to correct the inclination of the stacked sheet materials.
摘要翻译：片材供给装置包括：送出装置，其将输送在地板带上的层叠片材与拾取辊接触，并将片材沿与叠层片材的输送方向交叉的方向通过拾取辊和倾斜校正装置，其设置在所述送出装置的片材供给方向的上游，并且包括位于比拾取辊的位置高的位置的上辊，其将堆叠片材的上侧向送出装置输送的材料与上辊接触以校正堆叠的片材的倾斜度。

37. 发明申请

US20080050677A1 Processing method, manufacturing method of semiconductor device, and processing apparatus 审中-公开
标题翻译：半导体装置的加工方法，制造方法以及加工装置
公开(公告)号：US20080050677A1
公开(公告)日：2008-02-28
申请号：US11905976
申请日：2007-10-05
申请人： Tomoyuki Takeishi , Kenji Kawano , Hiroshi Ikegami , Shinichi Ito , Riichiro Takahashi
发明人： Tomoyuki Takeishi , Kenji Kawano , Hiroshi Ikegami , Shinichi Ito , Riichiro Takahashi
IPC分类号： G03C5/00
CPC分类号： H01L23/544 , B23K26/066 , B23K26/364 , B23K26/40 , B23K2103/172 , G03F7/2026 , G03F7/70341 , G03F9/7076 , G03F9/708 , G03F9/7084 , G21K5/10 , H01J2237/30438 , H01L2223/54453 , H01L2924/0002 , Y10S438/949 , H01L2924/00
摘要： A processing method for selectively reducing or removing the region to be exposed with energy ray in a film formed on a substrate, comprising relatively scanning a first exposure light whose shape on the substrate is smaller than the whole first region to be exposed against the whole first region to be exposed to selectively remove or reduce the first region to be exposed, and exposing a whole second region to be exposed inside the whole first region to be exposed with a second exposure light to selectively expose the whole second region to be exposed.
摘要翻译：一种处理方法，用于在形成在基板上的膜中选择性地减少或去除待曝光的区域，该方法包括相对地扫描基板上的形状比整个第一区域要暴露的整个第一区域的第一曝光灯区域，以选择性地去除或减少要暴露的第一区域，并且用第二曝光光将待暴露的整个第一区域暴露在整个第一区域内的整个第二区域，以选择性地暴露待暴露的整个第二区域。

38. 发明申请

US20070221664A1 Touch Key and Induction Heating Cooking Device Employing the Same 失效
标题翻译：触摸键和感应加热烹饪设备使用它
公开(公告)号：US20070221664A1
公开(公告)日：2007-09-27
申请号：US11572356
申请日：2005-10-06
申请人： Shinichi Ito
发明人： Shinichi Ito
IPC分类号： H05B6/12
CPC分类号： H05B6/062 , H03K17/962 , Y10T307/858
摘要： A touch key detects that an object touches the touch key. The touch key includes an electrode arranged to be touched with the object, an oscillator for outputting a high-frequency voltage and applies the high-frequency voltage to the electrode, a rectifier for rectifying and smoothing the high-frequency voltage output from the oscillator as to output a direct-current (DC) voltage, a reference voltage generator for generating a reference voltage, a subtracter for subtracting the reference voltage from the DC voltage output from the rectifier, a judging unit for detecting a voltage difference between the voltage output from the subtracter before and after changing and for determining that the object touches the electrode when the voltage difference exceeds a predetermined value. This touch key detects that an object touches the electrode with high sensitivity, and enhances the reliability of the judging unit.
摘要翻译：触摸键检测到物体接触触摸键。触摸键包括布置成与物体接触的电极，用于输出高频电压并将高频电压施加到电极的振荡器，用于整流和平滑从振荡器输出的高频电压的整流器，输出直流（DC）电压，用于产生参考电压的参考电压发生器，用于从整流器输出的直流电压中减去参考电压的减法器;判断单元，用于检测从整流器输出的电压之间的电压差; 所述减法器在变化之前和之后，以及当所述电压差超过预定值时确定所述物体接触所述电极。该触摸键检测到物体以高灵敏度触摸电极，并提高判断单元的可靠性。

39. 发明申请

US20070128554A1 Semiconductor device manufacturing method to form resist pattern, and substrate processing apparatus 失效
标题翻译：形成抗蚀剂图案的半导体器件制造方法以及基板处理装置
公开(公告)号：US20070128554A1
公开(公告)日：2007-06-07
申请号：US11600198
申请日：2006-11-16
申请人： Daisuke Kawamura , Eishi Shiobara , Tomoyuki Takeishi , Kei Hayasaki , Yasunobu Onishi , Shinichi Ito , Tatsuhiko Higashiki
发明人： Daisuke Kawamura , Eishi Shiobara , Tomoyuki Takeishi , Kei Hayasaki , Yasunobu Onishi , Shinichi Ito , Tatsuhiko Higashiki
IPC分类号： G03F7/20
CPC分类号： G03F7/70925 , G03F7/70341
摘要： This invention discloses a method to form a resist pattern on a to-be-processed substrate by immersion exposure. A resist film is formed on the central portion of the upper surface of the to-be-processed substrate, on a bevel portion of the upper surface, which is obtained by chamfering the peripheral portion of the to-be-processed substrate, and on the end portion of the to-be-processed substrate. Pattern exposure for forming the latent image of a desired pattern on the resist film is executed while a liquid whose refractive index is higher than that of air exists between the resist film and a constituent element of a projection optical system of an exposure apparatus, which is nearest to the to-be-processed substrate. The resist film formed on the end portion of the to-be-processed substrate is removed by supplying a rinse solution to the end portion of the to-be-processed substrate after executing pattern exposure.
摘要翻译：本发明公开了一种通过浸渍曝光在待处理衬底上形成抗蚀剂图案的方法。在被处理基板的上表面的中央部，在上表面的斜面部分上形成抗蚀剂膜，该斜面部分是通过倒角被处理基板的周边部分而得到的，待处理衬底的端部。在抗蚀剂膜和曝光装置的投影光学系统的构成元素之间存在折射率高于空气的液体的情况下，在抗蚀剂膜上形成期望图案的潜像的图案曝光，其为最接近被处理衬底。在执行图案曝光之后，通过向被处理基板的端部供给冲洗液，除去形成在被处理基板的端部的抗蚀剂膜。

40. 发明申请

US20060289431A1 Substrate processing method and manufacturing method of semiconductor device 失效
标题翻译：半导体器件的基板加工方法及其制造方法
公开(公告)号：US20060289431A1
公开(公告)日：2006-12-28
申请号：US11411139
申请日：2006-04-26
申请人： Kei Hayasaki , Tsuyoshi Shibata , Koutarou Sho , Shinichi Ito
发明人： Kei Hayasaki , Tsuyoshi Shibata , Koutarou Sho , Shinichi Ito
IPC分类号： F27B5/14 , F27D11/00
CPC分类号： F27B17/0025 , F27B5/04 , F27D3/0084 , H01L21/67109
摘要： According to an aspect of the invention, there is provided a single substrate processing method which continuously heats substrates to be processed to which films containing solvents are applied, by use of a heating apparatus having an opening/closing mechanism, including supplying a gas containing a solvent contained in a film of a first substrate to be processed into the heating apparatus in a closed state of the opening/closing mechanism between processing of the first substrate to be processed and processing of a second substrate to be processed.
摘要翻译：根据本发明的一个方面，提供了一种单一的基板处理方法，其通过使用具有打开/关闭机构的加热装置连续加热待加工的含有溶剂的薄膜的基板处理方法，该加热装置包括供给含有在待处理的第一基板的处理和待处理的第二基板的处理之间的打开/关闭机构的闭合状态下，加热到加热装置的第一基板的膜中所含的溶剂。

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