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31. 发明授权

US07679812B2 Support structure for MEMS device and methods therefor 失效
标题翻译： MEMS器件的支撑结构及其方法
公开(公告)号：US07679812B2
公开(公告)日：2010-03-16
申请号：US11491389
申请日：2006-07-21
申请人： Teruo Sasagawa , Clarence Chui , Manish Kothari , SuryaPrakash Ganti , Jeffrey B. Sampsell , Chun-Ming Wang
发明人： Teruo Sasagawa , Clarence Chui , Manish Kothari , SuryaPrakash Ganti , Jeffrey B. Sampsell , Chun-Ming Wang
IPC分类号： G02B26/00 , G02B26/08
CPC分类号： G02B26/0841 , B81B2201/042 , B81B2203/0307 , B81C1/00595 , B81C2201/014 , G02B26/001
摘要： A microelectromechanical systems device having support structures formed of sacrificial material surrounded by a protective material. The microelectromechanical systems device includes a substrate having an electrode formed thereon. Another electrode is separated from the first electrode by a cavity and forms a movable layer, which is supported by support structures formed of a sacrificial material.
摘要翻译：具有由保护材料包围的牺牲材料形成的支撑结构的微机电系统装置。微机电系统装置包括其上形成有电极的基板。另一电极通过空腔与第一电极分离，并形成可移动层，该可移动层由牺牲材料形成的支撑结构支撑。

32. 发明授权

US07506429B2 Method of constructing a magnetic sensor 失效
标题翻译：构造磁传感器的方法
公开(公告)号：US07506429B2
公开(公告)日：2009-03-24
申请号：US11053118
申请日：2005-02-07
申请人： Howard Gordon Zolla , Edward Hin Pong Lee , Kim Y. Lee , Tsann Lin , Chun-Ming Wang
发明人： Howard Gordon Zolla , Edward Hin Pong Lee , Kim Y. Lee , Tsann Lin , Chun-Ming Wang
IPC分类号： G11B5/127 , H04R31/00
CPC分类号： B82Y25/00 , B82Y10/00 , G11B5/3116 , G11B5/313 , G11B5/3163 , G11B5/3903 , G11B5/3909 , G11B2005/3996 , Y10T29/49032 , Y10T29/49043 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： A magnetoresistive sensor having a well defined track width and method of manufacture thereof.
摘要翻译：具有良好限定的轨道宽度的磁阻传感器及其制造方法。

33. 发明授权

US07186348B2 Method for fabricating a pole tip in a magnetic transducer 有权
标题翻译：在磁换能器中制造极尖的方法
公开(公告)号：US07186348B2
公开(公告)日：2007-03-06
申请号：US10882883
申请日：2004-06-30
申请人： Tsung Yuan Chen , David Patrick Druist , Quang Le , Kim Y. Lee , Chun-Ming Wang , Howard Gordon Zolla
发明人： Tsung Yuan Chen , David Patrick Druist , Quang Le , Kim Y. Lee , Chun-Ming Wang , Howard Gordon Zolla
IPC分类号： G11B5/187
CPC分类号： G11B5/3163 , G11B5/1278 , G11B5/3116 , Y10T29/49032
摘要： A method for fabricating a magnetic head with a trapezoidal shaped pole piece tip is described. The body of the main pole piece is deposited, then one or more layers for the pole piece tip are deposited. A bed material is deposited over the pole piece tip material. A void is formed in the bed material over the area for the pole piece tip. The void is filled with an ion-milling resistant material such as alumina preferably using atomic layer deposition or atomic layer chemical vapor deposition. The excess ion-milling resistant material and the bed material are removed. The result is an ion-milling mask formed over the area for the pole piece tip. Ion milling is then used to remove the unmasked material in the pole piece tip layer and to form a beveled pole piece tip and preferably a beveled face on the main pole piece.
摘要翻译：描述了制造具有梯形极片尖端的磁头的方法。沉积主极片的主体，然后沉积用于极片尖端的一个或多个层。床材料沉积在极片末端材料上。在用于极片尖端的区域上的床材料中形成空隙。空隙填充有耐离子碾磨材料，例如氧化铝，优选使用原子层沉积或原子层化学气相沉积。除去过量的抗离子碾磨材料和床料。结果是在极片尖端的区域上形成离子铣削掩模。然后使用离子铣削去除极片末端层中的未掩模材料，并且在主极片上形成斜面极片末端，并且优选地形成斜面。

34. 发明申请

US20070019923A1 Support structure for MEMS device and methods therefor 失效
标题翻译： MEMS器件的支撑结构及其方法
公开(公告)号：US20070019923A1
公开(公告)日：2007-01-25
申请号：US11491389
申请日：2006-07-21
申请人： Teruo Sasagawa , Clarence Chui , Manish Kothari , SuryaPrakash Ganti , Jeffrey Sampsell , Chun-Ming Wang
发明人： Teruo Sasagawa , Clarence Chui , Manish Kothari , SuryaPrakash Ganti , Jeffrey Sampsell , Chun-Ming Wang
IPC分类号： G02B6/00
CPC分类号： G02B26/0841 , B81B2201/042 , B81B2203/0307 , B81C1/00595 , B81C2201/014 , G02B26/001
摘要： A microelectromechanical systems device having support structures formed of sacrificial material surrounded by a protective material. The microelectromechanical systems device includes a substrate having an electrode formed thereon. Another electrode is separated from the first electrode by a cavity and forms a movable layer, which is supported by support structures formed of a sacrificial material.
摘要翻译：具有由保护材料包围的牺牲材料形成的支撑结构的微机电系统装置。微机电系统装置包括其上形成有电极的基板。另一电极通过空腔与第一电极分离，并形成可移动层，该可移动层由牺牲材料形成的支撑结构支撑。

35. 发明授权

US07166542B2 Method for fabricating passivation layer 有权
标题翻译：钝化层制造方法
公开(公告)号：US07166542B2
公开(公告)日：2007-01-23
申请号：US10707112
申请日：2003-11-21
申请人： Ming-Hung Lo , Liang-Pin Chou , Chun-Ming Wang , Li-Fu Chen
发明人： Ming-Hung Lo , Liang-Pin Chou , Chun-Ming Wang , Li-Fu Chen
IPC分类号： H01L21/31 , H01L21/469
CPC分类号： H01L21/76834 , H01L21/76832
摘要： A method of fabricating a passivation layer is provided. A substrate with a plurality of device structures and at least an interconnect thereon is provided. A patterned metallic layer is formed over the interconnection layer. A plasma-enhanced chemical vapor deposition process is performed to form a first passivation over the metallic layer such that the processing pressure is higher (and/or the processing power is lower) than the pressure (the power) used in prior art. A moisture impermeable second passivation is formed over the first passivation layer. With the first passivation formed in a higher processing pressure (and/or lower processing power), damages to metallic layers or devices due to plasma bombardment is minimized.
摘要翻译：提供一种制造钝化层的方法。提供具有多个器件结构并且至少在其上的互连的衬底。在互连层上形成图案化的金属层。执行等离子体增强化学气相沉积工艺以在金属层上形成第一钝化，使得处理压力比现有技术中使用的压力（功率）更高（和/或处理能力较低）。在第一钝化层上形成不透水的第二钝化。由于在较高的处理压力（和/或较低的处理能力）下形成的第一钝化，由于等离子体轰击而对金属层或器件造成的损害最小化。

36. 发明授权

US08465906B2 Method and mask for enhancing the resolution of patterning 2-row holes 有权
标题翻译：用于提高图案化2排孔分辨率的方法和掩模
公开(公告)号：US08465906B2
公开(公告)日：2013-06-18
申请号：US13081268
申请日：2011-04-06
申请人： Chun-Ming Wang , Chenche Huang , Masaaki Higashitani
发明人： Chun-Ming Wang , Chenche Huang , Masaaki Higashitani
IPC分类号： G03F7/20 , G03F7/36
CPC分类号： G03F7/70433 , G03F1/26 , G03F1/32 , G03F1/36 , G03F7/70091
摘要： A photolithography mask including a plurality of mask features. Adjacent mask features are separated by a gap and are offset from each other such that individual mask features have one-side dense portions and two-side dense portions. Also a photolithography method that includes a step of providing a substantially opaque mask having N stepped rows of offset, substantially transparent, rectangular mask features, where N is an integer and N≧2. The method also includes illuminating a photoresist layer located over an underlying material with dipole illumination through the substantially transparent, rectangular mask features in the substantially opaque mask to form 2N rows of exposed regions in the photoresist layer. The exposed regions have a substantially elliptical or substantially circular shape when viewed from above the photoresist layer.
摘要翻译：一种包括多个掩模特征的光刻掩模。相邻的掩模特征由间隙分隔开并且彼此偏移，使得各个掩模特征具有单侧致密部分和两侧致密部分。还有一种光刻方法，其包括提供具有偏移的，基本上透明的矩形掩模特征的N个阶梯行的基本不透明掩模的步骤，其中N是整数，N> = 2。该方法还包括通过偶极照明通过基本上不透明掩模中的基本上透明的矩形掩模特征照亮位于下层材料上的光致抗蚀剂层，以在光致抗蚀剂层中形成2N排暴露区域。当从光致抗蚀剂层的上方观察时，暴露区域具有基本上椭圆形或大致圆形形状。

37. 发明申请

US20130120307A1 Handheld Device and Control Method Thereof 审中-公开
标题翻译：手持设备及其控制方法
公开(公告)号：US20130120307A1
公开(公告)日：2013-05-16
申请号：US13314331
申请日：2011-12-08
申请人： Ya-Ting Tsai , Jia-Shen Hua , Chun-Ming Wang , Chien-Hsiung Chen
发明人： Ya-Ting Tsai , Jia-Shen Hua , Chun-Ming Wang , Chien-Hsiung Chen
IPC分类号： G06F3/041 , G06F3/045
CPC分类号： G06F3/0414 , H04M1/6016 , H04M2250/12 , H04M2250/22
摘要： A handheld device includes a touch panel, a speaker, and a processor. The touch panel is operable to detect the touched area generated by an object touching the touch panel. The speaker is operable to provide sounds. The processor is connected to the touch panel and the speaker and controls the volume of the sounds provided by the speaker based on the touched area. The processor decreases the volume of the sounds when the value of the touched area is lower than a first predetermined value, and the processor increases the volume of the sounds when the value of the touched area is high than a second predetermined value. Furthermore, a method for controlling the handheld device is disclosed herein.
摘要翻译：手持设备包括触摸面板，扬声器和处理器。触摸面板可操作以检测由触摸触摸面板的物体产生的触摸区域。扬声器可操作以提供声音。处理器连接到触摸面板和扬声器，并且基于触摸的区域来控制由扬声器提供的声音的音量。当触摸区域的值低于第一预定值时，处理器减小声音的音量，并且当触摸区域的值高于第二预定值时，处理器增加声音的音量。此外，本文公开了一种用于控制手持设备的方法。

38. 发明授权

US08076056B2 Method of making sub-resolution pillar structures using undercutting technique 有权
标题翻译：使用底切技术制作分辨率柱状结构的方法
公开(公告)号：US08076056B2
公开(公告)日：2011-12-13
申请号：US12285466
申请日：2008-10-06
申请人： Chun-Ming Wang , Steven Maxwell , Paul Wai Kie Poon , Yung-Tin Chen
发明人： Chun-Ming Wang , Steven Maxwell , Paul Wai Kie Poon , Yung-Tin Chen
IPC分类号： G03F7/26
CPC分类号： H01L21/0334 , H01L21/0338
摘要： A method of making a device includes forming an underlying mask layer over an underlying layer, forming a first mask layer over the underlying mask layer, patterning the first mask layer to form first mask features, undercutting the underlying mask layer to form underlying mask features using the first mask features as a mask, removing the first mask features, and patterning the underlying layer using at least the underlying mask features as a mask.
摘要翻译：一种制造器件的方法包括在下面的层上形成下面的掩模层，在下面的掩模层之上形成第一掩模层，对第一掩模层进行图案化以形成第一掩模特征，利用下面的掩模层来切割下面的掩模特征，使用第一掩模作为掩模，去除第一掩模特征，并使用至少底层掩模特征作为掩模来图案化底层。

39. 发明授权

US08026172B2 Method of forming contact hole arrays using a hybrid spacer technique 有权
标题翻译：使用混合间隔技术形成接触孔阵列的方法
公开(公告)号：US08026172B2
公开(公告)日：2011-09-27
申请号：US12458017
申请日：2009-06-29
申请人： Chun-Ming Wang , Chenche Huang , Masaaki Higashitani
发明人： Chun-Ming Wang , Chenche Huang , Masaaki Higashitani
IPC分类号： H01L21/4763
CPC分类号： H01L21/76816 , H01L21/0337 , H01L21/31144
摘要： One embodiment of the invention provides a method of forming a plurality of contact holes, including forming a first feature and a second feature over an underlying material, forming sidewall spacers on the first and second features, removing the first and second features without removing the sidewall spacers, forming a cover mask at least partially exposing the sidewall spacers, and etching the underlying material using the cover mask and the sidewall spacers as a mask to form the plurality of contact holes.
摘要翻译：本发明的一个实施例提供一种形成多个接触孔的方法，包括在下面的材料上形成第一特征和第二特征，在第一和第二特征上形成侧壁间隔物，去除第一和第二特征而不移除侧壁间隔件，形成至少部分地暴露侧壁间隔物的覆盖掩模，以及使用覆盖掩模和侧壁间隔物作为掩模蚀刻下面的材料以形成多个接触孔。

40. 发明授权

US07969641B2 Device having power generating black mask and method of fabricating the same 有权
标题翻译：具有发电黑色掩模的装置及其制造方法
公开(公告)号：US07969641B2
公开(公告)日：2011-06-28
申请号：US12371538
申请日：2009-02-13
申请人： Ion Bita , Chun-Ming Wang , Gang Xu
发明人： Ion Bita , Chun-Ming Wang , Gang Xu
IPC分类号： G02B7/02
CPC分类号： G02B26/001 , G02F1/133512 , G02F2001/13324 , Y02E10/52
摘要： A power generating black mask comprising an anti-reflection layer deposited over a substrate, a first electrode layer deposited over the anti-reflection layer, a semi-conductor layer deposited over the first electrode layer and a second electrode layer deposited over the semi-conductor layer.
摘要翻译：一种功率产生黑色掩模，包括沉积在衬底上的抗反射层，沉积在抗反射层上的第一电极层，沉积在第一电极层上的半导体层和沉积在半导体上的第二电极层层。

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