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    • 34. 发明授权
    • Active feedback pulsed measurement method
    • 主动反馈脉冲测量方法
    • US06396298B1
    • 2002-05-28
    • US09549503
    • 2000-04-14
    • Albert M. YoungSamuel S. Osofsky
    • Albert M. YoungSamuel S. Osofsky
    • G01R3126
    • G01R31/2621G01R27/28
    • A pulse measurement method is applied to test devices such as high power FET transistors for measuring DC device parameters as well as for measuring S parameters during AC testing. The method uses an input gate bias tee for applying an accurately shaped pulsed input, a sensing bias tee for sensing terminal voltages, such as drain voltages for an FET, and a drive bias tee for coupling in a feedback signal provided by an active feedback circuit receiving AC coupled input error signal of the DC terminal voltage and for providing a drive signal as an error signal so as to maintain the applied DC test voltages at stable levels for improved accuracy.
    • 应用脉冲测量方法来测试诸如大功率FET晶体管的器件,用于测量DC器件参数以及在AC测试期间测量S参数。 该方法使用用于施加精确成形的脉冲输入的输入栅极偏置T形件,用于感测端子电压的感测偏置T形,例如用于FET的漏极电压,以及用于在由有源反馈电路提供的反馈信号中耦合的驱动偏置三通 接收直流端电压的交流耦合输入误差信号,并提供驱动信号作为误差信号,以便将所施加的直流测试电压保持在稳定水平以提高精度。
    • 36. 发明授权
    • Method and structure for optimizing yield of 3-D chip manufacture
    • 优化3-D芯片制造产量的方法和结构
    • US07999377B2
    • 2011-08-16
    • US12029122
    • 2008-02-11
    • Edward M. DeMulderSarah H. KnickerbockerMichael J. ShapiroAlbert M. Young
    • Edward M. DeMulderSarah H. KnickerbockerMichael J. ShapiroAlbert M. Young
    • H01L23/488
    • H01L21/8221H01L27/0688H01L2224/13
    • The process begins with separate device wafers having complimentary chips. Thin metal capture pads, having a preferred thickness of about 10 microns so that substantial pressure may be applied during processing without damaging capture pads, are deposited on both device wafers, which are then tested and mapped for good chip sites. A handle wafer is attached to one device wafer, which can then be thinned to improve via etching and filling. Capture pads are removed and replaced after thinning. The device wafer with handle wafer is diced, and good chips with attached portions of the diced handle wafer are positioned and bonded to the good chip sites of the other device wafer, and the handle wafer portions are removed. The device wafer having known good 3-D chips then undergoes final processing.
    • 该过程开始于具有互补芯片的单独的器件晶片。 薄金属捕获垫具有约10微米的优选厚度,使得在处理过程中可能施加大的压力而不损坏捕获垫,沉积在两个器件晶片上,然后对其进行测试和映射以获得良好的芯片位置。 处理晶片连接到一个器件晶片,然后可以通过蚀刻和填充来减薄其改进。 捕获垫被去除并在变薄后更换。 切割具有处理晶片的器件晶片,并且将具有切割手柄晶片的附接部分的良好芯片定位并结合到另一器件晶片的良好芯片位置,并移除处理晶片部分。 具有已知良好3-D芯片的器件晶片然后进行最终处理。