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31. 发明授权

US07564636B2 Device for preventing the displacement of an optical element 有权
标题翻译：用于防止光学元件的位移的装置
公开(公告)号：US07564636B2
公开(公告)日：2009-07-21
申请号：US10570021
申请日：2004-08-20
申请人： Christian Zengerling , Armin Schoeppach , Ulrich Weber
发明人： Christian Zengerling , Armin Schoeppach , Ulrich Weber
IPC分类号： G02B7/02
CPC分类号： G03F7/70825 , G02B7/003
摘要： In a device for preventing the creeping of an optical element, in particular a lens or a mirror, the optical element is connected to a mount via connecting members arranged on the circumference of the optical element. The position of the optical element in an objective (PL) deviates from the vertical axial position. In order to compensate the dead weight at least of the optical element at least one holding element via which the optical element is held on a housing part of the objective (PL) is provided in addition to the connecting members.
摘要翻译：在防止光学元件，特别是透镜或反射镜的蠕变的装置中，光学元件通过布置在光学元件的圆周上的连接构件连接到安装座。光学元件在物镜（PL）中的位置偏离垂直轴向位置。为了补偿至少一个光学元件的自重，除了连接构件之外，还设置有至少一个保持元件，通过该保持元件将光学元件保持在物镜（PL）的外壳部分上。

32. 发明申请

US20090141258A1 Imaging Device in a Projection Exposure Machine 审中-公开
标题翻译：投影曝光机中的成像装置
公开(公告)号：US20090141258A1
公开(公告)日：2009-06-04
申请号：US12363065
申请日：2009-01-30
申请人： Stephan Back , Wolfgang Hummel , Juergen Fischer , Karl-Eugen Aubele , Erich Merz , Raoul Reiner , Klaus Rief , Stefan Schoengart , Markus Neumaier , Baerbel Schwaer , Ulrich Weber , Michael Muehlbeyer , Hubert Holderer , Alexander Kohl , Jochen Weber , Johannes Lippert , Thorsten Rassel
发明人： Stephan Back , Wolfgang Hummel , Juergen Fischer , Karl-Eugen Aubele , Erich Merz , Raoul Reiner , Klaus Rief , Stefan Schoengart , Markus Neumaier , Baerbel Schwaer , Ulrich Weber , Michael Muehlbeyer , Hubert Holderer , Alexander Kohl , Jochen Weber , Johannes Lippert , Thorsten Rassel
IPC分类号： G03B27/54 , G02B15/14
CPC分类号： G03F7/70258 , G03F7/70825
摘要： An imaging device in a projection exposure machine for microlithography includes at least one optical element and at least one manipulator, a linear drive for manipulating the position of the optical element. The linear drive has at least one moving element, the moving element having a shearing part and a lifting part. The shearing part is arranged to move the optical element and the lifting part is arranged to move the shearing part. The linear drive has a supporting element which is in contact with and prevents movement of the optical element while the shearing part is moved by the lifting part.
摘要翻译：用于微光刻的投影曝光机中的成像装置包括至少一个光学元件和至少一个操纵器，用于操纵光学元件的位置的线性驱动器。线性驱动器具有至少一个移动元件，移动元件具有剪切部分和提升部分。剪切部分被布置成移动光学元件，并且提升部分被布置成移动剪切部分。线性驱动器具有支撑元件，该支撑元件在通过提升部分移动剪切部分的同时与光学元件接触并防止其移动。

33. 发明授权

US07362520B2 Device for the low-deformation mounting of a rotationally asymmetric optical element 失效
标题翻译：用于旋转非对称光学元件的低变形安装的装置
公开(公告)号：US07362520B2
公开(公告)日：2008-04-22
申请号：US10964601
申请日：2004-10-12
申请人： Ulrich Weber
发明人： Ulrich Weber
IPC分类号： G02B7/02
CPC分类号： G03F7/70825 , G02B7/008 , G02B7/1805
摘要： A low-deformation mounting device of a rotationally asymmetric optical element, particularly an optical element in a projection lens used in semiconductor lithography. Said optical element is mounted in a frame and is provided with at least three connection surfaces that are positioned perpendicular to each other. Frame-connecting members are disposed in such a way that at least one but no more than two degrees of translational freedom and at least one but no more than two degrees of rotational freedom are obtained by means of said connecting members.
摘要翻译：旋转非对称光学元件的低变形安装装置，特别是用于半导体光刻的投影透镜中的光学元件。所述光学元件安装在框架中并且设置有至少三个彼此垂直定位的连接表面。框架连接构件以这样的方式设置，即通过所述连接构件获得至少一个但不超过两个平移自由度和至少一个但不超过两个旋转自由度。

34. 发明授权

US06891177B1 Ion beam scanner system and operating method 失效
标题翻译：离子束扫描仪系统及操作方法
公开(公告)号：US06891177B1
公开(公告)日：2005-05-10
申请号：US09890897
申请日：2000-02-11
申请人： Gerhard Kraft , Ulrich Weber
发明人： Gerhard Kraft , Ulrich Weber
IPC分类号： A61N5/10 , G21K1/04 , G21K3/00 , G21K5/00 , G21K5/04 , G21K1/00 , G21K1/02 , H01J5/18 , H01J29/46
CPC分类号： G21K1/10 , A61N5/1042 , A61N5/1043 , A61N2005/1087 , A61N2005/1095 , G21K1/04 , G21K1/046 , G21K5/04
摘要： The invention relates to an ion beam scanning system having an ion source device, an ion acceleration system and an ion beam guidance system comprising an ion beam outlet window for a converging centered ion beam, and a mechanical alignment system for the target volume to be scanned. For that purpose, the ion acceleration system can be set to an acceleration of the ions required to obtain a maximum depth of penetration. The scanning system also has energy absorption means arranged in the path of the ion beam between the target volume and the ion beam outlet window transverse to the center of the ion beam. The energy absorption means can be displaced transverse to the center of the ion beam in order to vary the energy of the ion beam, so enabling, in the target volume, depth modulation of the ion beam, which is effected by means of a linear motor and the transverse displacement of the energy absorption means, with depth-staggered scanning of volume elements of the target volume in rapid succession. The invention relates also to a method of ion beam scanning and a method of operating an ion beam scanning system using a gantry system.
摘要翻译：本发明涉及一种具有离子源装置，离子加速系统和离子束引导系统的离子束扫描系统，该离子束引导系统包括用于会聚中心离子束的离子束出口窗口和用于待扫描的目标体积的机械对准系统。为此，可以将离子加速系统设定为获得最大穿透深度所需离子的加速度。扫描系统还具有布置在离子束的路径中的能量吸收装置，该离子束在目标体积和垂直于离子束中心的离子束出射窗口之间。能量吸收装置可以横向于离子束的中心位移，以便改变离子束的能量，从而使目标体积中的离子束的深度调制能够通过线性电动机以及能量吸收装置的横向位移，其中快速连续地对目标体积的体积元素进行深度交错的扫描。本发明还涉及离子束扫描的方法和使用龙门架系统操作离子束扫描系统的方法。

35. 发明授权

US08542346B2 Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrations 有权
标题翻译：光学系统，具有可更换的可操作的校正装置，用于减少图像像差
公开(公告)号：US08542346B2
公开(公告)日：2013-09-24
申请号：US12409961
申请日：2009-03-24
申请人： Guido Limbach , Franz Sorg , Armin Schoeppach , Ulrich Weber , Ulrich Loering , Dirk Hellweg , Peter Meyer , Stefan Xalter , Jens Kugler , Bernhard Gellrich , Stefan Hembacher , Bernhard Geuppert , Aksel Goehnermeier
发明人： Guido Limbach , Franz Sorg , Armin Schoeppach , Ulrich Weber , Ulrich Loering , Dirk Hellweg , Peter Meyer , Stefan Xalter , Jens Kugler , Bernhard Gellrich , Stefan Hembacher , Bernhard Geuppert , Aksel Goehnermeier
IPC分类号： G03B27/52
CPC分类号： G02B7/004 , G02B27/0068 , G03F7/70191 , G03F7/70258 , G03F7/70308 , G03F7/70825
摘要： The disclosure relates to an optical system, such as a projection exposure apparatus for semiconductor lithography, including a manipulable correction arrangement for reducing image aberrations. In some embodiments, the system includes at least one manipulator configured to reduce image aberrations. The manipulator can include at least one optical element which can be manipulated by at least one actuator. The manipulator can be formed in changeable fashion together with an actuator.
摘要翻译：本发明涉及一种光学系统，例如用于半导体光刻的投影曝光装置，包括用于减小图像像差的可操作的校正装置。在一些实施例中，系统包括被配置为减少图像像差的至少一个操纵器。操纵器可以包括至少一个可由至少一个致动器操纵的光学元件。操纵器可以与致动器一起以可变的方式形成。

36. 发明申请

US20120067833A1 SUPPORT ELEMENTS FOR AN OPTICAL ELEMENT 有权
标题翻译：支持光学元件的元素
公开(公告)号：US20120067833A1
公开(公告)日：2012-03-22
申请号：US13071165
申请日：2011-03-24
申请人： Jens Kugler , Ulrich Weber , Nicolai Wengert
发明人： Jens Kugler , Ulrich Weber , Nicolai Wengert
IPC分类号： H05K7/18
CPC分类号： G03F7/7015 , G02B7/003 , G02B7/02 , G03F7/70825
摘要： Support elements for an optical element and a method for supporting an optical element are disclosed. The disclosure can be used in connection with arbitrary optical apparatuses or optical imaging methods. In particular, the disclosure can be used in connection with the microlithography employed in the manufacture of microelectronic circuits.
摘要翻译：公开了用于光学元件的支撑元件和用于支撑光学元件的方法。本公开可以与任意光学装置或光学成像方法结合使用。特别地，本公开可以结合用于制造微电子电路的微光刻来使用。

37. 发明申请

US20120019798A1 POSITIONING UNIT AND ALIGNMENT DEVICE FOR AN OPTICAL ELEMENT 有权
标题翻译：光学元件的定位单元和对准装置
公开(公告)号：US20120019798A1
公开(公告)日：2012-01-26
申请号：US13230398
申请日：2011-09-12
申请人： Ulrich Weber , Jens Kugler
发明人： Ulrich Weber , Jens Kugler
IPC分类号： G03B27/54 , G02B7/02
CPC分类号： G02B7/005 , G02B7/003 , G02B7/004 , G02B7/02 , G02B7/023 , G02B7/1822 , G03F7/7015 , G03F7/70258 , G03F7/70825
摘要： The disclosure provides a positioning unit for an optical element in a microlithographic projection exposure installation having a first connecting area for connection to the optical element, and having a second connecting area for connection to an object in the vicinity of the optical element.
摘要翻译：本公开提供了一种用于在微光刻投影曝光装置中的光学元件的定位单元，其具有用于连接到光学元件的第一连接区域，并且具有用于连接到光学元件附近的物体的第二连接区域。

38. 发明申请

US20110199597A1 IMAGING DEVICE IN A PROJECTION EXPOSURE FACILITY 有权
标题翻译：投影曝光设备中的成像装置
公开(公告)号：US20110199597A1
公开(公告)日：2011-08-18
申请号：US13096112
申请日：2011-04-28
申请人： Wolfgang Hummel , Jurgen Fischer , Karl-Eugen Aubele , Erich Merz , Raoul Reiner , Klaus Rief , Stefan Schöngart , Markus Neumaier , Bärbel Trossbach , Ulrich Weber , Michael Mühlbeyer , Hubert Holderer , Alexander Kohl , Jochen Weber , Johannes Lippert , Thorsten Rassel
发明人： Wolfgang Hummel , Jurgen Fischer , Karl-Eugen Aubele , Erich Merz , Raoul Reiner , Klaus Rief , Stefan Schöngart , Markus Neumaier , Bärbel Trossbach , Ulrich Weber , Michael Mühlbeyer , Hubert Holderer , Alexander Kohl , Jochen Weber , Johannes Lippert , Thorsten Rassel
IPC分类号： G03B27/52
CPC分类号： G03F7/70258 , G03F7/70825
摘要： An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.
摘要翻译：用于微光刻的投影曝光机中的成像装置具有至少一个光学元件和至少一个具有线性驱动的操纵器，用于操纵光学元件的位置。线性驱动器具有驱动区域和非驱动子区域，它们可以在运动轴线的方向上相对于彼此移动。至少临时地通过具有主动轴的功能元件和通过至少大致平行于运动轴的有源方向的功能元件临时地互相连接。

39. 发明申请

US20100245847A1 POSITIONING UNIT AND ALIGNMENT DEVICE FOR AN OPTICAL ELEMENT 有权
标题翻译：光学元件的定位单元和对准装置
公开(公告)号：US20100245847A1
公开(公告)日：2010-09-30
申请号：US12768286
申请日：2010-04-27
申请人： Ulrich Weber , Jens Kugler
发明人： Ulrich Weber , Jens Kugler
IPC分类号： G01B11/14
CPC分类号： G02B7/005 , G02B7/003 , G02B7/004 , G02B7/02 , G02B7/023 , G02B7/1822 , G03F7/7015 , G03F7/70258 , G03F7/70825
摘要： The invention relates to a positioning unit for an optical element in a microlithographic projection exposure installation. Said unit comprises a first connection region (A, 22) for connecting to the optical elements, and a second connection region (B, 20) for connecting to an object in the vicinity of the optical elements. At least two levers are connected to the second connection region by means of the respective lever bearing thereof, and the respective load arm thereof is connected to the first connection region by an articulation by means of an intermediate element (31, 33, 36) applied to said articulations. Regulating devices (28, 29) or actuators are arranged on the respective power arms of the levers. In a first position, the first connection region and the second connection region are arranged in relation to each other in such a way that the lever bearings of at least two levers and the articulations associated with said levers have approximately parallel rotational axes that are located approximately in a plane in the first position.
摘要翻译：本发明涉及一种用于微光刻投影曝光装置中的光学元件的定位单元。所述单元包括用于连接到光学元件的第一连接区域（A，22）和用于连接到光学元件附近的物体的第二连接区域（B，20）。至少两个杠杆通过其相应的杠杆轴承连接到第二连接区域，并且其相应的负载臂通过借助于施加的中间元件（31,33,36）的铰接而连接到第一连接区域到所说的关节。调节装置（28,29）或致动器布置在杠杆的相应动力臂上。在第一位置，第一连接区域和第二连接区域彼此相对布置，使得至少两个杠杆的杠杆轴承和与所述杠杆相关联的铰接件具有近似平行的旋转轴线，其大致位于在一架飞机中处于第一位。

40. 发明申请

US20100214675A1 OPTICAL ELEMENT MODULE WITH MINIMIZED PARASITIC LOADS 有权
标题翻译：具有最小化PARASIIC负载的光学元件模块
公开(公告)号：US20100214675A1
公开(公告)日：2010-08-26
申请号：US12708034
申请日：2010-02-18
申请人： Jens Kugler , Ulrich Weber , Dirk Schaffer
发明人： Jens Kugler , Ulrich Weber , Dirk Schaffer
IPC分类号： G02B7/00
CPC分类号： G02B7/02 , G02B7/021 , G03F7/70825
摘要： An optical element module is provided. The optical module includes an optical element unit that includes an optical element and a support structure that supports the optical element unit. The support structure includes a support device and a contact device mounted to the support device. The contact device exerts a force on the optical element unit in a first direction via a first contact surface of the contact device. The first contact surface contacts a second contact surface of the optical element unit. The contact device includes a first linking section and a second linking section extending along a second direction running transverse to the first direction and arranged kinematically in series between the first contact surface and the support device. The first linking section and the second linking section are elastically deformed in response to a bending moment resulting from the force. The first linking section and the second linking section are arranged on opposite sides of a reference plane. The reference plane includes the force and runs transverse to the second direction.
摘要翻译：提供了一种光学元件模块。光学模块包括光学元件单元，其包括光学元件和支撑光学元件单元的支撑结构。支撑结构包括支撑装置和安装到支撑装置的接触装置。接触装置经由接触装置的第一接触面沿第一方向在光学元件单元上施加力。第一接触表面接触光学元件单元的第二接触表面。接触装置包括第一连接部分和第二连接部分，该第二连接部分沿着横向于第一方向的第二方向延伸并且在运动学上串联布置在第一接触表面和支撑装置之间。第一连接部分和第二连接部分响应于由力产生的弯矩而弹性变形。第一连接部分和第二连接部分布置在参考平面的相对侧上。参考平面包括力并横向于第二方向延伸。

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